Probing many-body dynamics on a 51-atom quantum simulator

Controllable, coherent many-body systems can provide insights into the fundamental properties of quantum matter, enable the realization of new quantum phases and could ultimately lead to computational systems that outperform existing computers based on classical approaches. Here we demonstrate a method for creating controlled many-body quantum matter that combines deterministically prepared, reconfigurable arrays of individually trapped cold atoms with strong, coherent interactions enabled by excitation to Rydberg states. We realize a programmable Ising-type quantum spin model with tunable interactions and system sizes of up to 51 qubits. Within this model, we observe phase transitions into spatially ordered states that break various discrete symmetries, verify the high-fidelity preparation of these states and investigate the dynamics across the phase transition in large arrays of atoms. In particular, we observe robust manybody dynamics corresponding to persistent oscillations of the order after a rapid quantum quench that results from a sudden transition across the phase boundary. Our method provides a way of exploring many-body phenomena on a programmable quantum simulator and could enable realizations of new quantum algorithms.Comment: 17 pages, 13 figure

Six-Sigma Quality Management of Additive Manufacturing

Quality is a key determinant in deploying new processes, products, or services and influences the adoption of emerging manufacturing technologies. The advent of additive manufacturing (AM) as a manufacturing process has the potential to revolutionize a host of enterprise-related functions from production to the supply chain. The unprecedented level of design flexibility and expanded functionality offered by AM, coupled with greatly reduced lead times, can potentially pave the way for mass customization. However, widespread application of AM is currently hampered by technical challenges in process repeatability and quality management. The breakthrough effect of six sigma (6S) has been demonstrated in traditional manufacturing industries (e.g., semiconductor and automotive industries) in the context of quality planning, control, and improvement through the intensive use of data, statistics, and optimization. 6S entails a data-driven DMAIC methodology of five steps—define, measure, analyze, improve, and control. Notwithstanding the sustained successes of the 6S knowledge body in a variety of established industries ranging from manufacturing, healthcare, logistics, and beyond, there is a dearth of concentrated application of 6S quality management approaches in the context of AM. In this article, we propose to design, develop, and implement the new DMAIC methodology for the 6S quality management of AM. First, we define the specific quality challenges arising from AM layerwise fabrication and mass customization (even one-of-a-kind production). Second, we present a review of AM metrology and sensing techniques, from materials through design, process, and environment, to post-build inspection. Third, we contextualize a framework for realizing the full potential of data from AM systems and emphasize the need for analytical methods and tools. We propose and delineate the utility of new data-driven analytical methods, including deep learning, machine learning, and network science, to characterize and model the interrelationships between engineering design, machine setting, process variability, and final build quality. Fourth, we present the methodologies of ontology analytics, design of experiments (DOE), and simulation analysis for AM system improvements. In closing, new process control approaches are discussed to optimize the action plans, once an anomaly is detected, with specific consideration of lead time and energy consumption. We posit that this work will catalyze more in-depth investigations and multidisciplinary research efforts to accelerate the application of 6S quality management in AM

Advanced Computer Dormant Reliability Study Final Report

Reliability of integrated circuits and discrete components of electronics for computer and dormant module for Minuteman

Comparing Adobe’s Unsharp Masks and High-Pass Filters in Photoshop Using the Visual Information Fidelity Metric

The present study examines image sharpening techniques quantitatively. A technique known as unsharp masking has been the preferred image sharpening technique for imaging professionals for many years. More recently, another professional-level sharpening solution has been introduced, namely, the high-pass filter technique of image sharpening. An extensive review of the literature revealed no purely quantitative studies that compared these techniques. The present research compares unsharp masking (USM) and high-pass filter (HPF) sharpening using an image quality metric known as Visual Information Fidelity (VIF). Prior researchers have used VIF data in research aimed at improving the USM sharpening technique. The present study aims to add to this branch of the literature through the comparison of the USM and the HPF sharpening techniques. The objective of the present research is to determine which sharpening technique, USM or HPF, yields the highest VIF scores for two categories of images, macro images and architectural images. Each set of images was further analyzed to compare the VIF scores of subjects with high and low severity depth of field defects. Finally, the researcher proposed rules for choosing USM and HPF parameters that resulted in optimal VIF scores. For each category, the researcher captured 24 images (12 with high severity defects and 12 with low severity defects). Each image was sharpened using an iterative process of choosing USM and HPF sharpening parameters, applying sharpening filters with the chosen parameters, and assessing the resulting images using the VIF metric. The process was repeated until the VIF scores could no longer be improved. The highest USM and HPF VIF scores for each image were compared using a paired t-test for statistical significance. The t-test results demonstrated that: • The USM VIF scores for macro images (M = 1.86, SD = 0.59) outperformed those for HPF (M = 1.34, SD = 0.18), a statistically significant mean increase of 0.52, t = 5.57 (23), p = 0.0000115. Similar results were obtained for both the high severity and low severity subsets of macro images. • The USM VIF scores for architectural images (M = 1.40, SD = 0.24) outperformed those for HPF (M = 1.26, SD = 0.15), a statistically significant mean increase of 0.14, t = 5.21 (23), p = 0.0000276. Similar results were obtained for both the high severity and low severity subsets of architectural images. The researcher found that the optimal sharpening parameters for USM and HPF depend on the content of the image. The optimal choice of parameters for USM depends on whether the most important features are edges or objects. Specific rules for choosing USM parameters were developed for each class of images. HPF is simpler in the fact that it only uses one parameter, Radius. Specific rules for choosing the HPF Radius were also developed for each class of images. Based on these results, the researcher concluded that USM outperformed HPF in sharpening macro and architectural images. The superior performance of USM could be due to the fact that it provides more parameters for users to control the sharpening process than HPF