Overview of carbon-based circuits and systems

This paper presents an overview of the state of the art on carbon-based circuits and systems made up of carbon nanotubes and graphene transistors. A tutorial description of the most important devices and their potential benefits and limitations is given, trying to identify their suitability to implement analog and digital circuits and systems. Main electrical models reported so far for the design of carbon-based field-effect devices are surveyed, and the main sizing parameters required to implement such devices in practical integrated circuits are analyzed. The solutions proposed by cutting-edge integrated circuits and devices are discussed, identifying current trends, challenges and opportunities for the circuits and systems community1

Opportunities for radio frequency nanoelectronic integrated circuits using carbon-based technologies

This thesis presents a body of work on the modeling of and performance predictions for carbon nanotube field-effect transistors (CNFET) and graphene field-effect transistors (GFET). While conventional silicon-based CMOS is expected to reach its ultimate scaling limits during the next decade, these two novel technologies are promising candidates for future high-performance electronics. The main goal of this work is to investigate on the opportunities of using such carbon-based electronics for RF integrated circuits. This thesis addresses 1) the modeling of noise and process variability in CNFETs, 2) RF performance predictions for CNFETs, and 3) an accurate GFET compact model. This work proposes the first CNFET noise compact model. Noise is of primary importance for RF applications and its description significantly increases the insight gained from simulation studies. Furthermore, a CNFET variability model is presented, which handles tube synthesis and metal tube removal imperfections. These two model extensions have been added to the Stanford CNFET compact model and allow for the variability-aware RF performance assessment of the CNFET technology. In continuation, comprehensive RF performance projections for CNFETs are provided both on the device and circuit level. The overall set of ITRS RF-CMOS technology requirement FoMs is determined and shows that the CNFET performs excellently in terms of speed, gain, and minimum noise figure. Furthermore, for the first time FoMs are reported for the basic RF building blocks low-noise amplifier and oscillator. In addition, it is shown that CNFET downscaling yields significant performance improvements. Based on these analyses it is confirmed that the CNFET has the potential to outperform Si-CMOS in RF applications. A third key contribution of this thesis is the development of an accurate GFET compact model. Previous compact models simplify several physical aspects, which can cause erroneous simulation results. Here, an accurate yet simple mathematical description of the GFET’s current-voltage relation is proposed and implemented in Verilog-A. Comprehensive error analyses are done in order to highlight the advantages of the new approach. Furthermore, the model is verified against measurement results. The developed GFET model is an important step towards better understanding the characteristics and opportunities of graphene-based analog circuitry

Robust Circuit & Architecture Design in the Nanoscale Regime

Silicon based integrated circuit (IC) technology is approaching its physical limits. For sub 10nm technology nodes, the carbon nanotube (CNT) based field effect transistor has emerged as a promising device because of its excellent electronic properties. One of the major challenges faced by the CNT technology is the unwanted growth of metallic tubes. At present, there is no known CNT fabrication technology which allows the fabrication of 100% semiconducting CNTs. The presence of metallic tubes creates a short between the drain and source terminals of the transistor and has a detrimental impact on the delay, static power and yield of CNT based gates. This thesis will address the challenge of designing robust carbon nanotube based circuits in the presence of metallic tubes. For a small percentage of metallic tubes, circuit level solutions are proposed to increase the functional yield of CNT based gates in the presence of metallic tubes. Accurate analytical models with less than a 3% inaccuracy rate are developed to estimate the yield of CNT based circuit for a different percentage of metallic tubes and different drive strengths of logic gates. Moreover, a design methodology is developed for yield-aware carbon nanotube based circuits in the presence of metallic tubes using different CNFET transistor configurations. Architecture based on regular logic bricks with underlying hybrid CNFET configurations are developed which gives better trade-offs in terms of performance, power, and functional yield. In the case when the percentage of metallic tubes is large, the proposed circuit level techniques are not sufficient. Extra processing techniques must be applied to remove the metallic tubes. The tube removal techniques have trade-offs, as the removal process is not perfect and removes semiconducting tubes in addition to removing unwanted metallic tubes. As a result, stochastic removal of tubes from the drive and fanout gate(s) results in large variation in the performance of CNFET based gates and in the worst case open circuit gates. A Monte Carlo simulation engine is developed to estimate the impact of the removal of tubes on the performance and power of CNFET based logic gates. For a quick estimation of functional yield of logic gates, accurate analytical models are developed to estimate the functional yield of logic gates when a fraction of the tubes are removed. An efficient tube level redundancy (TLR) is proposed, resulting in a high functional yield of carbon nanotube based circuits with minimal overheads in terms of area and power when large fraction of tubes are removed. Furthermore, for applications where parallelism can be utilized we propose to increase the functional yield of the CNFET based circuits by increasing the logic depth of gates

Technology Projection Using Simple Compact Models

Abstract-We review recent efforts to capture the device nonidealities for circuit-level technology projection for Si CMOS. We also give some examples of simple compact model development for assessing the circuit-level performance of exploratory devices such as III-V FET, carbon nanotube transistor, and nanoelectromechanical (NEM) transistors and relays

New Logic Synthesis As Nanotechnology Enabler (invited paper)

Nanoelectronics comprises a variety of devices whose electrical properties are more complex as compared to CMOS, thus enabling new computational paradigms. The potentially large space for innovation has to be explored in the search for technologies that can support large-scale and high- performance circuit design. Within this space, we analyze a set of emerging technologies characterized by a similar computational abstraction at the design level, i.e., a binary comparator or a majority voter. We demonstrate that new logic synthesis techniques, natively supporting this abstraction, are the technology enablers. We describe models and data-structures for logic design using emerging technologies and we show results of applying new synthesis algorithms and tools. We conclude that new logic synthesis methods are required to both evaluate emerging technologies and to achieve the best results in terms of area, power and performance

Multiple-Independent-Gate Field-Effect Transistors for High Computational Density and Low Power Consumption

Transistors are the fundamental elements in Integrated Circuits (IC). The development of transistors significantly improves the circuit performance. Numerous technology innovations have been adopted to maintain the continuous scaling down of transistors. With all these innovations and efforts, the transistor size is approaching the natural limitations of materials in the near future. The circuits are expected to compute in a more efficient way. From this perspective, new device concepts are desirable to exploit additional functionality. On the other hand, with the continuously increased device density on the chips, reducing the power consumption has become a key concern in IC design. To overcome the limitations of Complementary Metal-Oxide-Semiconductor (CMOS) technology in computing efficiency and power reduction, this thesis introduces the multiple- independent-gate Field-Effect Transistors (FETs) with silicon nanowires and FinFET structures. The device not only has the capability of polarity control, but also provides dual-threshold- voltage and steep-subthreshold-slope operations for power reduction in circuit design. By independently modulating the Schottky junctions between metallic source/drain and semiconductor channel, the dual-threshold-voltage characteristics with controllable polarity are achieved in a single device. This property is demonstrated in both experiments and simulations. Thanks to the compact implementation of logic functions, circuit-level benchmarking shows promising performance with a configurable dual-threshold-voltage physical design, which is suitable for low-power applications. This thesis also experimentally demonstrates the steep-subthreshold-slope operation in the multiple-independent-gate FETs. Based on a positive feedback induced by weak impact ionization, the measured characteristics of the device achieve a steep subthreshold slope of 6 mV/dec over 5 decades of current. High Ion/Ioff ratio and low leakage current are also simultaneously obtained with a good reliability. Based on a physical analysis of the device operation, feasible improvements are suggested to further enhance the performance. A physics-based surface potential and drain current model is also derived for the polarity-controllable Silicon Nanowire FETs (SiNWFETs). By solving the carrier transport at Schottky junctions and in the channel, the core model captures the operation with independent gate control. It can serve as the core framework for developing a complete compact model by integrating advanced physical effects. To summarize, multiple-independent-gate SiNWFETs and FinFETs are extensively studied in terms of fabrication, modeling, and simulation. The proposed device concept expands the family of polarity-controllable FETs. In addition to the enhanced logic functionality, the polarity-controllable SiNWFETs and FinFETs with the dual-threshold-voltage and steep-subthreshold-slope operation can be promising candidates for future IC design towards low-power applications

Device and circuit-level models for carbon nanotube and graphene nanoribbon transistors

Metal-oxide semiconductor field-effect transistor (MOSFET) scaling throughout the years has enabled us to pack million of MOS transistors on a single chip to keep in pace with Moore’s Law. After forty years of advances in integrated circuit (IC) technology, the scaling of silicon (Si) MOSFET has entered the nanometer dimension with the introduction of 90 nm high volume manufacturing in 2004. The latest technological advancement has led to a low power, high-density and high-speed generation of processor. Nevertheless, the scaling of the Si MOSFET below 22 nm may soon meet its’ fundamental physical limitations. This threshold makes the possible use of novel devices and structures such as carbon nanotube field-effect transistors (CNTFETs) and graphene nanoribbon field-effect transistors (GNRFETs) for future nanoelectronics. The investigation explores the potential of these amazing carbon structures that exceed MOSFET capabilities in term of speed, scalability and power consumption. The research findings demonstrate the potential integration of carbon based technology into existing ICs. In particular, a simulation program with integrated circuit emphasis (SPICE) model for CNTFET and GNRFET in digital logic applications is presented. The device performance of these circuit models and their design layout are then compared to 45 nm and 90 nm MOSFET for benchmarking. It is revealed through the investigation that CNT and GNR channels can overcome the limitations imposed by Si channel length scaling and associated short channel effects while consuming smaller channel area at higher current density

Silicon on ferroelectric insulator field effect transistor (SOF-FET) a new device for the next generation ultra low power circuits

Title from PDF of title page, viewed on March 12, 2014Thesis advisor: Masud H. ChowdhuryVitaIncludes bibliographical references (pages 116-131)Thesis (M. S.)--School of Computer and Engineering. University of Missouri--Kansas City, 2013Field effect transistors (FETs) are the foundation for all electronic circuits and processors. These devices have progressed massively to touch its final steps in subnanometer level. Left and right proposals are coming to rescue this progress. Emerging nano-electronic devices (resonant tunneling devices, single-atom transistors, spin devices, Heterojunction Transistors rapid flux quantum devices, carbon nanotubes, and nanowire devices) took a vast share of current scientific research. Non-Si electronic materials like III-V heterostructure, ferroelectric, carbon nanotubes (CNTs), and other nanowire based designs are in developing stage to become the core technology of non-classical CMOS structures. FinFET present the current feasible commercial nanotechnology. The scalability and low power dissipation of this device allowed for an extension of silicon based devices. High short channel effect (SCE) immunity presents its major advantage. Multi-gate structure comes to light to improve the gate electrostatic over the channel. The new structure shows a higher performance that made it the first candidate to substitute the conventional MOSFET. The device also shows a future scalability to continue Moor’s Law. Furthermore, the device is compatible with silicon fabrication process. Moreover, the ultra-low-power (ULP) design required a subthreshold slope lower than the thermionic-emission limit of 60mV/ decade (KT/q). This value was unbreakable by the new structure (SOI-FinFET). On the other hand most of the previews proposals show the ability to go beyond this limit. However, those pre-mentioned schemes have publicized a very complicated physics, design difficulties, and process non-compatibility. The objective of this research is to discuss various emerging nano-devices proposed for ultra-low-power designs and their possibilities to replace the silicon devices as the core technology in the future integrated circuit. This thesis proposes a novel design that exploits the concept of negative capacitance. The new field effect transistor (FET) based on ferroelectric insulator named Silicon-On-Ferroelectric Insulator Field Effect Transistor (SOF-FET). This proposal is a promising methodology for future ultra-lowpower applications, because it demonstrates the ability to replace the silicon-bulk based MOSFET, and offers subthreshold swing significantly lower than 60mV/decade and reduced threshold voltage to form a conducting channel. The SOF-FET can also solve the issue of junction leakage (due to the presence of unipolar junction between the top plate of the negative capacitance and the diffused areas that form the transistor source and drain). In this device the charge hungry ferroelectric film already limits the leakage.Abstract -- List of illustrations - List of tables -- Acknowledgements -- Dedication -- Introduction -- Carbon nanotube field effect transistor -- Multi-gate transistors -FinFET -- Subthreshold swing -- Tunneling field effect transistors -- I-mos and nanowire fets -- Ferroelectric based field effect transistors -- An analytical model to approximate the subthreshold swing for soi-finfet -- Silicon-on-ferroelectric insulator field effect transistor (SOF-FET) -- Current-voltage characteristics of sof-fet -- Advantages, manufacturing process and future work of the proposed device -- Appendix -- Reference

Carbon Nanotube Interconnect Modeling for Very Large Scale Integrated Circuits

In this research, we have studied and analyzed the physical and electrical properties of carbon nanotubes. Based on the reported models for current transport behavior in non-ballistic CNT-FETs, we have built a dynamic model for non-ballistic CNT-FETs. We have also extended the surface potential model of a non-ballistic CNT-FET to a ballistic CNT-FET and developed a current transport model for ballistic CNT-FETs. We have studied the current transport in metallic carbon nanotubes. By considering the electron-electron interactions, we have modified two-dimensional fluid model for electron transport to build a semi-classical one-dimensional fluid model to describe the electron transport in carbon nanotubes, which is regarded as one-dimensional system. Besides its accuracy compared with two-dimensional fluid model and Lüttinger liquid theory, one-dimensional fluid model is simple in mathematical modeling and easier to extend for electronic transport modeling of multi-walled carbon nanotubes and single-walled carbon nanotube bundles as interconnections. Based on our reported one-dimensional fluid model, we have calculated the parameters of the transmission line model for the interconnection wires made of single-walled carbon nanotube, multi-walled carbon nanotube and single-walled carbon nanotube bundle. The parameters calculated from these models show close agreements with experiments and other proposed models. We have also implemented these models to study carbon nanotube for on-chip wire inductors and it application in design of LC voltage-controlled oscillators. By using these CNT-FET models and CNT interconnects models, we have studied the behavior of CNT based integrated circuits, such as the inverter, ring oscillator, energy recovery logic; and faults in CNT based circuits

Silicon on Ferroelectric Insulator Field Effect Transistor (SOFFET): A Radical Alternative to Overcome the Thermionic Limit

Title from PDF of title page viewed January 3,2018Dissertation advisor: Masud H ChowdhuryVitaIncludes bibliographical references (pages 165-180)Thesis (Ph.D.)--School of Computing and Engineering and Department of Physics and Astronomy. University of Missouri--Kansas City, 2016The path of down-scaling traditional MOSFET is reaching its technological, economic and, most importantly, fundamental physical limits. Before the dead-end of the roadmap, it is imperative to conduct a broad research to find alternative materials and new architectures to the current technology for the MOSFET devices. Beyond silicon electronic materials like group III-V heterostructure, ferroelectric material, carbon nanotubes (CNTs), and other nanowire-based designs are in development to become the core technology for non-classical CMOS structures. Field effect transistors (FETs) in general have made unprecedented progress in the last few decades by down-scaling device dimensions and power supply level leading to extremely high numbers of devices in a single chip. High density integrated circuits are now facing major challenges related to power management and heat dissipation due to excessive leakage, mainly due to subthreshold conduction. Over the years, planar MOSFET dimensional reduction was the only process followed by the semiconductor industry to improve device performance and to reduce the power supply. Further scaling increases short-channel-effect (SCE), and off-state current makes it difficult for the industry to follow the well-known Moore’s Law with bulk devices. Therefore, scaling planar MOSFET is no longer considered as a feasible solution to extend this law. The down-scaling of metal-oxide-semiconductor field effect transistors (MOSFETs) leads to severe short-channel-effects and power leakage at large-scale integrated circuits (LSIs). The device, which is governed by the thermionic emission of the carriers injected from the source to the channel region, has set a limitation of the subthreshold swing (S) of 60 / at room temperature. Devices with ‘S’ below this limit is highly desirable to reduce the power consumption and maintaining a high / current ratio. Therefore, the future of semiconductor industry hangs on new architectures, new materials or even new physics to govern the flow of carriers in new switches. As the subthreshold swing is increasing at every technology node, new structures using SOI, multi-gate, nanowire approach, and new channel materials such as III–V semiconductor have not satisfied the targeted values of subthreshold swing. Moreover, the ultra-low-power (ULP) design required a subthreshold slope lower than the thermionic emission limit of 60 /. This value was unbreakable by the new structure (SOI FinFET). On the other hand, most of the preview proposals show the ability to go beyond this limit. However, those pre-mentioned schemes have publicized very complicated physics, design difficulties, and process non-compatibility. The objective of this research is to discuss various emerging nano-devices proposed for sub-60 mV/decade designs and their possibilities to replace the silicon devices as the core technology in the future integrated circuit. This dissertation also proposes a novel design that exploits the concept of negative capacitance. The new field-effect-transistor (FET) based on ferroelectric insulator named Silicon-On-Ferroelectric Insulator Field effect-transistor (SOFFET). This proposal is a promising methodology for future ultra low-power applications because it demonstrates the ability to replace the silicon-bulk based MOSFET, and offers a subthreshold swing significantly lower than 60 / and reduced threshold voltage to form a conducting channel. The proposed SOFFET design, which utilizes the negative capacitance of a ferroelectric insulator in the body-stack, is completely different from the FeFET and NCFET designs. In addition to having the NC effect, the proposed device will have all the advantages of an SOI device. Body-stack that we are intending in this research has many advantages over the gate-stack. First, it is more compatible with the existing processes. Second, the gate and the working area of the proposed SOFFET is like the planar MOSFET. Third, the complexity and ferroelectric material interferences are shifted to the body of the device from the gate and the working area. The proposed structure offers better scalability and superior constructability because of the high-dielectric buried insulator. Here we are providing a very simplified model for the structure. Silicon-on-ferroelectric leads to several advantages including low off-state current and shift in the threshold voltage with the decrease of the ferroelectric material thickness. Moreover, having an insulator in the body of the device increases the controllability over the channel, which leads to the reduction in the short-channel-effect (SCE). The proposed SOFFET offers low value of subthreshold swing (S) leading to better performance in the on-state. The off-state current is directly related to S. So, the off-state current is also minimum in the proposed structure.Introduction -- Subthreshold swing -- Multi-gate devices -- Tunneling field effect transistors -- I-mos & FET transistors -- Ferroelectric based field effect transistors -- An analytical model to approximate the subthreshold swing for SOI-FINFET -- Multichannel tunneling carbon nanotube FET -- Partially depleted silicon-on-Ferroelectric insulator FET -- Fully depleted silicon-on-ferroelectric insulator FET -- Advantages, manufacturing process, and future work of the proposed devices -- Appendix A. Estimation of the body factor (n) [eta] of SOI FinFET -- Appendix B. Solution for the Poisson Equation of MT-CNTFE