A survey of carbon nanotube interconnects for energy efficient integrated circuits

This article is a review of the state-of-art carbon nanotube interconnects for Silicon application with respect to the recent literature. Amongst all the research on carbon nanotube interconnects, those discussed here cover 1) challenges with current copper interconnects, 2) process & growth of carbon nanotube interconnects compatible with back-end-of-line integration, and 3) modeling and simulation for circuit-level benchmarking and performance prediction. The focus is on the evolution of carbon nanotube interconnects from the process, theoretical modeling, and experimental characterization to on-chip interconnect applications. We provide an overview of the current advancements on carbon nanotube interconnects and also regarding the prospects for designing energy efficient integrated circuits. Each selected category is presented in an accessible manner aiming to serve as a survey and informative cornerstone on carbon nanotube interconnects relevant to students and scientists belonging to a range of fields from physics, processing to circuit design

Simulation for Reliability, Hardware Security, and Ising Computing in VLSI Chip Design

The continued scaling of VLSI circuits has provided a wealth of opportunities andchallenges to the VLSI circuit design area. Both these challenges and opportunities, however,require new simulation tools that can enable their solution or exploitation as classicalmethods typically dealt with problem domains with smaller scales or less complexity. Inthis dissertation, simulation methods are presented to address the emerging VLSI designtopics of Electromigration induced aging and Ising computing and are then applied to theapplication areas of hardware security and graph partitioning respectively.The Electromigration aging effect in VLSI circuits is a long-term reliability issueaffecting current carrying metal wires leading to IR drop degradation. Typically, simpleanalytical equations can determine a wire’s effective age or if it will be affected by the EMaging effect at all. However, these classical methods are overly conservative and can lead toover design or unnecessary design iterations. Furthermore, it is expected that the EM agingeffect will become more severe in future Integrated Cirucits (ICs) due to increasing currentdensities and the prevalance of polycrystaline copper atom structures seen at small wiredimensions. For this reason, more comprehensive simulation techniques that can efficientlysimulate the EM effect with less conservative results can help mitigate overdesign andincrease design margins while reducing design iterations.The area of Hardware Security is becoming increasingly important as the chipsupply chain becomes more globalized and the integrity of chips becomes more diffiuclt toverify. Utilizing the accurate simulation techniques for EM, we can utilize this reliabilityeffect to demonstrate how a reliability based attack could be perpatrated. Furthermore, wecan utilize this aging effect as a defense mechanism to help us validate the integrity of anIC and detect counterfeit chips in the component supply chain market.Ising computing is an emerging method of solving combinatorial optimization problemsby simulating the interactions of so-called spin glasses and their interactions. Borrowingconcepts from quantum computing, this methods mimics the quantum interaction betweenspin glasses in such a way that finding a ground state of these spin glass models leadsto the solution of a particular problem. In this dissertation, effective methods of simulatingthe spin glass interactions using General Purpose Graphics Processing Units (GPGPUs)and finding their ground state are developed.In addition to the GPU based Ising model simulations, important combinatorialproblems can be mapped to the Ising model. In this dissertation the Ising solver is appliedto graph partitioning which can be utilized in VLSI design and many other domains as well.Specifically, solvers for the maxcut problem and the balanced min-cut partitioning problemare developed

Computer-Assisted Prototyping of Advanced Microsystems

Contains reports on five research projects.Defense Advanced Research Projects Agency Contract DABT 63-95-C-0088Stanford Universit

Constraint-Aware, Scalable, and Efficient Algorithms for Multi-Chip Power Module Layout Optimization

Moving towards an electrified world requires ultra high-density power converters. Electric vehicles, electrified aerospace, data centers, etc. are just a few fields among wide application areas of power electronic systems, where high-density power converters are essential. As a critical part of these power converters, power semiconductor modules and their layout optimization has been identified as a crucial step in achieving the maximum performance and density for wide bandgap technologies (i.e., GaN and SiC). New packaging technologies are also introduced to produce reliable and efficient multichip power module (MCPM) designs to push the current limits. The complexity of the emerging MCPM layouts is surpassing the capability of a manual, iterative design process to produce an optimum design with agile development requirements. An electronic design automation tool called PowerSynth has been introduced with ongoing research toward enhanced capabilities to speed up the optimized MCPM layout design process. This dissertation presents the PowerSynth progression timeline with the methodology updates and corresponding critical results compared to v1.1. The first released version (v1.1) of PowerSynth demonstrated the benefits of layout abstraction, and reduced-order modeling techniques to perform rapid optimization of the MCPM module compared to the traditional, manual, and iterative design approach. However, that version is limited by several key factors: layout representation technique, layout generation algorithms, iterative design-rule-checking (DRC), optimization algorithm candidates, etc. To address these limitations, and enhance PowerSynth’s capabilities, constraint-aware, scalable, and efficient algorithms have been developed and implemented. PowerSynth layout engine has evolved from v1.3 to v2.0 throughout the last five years to incorporate the algorithm updates and generate all 2D/2.5D/3D Manhattan layout solutions. These fundamental changes in the layout generation methodology have also called for updates in the performance modeling techniques and enabled exploring different optimization algorithms. The latest PowerSynth 2 architecture has been implemented to enable electro-thermo-mechanical and reliability optimization on 2D/2.5D/3D MCPM layouts, and set up a path toward cabinet-level optimization. PowerSynth v2.0 computer-aided design (CAD) flow has been hardware-validated through manufacturing and testing of an optimized novel 3D MCPM layout. The flow has shown significant speedup compared to the manual design flow with a comparable optimization result

Design methodology and productivity improvement in high speed VLSI circuits

2017 Spring.Includes bibliographical references.To view the abstract, please see the full text of the document

Design tool and methodologies for interconnect reliability analysis in integrated circuits

Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 2004.This electronic version was submitted by the student author. The certified thesis is available in the Institute Archives and Special Collections.Includes bibliographical references (p. 195-204).by Syed Mohiul Alam.Ph.D

Investigation into yield and reliability enhancement of TSV-based three-dimensional integration circuits

Three dimensional integrated circuits (3D ICs) have been acknowledged as a promising technology to overcome the interconnect delay bottleneck brought by continuous CMOS scaling. Recent research shows that through-silicon-vias (TSVs), which act as vertical links between layers, pose yield and reliability challenges for 3D design. This thesis presents three original contributions.The first contribution presents a grouping-based technique to improve the yield of 3D ICs under manufacturing TSV defects, where regular and redundant TSVs are partitioned into groups. In each group, signals can select good TSVs using rerouting multiplexers avoiding defective TSVs. Grouping ratio (regular to redundant TSVs in one group) has an impact on yield and hardware overhead. Mathematical probabilistic models are presented for yield analysis under the influence of independent and clustering defect distributions. Simulation results using MATLAB show that for a given number of TSVs and TSV failure rate, careful selection of grouping ratio results in achieving 100% yield at minimal hardware cost (number of multiplexers and redundant TSVs) in comparison to a design that does not exploit TSV grouping ratios. The second contribution presents an efficient online fault tolerance technique based on redundant TSVs, to detect TSV manufacturing defects and address thermal-induced reliability issue. The proposed technique accounts for both fault detection and recovery in the presence of three TSV defects: voids, delamination between TSV and landing pad, and TSV short-to-substrate. Simulations using HSPICE and ModelSim are carried out to validate fault detection and recovery. Results show that regular and redundant TSVs can be divided into groups to minimise area overhead without affecting the fault tolerance capability of the technique. Synthesis results using 130-nm design library show that 100% repair capability can be achieved with low area overhead (4% for the best case). The last contribution proposes a technique with joint consideration of temperature mitigation and fault tolerance without introducing additional redundant TSVs. This is achieved by reusing spare TSVs that are frequently deployed for improving yield and reliability in 3D ICs. The proposed technique consists of two steps: TSV determination step, which is for achieving optimal partition between regular and spare TSVs into groups; The second step is TSV placement, where temperature mitigation is targeted while optimizing total wirelength and routing difference. Simulation results show that using the proposed technique, 100% repair capability is achieved across all (five) benchmarks with an average temperature reduction of 75.2? (34.1%) (best case is 99.8? (58.5%)), while increasing wirelength by a small amount

Interconnect Aging—Physics to Software

Device reliability or lifetime is often non-negotiable and crucial for sensitive applications such as medical devices, autonomous vehicles and space crafts. Inevitable technology advancement (e.g. miniaturization) has added unwelcome complications and unpredictability to the aging problem. Reliability of VLSI chips is jeopardized by mass transport in metallic interconnects. Material migration is caused by electrical, mechanical and thermal phenomena, and, therefore, is a complicated process. While all aspects of material migration have been studied, a comprehensive investigation that can explain and include all those phenomena simultaneously remains unsolved. Inaccuracies in modeling and predicting aging processes in wires cause that chipmakers often overdesign interconnects. This is an undesirable and expensive approach in terms of time and cost. In modern technologies, the predicted lifetime, aging, and failure mechanisms in interconnect very often do not match the observed behaviors. Unrealistic models used in CAD tools are the main culprit of such incompatibilities. In general, two situations may occur: (1) in some cases, the models may wrongly scrutinize reliability in unfailing parts and consequently impose unnecessary design tightening and (2) in some other cases, the models may underestimate serious reliability problems causing unpredicted behaviors or catastrophic failures to occur. The existing models for reliability evaluation are usually pessimistic in case of interconnect voiding and optimistic when extrusions occur. Time-consuming and not converging reliability assessments, as well as undesired chip behaviors, are the common expensive outcome of such models.We revisit the underlying physics of aging processes in dual-damascene copper lines. We demonstrate, that the simplistic modeling is the cause of the incompatibility of the existing models. We study all three main aging processes: electromigration, thermo-migration, and stress migration and offer several comprehensive yet compact models for realistic assessment of interconnect aging. These models explain many observations that have been inexplicable for decades. Ultimately, a computer-aided design tool, RAIN, is developed based on the proposed models and is capable of assessing the reliability of industry standard complex multi-layer, multi-segment interconnect networks. This tool can be readily integrated into other verification signoffs phases such as performance, timing, and power analyses. RAIN takes as inputs: (1) interconnect design, (2) technology specifications, (3) initial stress and temperature, (4) IR drop and lifetime requirements. It analyzes and assesses reliability and delivery requirements of all nets, and provides a report on voltage limitations, thermal violations and expected lifetime. It is validated on a wide spectrum of experimental results performed on various industry benchmarks