Improved Physical Design for Manufacturing Awareness and Advanced VLSI

Increasing challenges arise with each new semiconductor technology node, especially in advanced nodes, where the industry tries to extract every ounce of benefit as it approaches the limits of physics, through manufacturing-aware design technology co-optimization and design-based equivalent scaling. The increasing complexity of design and process technologies, and ever-more complex design rules, also become hurdles for academic researchers, separating academic researchers from the most up-to-date technical issues.This thesis presents innovative methodologies and optimizations to address the above challenges. There are three directions in this thesis: (i) manufacturing-aware design technology co-optimization; (ii) advanced node design-based equivalent scaling; and (iii) an open source academic detailed routing flow.To realize manufacturing-aware design technology co-optimization, this thesis presents two works: (i) a multi-row detailed placement optimization for neighbor diffusion effect mitigation between neighboring standard cells; and (ii) a post-routing optimization to generate 2D block mask layout for dummy segment removal in self-aligned multiple patterning.To achieve advanced node design-based equivalent scaling, this thesis presents two improved physical design methodologies: (i) a post-placement flop tray generation approach for clock power reduction; and (ii) a detailed placement approach to exploit inter-row M1 routing for congestion and wirelength reduction.To address the increasing gap between academia and industry, this thesis presents two works toward an open source academic detailed routing flow: (i) a complete, robust, scalable and design ruleaware dynamic programming-based pin access analysis framework; and (ii) TritonRoute – the open source detailed router that is capable of delivering DRC-clean detailed routing solutions in advanced nodes.This thesis concludes with a summary of its contributions and open directions for future research

EDA Solutions for Double Patterning Lithography

Expanding the optical lithography to 32-nm node and beyond is impossible using existing single exposure systems. As such, double patterning lithography (DPL) is the most promising option to generate the required lithography resolution, where the target layout is printed with two separate imaging processes. Among different DPL techniques litho-etch-litho-etch (LELE) and self-aligned double patterning (SADP) methods are the most popular ones, which apply two complete exposure lithography steps and an exposure lithography followed by a chemical imaging process, respectively. To realize double patterning lithography, patterns located within a sub-resolution distance should be assigned to either of the imaging sub-processes, so-called layout decomposition. To achieve the optimal design yield, layout decomposition problem should be solved with respect to characteristics and limitations of the applied DPL method. For example, although patterns can be split between the two sub-masks in the LELE method to generate conflict free masks, this pattern split is not favorable due to its sensitivity to lithography imperfections such as the overlay error. On the other hand, pattern split is forbidden in SADP method because it results in non-resolvable gap failures in the final image. In addition to the functional yield, layout decomposition affects parametric yield of the designs printed by double patterning. To deal with both functional and parametric challenges of DPL in dense and large layouts, EDA solutions for DPL are addressed in this thesis. To this end, we proposed a statistical method to determine the interconnect width and space for the LELE method under the effect of random overlay error. In addition to yield maximization and achieving near-optimal trade-off between different parametric requirements, the proposed method provides valuable insight about the trend of parametric and functional yields in future technology nodes. Next, we focused on self-aligned double patterning and proposed layout design and decomposition methods to provide SADP-compatible layouts and litho-friendly decomposed layouts. Precisely, a grid-based ILP formulation of SADP decomposition was proposed to avoid decomposition conflicts and improve overall printability of layout patterns. To overcome the limited applicability of this ILP-based method to fully-decomposable layouts, a partitioning-based method is also proposed which is faster than the grid-based ILP decomposition method too. Moreover, an A∗-based SADP-aware detailed routing method was proposed which performs detailed routing and layout decomposition simultaneously to avoid litho-limited layout configurations. The proposed router preserves the uniformity of pattern density between the two sub-masks of the SADP process. We finally extended our decomposition method for double patterning to triple patterning and formulated SATP decomposition by integer linear programming. In addition to conventional minimum width and spacing constraints, the proposed decomposition method minimizes the mandrel-trim co-defined edges and maximizes the layout features printed by structural spacers to achieve the minimum pattern distortion. This thesis is one of the very early researches that investigates the concept of litho-friendliness in SADP-aware layout design and decomposition. Provided by experimental results, the proposed methods advance prior state-of-the-art algorithms in various aspects. Precisely, the suggested SADP decomposition methods improve total length of sensitive trim edges, total EPE and overall printability of attempted designs. Additionally, our SADP-detailed routing method provides SADP-decomposable layouts in which trim patterns are highly robust to lithography imperfections. The experimental results for SATP decomposition show that total length of overlay-sensitive layout patterns, total EPE and overall printability of the attempted designs are also improved considerably by the proposed decomposition method. Additionally, the methods in this PhD thesis reveal several insights for the upcoming technology nodes which can be considered for improving the manufacturability of these nodes

Caracterización estructural y funcional de películas delgadas nanoporosas mediante microscopías electrónicas de transmisiónbarrido y espectroscopías ópticas

Nano-structuration of materials at the mesoscale to give rise to porosity-controlled coatings represents an important breakthrough in the area of Materials Science and Engineering, offering new and enhanced functionalities of interest in fields such as optics, optronics and optoelectronics. In order to optimize their performances, in-depth analyses are required: local information about the morphology, composition and atomic structure, the compactness distribution, but also layer homogeneity, interface and interpenetration between stacked layers or oxidation are extremely important factors that can ruin their way of operation. In this particular context, the objective of the present PhD Thesis is to make significant contributions to the study and development of multifunctional porous nanostructured systems, from their design and elaboration, to the maximum knowledge of their structure and properties, through advanced (S)TEM methods, including 3D reconstructions, elemental analyses at the nanoscale and atomic-scale imaging, combined with optical spectroscopy techniques. In the first instance, given the great potential of the slanted nanostructures generated by means of oblique angle depositions, in which the refractive index gradient can be tuned by the columns tilt and density imposed via the growth angles and parameters, OAD broadband antireflective coatings based on Si, Ge or SiO2 OAD films have been designed, manufactured, and extensively characterized with the aim of maximizing the performance of the optical elements in the vis-IR wavelength range. This same approach has also been implemented to enhance the antireflective capabilities of transparent conductive ITO thin films in the near-IR window without compromising too much their electrical response. On the other hand, the advanced structural and functional characterization of porosity-controlled GaN NW arrays grown by plasma-assisted MBE through (S)TEM methods and vis-IR SE elliposmetry, has helped not only to improve growth processes but also to optimize their resulting optical and electrical properties. Finally, the knowledge and methodologies acquired during the study and optimization of the previous porous systems have been transferred to the development of a two-step procedure, based on the deposition and the subsequent fast oxidation of vanadium-based OAD films in open air atmosphere, for the synthesis of thermochromic VO2 coatings of tunable metal-to-insulator response and controlled grain sizes and crystallinities

Scalable Nanophotonic Light Management Design for Solar Cells

The current trend in wide adoption of solar energy is encouraging in the context of current projections of increasing energy consumption and the dire need to decrease carbon emissions. The solar industry has expanded due to scientific advances in the power conversion efficiency of solar modules. In order maintain a rapid pace of adoption and further decrease electricity costs, converting each photon becomes increasingly important. This work focuses on nanophotonic approaches to increasing the power conversion efficiency of different solar photovoltaic designs. The projects voluntarily impose certain design constraints in order to be compatible with the large scale manufacturing needed by the solar industry. A focus was given to designs that can leverage the promising technology of nanoimprint lithography. Amorphous silicon tandem cells with embedded nanophotonic patterning attempted to increase absorption while minimizing materials and time costs. Simulated designs of Copper Indium Gallium Diselenide absorbers showed that the management of excited carriers is equally as important as light management in decreasingly thin absorber layers. Near perfect anti-reflection structures were given a detailed physical analysis to better describe the fundamental physics of near zero reflection due to nanocones printed on solar cell encapsulation glass. Experimental results agreed with the theoretical analysis, and showed that these nanostructures further increased absorbed photocurrent by trapping light in the encapsulation glass. Finally, a unique device in the form of a tandem luminescent solar concentrator/silicon solar module was proposed and analyzed as a low cost and adaptable technology for increased solar power conversion efficiency. Key to this design was discovery of new, near-perfect components for light management. Exciting and innovative designs are proposed to control the light-matter interaction within these devices. Study of a photonic luminescent solar concentrator predicted that luminescence can be trapped in photonic crystal slab waveguides with near zero loss. Rigorous experimental efforts to characterize a multitude of near-perfect samples help guide these designs toward their final goals

Glioma on Chips Analysis of glioma cell guidance and interaction in microfluidic-controlled microenvironment enabled by machine learning

In biosystems, chemical and physical fields established by gradients guide cell migration, which is a fundamental phenomenon underlying physiological and pathophysiological processes such as development, morphogenesis, wound healing, and cancer metastasis. Cells in the supportive tissue of the brain, glia, are electrically stimulated by the local field potentials from neuronal activities. How the electric field may influence glial cells is yet fully understood. Furthermore, the cancer of glia, glioma, is not only the most common type of brain cancer, but the high-grade form of it (glioblastoma) is particularly aggressive with cells migrating into the surrounding tissues (infiltration) and contribute to poor prognosis. In this thesis, I investigate how electric fields in the microenvironment can affect the migration of glioblastoma cells using a versatile microsystem I have developed. I employ a hybrid microfluidic design to combine poly(methylmethacrylate) (PMMA) and poly(dimethylsiloxane) (PDMS), two of the most common materials for microfluidic fabrication. The advantages of the two materials can be complemented while disadvantages can be mitigated. The hybrid microfluidics have advantages such as versatile 3D layouts in PMMA, high dimensional accuracy in PDMS, and rapid prototype turnaround by facile bonding between PMMA and PDMS using a dual-energy double sided tape. To accurately analyze label-free cell migration, a machine learning software, Usiigaci, is developed to automatically segment, track, and analyze single cell movement and morphological changes under phase contrast microscopy. The hybrid microfluidic chip is then used to study the migration of glioblastoma cell models, T98G and U-251MG, in electric field (electrotaxis). The influence of extracellular matrix and chemical ligands on glioblastoma electrotaxis are investigated. I further test if voltage-gated calcium channels are involved in glioblastoma electrotaxis. The electrotaxes of glioblastoma cells are found to require optimal laminin extracellular matrices and depend on different types of voltage-gated calcium channels, voltage-gated potassium channels, and sodium transporters. A reversiblysealed hybrid microfluidic chip is developed to study how electric field and laminar shear can condition confluent endothelial cells and if the biomimetic conditions affect glioma cell adhesion to them. It is found that glioma/endothelial adhesion is mediated by the Ang1/Tie2 signaling axis and adhesion of glioma is slightly increased to endothelial cells conditioned with shear flow and moderate electric field. In conclusion, robust and versatile hybrid microsystems are employed for studying glioma biology with emphasis on cell migration. The hybrid microfluidic tools can enable us to elucidate fundamental mechanisms in the field of the tumor biology and regenerative medicine.Okinawa Institute of Science and Technology Graduate Universit

Flash Memory Devices

Flash memory devices have represented a breakthrough in storage since their inception in the mid-1980s, and innovation is still ongoing. The peculiarity of such technology is an inherent flexibility in terms of performance and integration density according to the architecture devised for integration. The NOR Flash technology is still the workhorse of many code storage applications in the embedded world, ranging from microcontrollers for automotive environment to IoT smart devices. Their usage is also forecasted to be fundamental in emerging AI edge scenario. On the contrary, when massive data storage is required, NAND Flash memories are necessary to have in a system. You can find NAND Flash in USB sticks, cards, but most of all in Solid-State Drives (SSDs). Since SSDs are extremely demanding in terms of storage capacity, they fueled a new wave of innovation, namely the 3D architecture. Today “3D” means that multiple layers of memory cells are manufactured within the same piece of silicon, easily reaching a terabit capacity. So far, Flash architectures have always been based on "floating gate," where the information is stored by injecting electrons in a piece of polysilicon surrounded by oxide. On the contrary, emerging concepts are based on "charge trap" cells. In summary, flash memory devices represent the largest landscape of storage devices, and we expect more advancements in the coming years. This will require a lot of innovation in process technology, materials, circuit design, flash management algorithms, Error Correction Code and, finally, system co-design for new applications such as AI and security enforcement

Cold Micro Metal Forming

This open access book contains the research report of the Collaborative Research Center “Micro Cold Forming” (SFB 747) of the University of Bremen, Germany. The topical research focus lies on new methods and processes for a mastered mass production of micro parts which are smaller than 1mm (by forming in batch size higher than one million). The target audience primarily comprises research experts and practitioners in production engineering, but the book may also be of interest to graduate students alike

Scientific Advances in STEM

Following a previous topic (Scientific advances in STEM: from professors to students; https://www.mdpi.com/topics/advances_stem), this new topic aims to highlight the importance of establishing collaborations among research groups from different disciplines, combining the scientific knowledge from basic to applied research as well as taking advantage of different research facilities. Fundamental science helps us to understand phenomenological basics, while applied science focuses on products and technology developments, highlighting the need to perform a transference of knowledge to society and the industrial sector