Conquering Process Variability: A Key Enabler for Profitable Manufacturing in Advanced Technology Nodes

Abstract – Achieving the required time to market with economically acceptable yield levels and maintaining them in volume production has become a very challenging task in the most advanced technology nodes. One of the primary reasons is the relative increase in process variability in each generation. This paper will describe a comprehensive study of the main sources of variability and their effects on active devices, interconnect and ultimately product performance and yield. We will present benchmarking of yield loss components for different product classes. We will then propose several approaches for variability reduction in the design, yield ramp and volume manufacturing phases. EVOLUTION OF YIELD LOSS MECHANISMS In the older technology generations, manufacturing yield loss was dominated by random defects. By the time volum

DFM Techniques for the Detection and Mitigation of Hotspots in Nanometer Technology

With the continuous scaling down of dimensions in advanced technology nodes, process variations are getting worse for each new node. Process variations have a large influence on the quality and yield of the designed and manufactured circuits. There is a growing need for fast and efficient techniques to characterize and mitigate the effects of different sources of process variations on the design's performance and yield. In this thesis we have studied the various sources of systematic process variations and their effects on the circuit, and the various methodologies to combat systematic process variation in the design space. We developed abstract and accurate process variability models, that would model systematic intra-die variations. The models convert the variation in process into variation in electrical parameters of devices and hence variation in circuit performance (timing and leakage) without the need for circuit simulation. And as the analysis and mitigation techniques are studied in different levels of the design ow, we proposed a flow for combating the systematic process variation in nano-meter CMOS technology. By calculating the effects of variability on the electrical performance of circuits we can gauge the importance of the accurate analysis and model-driven corrections. We presented an automated framework that allows the integration of circuit analysis with process variability modeling to optimize the computer intense process simulation steps and optimize the usage of variation mitigation techniques. And we used the results obtained from using this framework to develop a relation between layout regularity and resilience of the devices to process variation. We used these findings to develop a novel technique for fast detection of critical failures (hotspots) resulting from process variation. We showed that our approach is superior to other published techniques in both accuracy and predictability. Finally, we presented an automated method for fixing the lithography hotspots. Our method showed success rate of 99% in fixing hotspots

Variability-aware low-power techniques for nanoscale mixed-signal circuits.

New circuit design techniques that accommodate lower supply voltages necessary for portable systems need to be integrated into the semiconductor intellectual property (IP) core. Systems that once worked at 3.3 V or 2.5 V now need to work at 1.8 V or lower, without causing any performance degradation. Also, the fluctuation of device characteristics caused by process variation in nanometer technologies is seen as design yield loss. The numerous parasitic effects induced by layouts, especially for high-performance and high-speed circuits, pose a problem for IC design. Lack of exact layout information during circuit sizing leads to long design iterations involving time-consuming runs of complex tools. There is a strong need for low-power, high-performance, parasitic-aware and process-variation-tolerant circuit design. This dissertation proposes methodologies and techniques to achieve variability, power, performance, and parasitic-aware circuit designs. Three approaches are proposed: the single iteration automatic approach, the hybrid Monte Carlo and design of experiments (DOE) approach, and the corner-based approach. Widely used mixed-signal circuits such as analog-to-digital converter (ADC), voltage controlled oscillator (VCO), voltage level converter and active pixel sensor (APS) have been designed at nanoscale complementary metal oxide semiconductor (CMOS) and subjected to the proposed methodologies. The effectiveness of the proposed methodologies has been demonstrated through exhaustive simulations. Apart from these methodologies, the application of dual-oxide and dual-threshold techniques at circuit level in order to minimize power and leakage is also explored

Fault- and Yield-Aware On-Chip Memory Design and Management

Ever decreasing device size causes more frequent hard faults, which becomes a serious burden to processor design and yield management. This problem is particularly pronounced in the on-chip memory which consumes up to 70% of a processor' s total chip area. Traditional circuit-level techniques, such as redundancy and error correction code, become less effective in error-prevalent environments because of their large area overhead. In this work, we suggest an architectural solution to building reliable on-chip memory in the future processor environment. Our approaches have two parts, a design framework and architectural techniques for on-chip memory structures. Our design framework provides important architectural evaluation metrics such as yield, area, and performance based on low level defects and process variations parameters. Processor architects can quickly evaluate their designs' characteristics in terms of yield, area, and performance. With the framework, we develop architectural yield enhancement solutions for on-chip memory structures including L1 cache, L2 cache and directory memory. Our proposed solutions greatly improve yield with negligible area and performance overhead. Furthermore, we develop a decoupled yield model of compute cores and L2 caches in CMPs, which show that there will be many more L2 caches than compute cores in a chip. We propose efficient utilization techniques for excess caches. Evaluation results show that excess caches significantly improve overall performance of CMPs

Design of complex integrated systems based on networks-on-chip: Trading off performance, power and reliability

The steady advancement of microelectronics is associated with an escalating number of challenges for design engineers due to both the tiny dimensions and the enormous complexity of integrated systems. Against this background, this work deals with Network-On-Chip (NOC) as the emerging design paradigm to cope with diverse issues of nanotechnology. The detailed investigations within the chapters focus on the communication-centric aspects of multi-core-systems, whereas performance, power consumption as well as reliability are considered likewise as the essential design criteria

A CAPACITY MODEL FOR RESEARCH BASED GOVERNMENT MANUFACTURING SYSTEMS

Manufacturing systems take longer than necessary to be designed and implemented, hence the greater developmental cost. A class of manufacturing systems exist which would benefit from the concepts of reverse engineering, to reduce lead times for establishing critical manufacturing capabilities essential to national safety and security. There is a need to reverse engineer these manufacturing systems as no current system and/or body of knowledge exists. Manufacturing systems vary in their ability to deliver products in an efficient and reliable manner and hence the variability in national readiness. Presently the design of manufacturing systems for some critical operations ranges from an educated trial and error process to duplicating from documentation and professional expertise. The literature search highlights the non-existence of a current systematic operational reverse engineering model that could be the standard for designing manufacturing systems. One of the main constraints in the manufacturing is that the time for production is limited and denoted by time available (TA). The time to finish (TF) is the time needed to complete the manufacturing operations in a facility so that the entire quantity demanded is produced, from start to end, in the production line. If the TF is less than the TA there is sufficient capacity to meet the demand. Literature search indicates that no study has been conducted to compute the TF. Further, it also indicates that no study has been carried out focusing on the vi impact of variations and disruptions at the design stage, even though these topics are covered in analysis of existing operational systems. The algorithms and mathematical model were developed. The model will compute the exact TF taking into account variation, disruption and flow issues. The equation for TF was developed. The model to be designed is validated using information from a government manufacturing system

Maßnahmen zur Steigerung der Zuverlässigkeit integrierter Schaltungen auf Gatterebene hinsichtlich Gateoxiddefekten

Die fortschreitende Skalierung führt zur Verbesserung dynamischer Parameter einer integrierten Schaltung, aber auch zu Verschleißerscheinungen, die die Lebensdauer dieser Schaltungen allein durch den Betrieb signifikant begrenzen. Die vorliegende Arbeit stellt neue Ansätze auf Gatterebene zur Erhöhung der Zuverlässigkeit für kombinatorische integrierte Schaltungen hinsichtlich Gateoxiddefekten vor, die sich in einen standardisierten CMOS-Designablauf integrieren lassen. Des Weiteren befasst sich diese Arbeit mit der Entwicklung eines Simulators zur Analyse der Auswirkungen von Gateoxiddefekten

Variability-Aware Circuit Performance Optimisation Through Digital Reconfiguration

This thesis proposes optimisation methods for improving the performance of circuits imple- mented on a custom reconfigurable hardware platform with knowledge of intrinsic variations, through the use of digital reconfiguration. With the continuing trend of transistor shrinking, stochastic variations become first order effects, posing a significant challenge for device reliability. Traditional device models tend to be too conservative, as the margins are greatly increased to account for these variations. Variation-aware optimisation methods are then required to reduce the performance spread caused by these substrate variations. The Programmable Analogue and Digital Array (PAnDA) is a reconfigurable hardware plat- form which combines the traditional architecture of a Field Programmable Gate Array (FPGA) with the concept of configurable transistor widths, and is used in this thesis as a platform on which variability-aware circuits can be implemented. A model of the PAnDA architecture is designed to allow for rapid prototyping of devices, making the study of the effects of intrinsic variability on circuit performance – which re- quires expensive statistical simulations – feasible. This is achieved by means of importing statistically-enhanced transistor performance data from RandomSPICE simulations into a model of the PAnDA architecture implemented in hardware. Digital reconfiguration is then used to explore the hardware resources available for performance optimisation. A bio-inspired optimisation algorithm is used to explore the large solution space more efficiently. Results from test circuits suggest that variation-aware optimisation can provide a significant reduction in the spread of the distribution of performance across various instances of circuits, as well as an increase in performance for each. Even if transistor geometry flexibility is not available, as is the case of traditional architectures, it is still possible to make use of the substrate variations to reduce spread and increase performance by means of function relocation

Enhancing Power Efficient Design Techniques in Deep Submicron Era

Excessive power dissipation has been one of the major bottlenecks for design and manufacture in the past couple of decades. Power efficient design has become more and more challenging when technology scales down to the deep submicron era that features the dominance of leakage, the manufacture variation, the on-chip temperature variation and higher reliability requirements, among others. Most of the computer aided design (CAD) tools and algorithms currently used in industry were developed in the pre deep submicron era and did not consider the new features explicitly and adequately. Recent research advances in deep submicron design, such as the mechanisms of leakage, the source and characterization of manufacture variation, the cause and models of on-chip temperature variation, provide us the opportunity to incorporate these important issues in power efficient design. We explore this opportunity in this dissertation by demonstrating that significant power reduction can be achieved with only minor modification to the existing CAD tools and algorithms. First, we consider peak current, which has become critical for circuit's reliability in deep submicron design. Traditional low power design techniques focus on the reduction of average power. We propose to reduce peak current while keeping the overhead on average power as small as possible. Second, dual Vt technique and gate sizing have been used simultaneously for leakage savings. However, this approach becomes less effective in deep submicron design. We propose to use the newly developed process-induced mechanical stress to enhance its performance. Finally, in deep submicron design, the impact of on-chip temperature variation on leakage and performance becomes more and more significant. We propose a temperature-aware dual Vt approach to alleviate hot spots and achieve further leakage reduction. We also consider this leakage-temperature dependency in the dynamic voltage scaling approach and discover that a commonly accepted result is incorrect for the current technology. We conduct extensive experiments with popular design benchmarks, using the latest industry CAD tools and design libraries. The results show that our proposed enhancements are promising in power saving and are practical to solve the low power design challenges in deep submicron era