Inorganic micro/nanostructures-based high-performance flexible electronics for electronic skin application

Electronics in the future will be printed on diverse substrates, benefiting several emerging applications such as electronic skin (e-skin) for robotics/prosthetics, flexible displays, flexible/conformable biosensors, large area electronics, and implantable devices. For such applications, electronics based on inorganic micro/nanostructures (IMNSs) from high mobility materials such as single crystal silicon and compound semiconductors in the form of ultrathin chips, membranes, nanoribbons (NRs), nanowires (NWs) etc., offer promising high-performance solutions compared to conventional organic materials. This thesis presents an investigation of the various forms of IMNSs for high-performance electronics. Active components (from Silicon) and sensor components (from indium tin oxide (ITO), vanadium pentaoxide (V2O5), and zinc oxide (ZnO)) were realised based on the IMNS for application in artificial tactile skin for prosthetics/robotics. Inspired by human tactile sensing, a capacitive-piezoelectric tandem architecture was realised with indium tin oxide (ITO) on a flexible polymer sheet for achieving static (upto 0.25 kPa-1 sensitivity) and dynamic (2.28 kPa-1 sensitivity) tactile sensing. These passive tactile sensors were interfaced in extended gate mode with flexible high-performance metal oxide semiconductor field effect transistors (MOSFETs) fabricated through a scalable process. The developed process enabled wafer scale transfer of ultrathin chips (UTCs) of silicon with various devices (ultrathin chip resistive samples, metal oxide semiconductor (MOS) capacitors and n‐channel MOSFETs) on flexible substrates up to 4″ diameter. The devices were capable of bending upto 1.437 mm radius of curvature and exhibited surface mobility above 330 cm2/V-s, on-to-off current ratios above 4.32 decades, and a subthreshold slope above 0.98 V/decade, under various bending conditions. While UTCs are useful for realizing high-density high-performance micro-electronics on small areas, high-performance electronics on large area flexible substrates along with low-cost fabrication techniques are also important for realizing e-skin. In this regard, two other IMNS forms are investigated in this thesis, namely, NWs and NRs. The controlled selective source/drain doping needed to obtain transistors from such structure remains a bottleneck during post transfer printing. An attractive solution to address this challenge based on junctionless FETs (JLFETs), is investigated in this thesis via technology computer-aided design (TCAD) simulation and practical fabrication. The TCAD optimization implies a current of 3.36 mA for a 15 μm channel length, 40 μm channel width with an on-to-off ratio of 4.02x 107. Similar to the NRs, NWs are also suitable for realizing high performance e-skin. NWs of various sizes, distribution and length have been fabricated using various nano-patterning methods followed by metal assisted chemical etching (MACE). Synthesis of Si NWs of diameter as low as 10 nm and of aspect ratio more than 200:1 was achieved. Apart from Si NWs, V2O5 and ZnO NWs were also explored for sensor applications. Two approaches were investigated for printing NWs on flexible substrates namely (i) contact printing and (ii) large-area dielectrophoresis (DEP) assisted transfer printing. Both approaches were used to realize electronic layers with high NW density. The former approach resulted in 7 NWs/μm for bottom-up ZnO and 3 NWs/μm for top-down Si NWs while the latter approach resulted in 7 NWs/μm with simultaneous assembly on 30x30 electrode patterns in a 3 cm x 3 cm area. The contact-printing system was used to fabricate ZnO and Si NW-based ultraviolet (UV) photodetectors (PDs) with a Wheatstone bridge (WB) configuration. The assembled V2O5 NWs were used to realize temperature sensors with sensitivity of 0.03% /K. The sensor arrays are suitable for tactile e-skin application. While the above focuses on realizing conventional sensing and addressing elements for e-skin, processing of a large amount of data from e-skin has remained a challenge, especially in the case of large area skin. A Neural NW Field Effect Transistors (υ-NWFETs) based hardware-implementable neural network (HNN) approach for tactile data processing in e-skin is presented in the final part of this thesis. The concept is evaluated by interfacing with a fabricated kirigami-inspired e-skin. Apart from e-skin for prosthetics and robotics, the presented research will also be useful for obtaining high performance flexible circuits needed in many futuristic flexible electronics applications such as smart surgical tools, biosensors, implantable electronics/electroceuticals and flexible mobile phones

Modelling and simulation study of NMOS Si nanowire transistors

Nanowire transistors (NWTs) represent a potential alternative to Silicon FinFET technology in the 5nm CMOS technology generation and beyond. Their gate length can be scaled beyond the limitations of FinFET gate length scaling to maintain superior off-state leakage current and performance thanks to better electrostatic control through the semiconductor nanowire channels by gate-all-around (GAA) architecture. Furthermore, it is possible to stack nanowires to enhance the drive current per footprint. Based on these considerations, vertically-stacked lateral NWTs have been included in the latest edition of the International Technology Roadmap for Semiconductors (ITRS) to allow for further performance enhancement and gate pitch scaling, which are key criteria of merit for the new CMOS technology generation. However, electrostatic confinement and the transport behaviour in these devices are more complex, especially in or beyond the 5nm CMOS technology generation. At the heart of this thesis is the model-based research of aggressively-scaled NWTs suitable for implementation in or beyond the 5nm CMOS technology generation, including their physical and operational limitations and intrinsic parameter fluctuations. The Ensemble Monte Carlo approach with Poisson-Schrödinger (PS) quantum corrections was adopted for the purpose of predictive performance evaluation of NWTs. The ratio of the major to the minor ellipsoidal cross-section axis (cross-sectional aspect ratio - AR) has been identified as a significant contributing factor in device performance. Until now, semiconductor industry players have carried out experimental research on NWTs with two different cross-sections: circular cylinder (or elliptical) NWTs and nanosheet (or nanoslab) NWTs. Each version has its own benefits and drawbacks; however, the key difference between these two versions is the cross-sectional AR. Several critical design questions, including the optimal NWT cross-sectional aspect ratio, remain unanswered. To answer these questions, the AR of a GAA NWT has been investigated in detail in this research maintaining the cross-sectional area constant. Signatures of isotropic charge distributions within Si NWTs were observed, exhibiting the same attributes as the golden ratio (Phi), the significance of which is well-known in the fields of art and architecture. To address the gap in the existing literature, which largely explores NWT scaling using single-channel simulation, thorough simulations of multiple channels vertically-stacked NWTs have been carried out with different cross-sectional shapes and channel lengths. Contact resistance, non-equilibrium transport and quantum confinement effects have been taken into account during the simulations in order to realistically access performance and scalability. Finally, the individual and combined effects of key statistical variability (SV) sources on threshold voltage (VT), subthreshold slope (SS), ON-current (Ion) and drain-induced barrier lowering (DIBL) have been simulated and discussed. The results indicate that the variability of NWTs is impacted by device architecture and dimensions, with a significant reduction in SV found in NWTs with optimal aspect ratios. Furthermore, a reduction in the variability of the threshold voltage has been observed in vertically-stacked NWTs due to the cancelling-out of variability in double and triple lateral channel NWTs

Journal of Telecommunications and Information Technology, 2004, nr 1

kwartalni

Science and technology roadmap for graphene, related two-dimensional crystals, and hybrid systems

We present the science and technology roadmap for graphene, related two-dimensional crystals, and hybrid systems, targeting an evolution in technology, that might lead to impacts and benefits reaching into most areas of society. This roadmap was developed within the framework of the European Graphene Flagship and outlines the main targets and research areas as best understood at the start of this ambitious project. We provide an overview of the key aspects of graphene and related materials (GRMs), ranging from fundamental research challenges to a variety of applications in a large number of sectors, highlighting the steps necessary to take GRMs from a state of raw potential to a point where they might revolutionize multiple industries. We also define an extensive list of acronyms in an effort to standardize the nomenclature in this emerging field.Peer ReviewedPostprint (published version

Towards the Mass Fabrication of Single Electron Transistors for Biosensing Applications

The development of ultra sensitive charge sensing devices such as single-electron transistors (SETs) for next-generation biomedical applications has received considerable attention in the past few years. In this thesis, a potential approach for the mass-fabrication of metallic SETs for ultra-sensitive biosensing applications --- an important prerequisit for early diagnosis of many serious diseases --- is investigated. Using the orthodox theory of Coulomb blockade it is shown that it is possible to engineer an SET system that can satisfy the requirements for a highly sensitive charge sensor operating at room temperature while using metallic electrodes rather than semiconductor structures. In this configuration, the SET design and fabrication process is simplified greatly by lifting the dependence of the system on the confinement energy of electrons in the quantum dots (QDs), as is the case in semiconductor SETs. In return, this makes the tunnel junction properties and the geometrical arrangement of the islands and electrodes far more critical in determining the maximum operating temperature of the device. Here, the geometrical requirements for such a sensitive device are studied theoretically whilst the tunnel junction properties are studied experimentally and then theoretically to provide a thorough assessment of the abilities of the proposed SET system. Atomic-layer deposition (ALD) has proven to be a highly reliable technique for depositing uniform thickness and reproducible thin metal-oxide films and particularly the Al2O3 ALD process is known to be `ideal' with highly reproducible properties. Here, a systematic study of the electronic properties of ALD deposited Al2O3 thin films in MIM structures was performed to assess the ALD techniques applicability to the mass fabrication of quantum tunneling junctions for metallic SET structures. The two most crucial material parameters relevant to the design of metallic SET tunnel barriers are studied in detail; the dielectric constant of the film that determines the junction capacitance, and the properties of the potential barrier that mediates electron tunneling. Photolithographic techniques were used to create electrodes with a wide range of characteristic lengths as to provide a wide range of impedances. Measurements and subsequent analysis show that a high consistency can be attained over large surface areas in the film properties, and that electrode coverage is very effective, showing promise for mass-fabrication applications. Further analysis of the measurements shows that small static distortions in the barrier can affect the symmetry of MIM diode IV characteristics operating in the direct tunneling regime and that under certain circumstances the effect of surface states can be observed in the tunneling conductance

Feature Papers in Electronic Materials Section

This book entitled "Feature Papers in Electronic Materials Section" is a collection of selected papers recently published on the journal Materials, focusing on the latest advances in electronic materials and devices in different fields (e.g., power- and high-frequency electronics, optoelectronic devices, detectors, etc.). In the first part of the book, many articles are dedicated to wide band gap semiconductors (e.g., SiC, GaN, Ga2O3, diamond), focusing on the current relevant materials and devices technology issues. The second part of the book is a miscellaneous of other electronics materials for various applications, including two-dimensional materials for optoelectronic and high-frequency devices. Finally, some recent advances in materials and flexible sensors for bioelectronics and medical applications are presented at the end of the book