ENERGY-EFFICIENT AND SECURE HARDWARE FOR INTERNET OF THINGS (IoT) DEVICES

Internet of Things (IoT) is a network of devices that are connected through the Internet to exchange the data for intelligent applications. Though IoT devices provide several advantages to improve the quality of life, they also present challenges related to security. The security issues related to IoT devices include leakage of information through Differential Power Analysis (DPA) based side channel attacks, authentication, piracy, etc. DPA is a type of side-channel attack where the attacker monitors the power consumption of the device to guess the secret key stored in it. There are several countermeasures to overcome DPA attacks. However, most of the existing countermeasures consume high power which makes them not suitable to implement in power constraint devices. IoT devices are battery operated, hence it is important to investigate the methods to design energy-efficient and secure IoT devices not susceptible to DPA attacks. In this research, we have explored the usefulness of a novel computing platform called adiabatic logic, low-leakage FinFET devices and Magnetic Tunnel Junction (MTJ) Logic-in-Memory (LiM) architecture to design energy-efficient and DPA secure hardware. Further, we have also explored the usefulness of adiabatic logic in the design of energy-efficient and reliable Physically Unclonable Function (PUF) circuits to overcome the authentication and piracy issues in IoT devices. Adiabatic logic is a low-power circuit design technique to design energy-efficient hardware. Adiabatic logic has reduced dynamic switching energy loss due to the recycling of charge to the power clock. As the first contribution of this dissertation, we have proposed a novel DPA-resistant adiabatic logic family called Energy-Efficient Secure Positive Feedback Adiabatic Logic (EE-SPFAL). EE-SPFAL based circuits are energy-efficient compared to the conventional CMOS based design because of recycling the charge after every clock cycle. Further, EE-SPFAL based circuits consume uniform power irrespective of input data transition which makes them resilience against DPA attacks. Scaling of CMOS transistors have served the industry for more than 50 years in providing integrated circuits that are denser, and cheaper along with its high performance, and low power. However, scaling of the transistors leads to increase in leakage current. Increase in leakage current reduces the energy-efficiency of the computing circuits,and increases their vulnerability to DPA attack. Hence, it is important to investigate the crypto circuits in low leakage devices such as FinFET to make them energy-efficient and DPA resistant. In this dissertation, we have proposed a novel FinFET based Secure Adiabatic Logic (FinSAL) family. FinSAL based designs utilize the low-leakage FinFET device along with adiabatic logic principles to improve energy-efficiency along with its resistance against DPA attack. Recently, Magnetic Tunnel Junction (MTJ)/CMOS based Logic-in-Memory (LiM) circuits have been explored to design low-power non-volatile hardware. Some of the advantages of MTJ device include non-volatility, near-zero leakage power, high integration density and easy compatibility with CMOS devices. However, the differences in power consumption between the switching of MTJ devices increase the vulnerability of Differential Power Analysis (DPA) based side-channel attack. Further, the MTJ/CMOS hybrid logic circuits which require frequent switching of MTJs are not very energy-efficient due to the significant energy required to switch the MTJ devices. In the third contribution of this dissertation, we have investigated a novel approach of building cryptographic hardware in MTJ/CMOS circuits using Look-Up Table (LUT) based method where the data stored in MTJs are constant during the entire encryption/decryption operation. Currently, high supply voltage is required in both writing and sensing operations of hybrid MTJ/CMOS based LiM circuits which consumes a considerable amount of energy. In order to meet the power budget in low-power devices, it is important to investigate the novel design techniques to design ultra-low-power MTJ/CMOS circuits. In the fourth contribution of this dissertation, we have proposed a novel energy-efficient Secure MTJ/CMOS Logic (SMCL) family. The proposed SMCL logic family consumes uniform power irrespective of data transition in MTJ and more energy-efficient compared to the state-of-art MTJ/ CMOS designs by using charge sharing technique. The other important contribution of this dissertation is the design of reliable Physical Unclonable Function (PUF). Physically Unclonable Function (PUF) are circuits which are used to generate secret keys to avoid the piracy and device authentication problems. However, existing PUFs consume high power and they suffer from the problem of generating unreliable bits. This dissertation have addressed this issue in PUFs by designing a novel adiabatic logic based PUF. The time ramp voltages in adiabatic PUF is utilized to improve the reliability of the PUF along with its energy-efficiency. Reliability of the adiabatic logic based PUF proposed in this dissertation is tested through simulation based temperature variations and supply voltage variations

Oxygen-insertion Technology for CMOS Performance Enhancement

Until 2003, the semiconductor industry followed Dennard scaling rules to improve complementary metal-oxide-semiconductor (CMOS) transistor performance. However, performance gains with further reductions in transistor gate length are limited by physical effects that do not scale commensurately with device dimensions: short-channel effects (SCE) due to gate-leakage-limited gate-oxide thickness scaling, channel mobility degradation due to enhanced vertical electric fields, increased parasitic resistances due to reductions in source/drain (S/D) contact area, and increased variability in transistor performance due to random dopant fluctuation (RDF) effects and gate work function variations (WFV). These emerging scaling issues, together with increased process complexity and cost, pose severe challenges to maintaining the exponential scaling of transistor dimensions. This dissertation discusses the benefits of oxygen-insertion (OI) technology, a CMOS performance booster, for overcoming these challenges. The benefit of OI technology to mitigate the increase in sheet resistance ($R_{sh}$) with decreasing junction depth ($X_J$) for ultra-shallow-junctions (USJs) relevant for deep-sub-micron planar CMOS transistors is assessed through the fabrication of $R_{sh}$ test structures, electrical characterization, and technology computer-aided design (TCAD) simulations. Experimental and secondary ion mass spectroscopy (SIMS) analyses indicate that OI technology can facilitate low-resistivity USJ formation by reducing $R_{sh}$ and $X_J$ due to retarded transient-enhanced-diffusion (TED) effects and enhanced dopant retention during post-implantation thermal annealing. It is also shown that a low-temperature-oxide (LTO) capping can increase $R_{sh}$ unfavorably due to lower dopant activation levels, which can be alleviated by OI technology. This dissertation extends the evaluation of OI technology to advanced FinFET technology, targeting 7/8-nm low power technology node. A bulk-Si FinFET design comprising a super-steep retrograde (SSR) fin channel doping profile achievable with OI technology is studied by three-dimensional (3-D) TCAD simulations. As compared with the conventional bulk-Si (control) FinFET design with a heavily-doped fin channel doping profile, SSR FinFETs can achieve higher $I_{on}/I_{off}$ ratios and reduce the sensitivity of device performance to variations due to the lightly doped fin channel. As compared with the SOI FinFET design, SSR FinFETs can achieve similarly low $V_{DD,min}$ for 6T-SRAM cell yield estimation. Both SSR and SOI design can provide for as much as 100 mV reduction in $V_{DD,min}$ compared with the control FinFET design. Overall, the SSR FinFET design that can be achieved with OI technology is demonstrated to be a cheaper alternative to the SOI FinFET technology for extending CMOS scaling beyond the 10-nm node. Finally, this dissertation investigates the benefits of OI technology for reducing the Schottky barrier height ($\Phi_{Bp}$) of a Pt/Ti/p-type Si metal-semiconductor (M/S) contact, which can be expected to help reduce the specific contact resistivity for a p-type silicon contact. Electrical measurements of back-to-back Schottky diodes, SIMS, and X-ray photoelectron spectroscopy (XPS) show that the reduction in $\Phi_{Bp}$ is associated with enhanced Ti 2p and Si 2p core energy level shifts. OI technology is shown to favor low-$\Phi_{Bp}$ Pt monosilicide formation during forming gas anneal (FGA) by suppressing the grain boundary diffusion of Pt atoms into the crystalline Si substrate

Assessment of InAs/AlGaSb Tunnel-FET Virtual Technology Platform for Low-Power Digital Circuits

In this work, a complementary InAs/Al0.05Ga0.95Sb tunnel field-effect-transistor (TFET) virtual technology platform is benchmarked against the projection to the CMOS FinFET 10-nm node, by means of device and basic circuit simulations. The comparison is performed in the ultralow voltage regime (below 500 mV), where the proposed III\u2013V TFETs feature ON-current levels comparable to scaled FinFETs, for the same low-operating-power OFF-current. Due to the asymmetrical n- and p-type I\u2013Vs, trends of noise margins and performances are investigated for different Wp/Wn ratios. Implications of the device threshold voltage variability, which turned out to be dramatic for steep slope TFETs, are also addressed

Assessment of InAs/AlGaSb Tunnel-FET Virtual Technology Platform for Low-Power Digital Circuits

In this work, a complementary InAs/Al0.05Ga0.95Sb tunnel field-effect-Transistor (TFET) virtual technology platform is benchmarked against the projection to the CMOS FinFET 10-nm node, by means of device and basic circuit simulations. The comparison is performed in the ultralow voltage regime (below 500 mV), where the proposed III-V TFETs feature ON-current levels comparable to scaled FinFETs, for the same low-operating-power OFF-current. Due to the asymmetrical n-and p-Type I-V exts , trends of noise margins and performances are investigated for different Wp/Wn ratios. Implications of the device threshold voltage variability, which turned out to be dramatic for steep slope TFETs, are also addressed

Near-Threshold Computing: Past, Present, and Future.

Transistor threshold voltages have stagnated in recent years, deviating from constant-voltage scaling theory and directly limiting supply voltage scaling. To overcome the resulting energy and power dissipation barriers, energy efficiency can be improved through aggressive voltage scaling, and there has been increased interest in operating at near-threshold computing (NTC) supply voltages. In this region sizable energy gains are achieved with moderate performance loss, some of which can be regained through parallelism. This thesis first provides a methodical definition of how near to threshold is "near threshold" and continues with an in-depth examination of NTC across past, present, and future CMOS technologies. By systematically defining near-threshold, the trends and tradeoffs are analyzed, lending insight in how best to design and optimize near-threshold systems. NTC works best for technologies that feature good circuit delay scalability, therefore technologies without strong short-channel effects. Early planar technologies (prior to 90nm or so) featured good circuit scalability (8x energy gains), but lacked area in which to add cores for parallelization. Recent planar nodes (32nm – 20nm) feature more area for cores but suffer from poor delay scalability, and so are not well-suited for NTC (4x energy gains). The switch to FinFET CMOS technology allows for a return to strong voltage scalability (8x gain), reversing trends seen in planar technologies, while dark silicon has created an opportunity to add cores for parallelization. Improved FinFET voltage scalability even allows for latency reduction of a single task, as long as the task is sufficiently parallelizable (< 10% serial code). Finally, we will look at a technique for fast voltage boosting, called Shortstop, in which a core's operating voltage is raised in 10s of cycles. Shortstop can be used to quickly respond to single-threaded performance demands of a near-threshold system by leveraging the innate parasitic inductance of a dedicated dirty supply rail, further improving energy efficiency. The technique is demonstrated in a wirebond implementation and is able to boost a core up to 1.8x faster than a header-based approach, while reducing supply droop by 2-7x. An improved flip-chip architecture is also proposed.PhDElectrical EngineeringUniversity of Michigan, Horace H. Rackham School of Graduate Studieshttp://deepblue.lib.umich.edu/bitstream/2027.42/113600/1/npfet_1.pd

Characterization of self-heating effects and assessment of its impact on reliability in finfet technology

The systematically growing power (heat) dissipation in CMOS transistors with each successive technology node is reaching levels which could impact its reliable operation. The emergence of technologies such as bulk/SOI FinFETs has dramatically confined the heat in the device channel due to its vertical geometry and it is expected to further exacerbate with gate-all-around transistors. This work studies heat generation in the channel of semiconductor devices and measures its dissipation by means of wafer level characterization and predictive thermal simulation. The experimental work is based on several existing device thermometry techniques to which additional layout improvements are made in state of the art bulk FinFET and SOI FinFET 14nm technology nodes. The sensors produce excellent matching results which are confirmed through TCAD thermal simulation, differences between sensor types are quantified and error bars on measurements are established. The lateral heat transport measurements determine that heat from the source is mostly dissipated at a distance of 1µm and 1.5µm in bulk FinFET and SOI FinFET, respectively. Heat additivity is successfully confirmed to prove and highlight the fact that the whole system needs to be considered when performing thermal analysis. Furthermore, an investigation is devoted to study self-heating with different layout densities by varying the number of fins and fingers per active region (RX). Fin thermal resistance is measured at different ambient temperatures to show its variation of up to 70% between -40°C to 175°C. Therefore, the Si fin has a more dominant effect in heat transport and its varying thermal conductivity should be taken into account. The effect of ambient temperature on self-heating measurement is confirmed by supplying heat through thermal chuck and adjacent heater devices themselves. Motivation for this work is the continuous evolution of the transistor geometry and use of exotic materials, which in the recent technology nodes made heat removal more challenging. This poses reliability and performance concerns. Therefore, this work studies the impact of self-heating on reliability testing at DC conditions as well as realistic CMOS logic operating (AC) conditions. Front-end-of-line (FEOL) reliability mechanisms, such as hot carrier injection (HCI) and non-uniform time dependent dielectric breakdown (TDDB), are studied to show that self-heating effects can impact measurement results and recommendations are given on how to mitigate them. By performing an HCI stress at moderate bias conditions, this dissertation shows that the laborious techniques of heat subtraction are no longer necessary. Self-heating is also studied at more realistic device switching conditions by utilizing ring oscillators with several densities and stage counts to show that self-heating is considerably lower compared to constant voltage stress conditions and degradation is not distinguishable

Expanded Noise Margin 10T SRAM Cell using Finfet Device

Static random access memory (SRAM) cells are being improved in order to increase resistance to device level changes and satisfy the requirements of low-power applications. A unique 10-transistor FinFET-based SRAM cell with single-ended read and differential write functionality is presented in this study. This cutting-edge architecture is more power-efficient than ST (Schmitt trigger) 10T or traditional 6T SRAM cells, using only 1.87 and 1.6 units of power respectively during read operations. The efficiency is attributable to a lower read activity factor, which saves electricity. The read static noise margin (RSNM) and write static noise margin (WSNM) of the proposed 10T SRAM cell show notable improvements over the 6T SRAM cell, increasing by 1.67 and 1.86, respectively. Additionally, compared to the 6T SRAM cell, the read access time has been significantly reduced by 1.96 seconds. Utilising the Cadence Virtuoso tool and an 18nm Advanced Node Process Design Kit (PDK) technology file, the design's efficacy has been confirmed. For low-power electronic systems and next-generation memory applications, this exciting 10T SRAM cell has a lot of potential

Ultra-Low-Power Embedded SRAM Design for Battery- Operated and Energy-Harvested IoT Applications

Internet of Things (IoT) devices such as wearable health monitors, augmented reality goggles, home automation, smart appliances, etc. are a trending topic of research. Various IoT products are thriving in the current electronics market. The IoT application needs such as portability, form factor, weight, etc. dictate the features of such devices. Small, portable, and lightweight IoT devices limit the usage of the primary energy source to a smaller rechargeable or non-rechargeable battery. As battery life and replacement time are critical issues in battery-operated or partially energy-harvested IoT devices, ultra-low-power (ULP) system on chips (SoC) are becoming a widespread solution of chip makers’ choice. Such ULP SoC requires both logic and the embedded static random access memory (SRAM) in the processor to operate at very low supply voltages. With technology scaling for bulk and FinFET devices, logic has demonstrated to operate at low minimum operating voltages (VMIN). However, due to process and temperature variation, SRAMs have higher VMIN in scaled processes that become a huge problem in designing ULP SoC cores. This chapter discusses the latest published circuits and architecture techniques to minimize the SRAM VMIN for scaled bulk and FinFET technologies and improve battery life for ULP IoT applications

Limits on Fundamental Limits to Computation

An indispensable part of our lives, computing has also become essential to industries and governments. Steady improvements in computer hardware have been supported by periodic doubling of transistor densities in integrated circuits over the last fifty years. Such Moore scaling now requires increasingly heroic efforts, stimulating research in alternative hardware and stirring controversy. To help evaluate emerging technologies and enrich our understanding of integrated-circuit scaling, we review fundamental limits to computation: in manufacturing, energy, physical space, design and verification effort, and algorithms. To outline what is achievable in principle and in practice, we recall how some limits were circumvented, compare loose and tight limits. We also point out that engineering difficulties encountered by emerging technologies may indicate yet-unknown limits.Comment: 15 pages, 4 figures, 1 tabl

Function Implementation in a Multi-Gate Junctionless FET Structure

Title from PDF of title page, viewed September 18, 2023Dissertation advisor: Mostafizur RahmanVitaIncludes bibliographical references (pages 95-117)Dissertation (Ph.D.)--Department of Computer Science and Electrical Engineering, Department of Physics and Astronomy. University of Missouri--Kansas City, 2023This dissertation explores designing and implementing a multi-gate junctionless field-effect transistor (JLFET) structure and its potential applications beyond conventional devices. The JLFET is a promising alternative to conventional transistors due to its simplified fabrication process and improved electrical characteristics. However, previous research has focused primarily on the device's performance at the individual transistor level, neglecting its potential for implementing complex functions. This dissertation fills this research gap by investigating the function implementation capabilities of the JLFET structure and proposing novel circuit designs based on this technology. The first part of this dissertation presents a comprehensive review of the existing literature on JLFETs, including their fabrication techniques, operating principles, and performance metrics. It highlights the advantages of JLFETs over traditional metal-oxide-semiconductor field-effect transistors (MOSFETs) and discusses the challenges associated with their implementation. Additionally, the review explores the limitations of conventional transistor technologies, emphasizing the need for exploring alternative device architectures. Building upon the theoretical foundation, the dissertation presents a detailed analysis of the multi-gate JLFET structure and its potential for realizing advanced functions. The study explores the impact of different design parameters, such as channel length, gate oxide thickness, and doping profiles, on the device performance. It investigates the trade-offs between power consumption, speed, and noise immunity, and proposes design guidelines for optimizing the function implementation capabilities of the JLFET. To demonstrate the practical applicability of the JLFET structure, this dissertation introduces several novel circuit designs based on this technology. These designs leverage the unique characteristics of the JLFET, such as its steep subthreshold slope and improved on/off current ratio, to implement complex functions efficiently. The proposed circuits include arithmetic units, memory cells, and digital logic gates. Detailed simulations and analyses are conducted to evaluate their performance, power consumption, and scalability. Furthermore, this dissertation explores the potential of the JLFET structure for emerging technologies, such as neuromorphic computing and bioelectronics. It investigates how the JLFET can be employed to realize energy-efficient and biocompatible devices for applications in artificial intelligence and biomedical engineering. The study investigates the compatibility of the JLFET with various materials and substrates, as well as its integration with other functional components. In conclusion, this dissertation contributes to the field of nanoelectronics by providing a comprehensive investigation into the function implementation capabilities of the multi-gate JLFET structure. It highlights the potential of this device beyond its individual transistor performance and proposes novel circuit designs based on this technology. The findings of this research pave the way for the development of advanced electronic systems that are more energy-efficient, faster, and compatible with emerging applications in diverse fields.Introduction -- Literature review -- Crosstalk principle -- Experiment of crosstalk -- Device architecture -- Simulation & results -- Conclusio