1,061 research outputs found

    Via-configurable transistors array: a regular design technique to improve ICs yield

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    Process variations are a major bottleneck for digital CMOS integrated circuits manufacturability and yield. That is why regular techniques with different degrees of regularity are emerging as possible solutions. Our proposal is a new regular layout design technique called Via-Configurable Transistors Array (VCTA) that pushes to the limit circuit layout regularity for devices and interconnects in order to maximize regularity benefits. VCTA is predicted to perform worse than the Standard Cell approach designs for a certain technology node but it will allow the use of a future technology on an earlier time. Our objective is to optimize VCTA for it to be comparable to the Standard Cell design in an older technology. Simulations for the first unoptimized version of our VCTA of delay and energy consumption for a Full Adder circuit in the 90 nm technology node are presented and also the extrapolation for Carry-Ripple Adders from 4 bits to 64 bits.Peer ReviewedPostprint (published version

    FOCSI: A new layout regularity metric

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    Technical ReportDigital CMOS Integrated Circuits (ICs) suffer from serious layout features printability issues associated to the lithography manufacturing process. Regular layout designs are emerging as alternative solutions to reduce these ICs systematic subwavelength lithography failures. However, there is no metric to evaluate and compare the layout regularity of those regular designs. In this paper we propose a new layout regularity metric called Fixed Origin Corner Square Inspection (FOCSI). FOCSI allows the comparison and quantification of designs in terms of regularity and for any given degree of granularity. When FOCSI is oriented to the evaluation of regularity while applying Lithography Enhancement Techniques, it comprehends layout layers measurements considering the optical interaction length and combines them to obtain the complete layout regularity measure. Examples are provided for 32-bit adders in the 90 nm technology node for the Standard Cell approach and for Via-Configurable Transistor Array regular designs. We show how layouts can be sorted accurately even if their degree of regularity is similar.Preprin

    Design Methodologies and Architecture Solutions for High-Performance Interconnects

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    ABSTRACT In Deep Sub-Micron (DSM) technologies, interconnects play a crucial role in the correct functionality and largely impact the performance of complex System-on-Chip (SoC) designs. For technologies of 0.25µm and below, wiring capacitance dominates gate capacitance, thus rapidly increasing the interconnect-induced delay. Moreover, the coupling capacitance becomes a significant portion of the on-chip total wiring capacitance, and coupling between adjacent wires cannot be considered as a second-order effect any longer. As a consequence, the traditional top-down design methodology is ineffective, since the actual wiring delays can be computed only after layout parasitic extraction, when the physical design is completed. Fixing all the timing violations often requires several time-consuming iterations of logical and physical design, and it is essentially a trial-and-error approach. Increasingly tighter time-to-market requirements dictate that interconnect parasitics must be taken into account during all phases of the design flow, at different level of abstractions. However, given the aggressive technology scaling trends and the growing design complexity, this approach will only temporarily ameliorate the interconnect problem. We believe that in order to achieve gigascale designs in the nanometer regime, a novel design paradigm, based on new forms of regularity and newly created IP (Intellectual Property) blocks must be developed, to provide a direct path from system-level architectural exploration to physical implementation

    Reliability-aware and energy-efficient system level design for networks-on-chip

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    2015 Spring.Includes bibliographical references.With CMOS technology aggressively scaling into the ultra-deep sub-micron (UDSM) regime and application complexity growing rapidly in recent years, processors today are being driven to integrate multiple cores on a chip. Such chip multiprocessor (CMP) architectures offer unprecedented levels of computing performance for highly parallel emerging applications in the era of digital convergence. However, a major challenge facing the designers of these emerging multicore architectures is the increased likelihood of failure due to the rise in transient, permanent, and intermittent faults caused by a variety of factors that are becoming more and more prevalent with technology scaling. On-chip interconnect architectures are particularly susceptible to faults that can corrupt transmitted data or prevent it from reaching its destination. Reliability concerns in UDSM nodes have in part contributed to the shift from traditional bus-based communication fabrics to network-on-chip (NoC) architectures that provide better scalability, performance, and utilization than buses. In this thesis, to overcome potential faults in NoCs, my research began by exploring fault-tolerant routing algorithms. Under the constraint of deadlock freedom, we make use of the inherent redundancy in NoCs due to multiple paths between packet sources and sinks and propose different fault-tolerant routing schemes to achieve much better fault tolerance capabilities than possible with traditional routing schemes. The proposed schemes also use replication opportunistically to optimize the balance between energy overhead and arrival rate. As 3D integrated circuit (3D-IC) technology with wafer-to-wafer bonding has been recently proposed as a promising candidate for future CMPs, we also propose a fault-tolerant routing scheme for 3D NoCs which outperforms the existing popular routing schemes in terms of energy consumption, performance and reliability. To quantify reliability and provide different levels of intelligent protection, for the first time, we propose the network vulnerability factor (NVF) metric to characterize the vulnerability of NoC components to faults. NVF determines the probabilities that faults in NoC components manifest as errors in the final program output of the CMP system. With NVF aware partial protection for NoC components, almost 50% energy cost can be saved compared to the traditional approach of comprehensively protecting all NoC components. Lastly, we focus on the problem of fault-tolerant NoC design, that involves many NP-hard sub-problems such as core mapping, fault-tolerant routing, and fault-tolerant router configuration. We propose a novel design-time (RESYN) and a hybrid design and runtime (HEFT) synthesis framework to trade-off energy consumption and reliability in the NoC fabric at the system level for CMPs. Together, our research in fault-tolerant NoC routing, reliability modeling, and reliability aware NoC synthesis substantially enhances NoC reliability and energy-efficiency beyond what is possible with traditional approaches and state-of-the-art strategies from prior work

    Single event upset hardened embedded domain specific reconfigurable architecture

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    Current Trends in High-Level Synthesis of Asynchronous Circuits

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    Design Techniques for Lithography-Friendly Nanometer CMOS Integrated Circuits

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    The Integrated Circuits industry has been a major driver of the outstanding changes and improvements in the modern day technology and life style that we are observing in our day to day life. The continuous scaling of CMOS technology has been one of the major challenges and success stories. However, as the CMOS technology advances deeply into the deep sub-micron technology nodes, the whole industry (both manufacturing and design) is starting to face new challenges. One major challenge is the control of the variation in device parameters. Lithography variations result from the industry incapability to come up with new light sources with a smaller wavelength than ArF source (193 nm wavelength). In this research, we develop better understanding of the photo-lithography variations and their effect on how the design gets patterned. We investigate the state-of-the-art mask correction and design manipulation techniques. We are focusing in our study on the different Optical Proximity Correction (OPC) and design retargeting techniques to assess how we can improve both the functional and parametric yield. Our goal is to achieve a fast and accurate Model Based Re-Targeting (MBRT) technique that can achieve a better functional yield during manufacturing by establishing the techniques to produce more lithography-friendly targets. Moreover, it can be easily integrated into a fab's PDK (due to its relatively high speed) to feedback the exact final printing on wafer to the designers during the early design phase. In this thesis, we focus on two main topics. First is the development of a fast technique that can predict the final mask shape with reasonable accuracy. This is our proposed Model-based Initial Bias (MIB) methodology, in which we develop the full methodology for creating compact models that can predict the perturbation needed to get to an OPC initial condition that is much closer to the final solution. This is very useful in general in the OPC domain, where it can save almost 50% of the OPC runtime. We also use MIB in our proposed Model-Based Retargeting (MBRT) flow to accurately compute lithography hot-spots location and severity. Second, we develop the fast model-based retargeting methodology that is capable of fixing lithography hot spots and improving the functional yield. Moreover, in this methodology we introduce to the first time the concept of distributed retargeting. In distributed MBRT, not only the design portion that is suffering from the hot-spot is moving to get it fixed but also the surrounding designs and design fragments also contribute to the hot-spot fix. Our proposed model-based retargeting methodology also includes the multiple-patterning awareness as well as the electrical-connectivity-awareness (via-awareness). We used Mentor Graphics Calibre Litho-API c-based programing to develop all of the methodologies we explain in this thesis and tested it on 20nm and 10nm nodes

    Control of sectioned on-chip communication

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