232 research outputs found

    Charracterisation and Analysis of High Voltage Silicon Carbide Mosfet

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    Silicon carbide power devices

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    4H-SiC Integrated circuits for high temperature and harsh environment applications

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    Silicon Carbide (SiC) has received a special attention in the last decades thanks to its superior electrical, mechanical and chemical proprieties. SiC is mostly used for applications where Silicon is limited, becoming a proper material for both unipolar and bipolar power device able to work under high power, high frequency and high temperature conditions. Aside from the outstanding theoretical and practical advantages still to be proved in SiC devices, the need for more accurate models for the design and optimization of these devices, along with the development of integrated circuits (ICs) on SiC is indispensable for the further success of modern power electronics. The design and development of SiC ICs has become a necessity since the high temperature operation of ICs is expected to enable important improvements in aerospace, automotive, energy production and other industrial systems. Due to the last impressive progresses in the manufacturing of high quality SiC substrates, the possibility of developing ICs applications is now feasible. SiC unipolar transistors, such as JFETs and MESFETs show a promising potential for digital ICs operating at high temperature and in harsh environments. The reported ICs on SiC have been realized so far with either a small number of elements, or with a low integration density. Therefore, this work demonstrates that by means of our SiC MESFET technology, multi-stage digital ICs fabrication containing a large number of 4H-SiC devices is feasible, accomplishing some of the most important ICs requirements. The ultimate objective is the development of SiC digital building blocks by transferring the Si CMOS topologies, hence demonstrating that the ICs SiC technology can be an important competitor of the Si ICs technology especially in application fields in which high temperature, high switching speed and harsh environment operations are required. The study starts with the current normally-on SiC MESFET CNM complete analysis of an already fabricated MESFET. It continues with the modeling and fabrication of a new planar-MESFET structure together with new epitaxial resistors specially suited for high temperature and high integration density. A novel device isolation technique never used on SiC before is approached. A fabrication process flow with three metal levels fully compatible with the CMOS technology is defined. An exhaustive experimental characterization at room and high temperature (300ºC) and Spice parameter extractions for both structures are performed. In order to design digital ICs on SiC with the previously developed devices, the current available topologies for normally-on transistors are discussed. The circuits design using Spice modeling, the process technology, the fabrication and the testing of the 4H-SiC MESFET elementary logic gates library at high temperature and high frequencies are performed. The MESFET logic gates behavior up to 300ºC is analyzed. Finally, this library has allowed us implementing complex multi-stage logic circuits with three metal levels and a process flow fully compatible with a CMOS technology. This study demonstrates that the development of important SiC digital blocks by transferring CMOS topologies (such as Master Slave Data Flip-Flop and Data-Reset Flip-Flop) is successfully achieved. Hence, demonstrating that our 4H-SiC MESFET technology enables the fabrication of mixed signal ICs capable to operate at high temperature (300ºC) and high frequencies (300kHz). We consider this study an important step ahead regarding the future ICs developments on SiC. Finally, experimental irradiations were performed on W-Schotthy diodes and mesa-MESFET devices (with the same Schottky gate than the planar SiC MESFET) in order to study their radiation hardness stability. The good radiation endurance of SiC Schottky-gate devices is proven. It is expected that the new developed devices with the same W-Schottky gate, to have a similar behavior in radiation rich environments.Postprint (published version

    Komponente na bazi silicijum karbida u elektronskim kolima velike snage

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    Silicon has been the number one choice of materials for over 40 years. It has reached an almost perfected stage through extensive research for so many years; now it is cheap to be manufactured and performs very reliably at room temperature. However, as modem electronics move to a more advanced level with increasing complexity, materials other than silicon are under consideration. Several areas where Silicon shows shortcomings in high temperature environments and high voltage conditions. The Silicon devices need to be shielded – cooled, are limited to operation at low temperature and low blocking voltage by virtue physical and electric properties. So silicon devices are restricted and have focused on low power electronics applications only, these various limitations in the use of Si devices has led to development of wide band gap semiconductors such as Silicon carbide . And because there is an urgent need for high voltage electronics for advanced technology represented in (transportation - space - communications - power systems) in which silicon has failed to be used. Due to various properties of Silicon carbide like lower intrinsic carrier concentration (10–35 orders of magnitude), higher electric breakdown field (4–20 times), higher thermal conductivity (3–13 times), larger saturated electron drift velocity (2–2.5 times),wide band gap (2.2 eV) and higher, more isotropic bulk electron mobility comparable to that of Si. These properties make it a potential material to overcome the limitations of Si. The fact that wide band gap semiconductors are capable of electronic functionality, particularly in the case of SiC. 4H-SiC is a potentially useful material for high temperature devices because of its refractory nature. So Silicon Carbide (SiC) will bring solid-state power electronics to a new horizon by expanding to applications in the high voltage power electronics sectors. It is the better choice for use in high temperature environment and high voltage conditions. Silicon carbide is about to replace Si material very quickly and scientifically will force Si to get retired. The superior characteristics of silicon carbide, have suggested considering as the next generation of power semiconductor devices. And because our study will concentrate on the use of semiconductors on high voltage unipolar power electronics devices. DIMOSFET will be..
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