Advanced analog layout design automation in compliance with density uniformity

To fabricate a reliable integrated circuit chip, foundries follow specific design rules and layout processing techniques. One of the parameters, which affect circuit performance and final electronic product quality, is the variation of thickness for each semiconductor layer within the fabricated chips. The thickness is closely dependent on the density of geometric features on that layer. Therefore, to ensure consistent thickness, foundries normally have to seriously control distribution of the feature density on each layer by using post-processing operations. In this research, the methods of controlling feature density distribution on different layers of an analog layout during the process of layout migration from an old technology to a new one or updated design specifications in the same technology have been investigated. We aim to achieve density-uniformity-aware layout retargeting for facilitating manufacturing process in the advanced technologies. This can offer an advantage right to the design stage for the designers to evaluate the effects of applying density uniformity to their drafted layouts, which are otherwise usually done by the foundries at the final manufacturing stage without considering circuit performance. Layout modification for density uniformity includes component position change and size modification, which may induce crosstalk noise caused by extra parasitic capacitance. To effectively control this effect, we have also investigated and proposed a simple yet accurate analytic method to model the parasitic capacitance on multi-layer VLSI chips. Supported by this capacitance modeling research, a unique methodology to deal with density-uniformity-aware analog layout retargeting with the capability of parasitic capacitance control has been presented. The proposed operations include layout geometry position rearrangement, interconnect size modification, and extra dummy fill insertion for enhancing layout density uniformity. All of these operations are holistically coordinated by a linear programming optimization scheme. The experimental results demonstrate the efficacy of the proposed methodology compared to the popular digital solutions in terms of minimum density variation and acute parasitic capacitance control

Millimeter-Wave Concurrent Dual-Band Sige Bicmos Rfic Phased-Array Transmitter and Components

A concurrent dual-band phased-array transmitter (TX) and its constituent components are studied in this dissertation. The TX and components are designed for the unlicensed bands, 22–29 and 57–64 GHz, using a 0.18-μm BiCMOS technology. Various studies have been done to design the components, which are suitable for the concurrent dual-band phased-array TX. The designed and developed components in this study are an attenuator, switch, phase shifter, power amplifier and power divider. Attenuators play a key role in tailoring main beam and side-lobe patterns in a phased-array TX. To perform the function in the concurrent dual-band phased-array TX, a 22–29 and 57–64 GHz concurrent dual-band attenuator with low phase variations is designed. Signal detection paths are employed at the output of the phased-array TX to monitor the phase and amplitude deviations/errors, which are larger in the high-frequency design. The detected information enables the TX to have an accurate beam tailoring and steering. A 10–67 GHz wide-band attenuator, covering the dual bands, is designed to manipulate the amplitude of the detected signal. New design techniques for an attenuator with a wide attenuation range and improved flatness are proposed. Also, a topology of dual-function circuit, attenuation and switching, is proposed. The switching turns on and off the detection path to minimize the leakages while the path is not used. Switches are used to minimize the number of components in the phased-array transceiver. With the switches, some of the bi-directional components in the transceiver such as an attenuator, phase shifter, filter, and antenna can be shared by the TX and receiver (RX) parts. In this dissertation, a high-isolation switch with a band-pass filtering response is proposed. The band-pass filtering response suppresses the undesired harmonics and intermodulation products of the TX. Phase shifters are used in phased-array TXs to steer the direction of the beam. A 24-GHz phase shifter with low insertion loss variation is designed using a transistor-body-floating technique for our phased-array TX. The low insertion loss variation minimizes the interference in the amplitude control operation (by attenuator or variable gain amplifier) in phased-array systems. BJTs in a BiCMOS process are characterized across dc to 67 GHz. A novel characterization technique, using on-wafer calibration and EM-based de-embedding both, is proposed and its accuracy at high frequencies is verified. The characterized BJT is used in designing the amplifiers in the phased-array TX. A concurrent dual-band power amplifier (PA) centered at 24 and 60 GHz is proposed and designed for the dual-band phased-array TX. Since the PA is operating in the dual frequency bands simultaneously, significant linearity issues occur. To resolve the problems, a study to find significant intermodulation (IM) products, which increase the third intermodulation (IM3) products most, has been done. Also, an advanced simulation and measurement methodology using three fundamental tones is proposed. An 8-way power divider with dual-band frequency response of 22–29 and 57–64 GHz is designed as a constituent component of the phased-array TX

Through-Silicon Vias in SiGe BiCMOS and Interposer Technologies for Sub-THz Applications

Im Rahmen der vorliegenden Dissertation zum Thema „Through-Silicon Vias in SiGe BiCMOS and Interposer Technologies for Sub-THz Applications“ wurde auf Basis einer 130 nm SiGe BiCMOS Technologie ein Through-Silicon Via (TSV) Technologiemodul zur Herstellung elektrischer Durchkontaktierungen für die Anwendung im Millimeterwellen und Sub-THz Frequenzbereich entwickelt. TSVs wurden mittels elektromagnetischer Simulationen modelliert und in Bezug auf ihre elektrischen Eigenschaften bis in den sub-THz Bereich bis zu 300 GHz optimiert. Es wurden die Wechselwirkungen zwischen Modellierung, Fertigungstechnologie und den elektrischen Eigenschaften untersucht. Besonderes Augenmerk wurde auf die technologischen Einflussfaktoren gelegt. Daraus schlussfolgernd wurde das TSV Technologiemodul entwickelt und in eine SiGe BiCMOS Technologie integriert. Hierzu wurde eine Via-Middle Integration gewählt, welche eine Freilegung der TSVs von der Wafer Rückseite erfordert. Durch die geringe Waferdicke von ca. 75 μm wird einen Carrier Wafer Handling Prozess verwendet. Dieser Prozess wurde unter der Randbedingung entwickelt, dass eine nachfolgende Bearbeitung der Wafer innerhalb der BiCMOS Pilotlinie erfolgen kann. Die Rückseitenbearbeitung zielt darauf ab, einen Redistribution Layer auf der Rückseite der BiCMOS Wafer zu realisieren. Hierzu wurde ein Prozess entwickelt, um gleichzeitig verschiedene TSV Strukturen mit variablen Geometrien zu realisieren und damit eine hohe TSV Design Flexibilität zu gewährleisten. Die TSV Strukturen wurden von DC bis über 300 GHz charakterisiert und die elektrischen Eigenschaften extrahiert. Dabei wurde gezeigt, dass TSV Verbindungen mit sehr geringer Dämpfung <1 dB bis 300 GHz realisierbar sind und somit ausgezeichnete Hochfrequenzeigenschaften aufweisen. Zuletzt wurden vielfältige Anwendungen wie das Grounding von Hochfrequenzschaltkreisen, Interposer mit Waveguides und 300 GHz Antennen dargestellt. Das Potential für Millimeterwellen Packaging und 3D Integration wurde evaluiert. TSV Technologien sind heutzutage in vielen Anwendungen z.B. im Bereich der Systemintegration von Digitalschaltkreisen und der Spannungsversorgung von integrierten Schaltkreisen etabliert. Im Rahmen dieser Arbeit wurde der Einsatz von TSVs für Millimeterwellen und dem sub-THz Frequenzbereich untersucht und die Anwendung für den sub-THz Bereich bis 300 GHz demonstriert. Dadurch werden neue Möglichkeiten der Systemintegration und des Packaging von Höchstfrequenzsystemen geschaffen.:Bibliographische Beschreibung List of symbols and abbreviations Acknowledgement 1. Introduction 2. FEM Modeling of BiCMOS & Interposer Through-Silicon Vias 3. Fabrication of BiCMOS & Silicon Interposer with TSVs 4. Characterization of BiCMOS Embedded Through-Silicon Vias 5. Applications 6. Conclusion and Future Work 7. Appendix 8. Publications & Patents 9. Bibliography 10. List of Figures and Table

MEMS Switches Implemented in Different Technologies for RF Applications

Microfabrication technologies allow building micro-scale and nano-scale mechanical switches. Despite the fact that the solid-state switches exhibit superior performance as compared to their micro-mechanical competitors in terms of speed and lifetime, mechanical switches exhibit various attractive features such as low power consumption, high linearity, high isolation and low loss. This work summarizes the design, fabrication and testing of several micro-mechanical switches for Radio Frequency (RF) applications and using different microelectromechanical systems (MEMS) technologies. The implementation is carried out through four approaches for realizing MEMS switches. In the first approach, the switches are built by post-processing chips fabricated in a standard complementary metal-oxide semiconductor (CMOS) fabrication process. The structural layers of the electrostatic MEMS switches are implemented in the four metal layers of the back end of line (BEOL) in the standard CMOS 0.35µm process. In addition, an enhanced post-processing technique is developed and implemented successfully. The switches presented include a compact 4-bit capacitor bank, a compact 4-bit phase shifter / delay line, a W-band single pole single through (SPST) series capacitive switch, SPST shunt capacitive switches with enhanced capacitance density, and a proposed compact T-switch cell with metal-to-metal contact switches. In the second approach, a standard multi-user MEMS process is implemented. Electrothermal and electrostatic MEMS switches designed, fabricated and tested for low-frequency high-power RF applications using the MetalMUMPs process. The devices include a 3-bit capacitor bank, a compact discrete capacitor bank that can be configured for 2-bit / 3-bit operation depending on the stroke of the electrothermal actuators, and a novel rotor-based electrostatic multi-port switch. In the third approach, an in-house university-based microfabrication process is developed in order to build reliable MEMS switches. The UWMEMS process, which was developed at the Center for Integrated RF Engineering (CIRFE), is used in this research to fabricate novel switch configurations. Moreover, the capabilities of the standard UWMEMS process are further expanded in order to allow for building geometric confinement (GC) or anchorless switches and other novel switches. The gold-based UWMEMS switches presented include compact T-switches, R-switches and C-switches, GC SPST shunt and series switches. Additionally, other novel switch architectures such as the hybrid self-actuation switch (HSAS) and thermally-restored switches (TRS). In the fourth approach, which is a hybrid approach between the first and third approaches, the MEMS switches are built and packaged in one fabrication process, and without the need for sacrificial layer, by means of a wafer-level packaging technique. Adopting silicon wafers for the microfabrication necessitates using silicon-core switching, which offers few attractive advantages as compared to the metal-based switches implemented by the third approach. The designed switches to be fabricated in a state-of-the-art industrial facility include a variety of simple SPST contact-type switches as well as compact designs of T-switch, C-switch, a novel four-port gimbal-based switch (G-switch) introduced in this work, SP4T cells, and a seesaw push-pull SPST switch design is included

Electrical recommendations and formulas for metal fill in radio-frequency integrated circuits

With increasing transistor operating frequencies, interconnects and passive devices are becoming performance limiters in integrated circuit (IC) designs. To combat this, the interconnect layers above the active silicon are trending toward low-κ dielectrics and Cu metallization. The use of these new materials has popularized chemical mechanical polishing (CMP) to planarize the several interconnect layers. Unfortunately, the mechanical trade-offs of CMP require metal pattern density uniformity and additional dummy metal shapes fill in regions of low density. These metal fills act as parasitics that increase the capacitances in interconnects and passive devices – hindering their performance. This work analyzes and optimizes the parasitic capacitive impact of rectangular metal fills on key passive components. Our systematic analysis of fills below a metal-insulator-metal (MIM) capacitor reveals an optimal design: large, square fills with lengths roughly 40% of MIM capacitors plate length. We fabricated such a MIM capacitor in a 250nm process showing a reduction in the substrate capacitance by half (compared to default tiling). Fill’s impact on interconnects, such as transmission lines, is also investigated. A detailed study of schemes that use grounded fills as shielding between interconnects informs an optimal grounding strategy. The strategy provides maximal isolation while minimizing capacitive loading. In fact, compared to no fills the addition of our metal fill shield increases loading by 58% while providing 58dB more isolation between example interconnects fabricated in a 130nm process. The capacitive impact of adding metal fills is found to be more significant as process dimensions shrink. In a 65nm process the inter-level dielectric constant is 3.5, but the addition of 50% density fills causes the effective dielectric constant to be 5.5. A semi-empirical, closed-form formula is developed to calculate this effective dielectric constant. The formula is accurate to within <1% for a wide range of metal fill densities, sizes, aspect ratios, and process dimensions. This is a significant improvement over state-of-the-art formulas which are found to be accurate to within ~10%. Our high accuracy is maintained when applied to multiple layers with and without staggering. Moreover, we successfully apply the formula to calculating ground/substrate capacitances of MIM capacitors, microstrip transmission lines, and a spiral inductor. This may speed up the calculation by hundredfold or even thousandfold. Results are compared to fabricated MIM capacitors and microstrips. Calculations and measurements match to within <5% for the capacitors and <2% for the microstrips

Characterization and design of CMOS components for microwave and millimeter wave applications

Ph.DDOCTOR OF PHILOSOPH

DESIGN OF A BURST MODE ULTRA HIGH-SPEED LOW-NOISE CMOS IMAGE SENSOR

Ultra-high-speed (UHS) image sensors are of interest for studying fast scientific phenomena and may also be useful in medicine. Several published studies have recently achieved frame rates of up to millions of frames per second (Mfps) using advanced processes and/or customized processes. This thesis presents a burst-mode (108 frames) UHS low-noise CMOS image sensor (CIS) based on charge-sweep transfer gates in an unmodified, standard 180 nm front-side-illuminated CIS process. By optimizing the photodiode geometry, the 52.8 μm pitch pixels with 20x20 μm^2 of active area, achieve a charge-transfer time of less than 10 ns. A proof-of-concept CIS was designed and fabricated. Through characterization, it is shown that the designed CIS has the potential to achieve 20 Mfps with an input-referred noise of 5.1 e− rms