Schottky Field Effect Transistors and Schottky CMOS Circuitry

It was the primary goal (and result) of the presented work to empirically demonstrate CMOS operation (i.e., inverter transfer characteristics) using metallic/Schottky source/drain MOSFETs (SFETs - Schottky Field Effect Transistors) fabricated on silicon-on-insulator (SOI) substrates - a first-ever in the history of SFET research. Due to its candidacy for present and future CMOS technology, many different research groups have explored different SFET architectures in an effort to maximize performance. In the presented work, an architecture known as a bulk switching SFET was fabricated using an implant-to-silicide (ITS) technique, which facilitates a high degree of Schottky barrier lowering and therefore an increase in current injection with minimal process complexity. The different switching mechanism realized with this technique also reduces the ambipolar leakage current that has so often plagued SFETs of more conventional design. In addition, these devices have been utilized in a patent pending approach that may facilitate an increase in circuit density for devices of a given size. In other words, for example, it may be possible to achieve circuit density equivalent to 65 nm technology using a 90 nm process, while at the same time preserving or reducing local interconnect density for enhanced overall system speed. Fabrication details and electrical results will be discussed, as well as some initial modeling efforts toward gaining insight into the details of current injection at the metal-semiconductor (M-S) interface. The challenges faced using the ITS approach at aggressive scales will be discussed, as will the potential advantages and disadvantages of other approaches to SFET technology

A novel deep submicron bulk planar sizing strategy for low energy subthreshold standard cell libraries

Engineering andPhysical Science ResearchCouncil (EPSRC) and Arm Ltd for providing funding in the form of grants and studentshipsThis work investigates bulk planar deep submicron semiconductor physics in an attempt to improve standard cell libraries aimed at operation in the subthreshold regime and in Ultra Wide Dynamic Voltage Scaling schemes. The current state of research in the field is examined, with particular emphasis on how subthreshold physical effects degrade robustness, variability and performance. How prevalent these physical effects are in a commercial 65nm library is then investigated by extensive modeling of a BSIM4.5 compact model. Three distinct sizing strategies emerge, cells of each strategy are laid out and post-layout parasitically extracted models simulated to determine the advantages/disadvantages of each. Full custom ring oscillators are designed and manufactured. Measured results reveal a close correlation with the simulated results, with frequency improvements of up to 2.75X/2.43X obs erved for RVT/LVT devices respectively. The experiment provides the first silicon evidence of the improvement capability of the Inverse Narrow Width Effect over a wide supply voltage range, as well as a mechanism of additional temperature stability in the subthreshold regime. A novel sizing strategy is proposed and pursued to determine whether it is able to produce a superior complex circuit design using a commercial digital synthesis flow. Two 128 bit AES cores are synthesized from the novel sizing strategy and compared against a third AES core synthesized from a state-of-the-art subthreshold standard cell library used by ARM. Results show improvements in energy-per-cycle of up to 27.3% and frequency improvements of up to 10.25X. The novel subthreshold sizing strategy proves superior over a temperature range of 0 °C to 85 °C with a nominal (20 °C) improvement in energy-per-cycle of 24% and frequency improvement of 8.65X. A comparison to prior art is then performed. Valid cases are presented where the proposed sizing strategy would be a candidate to produce superior subthreshold circuits

Analysis and Design Considerations of Static CMOS Logics under Process, Voltage and Temperature Variation in 90nm Process

[[abstract]]In this paper, we analyze the circuit characteristic of static CMOS logics and provide the size ratio of PMOS to NMOS transistors under process, voltage and temperature (PVT) variations in 90nm CMOS process. The threshold voltage of a MOS transistor is influenced seriously under PVT variations in ultralow voltages. The performances of the static CMOS logics are unstable under those conditions. To find the best size ratio region of PMOS to NMOS transistors, NOT, NAND, NOR, and XOR gates are simulated with various PVT conditions. Four kinds of gates are designed by different ratios respectively to compose the ring oscillators. By examining operating frequency, then we analyze the change of current according to various channel length and PVT conditions. By further analyzing the simulation results, if the channel length of MOS transistors is shorter than 200nm, or the operating voltage is lower than 0.5V, then the performance of MOS transistors is unstable in 90nm CMOS process. Through the data and the simulation provided by this paper, we can design the circuits with different needs, and we can also understand how each different section of PVT variations will affect the circuit in 90nm CMOS process.[[sponsorship]]IEEE Sapporo Section, Japan; Xiamen University[[conferencetype]]國際[[conferencedate]]20140426~20140428[[booktype]]電子版[[iscallforpapers]]Y[[conferencelocation]]Sapporo City, Hokkaido, Japa

Subthreshold and gate leakage current analysis and reduction in VLSI circuits

CMOS technology has scaled aggressively over the past few decades in an effort to enhance functionality, speed and packing density per chip. As the feature sizes are scaling down to sub-100nm regime, leakage power is increasing significantly and is becoming the dominant component of the total power dissipation. Major contributors to the total leakage current in deep submicron regime are subthreshold and gate tunneling leakage currents. The leakage reduction techniques developed so far were mostly devoted to reducing subthreshold leakage. However, at sub-65nm feature sizes, gate leakage current grows faster and is expected to surpass subthreshold leakage current. In this work, an extensive analysis of the circuit level characteristics of subthreshold and gate leakage currents is performed at 45nm and 32nm feature sizes. The analysis provides several key observations on the interdependency of gate and subthreshold leakage currents. Based on these observations, a new leakage reduction technique is proposed that optimizes both the leakage currents. This technique identifies minimum leakage vectors for a given circuit based on the number of transistors in OFF state and their position in the stack. The effectiveness of the proposed technique is compared to most of the mainstream leakage reduction techniques by implementing them on ISCAS89 benchmark circuits. The proposed leakage reduction technique proved to be more effective in reducing gate leakage current than subthreshold leakage current. However, when combined with dual-threshold and variable-threshold CMOS techniques, substantial subthreshold leakage current reduction was also achieved. A total savings of 53% for subthreshold leakage current and 26% for gate leakage current are reported

Ultra Low Power Digital Circuit Design for Wireless Sensor Network Applications

Ny forskning innenfor feltet trådløse sensornettverk åpner for nye og innovative produkter og løsninger. Biomedisinske anvendelser er blant områdene med størst potensial og det investeres i dag betydelige beløp for å bruke denne teknologien for å gjøre medisinsk diagnostikk mer effektiv samtidig som man åpner for fjerndiagnostikk basert på trådløse sensornoder integrert i et ”helsenett”. Målet er å forbedre tjenestekvalitet og redusere kostnader samtidig som brukerne skal oppleve forbedret livskvalitet som følge av økt trygghet og mulighet for å tilbringe mest mulig tid i eget hjem og unngå unødvendige sykehusbesøk og innleggelser. For å gjøre dette til en realitet er man avhengige av sensorelektronikk som bruker minst mulig energi slik at man oppnår tilstrekkelig batterilevetid selv med veldig små batterier. I sin avhandling ” Ultra Low power Digital Circuit Design for Wireless Sensor Network Applications” har PhD-kandidat Farshad Moradi fokusert på nye løsninger innenfor konstruksjon av energigjerrig digital kretselektronikk. Avhandlingen presenterer nye løsninger både innenfor aritmetiske og kombinatoriske kretser, samtidig som den studerer nye statiske minneelementer (SRAM) og alternative minnearkitekturer. Den ser også på utfordringene som oppstår når silisiumteknologien nedskaleres i takt med mikroprosessorutviklingen og foreslår løsninger som bidrar til å gjøre kretsløsninger mer robuste og skalerbare i forhold til denne utviklingen. De viktigste konklusjonene av arbeidet er at man ved å introdusere nye konstruksjonsteknikker både er i stand til å redusere energiforbruket samtidig som robusthet og teknologiskalerbarhet øker. Forskningen har vært utført i samarbeid med Purdue University og vært finansiert av Norges Forskningsråd gjennom FRINATprosjektet ”Micropower Sensor Interface in Nanometer CMOS Technology”

Ultra-Low Power Circuit Design for Cubic-Millimeter Wireless Sensor Platform.

Modern daily life is surrounded by smaller and smaller computing devices. As Bell’s Law predicts, the research community is now looking at tiny computing platforms and mm3-scale sensor systems are drawing an increasing amount of attention since they can create a whole new computing environment. Designing mm3-scale sensor nodes raises various circuit and system level challenges and we have addressed and proposed novel solutions for many of these challenges to create the first complete 1.0mm3 sensor system including a commercial microprocessor. We demonstrate a 1.0mm3 form factor sensor whose modular die-stacked structure allows maximum volume utilization. Low power I2C communication enables inter-layer serial communication without losing compatibility to standard I2C communication protocol. A dual microprocessor enables concurrent computation for the sensor node control and measurement data processing. A multi-modal power management unit allowed energy harvesting from various harvesting sources. An optical communication scheme is provided for initial programming, synchronization and re-programming after recovery from battery discharge. Standby power reduction techniques are investigated and a super cut-off power gating scheme with an ultra-low power charge pump reduces the standby power of logic circuits by 2-19× and memory by 30%. Different approaches for designing low-power memory for mm3-scale sensor nodes are also presented in this work. A dual threshold voltage gain cell eDRAM design achieves the lowest eDRAM retention power and a 7T SRAM design based on hetero-junction tunneling transistors reduces the standby power of SRAM by 9-19× with only 15% area overhead. We have paid special attention to the timer for the mm3-scale sensor systems and propose a multi-stage gate-leakage-based timer to limit the standard deviation of the error in hourly measurement to 196ms and a temperature compensation scheme reduces temperature dependency to 31ppm/°C. These techniques for designing ultra-low power circuits for a mm3-scale sensor enable implementation of a 1.0mm3 sensor node, which can be used as a skeleton for future micro-sensor systems in variety of applications. These microsystems imply the continuation of the Bell’s Law, which also predicts the massive deployment of mm3-scale computing systems and emergence of even smaller and more powerful computing systems in the near future.Ph.D.Electrical EngineeringUniversity of Michigan, Horace H. Rackham School of Graduate Studieshttp://deepblue.lib.umich.edu/bitstream/2027.42/91438/1/sori_1.pd