Integrated performance prediction and quality control in manufacturing systems

textPredicting the condition of a degrading dynamic system is critical for implementing successful control and designing the optimal operation and maintenance strategies throughout the lifetime of the system. In many situations, especially in manufacturing, systems experience multiple degradation cycles, failures, and maintenance events throughout their lifetimes. In such cases, historical records of sensor readings observed during the lifecycle of a machine can yield vital information about degradation patterns of the monitored machine, which can be used to formulate dynamic models for predicting its future performance. Besides the ability to predict equipment failures, another major component of cost effective and high-throughput manufacturing is tight control of product quality. Quality control is assured by taking periodic measurements of the products at various stages of production. Nevertheless, quality measurements of the product require time and are often executed on costly measurement equipment, which increases the cost of manufacturing and slows down production. One possible way to remedy this situation is to utilize the inherent link between the manufacturing equipment condition, mirrored in the readings of sensors mounted on that machine, and the quality of products coming out of it. The concept of Virtual Metrology (VM) addresses the quality control problem by using data-driven models that relate the product quality to the equipment sensors, enabling continuous estimation of the quality characteristics of the product, even when physical measurements of product quality are not available. VM can thus bring significant production benefits, including improved process control, reduced quality losses and higher productivity. In this dissertation, new methods are formulated that will combine long-term performance prediction of sensory signatures from a degrading manufacturing machine with VM quality estimation, which enables integration of predictive condition monitoring (prediction of sensory signatures) with predictive manufacturing process control (predictive VM model). The recently developed algorithm for prediction of sensory signatures is capable of predicting the system condition by comparing the similarity of the most recent performance signatures with the known degradation patterns available in the historical records. The method accomplishes the prediction of non-Gaussian and non-stationary time-series of relevant performance signatures with analytical tractability, which enables calculations of predicted signature distributions with significantly greater speeds than what can be found in literature. VM quality estimation is implemented using the recently introduced growing structure multiple model system paradigm (GSMMS), based on the use of local linear dynamic models. The concept of local models enables representation of complex, non-linear dependencies with non-Gaussian and non-stationary noise characteristics, using a locally tractable model representation. Localized modeling enables a VM that can detect situations when the VM model is not adequate and needs to be improved, which is one of the main challenges in VM. Finally, uncertainty propagation with Monte Carlo simulation is pursued in order to propagate the predicted distributions of equipment signatures through the VM model to enable prediction of distributions of the quality variables using the readily available sensor readings streaming from the monitored manufacturing machine. The newly developed methods are applied to long-term production data coming from an industrial plasma-enhanced chemical vapor deposition (PECVD) tool operating in a major semiconductor manufacturing fab.Mechanical Engineerin

Virtual metrology for plasma etch processes.

Plasma processes can present dicult control challenges due to time-varying dynamics and a lack of relevant and/or regular measurements. Virtual metrology (VM) is the use of mathematical models with accessible measurements from an operating process to estimate variables of interest. This thesis addresses the challenge of virtual metrology for plasma processes, with a particular focus on semiconductor plasma etch. Introductory material covering the essentials of plasma physics, plasma etching, plasma measurement techniques, and black-box modelling techniques is rst presented for readers not familiar with these subjects. A comprehensive literature review is then completed to detail the state of the art in modelling and VM research for plasma etch processes. To demonstrate the versatility of VM, a temperature monitoring system utilising a state-space model and Luenberger observer is designed for the variable specic impulse magnetoplasma rocket (VASIMR) engine, a plasma-based space propulsion system. The temperature monitoring system uses optical emission spectroscopy (OES) measurements from the VASIMR engine plasma to correct temperature estimates in the presence of modelling error and inaccurate initial conditions. Temperature estimates within 2% of the real values are achieved using this scheme. An extensive examination of the implementation of a wafer-to-wafer VM scheme to estimate plasma etch rate for an industrial plasma etch process is presented. The VM models estimate etch rate using measurements from the processing tool and a plasma impedance monitor (PIM). A selection of modelling techniques are considered for VM modelling, and Gaussian process regression (GPR) is applied for the rst time for VM of plasma etch rate. Models with global and local scope are compared, and modelling schemes that attempt to cater for the etch process dynamics are proposed. GPR-based windowed models produce the most accurate estimates, achieving mean absolute percentage errors (MAPEs) of approximately 1:15%. The consistency of the results presented suggests that this level of accuracy represents the best accuracy achievable for the plasma etch system at the current frequency of metrology. Finally, a real-time VM and model predictive control (MPC) scheme for control of plasma electron density in an industrial etch chamber is designed and tested. The VM scheme uses PIM measurements to estimate electron density in real time. A predictive functional control (PFC) scheme is implemented to cater for a time delay in the VM system. The controller achieves time constants of less than one second, no overshoot, and excellent disturbance rejection properties. The PFC scheme is further expanded by adapting the internal model in the controller in real time in response to changes in the process operating point

Virtual metrology for plasma etch processes.

Plasma processes can present dicult control challenges due to time-varying dynamics and a lack of relevant and/or regular measurements. Virtual metrology (VM) is the use of mathematical models with accessible measurements from an operating process to estimate variables of interest. This thesis addresses the challenge of virtual metrology for plasma processes, with a particular focus on semiconductor plasma etch. Introductory material covering the essentials of plasma physics, plasma etching, plasma measurement techniques, and black-box modelling techniques is rst presented for readers not familiar with these subjects. A comprehensive literature review is then completed to detail the state of the art in modelling and VM research for plasma etch processes. To demonstrate the versatility of VM, a temperature monitoring system utilising a state-space model and Luenberger observer is designed for the variable specic impulse magnetoplasma rocket (VASIMR) engine, a plasma-based space propulsion system. The temperature monitoring system uses optical emission spectroscopy (OES) measurements from the VASIMR engine plasma to correct temperature estimates in the presence of modelling error and inaccurate initial conditions. Temperature estimates within 2% of the real values are achieved using this scheme. An extensive examination of the implementation of a wafer-to-wafer VM scheme to estimate plasma etch rate for an industrial plasma etch process is presented. The VM models estimate etch rate using measurements from the processing tool and a plasma impedance monitor (PIM). A selection of modelling techniques are considered for VM modelling, and Gaussian process regression (GPR) is applied for the rst time for VM of plasma etch rate. Models with global and local scope are compared, and modelling schemes that attempt to cater for the etch process dynamics are proposed. GPR-based windowed models produce the most accurate estimates, achieving mean absolute percentage errors (MAPEs) of approximately 1:15%. The consistency of the results presented suggests that this level of accuracy represents the best accuracy achievable for the plasma etch system at the current frequency of metrology. Finally, a real-time VM and model predictive control (MPC) scheme for control of plasma electron density in an industrial etch chamber is designed and tested. The VM scheme uses PIM measurements to estimate electron density in real time. A predictive functional control (PFC) scheme is implemented to cater for a time delay in the VM system. The controller achieves time constants of less than one second, no overshoot, and excellent disturbance rejection properties. The PFC scheme is further expanded by adapting the internal model in the controller in real time in response to changes in the process operating point

Statistical Methods for Semiconductor Manufacturing

In this thesis techniques for non-parametric modeling, machine learning, filtering and prediction and run-to-run control for semiconductor manufacturing are described. In particular, algorithms have been developed for two major applications area: - Virtual Metrology (VM) systems; - Predictive Maintenance (PdM) systems. Both technologies have proliferated in the past recent years in the semiconductor industries, called fabs, in order to increment productivity and decrease costs. VM systems aim of predicting quantities on the wafer, the main and basic product of the semiconductor industry, that may be physically measurable or not. These quantities are usually ’costly’ to be measured in economic or temporal terms: the prediction is based on process variables and/or logistic information on the production that, instead, are always available and that can be used for modeling without further costs. PdM systems, on the other hand, aim at predicting when a maintenance action has to be performed. This approach to maintenance management, based like VM on statistical methods and on the availability of process/logistic data, is in contrast with other classical approaches: - Run-to-Failure (R2F), where there are no interventions performed on the machine/process until a new breaking or specification violation happens in the production; - Preventive Maintenance (PvM), where the maintenances are scheduled in advance based on temporal intervals or on production iterations. Both aforementioned approaches are not optimal, because they do not assure that breakings and wasting of wafers will not happen and, in the case of PvM, they may lead to unnecessary maintenances without completely exploiting the lifetime of the machine or of the process. The main goal of this thesis is to prove through several applications and feasibility studies that the use of statistical modeling algorithms and control systems can improve the efficiency, yield and profits of a manufacturing environment like the semiconductor one, where lots of data are recorded and can be employed to build mathematical models. We present several original contributions, both in the form of applications and methods. The introduction of this thesis will be an overview on the semiconductor fabrication process: the most common practices on Advanced Process Control (APC) systems and the major issues for engineers and statisticians working in this area will be presented. Furthermore we will illustrate the methods and mathematical models used in the applications. We will then discuss in details the following applications: - A VM system for the estimation of the thickness deposited on the wafer by the Chemical Vapor Deposition (CVD) process, that exploits Fault Detection and Classification (FDC) data is presented. In this tool a new clustering algorithm based on Information Theory (IT) elements have been proposed. In addition, the Least Angle Regression (LARS) algorithm has been applied for the first time to VM problems. - A new VM module for multi-step (CVD, Etching and Litography) line is proposed, where Multi-Task Learning techniques have been employed. - A new Machine Learning algorithm based on Kernel Methods for the estimation of scalar outputs from time series inputs is illustrated. - Run-to-Run control algorithms that employ both the presence of physical measures and statistical ones (coming from a VM system) is shown; this tool is based on IT elements. - A PdM module based on filtering and prediction techniques (Kalman Filter, Monte Carlo methods) is developed for the prediction of maintenance interventions in the Epitaxy process. - A PdM system based on Elastic Nets for the maintenance predictions in Ion Implantation tool is described. Several of the aforementioned works have been developed in collaborations with major European semiconductor companies in the framework of the European project UE FP7 IMPROVE (Implementing Manufacturing science solutions to increase equiPment pROductiVity and fab pErformance); such collaborations will be specified during the thesis, underlying the practical aspects of the implementation of the proposed technologies in a real industrial environment

Measurements, Models, Systems and Design

531 s.

Design, control and error analysis of a fast tool positioning system for ultra-precision machining of freeform surfaces

This thesis was previously held under moratorium from 03/12/19 to 03/12/21Freeform surfaces are widely found in advanced imaging and illumination systems, orthopaedic implants, high-power beam shaping applications, and other high-end scientific instruments. They give the designers greater ability to cope with the performance limitations commonly encountered in simple-shape designs. However, the stringent requirements for surface roughness and form accuracy of freeform components pose significant challenges for current machining techniques—especially in the optical and display market where large surfaces with tens of thousands of micro features are to be machined. Such highly wavy surfaces require the machine tool cutter to move rapidly while keeping following errors small. Manufacturing efficiency has been a bottleneck in these applications. The rapidly changing cutting forces and inertial forces also contribute a great deal to the machining errors. The difficulty in maintaining good surface quality under conditions of high operational frequency suggests the need for an error analysis approach that can predict the dynamic errors. The machining requirements also impose great challenges on machine tool design and the control process. There has been a knowledge gap on how the mechanical structural design affects the achievable positioning stability. The goal of this study was to develop a tool positioning system capable of delivering fast motion with the required positioning accuracy and stiffness for ultra-precision freeform manufacturing. This goal is achieved through deterministic structural design, detailed error analysis, and novel control algorithms. Firstly, a novel stiff-support design was proposed to eliminate the structural and bearing compliances in the structural loop. To implement the concept, a fast positioning device was developed based on a new-type flat voice coil motor. Flexure bearing, magnet track, and motor coil parameters were designed and calculated in detail. A high-performance digital controller and a power amplifier were also built to meet the servo rate requirement of the closed-loop system. A thorough understanding was established of how signals propagated within the control system, which is fundamentally important in determining the loop performance of high-speed control. A systematic error analysis approach based on a detailed model of the system was proposed and verified for the first time that could reveal how disturbances contribute to the tool positioning errors. Each source of disturbance was treated as a stochastic process, and these disturbances were synthesised in the frequency domain. The differences between following error and real positioning error were discussed and clarified. The predicted spectrum of following errors agreed with the measured spectrum across the frequency range. It is found that the following errors read from the control software underestimated the real positioning errors at low frequencies and overestimated them at high frequencies. The error analysis approach thus successfully revealed the real tool positioning errors that are mingled with sensor noise. Approaches to suppress disturbances were discussed from the perspectives of both system design and control. A deterministic controller design approach was developed to preclude the uncertainty associated with controller tuning, resulting in a control law that can minimize positioning errors. The influences of mechanical parameters such as mass, damping, and stiffness were investigated within the closed-loop framework. Under a given disturbance condition, the optimal bearing stiffness and optimal damping coefficients were found. Experimental positioning tests showed that a larger moving mass helped to combat all disturbances but sensor noise. Because of power limits, the inertia of the fast tool positioning system could not be high. A control algorithm with an additional acceleration-feedback loop was then studied to enhance the dynamic stiffness of the cutting system without any need for large inertia. An analytical model of the dynamic stiffness of the system with acceleration feedback was established. The dynamic stiffness was tested by frequency response tests as well as by intermittent diamond-turning experiments. The following errors and the form errors of the machined surfaces were compared with the estimates provided by the model. It is found that the dynamic stiffness within the acceleration sensor bandwidth was proportionally improved. The additional acceleration sensor brought a new error source into the loop, and its contribution of errors increased with a larger acceleration gain. At a certain point, the error caused by the increased acceleration gain surpassed other disturbances and started to dominate, representing the practical upper limit of the acceleration gain. Finally, the developed positioning system was used to cut some typical freeform surfaces. A surface roughness of 1.2 nm (Ra) was achieved on a NiP alloy substrate in flat cutting experiments. Freeform surfaces—including beam integrator surface, sinusoidal surface, and arbitrary freeform surface—were successfully machined with optical-grade quality. Ideas for future improvements were proposed in the end of this thesis.Freeform surfaces are widely found in advanced imaging and illumination systems, orthopaedic implants, high-power beam shaping applications, and other high-end scientific instruments. They give the designers greater ability to cope with the performance limitations commonly encountered in simple-shape designs. However, the stringent requirements for surface roughness and form accuracy of freeform components pose significant challenges for current machining techniques—especially in the optical and display market where large surfaces with tens of thousands of micro features are to be machined. Such highly wavy surfaces require the machine tool cutter to move rapidly while keeping following errors small. Manufacturing efficiency has been a bottleneck in these applications. The rapidly changing cutting forces and inertial forces also contribute a great deal to the machining errors. The difficulty in maintaining good surface quality under conditions of high operational frequency suggests the need for an error analysis approach that can predict the dynamic errors. The machining requirements also impose great challenges on machine tool design and the control process. There has been a knowledge gap on how the mechanical structural design affects the achievable positioning stability. The goal of this study was to develop a tool positioning system capable of delivering fast motion with the required positioning accuracy and stiffness for ultra-precision freeform manufacturing. This goal is achieved through deterministic structural design, detailed error analysis, and novel control algorithms. Firstly, a novel stiff-support design was proposed to eliminate the structural and bearing compliances in the structural loop. To implement the concept, a fast positioning device was developed based on a new-type flat voice coil motor. Flexure bearing, magnet track, and motor coil parameters were designed and calculated in detail. A high-performance digital controller and a power amplifier were also built to meet the servo rate requirement of the closed-loop system. A thorough understanding was established of how signals propagated within the control system, which is fundamentally important in determining the loop performance of high-speed control. A systematic error analysis approach based on a detailed model of the system was proposed and verified for the first time that could reveal how disturbances contribute to the tool positioning errors. Each source of disturbance was treated as a stochastic process, and these disturbances were synthesised in the frequency domain. The differences between following error and real positioning error were discussed and clarified. The predicted spectrum of following errors agreed with the measured spectrum across the frequency range. It is found that the following errors read from the control software underestimated the real positioning errors at low frequencies and overestimated them at high frequencies. The error analysis approach thus successfully revealed the real tool positioning errors that are mingled with sensor noise. Approaches to suppress disturbances were discussed from the perspectives of both system design and control. A deterministic controller design approach was developed to preclude the uncertainty associated with controller tuning, resulting in a control law that can minimize positioning errors. The influences of mechanical parameters such as mass, damping, and stiffness were investigated within the closed-loop framework. Under a given disturbance condition, the optimal bearing stiffness and optimal damping coefficients were found. Experimental positioning tests showed that a larger moving mass helped to combat all disturbances but sensor noise. Because of power limits, the inertia of the fast tool positioning system could not be high. A control algorithm with an additional acceleration-feedback loop was then studied to enhance the dynamic stiffness of the cutting system without any need for large inertia. An analytical model of the dynamic stiffness of the system with acceleration feedback was established. The dynamic stiffness was tested by frequency response tests as well as by intermittent diamond-turning experiments. The following errors and the form errors of the machined surfaces were compared with the estimates provided by the model. It is found that the dynamic stiffness within the acceleration sensor bandwidth was proportionally improved. The additional acceleration sensor brought a new error source into the loop, and its contribution of errors increased with a larger acceleration gain. At a certain point, the error caused by the increased acceleration gain surpassed other disturbances and started to dominate, representing the practical upper limit of the acceleration gain. Finally, the developed positioning system was used to cut some typical freeform surfaces. A surface roughness of 1.2 nm (Ra) was achieved on a NiP alloy substrate in flat cutting experiments. Freeform surfaces—including beam integrator surface, sinusoidal surface, and arbitrary freeform surface—were successfully machined with optical-grade quality. Ideas for future improvements were proposed in the end of this thesis

Manufacturing Metrology

Metrology is the science of measurement, which can be divided into three overlapping activities: (1) the definition of units of measurement, (2) the realization of units of measurement, and (3) the traceability of measurement units. Manufacturing metrology originally implicates the measurement of components and inputs for a manufacturing process to assure they are within specification requirements. It can also be extended to indicate the performance measurement of manufacturing equipment. This Special Issue covers papers revealing novel measurement methodologies and instrumentations for manufacturing metrology from the conventional industry to the frontier of the advanced hi-tech industry. Twenty-five papers are included in this Special Issue. These published papers can be categorized into four main groups, as follows: Length measurement: covering new designs, from micro/nanogap measurement with laser triangulation sensors and laser interferometers to very-long-distance, newly developed mode-locked femtosecond lasers. Surface profile and form measurements: covering technologies with new confocal sensors and imagine sensors: in situ and on-machine measurements. Angle measurements: these include a new 2D precision level design, a review of angle measurement with mode-locked femtosecond lasers, and multi-axis machine tool squareness measurement. Other laboratory systems: these include a water cooling temperature control system and a computer-aided inspection framework for CMM performance evaluation

NASA SBIR abstracts of 1991 phase 1 projects

The objectives of 301 projects placed under contract by the Small Business Innovation Research (SBIR) program of the National Aeronautics and Space Administration (NASA) are described. These projects were selected competitively from among proposals submitted to NASA in response to the 1991 SBIR Program Solicitation. The basic document consists of edited, non-proprietary abstracts of the winning proposals submitted by small businesses. The abstracts are presented under the 15 technical topics within which Phase 1 proposals were solicited. Each project was assigned a sequential identifying number from 001 to 301, in order of its appearance in the body of the report. Appendixes to provide additional information about the SBIR program and permit cross-reference of the 1991 Phase 1 projects by company name, location by state, principal investigator, NASA Field Center responsible for management of each project, and NASA contract number are included