Channel-Stacked NAND Flash Memory with High-κ Charge Trapping Layer for High Scalability

학위논문 (박사)-- 서울대학교 대학원 : 전기·컴퓨터공학부, 2016. 2. 박병국.Exploding demands for mobile devices induce the drastic expansion of the market of NAND flash memory as high density storage devices. Three-dimensional (3D) NAND flash memory paved a new way of increasing the memory capacity by stacking cells in three-dimension. For stacked NAND flash memory, the thickness of ONO (memory dielectric layers) is a roadblock in scaling-down of the minimum feature size, because channel diameter can be scaled down to < 20 nm. However, it is challenging to reduce the thickness of oxide-nitride-oxide (ONO) layer, since the charge trapping properties degrade when the Si3N4 is made thinner. .In this thesis, the channel stacked NAND flash memory array (CSTAR) with high-κ charge trapping layer for high scalability is proposed. To adopt high-κ layer into 3D NAND, its memory characteristics were evaluated with capacitors and gate-all-around flash memory devices. Finally, 4-layer channel stacked memory with high-κ layer was successfully fabricated and characterized. Recent trend of nonvolatile memories are introduced and the overview of 3D stacked NAND flash memory technology is presented in Chapter 1 and 2. In Chapter 3, the memory characteristics of high-κ layer were evaluated with fabricated capacitors and flash memory devices. In Chapter 4, fabrication process and electrical characteristics of CSTAR with high-κ are shown. With the comparison with previous works using ONO layer, CSTAR with high-κ is evaluated. In Chapter 5, the novel operation method of CSTAR is presented. Using TCAD and measurement, a newly designed operation method is verifiedChapter 1 Introduction 1 1.1 Flash Memory Technology 1 1.2 Flash Memory Unit Cell and Array Structure 6 1.3 NAND Cell Operation 13 1.4 Charge Trap Flash Memory 25 Chapter 2 3-D Stacked NAND Flash Memory 28 2.2 Examination of Previous 3-D Stacked NAND Flash 28 2.2.1 Gate Stack Type 3-D NAND Flash Memory 28 2.2.2 Channel Stack Type 3-D NAND Flash Memory 36 2.2.3 Comparison between the Gate Stack Type and the Channel Stack Type 45 Chapter 3 Channel Stacked NAND Flash Memory with high- Charge Trapping Layer 48 3.1 Introduction 48 3.2 Memory Characteristics of HfO2 52 3.3 Fabrication of Nanowire Memory Devices with high-κ Dielectric Layer 56 Chapter 4 Fabrication of Channel Stacked NAND Flash Memory with High-κ 66 4.1 Introduction 66 4.2 Fabrication Method 67 4.3 Key Process Steps of CSTAR with high-κ 72 4.3.1 Single Crystalline Silicon Channel 72 4.3.2 Fin Patterning 74 4.3.3 Stacked Nanowires 76 4.4 Measurement Results 81 4.5 Comparison with Previous Works 88 Chapter 5 Novel Program Operation in CSTAR 92 5.1 Introduction. 92 5.2 Simulation Results 93 5.3 Measurement Results 103 Chapter 6 Conclusions 106 Bibliography 108 Abstract in Korean 116 List of Publications 118Docto

Through Silicon Via Field-Effect Transistor with Hafnia-based Ferroelectrics and the Doping of Silicon by Gallium Implantation Utilizing a Focused Ion Beam System

3-dimensional integration has become a standard to further increase the transistor density and to enhance the integrated functionality in microchips. Integrated circuits are stacked on top of each other and copper-filled through-silicon VIAs (TSVs) are the industry-accepted choice for their vertical electrical connection. The aim of this work is to functionalize the TSVs by implementing vertical field-effect transistors inside the via holes. The front and back sides of 200 ... 300 µm thin silicon wafers were doped to create the source/drain regions of n- and p-FETs. The TSVFETs showed very stable saturation currents and on/off current ratios of about 10^6 (n-TSVFET) and 10^3 (p-TSVFET) for a gate voltage magnitude of 4V. The use of hafnium zirconium oxide on a thin SiO_2 interface layer as gate dielectric material in a p-TSVFET, enabled the implementation of a charge trapping memory inside the TSVs, showing a memory window of about 1V. This allows the non-volatile storage of the transistor on/off state. In addition, the demonstration of the use of gallium as the source/drain dopant in planar p-FET test structures (ion implanted from a focused ion beam tool) paves the way for maskless doping and for a process flow with a low thermal budget. It was shown, that ion implanted gallium can be activated and annealed at relatively low temperatures of 500 °C ... 700 °C.:Abstract / Kurzzusammenfassung Danksagung Index I List of Figures III List of Tables X List of Symbols XI List of Abbreviations XV 1 Introduction 1 2 Fundamentals 5 2.1 Metal Oxide Semiconductor Field Effect Transistors (MOSFETs) 5 2.1.1 Historical Development - Technological Advancements 7 2.1.2 Field-Effect Transistors in Semiconductor Memories 10 2.2 3D Integration and the Use of TSVs (Through Silicon VIAs) 16 2.3 Doping of Silicon 19 2.3.1 Doping by Thermal Diffusion 20 2.3.2 Doping by Ion Implantation 22 3 Electrical Characterization 24 3.1 Resistivity Measurements 24 3.1.1 Resistance Determination by Four-Point Probes Measurement 24 3.1.2 Contact Resistivity 27 3.1.3 Doping Concentration 32 3.2 C-V Measurements 35 3.2.1 Fundamentals of MIS C-V Measurements 35 3.2.2 Interpretation of C-V Measurements 37 3.3 Transistor Measurements 41 3.3.1 Output Characteristics (I_D-V_D) 41 3.3.2 Transfer Characteristics (I_D-V_G) 42 4 TSV Transistor 45 4.1 Idea and Motivation 45 4.2 Design and Layout of the TSV Transistor 47 4.2.1 Design of the TSV Transistor Structures 47 4.2.2 Test Structures for Planar FETs 48 5 Variations in the Integration Scheme of the TSV Transistor 51 5.1 Doping by Diffusion from Thin Films 51 5.1.1 Determination of Doping Profiles 52 5.1.2 n- and p- TSVFETs Doped Manufactures by the Use of the Diffusion Technique 59 5.2 Ferroelectric Hafnium-Zirconium-Oxide (HZO) in the Gate Stack 81 5.2.1 Planar ferroelectric p-MOSFETs Doped by Thermal Diffusion 82 5.2.2 p-TSVFETs with Hafnium-Zirconium-Oxide Metal Gate 90 5.3 Doping by Ion Implantation of Gallium with a Focused Ion Beam (FIB) Tool 96 5.3.1 Ga doped Si Diodes 97 5.3.2 Planar p-MOSFETs Doped by Ga Implantation 108 5.3.3 Proposal for a parallel integration of Cu TSVs and p-TSVFETs 117 6 Summary and Outlook 120 Bibliography XVIII A Appendix XXXVI A.1 Resistivity and Dopant Density XXXVI A.2 Mask set for the TSVFET XXXVII A.3 Mask Design of the Planar Test Structures XXXVIII Curriculum Vitae XXXIX List of Scientific Publications XL

New Approaches for Memristive Logic Computations

Over the past five decades, exponential advances in device integration in microelectronics for memory and computation applications have been observed. These advances are closely related to miniaturization in integrated circuit technologies. However, this miniaturization is reaching the physical limit (i.e., the end of Moore\u27s Law). This miniaturization is also causing a dramatic problem of heat dissipation in integrated circuits. Additionally, approaching the physical limit of semiconductor devices in fabrication process increases the delay of moving data between computing and memory units hence decreasing the performance. The market requirements for faster computers with lower power consumption can be addressed by new emerging technologies such as memristors. Memristors are non-volatile and nanoscale devices and can be used for building memory arrays with very high density (extending Moore\u27s law). Memristors can also be used to perform stateful logic operations where the same devices are used for logic and memory, enabling in-memory logic. In other words, memristor-based stateful logic enables a new computing paradigm of combining calculation and memory units (versus von Neumann architecture of separating calculation and memory units). This reduces the delays between processor and memory by eliminating redundant reloading of reusable values. In addition, memristors consume low power hence can decrease the large amounts of power dissipation in silicon chips hitting their size limit. The primary focus of this research is to develop the circuit implementations for logic computations based on memristors. These implementations significantly improve the performance and decrease the power of digital circuits. This dissertation demonstrates in-memory computing using novel memristive logic gates, which we call volistors (voltage-resistor gates). Volistors capitalize on rectifying memristors, i.e., a type of memristors with diode-like behavior, and use voltage at input and resistance at output. In addition, programmable diode gates, i.e., another type of logic gates implemented with rectifying memristors are proposed. In programmable diode gates, memristors are used only as switches (unlike volistor gates which utilize both memory and switching characteristics of the memristors). The programmable diode gates can be used with CMOS gates to increase the logic density. As an example, a circuit implementation for calculating logic functions in generalized ESOP (Exclusive-OR-Sum-of-Products) form and multilevel XOR network are described. As opposed to the stateful logic gates, a combination of both proposed logic styles decreases the power and improves the performance of digital circuits realizing two-level logic functions Sum-of-Products or Product-of-Sums. This dissertation also proposes a general 3-dimentional circuit architecture for in-memory computing. This circuit consists of a number of stacked crossbar arrays which all can simultaneously be used for logic computing. These arrays communicate through CMOS peripheral circuits

Integrated Circuits/Microchips

With the world marching inexorably towards the fourth industrial revolution (IR 4.0), one is now embracing lives with artificial intelligence (AI), the Internet of Things (IoTs), virtual reality (VR) and 5G technology. Wherever we are, whatever we are doing, there are electronic devices that we rely indispensably on. While some of these technologies, such as those fueled with smart, autonomous systems, are seemingly precocious; others have existed for quite a while. These devices range from simple home appliances, entertainment media to complex aeronautical instruments. Clearly, the daily lives of mankind today are interwoven seamlessly with electronics. Surprising as it may seem, the cornerstone that empowers these electronic devices is nothing more than a mere diminutive semiconductor cube block. More colloquially referred to as the Very-Large-Scale-Integration (VLSI) chip or an integrated circuit (IC) chip or simply a microchip, this semiconductor cube block, approximately the size of a grain of rice, is composed of millions to billions of transistors. The transistors are interconnected in such a way that allows electrical circuitries for certain applications to be realized. Some of these chips serve specific permanent applications and are known as Application Specific Integrated Circuits (ASICS); while, others are computing processors which could be programmed for diverse applications. The computer processor, together with its supporting hardware and user interfaces, is known as an embedded system.In this book, a variety of topics related to microchips are extensively illustrated. The topics encompass the physics of the microchip device, as well as its design methods and applications

Characterisation of Novel Resistive Switching Memory Devices

Resistive random access memory (RRAM) is widely considered as a disruptive technology that will revolutionize not only non-volatile data storage, but also potentially digital logic and neuromorphic computing. The resistive switching mechanism is generally conceived as the rupture/restoration of defect-formed conductive filament (CF) or defect profile modulation, for filamentary and non-filamentary devices respectively. However, details of the underlying microscopic behaviour of the resistive switching in RRAM are still largely missing. In this thesis, a defect probing technique based on the random telegraph noise (RTN) is developed for both filamentary and non-filamentary devices, which can reveal the resistive switching mechanism at defect level and can also be used to analyse the device performance issues. HfO2 is one of the most matured metal-oxide materials in semiconductor industry and HfO2 RRAM shows promising potential in practical application. An RTN-based defect extraction technique is developed for the HfO2 devices to detect individual defect movement and provide statistical information of CF modification during normal operations. A critical filament region (CFR) is observed and further verified by defect movement tracking. Both defect movements and CFR modification are correlated with operation conditions, endurance failure and recovery. Non-filamentary devices have areal switching characteristics, and are promising in overcoming the drawbacks of filamentary devices that mainly come from the stochastic nature of the CF. a-VMCO is an outstanding non-filamentary device with a set of unique characteristics, but its resistive switching mechanism has not been clearly understood yet. By utilizing the RTN-based defect profiling technique, defect profile modulation in the switching layer is identified and correlated with digital and analogue switching behaviours, for the first time. State instability is analysed and a stable resistance window of 10 for >106 cycles is restored through combining optimizations of device structure and operation conditions, paving the way for its practical application. TaOx-based RRAM has shown fast switching in the sub-nanosecond regime, good CMOS compatibility and record endurance of more than 1012 cycles. Several inconsistent models have been proposed for the Ta2O5/TaOx bilayered structure, and it is difficult to quantify and optimize the performance, largely due to the lack of microscopic description of resistive switching based on experimental results. An indepth analysis of the TiN/Ta2O5/TaOx/TiN structured RRAM is carried out with the RTN-based defect probing technique, for both bipolar and unipolar switching modes. Significant differences in defect profile have been observed and explanations have been provided

Nano-intrinsic security primitives for internet of everything

With the advent of Internet-enabled electronic devices and mobile computer systems, maintaining data security is one of the most important challenges in modern civilization. The innovation of physically unclonable functions (PUFs) shows great potential for enabling low-cost low-power authentication, anti-counterfeiting and beyond on the semiconductor chips. This is because secrets in a PUF are hidden in the randomness of the physical properties of desirably identical devices, making it extremely difficult, if not impossible, to extract them. Hence, the basic idea of PUF is to take advantage of inevitable non-idealities in the physical domain to create a system that can provide an innovative way to secure device identities, sensitive information, and their communications. While the physical variation exists everywhere, various materials, systems, and technologies have been considered as the source of unpredictable physical device variation in large scales for generating security primitives. The purpose of this project is to develop emerging solid-state memory-based security primitives and examine their robustness as well as feasibility. Firstly, the author gives an extensive overview of PUFs. The rationality, classification, and application of PUF are discussed. To objectively compare the quality of PUFs, the author formulates important PUF properties and evaluation metrics. By reviewing previously proposed constructions ranging from conventional standard complementary metal-oxide-semiconductor (CMOS) components to emerging non-volatile memories, the quality of different PUFs classes are discussed and summarized. Through a comparative analysis, emerging non-volatile redox-based resistor memories (ReRAMs) have shown the potential as promising candidates for the next generation of low-cost, low-power, compact in size, and secure PUF. Next, the author presents novel approaches to build a PUF by utilizing concatenated two layers of ReRAM crossbar arrays. Upon concatenate two layers, the nonlinear structure is introduced, and this results in the improved uniformity and the avalanche characteristic of the proposed PUF. A group of cell readout method is employed, and it supports a massive pool of challenge-response pairs of the nonlinear ReRAM-based PUF. The non-linear PUF construction is experimentally assessed using the evaluation metrics, and the quality of randomness is verified using predictive analysis. Last but not least, random telegraph noise (RTN) is studied as a source of entropy for a true random number generation (TRNG). RTN is usually considered a disadvantageous feature in the conventional CMOS designs. However, in combination with appropriate readout scheme, RTN in ReRAM can be used as a novel technique to generate quality random numbers. The proposed differential readout-based design can maintain the quality of output by reducing the effect of the undesired noise from the whole system, while the controlling difficulty of the conventional readout method can be significantly reduced. This is advantageous as the differential readout circuit can embrace the resistance variation features of ReRAMs without extensive pre-calibration. The study in this thesis has the potential to enable the development of cost-efficient and lightweight security primitives that can be integrated into modern computer mobile systems and devices for providing a high level of security