Impact of the gate oxide reliability of SiC MOSFETs on the junction temperature estimation using temperature sensitive electrical parameters

Bias temperature instability (BTI) is more problematic in SiC power MOSFETs due to the occurrence of higher interface state traps and fixed oxide traps compared to traditional silicon MOS interfaces where there are no carbon atoms degrading the atomically smooth Si/SiO2 interface. The use of temperature sensitive electrical parameters (TSEPs) for measuring the junction temperature and enabling health monitoring based on junction temperature identification is a promising technique for increasing the reliability of power devices, however in the light of increased BTI in SiC devices, this must be carefully assessed. This paper evaluates how BTI of SiC power MOSFETs under high temperature gate bias stresses affects the electrical parameters used as TSEPs and its impact on condition monitoring

Non-intrusive methodologies for characterization of bias temperature instability in SiC power MOSFETs

The gate oxide reliability of SiC power MOSFETs remains a challenge, despite the improvements of the new generation power devices. The threshold voltage drift caused by Bias Temperature Instability (BTI) has been subject of different studies and methods have been proposed to evaluate the real magnitude of the threshold voltage shift. These methodologies usually focus on the characterization of the threshold voltage shift, rather than its implications to the operation or how the threshold voltage shift can be detected during the application. This paper presents two non-intrusive methodologies which can assess and determine the impact of BTI-induced. The proposed methodologies are able to capture the peak shift and subsequent recovery after stress removal

Crosstalk in SiC power MOSFETs for evaluation of threshold voltage shift caused by bias temperature instability

Threshold voltage drift from Bias Temperature Instability is known to be a reliability concern for SiC MOSFETs. Negative bias temperature instability (NBTI) results from positive charge trapping at the gate dielectric interface and is more problematic in SiC due to the higher interface trap density. Turning SiC MOSFETs OFF with negative voltages to avoid Miller coupling induced cross-talk can cause VTH shifts in periods with long standby duration and high temperatures. This paper proposes a novel test method for BTI characterization that relies on measuring the shoot-through current and charge during switching transients. The method exploits the Miller coupling between 2 devices in the same phase and uses the shoot-through current from parasitic turn-ON to monitor VTH. Standard techniques require the use of static measurements (typically from a parameter analyzer or a curve tracer) to determine the threshold voltage shift. These conventional methods can underestimate the VTH shift since the recovery from charge de-trapping can mask the true extent of the problem. The proposed methodology uses the actual converter environment to investigate the VTH shift and should therefore be of more interest to applications engineers as opposed to device physicists. Furthermore, it avoids the problem of VTH recovery and is therefore more accurate in VTH shift characterization

A novel non-intrusive technique for BTI characterization in SiC MOSFETs

Threshold voltage ( $V_{TH}$ ) shift due to Bias Temperature Instability (BTI) is a well-known problem in SiC-MOSFETs that occurs due to oxide traps in the $SiC/SiO_2$ gate interface. The reduced band offsets and increased interface/fixed oxide traps in SiC-MOSFETs makes this a more critical problem compared to silicon. Before qualification, power devices are subjected to gate bias stress tests after which $V_{TH}$ shift is monitored. However, some recovery occurs between the end of the stress and $V_{TH}$ characterisation, thereby potentially under-estimating the extent of the problem. In applications where the SiC-MOSFET is turned OFF with a negative bias at high temperature, if $V_{TH}$ shift is severe enough there may be electrothermal failure due to current crowding since parallel devices lose synchronization during turn-ON. In this paper, a novel method that uses the forward voltage of the body diode during reverse conduction of a small sensing current is introduced as a technique for monitoring $V_{TH}$ shift and recovery due to BTI. This non-invasive method exploits the increased body effect that is peculiar SiC-MOSFETs due to the higher body diode forward voltage. With the proposed method, it is possible to non-invasively assess $V_{TH}$ shift dynamically during BTI characterization tests

Impact of BTI induced threshold voltage shifts in shoot-through currents from crosstalk in SiC MOSFETs

In this paper a method for evaluating the implications of threshold voltage (VTH) drift from gate voltage stress in SiC MOSFETs is presented. By exploiting the Miller coupling between two devices in the same phase leg, the technique uses the shoot-through charge from parasitic turn-ON to characterize the impact of Bias Temperature Instability (BTI) induced VTH shift. Traditional methods of BTI characterization rely on the application of a stress voltage without characterizing the implication of the VTH shift on the switching characteristics of the device in a circuit. Unlike conventional methods, this method uses the actual converter environment to investigate the implications of VTH shift and should therefore be of more interest to applications engineers as opposed to device physicists. Furthermore, a common problem is the underestimation of the VTH shift since recovery from charge de-trapping can mask the true extent of the problem. The impact of temperature, the recovery time after stress removal and polarity of the stress have been studied for a set of commercially available SiC MOSFETs

Trade-offs between gate oxide protection and performance in SiC MOSFETs

The reliability of gate oxides in SiC MOSFETs has come under increased scrutiny due to reduced performance under time dependent dielectric breakdown and increased threshold voltage instability. This paper investigates how 10% gate voltage (V GS ) derating in SiC MOSFETs can be implemented with minimal impact on loss performance. Using experimental measurements and electrothermal simulations of power converters, the trade-off between reduced V GS and conversion loss is investigated. It is shown that 10% V GS de-rating increases the ON-state resistance by 10% and the turn-ON switching energy by 7% average while the turn-OFF switching energy is unaffected. The low temperature sensitivity of the ON-state losses in SiC MOSFETs can be exploited since the rise in junction temperature due to V GS derating is marginal, unlike Si devices where ON-state resistance rises significantly with temperature. The load current and switching frequency influences the effectiveness of V GS derating. It is also shown that reducing the gate drive output impedance can compensate for V GS derating at high switching frequencies, with reduced total loss penalization. This may be important for protecting the gate oxide and enhancing its reliability

Cause and Effect of Threshold-Voltage Instability on the Reliability of Silicon-Carbide MOSFETs

A significant instability of the threshold voltage (VT) in silicon carbide (SiC) MOSFETs in response to gate-bias and ON-state current stressing was discovered and examined as a function of bias, temperature, and time. It was determined that the likely mechanism causing this effect is the charging and discharging of gate-oxide traps, located close to the interface of the SiC conducting channel, via a direct tunneling mechanism. High-temperature reverse-bias induced leakage current in the OFF-state was identified as a potential failure mode. A simultaneous two-way tunneling model was developed, based on an existing one-way tunneling model, to simulate the time-dependent and field-dependent charging and discharging of the near-interfacial oxide traps in response to an applied gate-bias stress. The simulations successfully matched experimental results, both with respect to measurement time and to bias-stress time as a function of gate bias. Experimental results were presented, showing that the VT instability increases with both increasing gate-bias-stress time and bias-stress magnitude. The measurement conditions, including gate-ramp speed and direction, were shown to have a significant influence on the measured result, with a 20-μs measurement revealing instabilities three times greater than those at standard 1-s measurement speeds, whereas 1-ks measurements showed shifts only half as large. High-temperature bias stressing was found to cause even more significant increases in the VT instability. ON-state current stressing was found to also increase the VT instability, due to self-heating effects. VT shifts as large as 2 V were reported, with the number of calculated oxide traps switching charge state varying between 1×1011 and 8×1011 cm–2, depending on processing, stress, and measurement conditions. The standard post-oxidation NO anneal was shown to reduce the number of active oxide traps by about 70 percent. The dominant oxide trap was identified as an E-prime-center type defect—a weak Si-Si bond due to an oxygen vacancy which has been broken during processing or subsequent device stressing. The large increase in bias-stress induced VT instability at temperatures above 100 °C was explained by an increase in the number of active E-prime-center type defects. Existing reliability qualification standards based on silicon device technology are inadequate for SiC MOSFETs and need to be revised, with particular attention paid to the measurement conditions

The potential of SiC Cascode JFETs in electric vehicle traction inverters

The benefits of implementing SiC devices in EV powertrains has been widely reported in various studies. New generations of SiC devices including planar MOSFETs, trench MOSFETs and more recently, cascode JFETs have been released by various manufacturers. SiC cascode devices comprise of low voltage silicon MOSFETs for gate driving and high voltage depletion mode SiC JFETs for voltage blocking. These devices are particularly interesting because it avoids the known reliability issues of SiC gate oxide traps resulting in threshold voltage drift. In this paper, an EV powertrain is simulated using experimental measurements of conduction and switching energies of various SiC devices including 650V trench, 900V planar and 650V cascode JFETs. Unlike previous papers where losses are calculated using models based on datasheet parameters, here static and dynamic measurements on the power devices at different currents and temperatures are used to calculate losses over simulated driving cycles. Field-stop IGBTs are also evaluated. The 3-phase 2-level inverter model is electrothermal by accounting for the measured temperature dependence of the losses and uses accurate thermal networks derived from datasheets. Converter efficiency and thermal performance are compared for each device technology. Results show that SiC cascode JFETs have great potential in EV powertrain applications