Metamaterial based CMOS terahertz focal plane array

The distinctive properties of terahertz radiation have driven an increase in interest to develop applications in the imaging field. The non-ionising radiation properties and transparency to common non-conductive materials have led research into developing a number of important applications including security screening, medical imaging, explosive detection and wireless communications. The proliferation of these applications into everyday life has been hindered by the lack of inexpensive, compact and room-temperature terahertz sources and detectors. These issues are addressed in this work by developing an innovative, uncooled, compact, scalable and low-cost terahertz detector able to target single frequency imaging applications such as stand-off imaging and non-invasive package inspection. The development of two types of metamaterial (MM) based terahertz focal plane arrays (FPAs) monolithically integrated in a standard complementary metal-oxide semiconductor (CMOS) technology are presented in this Thesis. The room temperature FPAs are composed of periodic cross-shaped resonant MM absorbers, microbolometer sensors in every pixel and front-end readout electronics fabricated in a 180 nm six metal layer CMOS process from Texas Instruments (TI). The MM absorbers are used due to the lack of natural selective absorbing materials of terahertz radiation. These subwavelength structures are made directly in the metallic and insulating layers available in the CMOS foundry process. When the MM structures are distributed in a periodic fashion, they behave as a frequency-selective material and are able to absorb at the required frequency. The electromagnetic (EM) properties are determined by the MM absorber geometry rather than their composition, thus being completely customisable for different frequencies. Single band and broadband absorbers were designed and implemented in the FPAs to absorb at 2.5 THz where a natural atmospheric transmission window is found, thus reducing the signal loss in the imaging system. The new approach of terahertz imaging presented in this Thesis is based in coupling a MM absorber with a suitable microbolometer sensor. The MM structure absorbs the terahertz wave while the microbolometer sensor detects the localised temperature change, depending on the magnitude of the radiation. Two widely used microbolometer sensors are investigated to compare the sensitivity of the detectors. The two materials are Vanadium Oxide (VOx) and p-n silicon diodes both of which are widely used in infrared (IR) imaging systems. The VOx microbolometers are patterned above the MM absorber and the p-n diode microbolometers are already present in the CMOS process. The design and fabrication of four prototypes of FPAs with VOx microbolometers demonstrate the scalability properties to create high resolution arrays. The first prototype consists of a 5 x 5 array with a pixel size of 30 μm x 30 μm. An 8 x 8 array, a 64 x 64 array with serial readout and a 64 x 64 array with parallel readout are also presented. Additionally, a 64 x 64 array with parallel output readout electronics with p-n diode microbolometers was fabricated. The design, simulation, characterisation and fabrication of single circuit blocks and a complete 64 x 64 readout integrated circuit is thoroughly discussed in this Thesis. The absorption characteristics of the MMs absorbers, single VOx and p-n diode pixels, 5 x 5 VOx FPA and a 64 x 64 array for both microbolometer types demonstrate the concept of CMOS integration of a monolithic MM based terahertz FPA. The imaging performance using both transmission and reflection mode is demonstrated by scanning a metallic object hidden in a manila envelope and using a single pixel of the array as a terahertz detector. This new approach to make a terahertz imager has the advantages of creating a high sensitivity room temperature technology that is capable of scaling and low-cost manufacture

Bolometers

Infrared Detectors and technologies are very important for a wide range of applications, not only for Military but also for various civilian applications. Comparatively fast bolometers can provide large quantities of low cost devices opening up a new era in infrared technologies. This book deals with various aspects of bolometer developments. It covers bolometer material aspects, different types of bolometers, performance limitations, applications and future trends. The chapters in this book will be useful for senior researchers as well as beginning graduate students

Silicon based uncooled microbolometer

During the last decade, uncooled microbolometer infrared detectors have attracted the attention of military and civilian infrared detection and imaging industry due to their significant advantages. In actuality, infrared imaging systems play a critical role in sectors such as thermography (predictive maintenance and building inspection), commercial and civilian applications (vision automotive, surveillance, navigation and fire-fighting), and defense industry (thermal weapon sight, soldier vision and vehicle vision enhancer). Compared with the cryogenically cooled infrared photon detectors, uncooled infrared imaging technology offers advantages such as operation at room temperature, light weight and size, reduced power consumption, easy integration with read-out electronics and broadband response capability. The motivation for this study is the consideration of silicon as an alternative candidate to replace the standard infrared detector thermosensing materials, as a result of its low cost and easy integration with the actual silicon planar lithography microfabrication techniques. No prior attempts are known in the literature on the use of low doped p-type silicon (p-Si) as a thermosensing material in thermal infrared detectors. The main aim of this research work is the design, modeling and simulation of low doped p-Si based uncooled microbolometer infrared detector. The theoretical optical modeling, and electronic performance are analyzed and explained. Radiative properties, as function of thin film thickness, of some commonly used thin films of dielectric materials, aluminum oxide (Al2O3), silicon dioxide (SiO2), aluminum nitride (AlN) and silicon nitride (Si3N4) are investigated within the infrared spectral range of 1.5-14.2 μm. A novel thermally isolated, suspended square-shaped multilayer structure microbolometer is proposed. Its radiative properties are simulated and optimized in the long wavelength spectral range of 8-14 µm (transmission window at room temperature). The performance of the proposed microbolometer structure is numerically calculated by the figures of merit that characterize the thermal detector response. The dimensions of the microbolometer structure are optimized in order to achieve the maximum responsivity and low thermal time response required by the imaging systems, while securing the stability and support of the structure

Low-power CMOS digital-pixel Imagers for high-speed uncooled PbSe IR applications

This PhD dissertation describes the research and development of a new low-cost medium wavelength infrared MWIR monolithic imager technology for high-speed uncooled industrial applications. It takes the baton on the latest technological advances in the field of vapour phase deposition (VPD) PbSe-based medium wavelength IR (MWIR) detection accomplished by the industrial partner NIT S.L., adding fundamental knowledge on the investigation of novel VLSI analog and mixed-signal design techniques at circuit and system levels for the development of the readout integrated device attached to the detector. The work supports on the hypothesis that, by the use of the preceding design techniques, current standard inexpensive CMOS technologies fulfill all operational requirements of the VPD PbSe detector in terms of connectivity, reliability, functionality and scalability to integrate the device. The resulting monolithic PbSe-CMOS camera must consume very low power, operate at kHz frequencies, exhibit good uniformity and fit the CMOS read-out active pixels in the compact pitch of the focal plane, all while addressing the particular characteristics of the MWIR detector: high dark-to-signal ratios, large input parasitic capacitance values and remarkable mismatching in PbSe integration. In order to achieve these demands, this thesis proposes null inter-pixel crosstalk vision sensor architectures based on a digital-only focal plane array (FPA) of configurable pixel sensors. Each digital pixel sensor (DPS) cell is equipped with fast communication modules, self-biasing, offset cancellation, analog-to-digital converter (ADC) and fixed pattern noise (FPN) correction. In-pixel power consumption is minimized by the use of comprehensive MOSFET subthreshold operation. The main aim is to potentiate the integration of PbSe-based infra-red (IR)-image sensing technologies so as to widen its use, not only in distinct scenarios, but also at different stages of PbSe-CMOS integration maturity. For this purpose, we posit to investigate a comprehensive set of functional blocks distributed in two parallel approaches: • Frame-based “Smart” MWIR imaging based on new DPS circuit topologies with gain and offset FPN correction capabilities. This research line exploits the detector pitch to offer fully-digital programmability at pixel level and complete functionality with input parasitic capacitance compensation and internal frame memory. • Frame-free “Compact”-pitch MWIR vision based on a novel DPS lossless analog integrator and configurable temporal difference, combined with asynchronous communication protocols inside the focal plane. This strategy is conceived to allow extensive pitch compaction and readout speed increase by the suppression of in-pixel digital filtering, and the use of dynamic bandwidth allocation in each pixel of the FPA. In order make the electrical validation of first prototypes independent of the expensive PbSe deposition processes at wafer level, investigation is extended as well to the development of affordable sensor emulation strategies and integrated test platforms specifically oriented to image read-out integrated circuits. DPS cells, imagers and test chips have been fabricated and characterized in standard 0.15μm 1P6M, 0.35μm 2P4M and 2.5μm 2P1M CMOS technologies, all as part of research projects with industrial partnership. The research has led to the first high-speed uncooled frame-based IR quantum imager monolithically fabricated in a standard VLSI CMOS technology, and has given rise to the Tachyon series [1], a new line of commercial IR cameras used in real-time industrial, environmental and transportation control systems. The frame-free architectures investigated in this work represent a firm step forward to push further pixel pitch and system bandwidth up to the limits imposed by the evolving PbSe detector in future generations of the device.La present tesi doctoral descriu la recerca i el desenvolupament d'una nova tecnologia monolítica d'imatgeria infraroja de longitud d'ona mitja (MWIR), no refrigerada i de baix cost, per a usos industrials d'alta velocitat. El treball pren el relleu dels últims avenços assolits pel soci industrial NIT S.L. en el camp dels detectors MWIR de PbSe depositats en fase vapor (VPD), afegint-hi coneixement fonamental en la investigació de noves tècniques de disseny de circuits VLSI analògics i mixtes pel desenvolupament del dispositiu integrat de lectura unit al detector pixelat. Es parteix de la hipòtesi que, mitjançant l'ús de les esmentades tècniques de disseny, les tecnologies CMOS estàndard satisfan tots els requeriments operacionals del detector VPD PbSe respecte a connectivitat, fiabilitat, funcionalitat i escalabilitat per integrar de forma econòmica el dispositiu. La càmera PbSe-CMOS resultant ha de consumir molt baixa potència, operar a freqüències de kHz, exhibir bona uniformitat, i encabir els píxels actius CMOS de lectura en el pitch compacte del pla focal de la imatge, tot atenent a les particulars característiques del detector: altes relacions de corrent d'obscuritat a senyal, elevats valors de capacitat paràsita a l'entrada i dispersions importants en el procés de fabricació. Amb la finalitat de complir amb els requisits previs, es proposen arquitectures de sensors de visió de molt baix acoblament interpíxel basades en l'ús d'una matriu de pla focal (FPA) de píxels actius exclusivament digitals. Cada píxel sensor digital (DPS) està equipat amb mòduls de comunicació d'alta velocitat, autopolarització, cancel·lació de l'offset, conversió analògica-digital (ADC) i correcció del soroll de patró fixe (FPN). El consum en cada cel·la es minimitza fent un ús exhaustiu del MOSFET operant en subllindar. L'objectiu últim és potenciar la integració de les tecnologies de sensat d'imatge infraroja (IR) basades en PbSe per expandir-ne el seu ús, no només a diferents escenaris, sinó també en diferents estadis de maduresa de la integració PbSe-CMOS. En aquest sentit, es proposa investigar un conjunt complet de blocs funcionals distribuïts en dos enfocs paral·lels: - Dispositius d'imatgeria MWIR "Smart" basats en frames utilitzant noves topologies de circuit DPS amb correcció de l'FPN en guany i offset. Aquesta línia de recerca exprimeix el pitch del detector per oferir una programabilitat completament digital a nivell de píxel i plena funcionalitat amb compensació de la capacitat paràsita d'entrada i memòria interna de fotograma. - Dispositius de visió MWIR "Compact"-pitch "frame-free" en base a un novedós esquema d'integració analògica en el DPS i diferenciació temporal configurable, combinats amb protocols de comunicació asíncrons dins del pla focal. Aquesta estratègia es concep per permetre una alta compactació del pitch i un increment de la velocitat de lectura, mitjançant la supressió del filtrat digital intern i l'assignació dinàmica de l'ample de banda a cada píxel de l'FPA. Per tal d'independitzar la validació elèctrica dels primers prototips respecte a costosos processos de deposició del PbSe sensor a nivell d'oblia, la recerca s'amplia també al desenvolupament de noves estratègies d'emulació del detector d'IR i plataformes de test integrades especialment orientades a circuits integrats de lectura d'imatge. Cel·les DPS, dispositius d'imatge i xips de test s'han fabricat i caracteritzat, respectivament, en tecnologies CMOS estàndard 0.15 micres 1P6M, 0.35 micres 2P4M i 2.5 micres 2P1M, tots dins el marc de projectes de recerca amb socis industrials. Aquest treball ha conduït a la fabricació del primer dispositiu quàntic d'imatgeria IR d'alta velocitat, no refrigerat, basat en frames, i monolíticament fabricat en tecnologia VLSI CMOS estàndard, i ha donat lloc a Tachyon, una nova línia de càmeres IR comercials emprades en sistemes de control industrial, mediambiental i de transport en temps real.Postprint (published version

Interferometric Optical Readout System for a MEMS Infrared Imaging Detector

MEMS technology has led to the development of new uncooled infrared imaging detectors. One type of these MEMS detectors consist of arrays of bi-metallic photomechanical pixels that tilt as a function of temperature associated with infrared radiation from the scene. The main advantage of these detectors is the optical readout system that measures the tilt of the beams based on the intensity of the reflected light. This removes the need for electronic readout at each of the sensing elements and reduces the fabrication cost and complexity of sensor design, as well as eliminates the electronic noise at the detector. The optical readout accuracy is sensitive to the uniformity of individual pixels on the array. The hypothesis of the present research is that direct measurements of the height change corresponding to tilt through holographic interferometry will reduce the need for high pixel uniformity. Measurements of displacements for a vacuum packaged detector with nominal responsivity of 2.4nm/K are made with a Linnik interferometer employing the four phase step technique. The interferometer can measure real-time, full-field height variations across the array. In double-exposure mode, the current height map is subtracted from a reference image so that the change in deflection is measured. A software algorithm locates each mirror on the array, extracts the measured deflection at the tip of a mirror, and uses that measurement to form a pixel of a thermogram in real-time. A blackbody target projector with temperature controllable to 0.001K is used to test the thermal resolution of the imaging system. The achieved minimum temperature resolution is better than 0.25K. The double exposure technique removes mirror non-uniformity as a source of noise. A lower than nominal measured responsivity of around 1.5nm/K combined with noise from the measurements made with the interferometric optical readout system limit the potential minimum temperature resolution. Improvements need to be made both in the holographic setup and in the MEMS detector to achieve the target temperature resolution of 0.10K

Monolithic sensor integration in CMOS technologies

© 2023 IEEE. Personal use of this material is permitted. Permission from IEEE must be obtained for all other uses, in any current or future media, including reprinting/republishing this material for advertising or promotional purposes,creating new collective works, for resale or redistribution to servers or lists, or reuse of any copyrighted component of this work in other works.Besides being mainstream for mixed-signal electronics, CMOS technology can be used to integrate micro-electromechanical system (MEMS) on a single die, taking advantage of the structures and materials available in feature sizes around 180 nm. In this article, we demonstrate that the CMOS back-end-of-line (BEOL) layers can be postprocessed and be opportunistically used to create several kinds of MEMS sensors exhibiting good or even excellent performance, such as accelerometers, pressure sensors, and magnetometers. Despite the limitations of the available mechanical and material properties in CMOS technology, due to monolithic integration, these are compensated by the significant reduction of parasitics and system size. Furthermore, this work opens the path to create monolithic integrated multisensor (and even actuator) chips, including data fusion and intelligent processing.This work was supported in part by Baolab Microsystems; in part by the Spanish Ministry of Science, Innovation and Universities (MCIN); in part by the State Research Agency (AEI); in part by the European Social Fund (ESF) under Project RTI2018-099766-B-I00; in part by MCIN/AEI/10.13039/501100011033 under Grant PID2021-123535OB-I00; and in part by ERDF, “A way of making Europe.” The associate editor coordinating the review of this article and approving it for publication was Prof. Jean-Michel Redoute.Peer ReviewedPostprint (author's final draft

Electrical Properties Of Reactive Magnetron Sputtered Vanadium Oxide Thin Films

It is well known that vanadium oxide can take many different forms. However for this study, only the amorphous phase was investigated. Amorphous vanadium oxide (VOx) thin films were deposited on thermally grown silicon dioxide by DC magnetron sputtering using a vanadium metal target in an argon / oxygen atmosphere. The driving force of this study was to investigate the temperature coefficient of resistance (TCR) and low resistivity in the amorphous films. Sheet resistance is very sensitive to small changes in temperature, making amorphous VOx very attractive to thermal sensor applications such as infrared detectors. To form the vanadium oxide, physical vapor deposition of vanadium metal at 200 Watts of DC power was used with varied amounts of oxygen in a primary argon atmosphere. During deposition, the concentration of oxygen was controlled by using a 20:80 mixture of O2 and Ar in conjunction with high purity Ar supply. Flow control techniques were derived and calculated to predict the percentage of oxygen before and during deposition to understand the reaction between the vanadium metal and oxygen. Concentrations of O2 in the deposition chamber were varied from 0.025% to 3.000% with the purpose of gaining an understanding of the affects of O2 concentration in amorphous VOx films. TCR and resistivity measurements were performed to characterize the films. The results showed a resistivity decrement with decreasing oxygen concentration. The films with lower concentrations of oxygen were found to have better TCR values then those with higher percentages of oxygen. To further reduce the resistivity of the VOx and maintain the TCR value, co-sputtering of noble metals (gold and platinum) with VOx was studied. The metals were co-sputtered at various power settings with the vanadium oxide reactive process at a fixed percentage of oxygen. The TCR and resistivity results showed that the additions of Au and Pt into VOx reduced the resistivity. However, only Au was found to improve TCR value. The results of these experiments showed that by reducing the amount of oxygen in the film, the ratio between TCR and resistivity further improved. Mechanical limits of the gas delivery system and the relatively low sensitivity to oxygen detection, gas flow control is limited when sputtering with only a single target. Several targets were therefore used during sputtering to allow for higher gas flows thereby increasing the effective sensitivity of the oxygen control. To increase the amount of available vanadium and still have a sufficient amount of detectible oxygen present, four vanadium targets were sputtered simultaneously. The measurements appeared to have a trend of increase in TCR values with a decrease in resistivity. For an ideal case, thermal sensor material should incorporate high TCR and low resistivity for better sensitivity. The amorphous vanadium oxide deposited by 4 vanadium targets seems to satisfy that requirement. In conclusion, a novel method has been established to fabricate amorphous vanadium oxide thin films with high TCR and low resistivity for infrared detectors

Miniaturized Silicon Photodetectors

Silicon (Si) technologies provide an excellent platform for the design of microsystems where photonic and microelectronic functionalities are monolithically integrated on the same substrate. In recent years, a variety of passive and active Si photonic devices have been developed, and among them, photodetectors have attracted particular interest from the scientific community. Si photodiodes are typically designed to operate at visible wavelengths, but, unfortunately, their employment in the infrared (IR) range is limited due to the neglectable Si absorption over 1100 nm, even though the use of germanium (Ge) grown on Si has historically allowed operations to be extended up to 1550 nm. In recent years, significant progress has been achieved both by improving the performance of Si-based photodetectors in the visible range and by extending their operation to infrared wavelengths. Near-infrared (NIR) SiGe photodetectors have been demonstrated to have a “zero change” CMOS process flow, while the investigation of new effects and structures has shown that an all-Si approach could be a viable option to construct devices comparable with Ge technology. In addition, the capability to integrate new emerging 2D and 3D materials with Si, together with the capability of manufacturing devices at the nanometric scale, has led to the development of new device families with unexpected performance. Accordingly, this Special Issue of Micromachines seeks to showcase research papers, short communications, and review articles that show the most recent advances in the field of silicon photodetectors and their respective applications

Semiconductor Infrared Devices and Applications

Infrared (IR) technologies—from Herschel’s initial experiment in the 1800s to thermal detector development in the 1900s, followed by defense-focused developments using HgCdTe—have now incorporated a myriad of novel materials for a wide variety of applications in numerous high-impact fields. These include astronomy applications; composition identifications; toxic gas and explosive detection; medical diagnostics; and industrial, commercial, imaging, and security applications. Various types of semiconductor-based (including quantum well, dot, ring, wire, dot in well, hetero and/or homo junction, Type II super lattice, and Schottky) IR (photon) detectors, based on various materials (type IV, III-V, and II-VI), have been developed to satisfy these needs. Currently, room temperature detectors operating over a wide wavelength range from near IR to terahertz are available in various forms, including focal plane array cameras. Recent advances include performance enhancements by using surface Plasmon and ultrafast, high-sensitivity 2D materials for infrared sensing. Specialized detectors with features such as multiband, selectable wavelength, polarization sensitive, high operating temperature, and high performance (including but not limited to very low dark currents) are also being developed. This Special Issue highlights advances in these various types of infrared detectors based on various material systems