Computation lithography: Virtual reality and virtual virtuality

Computation lithography is enabled by a combination of physical understanding, mathematical abstraction, and implementation simplification. An application in the virtual world of computation lithography can be a virtual reality or a virtual virtuality depending on its engineering sensible-ness and technical feasibility. Examples under consideration include design-for- manufacturability and inverse lithography. © 2009 Optical Society of America.postprin

光フェーズドアレイ素子の高出力化に向けた半導体光増幅器の設計と試作

学位の種別: 修士University of Tokyo(東京大学

Micro-optics technology and sensor systems applications

The current generation of electro-optical sensors utilizing refractive and reflective optical elements require sophisticated, complex, and expensive designs. Advanced-technology-based electro-optical sensors of minimum size and weight require miniaturization of optical, electrical, and mechanical devices with an increasing trend toward integration of various components. Micro-optics technology has the potential in a number of areas to simplify optical design with improved performance. This includes internally cooled apertures, hybrid optical design, microlenses, dispersive multicolor microlenses, active dither, electronically controlled optical beam steer, and microscopic integration of micro-optics, detectors, and signal processing layers. This paper describes our approach to the development of micro-optics technology with our main emphasis for sensors applications

A Customer Programmable Microfluidic System

Microfluidics is both a science and a technology offering great and perhaps even revolutionary capabilities to impact the society in the future. However, due to the scaling effects there are unknown phenomena and technology barriers about fluidics in microchannel, material properties in microscale and interactions with fluids are still missing. A systematic investigation has been performed aiming to develop A Customer Programmable Microfluidic System . This innovative Polydimethylsiloxane (PDMS)-based microfluidic system provides a bio-compatible platform for bio-analysis systems such as Lab-on-a-chip, micro-total-analysis system and biosensors as well as the applications such as micromirrors. The system consists of an array of microfluidic devices and each device containing a multilayer microvalve. The microvalve uses a thermal pneumatic actuation method to switch and/or control the fluid flow in the integrated microchannels. It provides a means to isolate samples of interest and channel them from one location of the system to another based on needs of realizing the customers\u27 desired functions. Along with the fluid flow control properties, the system was developed and tested as an array of micromirrors. An aluminum layer is embedded into the PDMS membrane. The metal was patterned as a network to increase the reflectivity of the membrane, which inherits the deformation of the membrane as a mirror. The deformable mirror is a key element in the adaptive optics. The proposed system utilizes the extraordinary flexibility of PDMS and the addressable control to manipulate the phase of a propagating optical wave front, which in turn can increase the performance of the adaptive optics. Polydimethylsiloxane (PDMS) has been widely used in microfabrication for microfluidic systems. However, few attentions were paid in the past to mechanical properties of PDMS. Importantly there is no report on influences of microfabrication processes which normally involve chemical reactors and biologically reaction processes. A comprehensive study was made in this work to study fundamental issues such as scaling law effects on PDMS properties, chemical emersion and temperature effects on mechanical properties of PDMS, PDMS compositions and resultant properties, as well as bonding strength, etc. Results achieved from this work will provide foundation of future developments of microfluidics utilizing PDMS

Method and system for providing beam polarization

A radiation polarizer, controller, and a method of radiation polarization and beam control, are disclosed. The radiation polarizer includes a substrate, at least one anti-reflection coating layer communicatively coupled to the substrate, at least two nanostructures communicatively coupled to the at least one anti-reflection coating layer, and at least two groove layers, wherein each one of the at least two groove layers is interstitial to a respective one of the at least two nanostructures. The method may include the steps of communicatively coupling at least one anti-reflection coating layer to a substrate, communicatively coupling at least two nanostructures to at least one of the at least one anti-reflection coating layer, providing interstitially to a respective one of the at least two nanostructures at least two groove layers, coupling the at least two groove layers and the at least two nanostructures to provide a pass wavelength in the range of about 250 nm to less than about a microwave wavelength, and allowing for examining of radiation having a wavelength in a range of about 250 nm to less than about a microwave wavelength, and having an electric field orthogonal to the at least two groove layers, by allowing for a passing of the radiation through said coupling of the at least two groove layers and the at least two nanostructures.Published versio

Amphibian XIS: An Immersion Lithography Microstepper Platform

Recent advances in immersion lithography have created the need for a small field microstepper to carry out the early learning necessary for next generation device application. Combined with fluid immersion, multiple-beam lithography can provide an opportunity to explore lithographic imaging at oblique propagation angles and extreme NA imaging. Using the phase preserving properties of Smith Talbot interferometry, the Amphibian XIS immersion lithography microstepper has been created for research and development applications directed toward sub-90nm patterning. The system has been designed for use at ArF and KrF excimer laser wavelengths, based on a fused silica or sapphire prism lens with numerical aperture values up to 1.60. Combined with a chromeless phase grating mask, two and four beam imaging is made possible for feature resolution to 35nm. The approach is combined with X-Y staging to provide immersion imaging on a microstepper platform for substrates ranging up to 300mm. The Amphibian system consists of single or dual wavelength sources (193nm and 248nm), a 2mm exposure field size, stage accuracy better than 1 um, polarization control over a full range from linear polarization to unpolarized illumination, full control of exposure dose and demodulation (to synthesize defocus), and the ability to image both line patterns as well as contact features. A fluid control system allows use of water or alternative fluids, with the ability to change fluids rapidly between wafers. The Amphibian system is fully enclosed in a HEPA and amine controlled environment for use in fab or research environments

Resolution enhancement in mask aligner photolithography

Photolithographie ist eine unentbehrliche Technologie in der heutigen Mikrofabrikation integrierter elektronischer Schaltungen und optischer Komponenten auf verschiedenen Größenskalen. Die zugrundeliegende Aufgabe ist die Replikation der gewünschten Struktur, die kodiert ist in einer Photomaske, auf einem photolackbedeckten Wafer. In vergangenen Jahrzehnten gab es eine beeindruckende Weiterentwicklung photolithographischer Anlagen, was Auflösungen weit unterhalb eines Mikrometers ermöglicht. Das einfachste photolithographische Instrument ist der Maskenjustierbelichter, bei dem die Photomaske und der Wafer entweder in Kontakt oder in unmittelbare Nähe gebracht werden (Proximity-Modus), ohne zusätzliche optische Komponenten dazwischen. Vor über 50~Jahren eingeführt bleibt der Maskenjustierbelichter aufgrund seines wirtschaftlichen Betriebs das Instrument der Wahl für die Herstellung unkritischer Schichten, mit einer Auflösung von einigen Mikrometern im bevorzugten Proximity-Modus. Maskenjustierbelichter werden beispielsweise für die Herstellung von Mikrolinsen, lichtemittierende Dioden und mikromechanischen Systemen verwendet. Die erreichbare laterale räumliche Auflösung ist letztlich begrenzt durch die Beugung des Lichts an den Strukturen der Photomaske, was zu Verfälschungen der Abbildung auf dem Photolack führt. In dieser Arbeit entwickeln, präsentieren und diskutieren wir mehrere Technologien zur Auflösungsverbesserung für Maskenjustierbelichter im Proximity-Modus. Dies umfasst Photolithographie mit einer neuartigen Lichtquelle, die im tiefen Ultraviolett-Bereich emittiert, eine rigoros optimierte Phasenschiebermaske für periodische Strukturen, optische Proximity-Korrektur (Nahbereichskorrektur) angewandt auf nichtorthogonale Geometrien, und die Anwendung optischer Metaoberflächen als Photomasken. Eine Reduzierung der Wellenlänge verringert die Auswirkungen der Lichtbrechung und verbessert daher direkt die Auflösung, benötigt aber auch die Entwicklung geeigneter Konzepte für die Strahlformung und Homogenisierung der Beleuchtung. Wir diskutieren die Integration einer neuartigen Lichtquelle, ein frequenzvervierfachter Dauerstrichlaser mit einer Emissionswellenlänge von 193$\,$nm, in einem Maskenjustierbelichter. Damit zeigen wir erfolgreiche Prints von Teststrukturen mit einer Auflösung von bis zu 1,75$\,$µm bei einem Proximity-Abstand von 20$\,$µm. Bei Verwendung des selbstabbildenden Talboteffekts wird sogar eine Auflösung weit unterhalb eines Mikrometers für periodische Strukturen erzielt. Außerdem diskutieren wir die rigorose Simulation und Optimierung der Lichtausbreitung in und hinter Phasenschiebermasken, die unter schrägem Einfall belichtet werden. Mit einem optimierten Photomaskendesign kann dabei die Periode bei Belichtung unter drei diskreten Winkeln verkleinert abgebildet werden. Dies erlaubt es, Strukturen deutlich kleiner als ein Mikrometer abzubilden, wobei die Strukturen auf der Photomaske deutlich größer und damit einfacher herzustellen sind. Zudem betrachten wir eine Simulations- und Optimierungsmethode für die optische Proximity-Korrektur nicht-orthogonaler Strukturen, was deren Formtreue verbessert. die Wirksamkeit beider Konzepte bestätigen wir erfolgreich in experimentellen Prints. Die Verwendung optischer Metaoberflächen erweitert die Fähigkeiten zur Wellenfrontformung von Photomasken gegenüber etablierten Intensitäts- oder Phasenschiebermasken. Wir diskutieren zwei Designs für optische Metaoberflächen, die beide den vollen $2\,\pi$-Phasenbereich abdecken. Ein Design beinhaltet dabei noch einen plasmonischen Absorber, was zusätzliche Möglichkeiten bietet, den Transmissionskoeffizient anzupassen. Desweiteren beschreiben wir einen Algorithmus zur Berechnung des Maskenlayouts für beliebige Strukturen. Eine kontinuierliche Weiterentwicklung von Maskenjustierbelichtern ist unerlässlich, um Schritt zu halten mit der fortschreitenden Miniaturisierung in allen Bereich der Optik, der Mechanik und der Elektronik. Unsere Forschungsergebnisse ermöglichen es, die Auflösung der optischen Lithographie im Proximity-Modus zu verbessern und sich damit den zukünftigen Herausforderungen der optischen Industrie stellen zu können

Designs of a Planar Waveguide Solar Concentrator

Solar energy, especially through the use of photovoltaic cells, is a promising sustainable energy source for human race. III-V multijunction photovoltaic cells with over 40% confirmed efficiency are among the best candidates for next generation solar cells. However, due to their complex fabrication process, these solar cells are currently too expensive for terrestrial 1 sun use. By using solar concentrators to replace sunlight collection area with cheap materials, total system cost is reduced and cell efficiency is increased. As a result, solar concentrators are viewed as an indispensable part in today’s multijunction photovoltaic cell systems. A novel planar waveguide solar concentrator is proposed in this work. Comparing to conventional solar concentrators, a waveguide is used to output homogenized light onto photovoltaic cells at its end surface. Such a planar structure is potentially easy to fabricate and is possible for novel sun tracking methods. It also benefits in terms of cell connections and heat management. The basic lens array-waveguide structure with the use of a tapered waveguide as a secondary concentrator shows over 90% efficiency under 800 geometric concentration under ideal cases. Optimizations are applied to the lens array, the couplers, and the secondary concentrator. The optimized structure has <1% geometry loss under 1000 geometric concentration and acceptance angles of 0.5˚~0.7˚ depending on the orientations due to structure asymmetry, which is verified by ZEMAX. As an integral part, solar tracking methods are reviewed and a two-axis tracking method realized by using a single-axis tracker and lateral translations is studied. Lateral translation is used for adjusting positions for seasonal sun movement. It has two-dimensional x-y tracking instead of horizontal movement x-only. A prototype system of 50 geometric concentration with >75% optical efficiency in simulation and >65% efficiency in experiment is presented as a practical example of the proposed tracking method