Study of the impact of lithography techniques and the current fabrication processes on the design rules of tridimensional fabrication technologies

Working for the photolithography tool manufacturer leader sometimes gives me the impression of how complex and specific is the sector I am working on. This master thesis topic came with the goal of getting the overall picture of the state-of-the-art: stepping out and trying to get a helicopter view usually helps to understand where a process is in the productive chain, or what other firms and markets are doing to continue improvingUniversidad de sevilla.Máster Universitario en Microelectrónica: Diseño y Aplicaciones de Sistemas Micro/Nanométrico

Algorithmic techniques for physical design : macro placement and under-the-cell routing

With the increase of chip component density and new manufacturability constraints imposed by modern technology nodes, the role of algorithms for electronic design automation is key to the successful implementation of integrated circuits. Two of the critical steps in the physical design flows are macro placement and ensuring all design rules are honored after timing closure. This thesis proposes contributions to help in these stages, easing time-consuming manual steps and helping physical design engineers to obtain better layouts in reduced turnaround time. The first contribution is under-the-cell routing, a proposal to systematically connect standard cell components via lateral pins in the lower metal layers. The aim is to reduce congestion in the upper metal layers caused by extra metal and vias, decreasing the number of design rule violations. To allow cells to connect by abutment, a standard cell library is enriched with instances containing lateral pins in a pre-selected sharing track. Algorithms are proposed to maximize the numbers of connections via lateral connection by mapping placed cell instances to layouts with lateral pins, and proposing local placement modifications to increase the opportunities for such connections. Experimental results show a significant decrease in the number of pins, vias, and in number of design rule violations, with negligible impact on wirelength and timing. The second contribution, done in collaboration with eSilicon (a leading ASIC design company), is the creation of HiDaP, a macro placement tool for modern industrial designs. The proposed approach follows a multilevel scheme to floorplan hierarchical blocks, composed of macros and standard cells. By exploiting RTL information available in the netlist, the dataflow affinity between these blocks is modeled and minimized to find a macro placement with good wirelength and timing properties. The approach is further extended to allow additional engineer input, such as preferred macro locations, and also spectral and force methods to guide the floorplanning search. Experimental results show that the layouts generated by HiDaP outperforms those obtained by a state-of-the-art EDA physical design software, with similar wirelength and better timing when compared to manually designed tape-out ready macro placements. Layouts obtained by HiDaP have successfully been brought to near timing closure with one to two rounds of small modifications by physical design engineers. HiDaP has been fully integrated in the design flows of the company and its development remains an ongoing effort.A causa de l'increment de la densitat de components en els xip i les noves restriccions de disseny imposades pels últims nodes de fabricació, el rol de l'algorísmia en l'automatització del disseny electrònic ha esdevingut clau per poder implementar circuits integrats. Dos dels passos crucials en el procés de disseny físic és el placement de macros i assegurar la correcció de les regles de disseny un cop les restriccions de timing del circuit són satisfetes. Aquesta tesi proposa contribucions per ajudar en aquests dos reptes, facilitant laboriosos passos manuals en el procés i ajudant als enginyers de disseny físic a obtenir millors resultats en menys temps. La primera contribució és el routing "under-the-cell", una proposta per connectar cel·les estàndard usant pins laterals en les capes de metall inferior de manera sistemàtica. L'objectiu és reduir la congestió en les capes de metall superior causades per l'ús de metall i vies, i així disminuir el nombre de violacions de regles de disseny. Per permetre la connexió lateral de cel·les, estenem una llibreria de cel·les estàndard amb dissenys que incorporen connexions laterals. També proposem modificacions locals al placement per permetre explotar aquest tipus de connexions més sovint. Els resultats experimentals mostren una reducció significativa en el nombre de pins, vies i nombre de violacions de regles de disseny, amb un impacte negligible en wirelength i timing. La segona contribució, desenvolupada en col·laboració amb eSilicon (una empresa capdavantera en disseny ASIC), és el desenvolupament de HiDaP, una eina de macro placement per a dissenys industrials actuals. La proposta segueix un procés multinivell per fer el floorplan de blocks jeràrquics, formats per macros i cel·les estàndard. Mitjançant la informació RTL disponible en la netlist, l'afinitat de dataflow entre els mòduls es modela i minimitza per trobar macro placements amb bones propietats de wirelength i timing. La proposta també incorpora la possibilitat de rebre input addicional de l'enginyer, com ara suggeriments de les posicions de les macros. Finalment, també usa mètodes espectrals i de forçes per guiar la cerca de floorplans. Els resultats experimentals mostren que els dissenys generats amb HiDaP són millors que els obtinguts per eines comercials capdavanteres de EDA. Els resultats també mostren que els dissenys presentats poden obtenir un wirelength similar i millor timing que macro placements obtinguts manualment, usats per fabricació. Alguns dissenys obtinguts per HiDaP s'han dut fins a timing-closure en una o dues rondes de modificacions incrementals per part d'enginyers de disseny físic. L'eina s'ha integrat en el procés de disseny de eSilicon i el seu desenvolupament continua més enllà de les aportacions a aquesta tesi

Design of LCOS microdisplay backplanes for projection applications

De evolutie van licht emitterende diodes (LED) heeft ervoor gezorgd dat het op dit moment interessant wordt om deze componenten als lichtbron te gebruiken in projectiesystemen. LED’s hebben belangrijke voordelen vergeleken met klassieke booglampen. Ze zijn compact, ze hebben een veel grotere levensduur en ogenblikkelijke schakeltijden, ze werken op lage spanningen, etc. LED’s zijn smalbandig en kunnen een groterekleurenbereik realiseren. Ze hebben momenteel echter een beperkte helderheid. Naast de lichtbron is het type van de lichtklep ook bepalend voor de kwaliteit van een projectiesysteem. Er bestaan verschillende lichtkleptechnologieën waaronder die van de reflectieve LCOS-panelen. Deze lichtkleppen kunnen zeer hoge resoluties hebben en wordenvaak gebruikt in kwalitatieve, professionele projectiesystemen. LED’s zijn echter totaal verschillend van booglampen. Ze hebben een andere vorm, package, stralingspatroon, aansturing, fysische en thermische eigenschappen, etc. Hoewel er een twintigtal optische architecturen bekend zijn voor reflectieve beeldschermen (met een booglamp als lichtbron), zijn ze niet geschikt voor LED-projectoren en moeten nieuwe optische architecturen en een elektronische aansturing ontwikkeld worden. In dit doctoraat werd er hieromtrent onderzoek gedaan. Er werd uiteindelijk een driekleurenprojector (R, G, B) met een efficiënt LED-belichtingssysteem gebouwd met twee LCOS-lichtkleppen. Deze LEDprojector heeft superieure eigenschappen (zeer lange levensduur, beeldkwaliteit, etc.) en een matige lichtopbrengst

Algorithmic techniques for physical design : macro placement and under-the-cell routing

With the increase of chip component density and new manufacturability constraints imposed by modern technology nodes, the role of algorithms for electronic design automation is key to the successful implementation of integrated circuits. Two of the critical steps in the physical design flows are macro placement and ensuring all design rules are honored after timing closure. This thesis proposes contributions to help in these stages, easing time-consuming manual steps and helping physical design engineers to obtain better layouts in reduced turnaround time. The first contribution is under-the-cell routing, a proposal to systematically connect standard cell components via lateral pins in the lower metal layers. The aim is to reduce congestion in the upper metal layers caused by extra metal and vias, decreasing the number of design rule violations. To allow cells to connect by abutment, a standard cell library is enriched with instances containing lateral pins in a pre-selected sharing track. Algorithms are proposed to maximize the numbers of connections via lateral connection by mapping placed cell instances to layouts with lateral pins, and proposing local placement modifications to increase the opportunities for such connections. Experimental results show a significant decrease in the number of pins, vias, and in number of design rule violations, with negligible impact on wirelength and timing. The second contribution, done in collaboration with eSilicon (a leading ASIC design company), is the creation of HiDaP, a macro placement tool for modern industrial designs. The proposed approach follows a multilevel scheme to floorplan hierarchical blocks, composed of macros and standard cells. By exploiting RTL information available in the netlist, the dataflow affinity between these blocks is modeled and minimized to find a macro placement with good wirelength and timing properties. The approach is further extended to allow additional engineer input, such as preferred macro locations, and also spectral and force methods to guide the floorplanning search. Experimental results show that the layouts generated by HiDaP outperforms those obtained by a state-of-the-art EDA physical design software, with similar wirelength and better timing when compared to manually designed tape-out ready macro placements. Layouts obtained by HiDaP have successfully been brought to near timing closure with one to two rounds of small modifications by physical design engineers. HiDaP has been fully integrated in the design flows of the company and its development remains an ongoing effort.A causa de l'increment de la densitat de components en els xip i les noves restriccions de disseny imposades pels últims nodes de fabricació, el rol de l'algorísmia en l'automatització del disseny electrònic ha esdevingut clau per poder implementar circuits integrats. Dos dels passos crucials en el procés de disseny físic és el placement de macros i assegurar la correcció de les regles de disseny un cop les restriccions de timing del circuit són satisfetes. Aquesta tesi proposa contribucions per ajudar en aquests dos reptes, facilitant laboriosos passos manuals en el procés i ajudant als enginyers de disseny físic a obtenir millors resultats en menys temps. La primera contribució és el routing "under-the-cell", una proposta per connectar cel·les estàndard usant pins laterals en les capes de metall inferior de manera sistemàtica. L'objectiu és reduir la congestió en les capes de metall superior causades per l'ús de metall i vies, i així disminuir el nombre de violacions de regles de disseny. Per permetre la connexió lateral de cel·les, estenem una llibreria de cel·les estàndard amb dissenys que incorporen connexions laterals. També proposem modificacions locals al placement per permetre explotar aquest tipus de connexions més sovint. Els resultats experimentals mostren una reducció significativa en el nombre de pins, vies i nombre de violacions de regles de disseny, amb un impacte negligible en wirelength i timing. La segona contribució, desenvolupada en col·laboració amb eSilicon (una empresa capdavantera en disseny ASIC), és el desenvolupament de HiDaP, una eina de macro placement per a dissenys industrials actuals. La proposta segueix un procés multinivell per fer el floorplan de blocks jeràrquics, formats per macros i cel·les estàndard. Mitjançant la informació RTL disponible en la netlist, l'afinitat de dataflow entre els mòduls es modela i minimitza per trobar macro placements amb bones propietats de wirelength i timing. La proposta també incorpora la possibilitat de rebre input addicional de l'enginyer, com ara suggeriments de les posicions de les macros. Finalment, també usa mètodes espectrals i de forçes per guiar la cerca de floorplans. Els resultats experimentals mostren que els dissenys generats amb HiDaP són millors que els obtinguts per eines comercials capdavanteres de EDA. Els resultats també mostren que els dissenys presentats poden obtenir un wirelength similar i millor timing que macro placements obtinguts manualment, usats per fabricació. Alguns dissenys obtinguts per HiDaP s'han dut fins a timing-closure en una o dues rondes de modificacions incrementals per part d'enginyers de disseny físic. L'eina s'ha integrat en el procés de disseny de eSilicon i el seu desenvolupament continua més enllà de les aportacions a aquesta tesi.Postprint (published version

Modeling of reverse current effects in trench-based smart power technologies

The increase in complexity in todays automotive products is driven by the trend to implement new features in the area of safety, comfort and entertainment. This significantly raises the safety requirements of new ICs and the identification of possible sources of failures gains in priority. One of these failure sources is the injection of parasitic currents into the common substrate of a chip. This does not only occur during exceptions in the operation of the IC but also affects applications which require switching of inductive loads. The difficulty to handle substrate current injection originates from its nonlocality as it potentially influences the entire IC. In this thesis a point-to-point modeling scheme for Spice-based circuit simulation is proposed. It addresses parasitic coupling effects caused by minority carrier injection into the substrate of a deep-trench based BCD technology. Since minority carriers can diffuse over large distances in the common substrate and disturb circuits in their normal operation, a quantitative approach is necessary to address this parasitic effect early during design. An equivalent circuit based on the chip's design is extracted and the coupling effect between the perturbing devices and the susceptible nodes is represented by Verilog-AMS models. These models represent the three main components in the coupling path which are the forward biased diode at the perturbing device, the reverse biased diode at the susceptible node, and the intermediary common substrate of the chip. An automated layout extraction framework identifies the injectors of the minority carriers and the sensitive devices. Additionally, it determines the relevant parameters for the models. The curve fitting functions of the models are derived from calibrated TCAD simulations which are based on the measurement results of two dedicated test chips. The test chips were specifically designed to provide detailed analysis capabilities of this parasitic coupling effect. This led to a design which contains several different injector nodes and a large number of susceptible nodes spread over the entire area of the chip. Additionally, the chip incorporates the most commonly used layout-based guard structures to obtain an in-depth insight on their efficiency in recent BCD technologies. Based on the results obtained by measurements of the test chips the underlying physics of the coupling effect are discussed in detail. Minority carrier injection in the substrate is not much different to the operating principle of a bipolar transistor and the differences and similarities between them are presented. This forms the basis of the model development and explains how the equations of the Verilog-AMS models were derived. Finally, the entire simulation flow is evaluated and the simulation results are compared to measurements of the chip

Enhanced Design Flow and Optimizations for Multi-Project Wafers

The aggressive scaling of VLSI feature size and the pervasive use of advanced reticle enhancement technologies leads to dramatic increases in mask costs, pushing prototype and low volume production designs at the limit of economic feasibility. Multiple project wafers (MPW), or "shuttle" runs, provide an attractive solution for such designs, by providing a mechanism to share the cost of mask tooling among up to tens of designs. However, MPW reticle floorplanning and wafer dicing introduce complexities not encountered in typical, single-project wafers. Recent works attempting to address these challenges have several drawbacks, including (i) assuming equal production volume requirement for all designs, (ii) assuming that the same dicing plan in used for all wafers or for all rows/columns of reticle images on a wafer, (iii) assuming unrealistic wafer models such as a rectangular array of projections, and (iv) disregarding important practical constraints on the maximum reticle size. In this report we propose a comprehensive MPW flow aimed at minimizing the number of wafers needed to fulfill given die production volumes. Our flow includes three main steps: (1)multi-project reticle floorplanning, (2) wafer shot-map definition, and (3) wafer dicing plan definition. For each of these steps we propose improved algorithms as follows. Our reticle floorplanner uses hierarchical quadrisection combined with simulated annealing to generate ``diceable'' floorplans observing given maximum reticle sizes. The new wafer shot-map definition step allows to fully utilize round wafer real estate by extracting the maximum number of functional dies from both fully and partially printed reticle images. Finally, our dicing planner allows multiple side-to-side dicing plans for different wafers as well as different reticle projection rows/columns within a wafer, and further improves dicing yield by partitioning each wafer into a small number of parts before individual die extraction. Experiments on industry testcases show that our methods outperform significantly not only previous methods in the literature, but also reticle floorplans manually designed by experienced engineers.Pre-2018 CSE ID: CS2005-082

Yield-driven multi-project reticle design and wafer dicing

The aggressive scaling of VLSI feature size and the pervasive use of advanced reticle enhancement technologies has led to dramatic increases in mask costs, pushing prototype and low volume production designs to the limit of economic feasibility. Multiple project wafers (MPW), or “shuttle ” runs, provide an attractive solution for such low volume designs, by providing a mechanism to share the cost of mask tooling among up to tens of designs. However, MPW reticle design and wafer dicing introduce complexities not encountered in typical, single-project wafers. Recent works on wafer dicing do not take in account several known degrees of freedom and requirements, which degrades the optimality and feasibility of the proposed solutions. Furthermore, the delay cost associated with schedule alignment has been completely ignored in all previous works. In this paper we propose an enhanced MPW flow comprising four main steps: (1) schedule-aware project partitioning, (2) multi-project reticle floorplanning, (3) wafer shot-map definition, and (4) wafer dicing plan definition. The proposed project partitioning algorithm gives improved trade-offs between mask cost and schedule delay cost. Our reticle floorplaner combines hierarchical quadrisection with a simulated annealing framework to generate more “diceable ” floorplans subject to given maximum reticle sizes. The round wafer shot-map definition step maximizes extraction of functional dies from partially printed reticle images. Finally, our dicing planner employs multiple side-to-side dicing plans for different wafers, as well as different reticle image rows/columns within a wafer. Experiments on industry testcases show that our methods significantly outperform not only previous methods in the literature, but also reticle floorplans manually designed by experienced engineers

Optimizations of manufacturability and manufacturing in nanometer-era VLSI

As optical lithography advances into the 65nm technology node and beyond, minimum feature size outpaces the lithography wavelength. As a result, mask/wafer manufacturing yield improvement and cost reduction have been widely accepted as key factors for aggressive technology scaling. This thesis is concerned with the following four manufacturability/manufacturing problems. Fracturing: Mask manufacturing for the 90nm and 65nm nodes increasingly deploys variable shaped beam mask writing machines. The pervasive use of OPC leads to dramatic increase in the number of thin trapezoids, which significantly decrease the mask manufacturing yield. This thesis suggests an optimal integer linear programming based fracturing approach and a fast heuristics which substantially reduce sliver count in comparison to leading commercial fracturing tools. MPW: Multiple project wafers (MPW) provide an attractive mask manufacturing cost reduction solution for low-volume production designs by sharing the cost of mask tooling among up to tens of designs. This thesis proposes a comprehensive MPW flow aimed at minimizing the manufacturing cost which includes (1) multi-project reticle floorplanning, and (2) wafer shot-map and dicing plan definition. PSM: In the context of wafer manufacturing, Alternating-Aperture Phase Shift Masking (AAPSM) will be used to image critical features on the polysilicon layer at smaller technology nodes. This technology imposes additional constraints on the layouts beyond traditional design rules. Phase conflicts have to be detected and removed to enable the use of AAPSM. This thesis has two key contributions: (1) a new computationally efficient approach to detect a minimal set of phase conflicts, which when corrected will produce a phase-assignable layout; (2) a novel layout modification scheme for correcting these phase conflicts in standard- cell blocks. Redundant Vias: Finally, a large part of wafer manufacturing yield loss is due to via voids, which can be relieved by redundant vias insertion or via doubling. This thesis proposes perfect matching based post -route via doubling which achieves optimum yield improvement. Redundant interconnects or "short loops& quot; are introduced to maximize the number of doubled vias. Experimental results show that near 100% via doubling coverage can be achieved with simultaneously optimal redundant via and short loop insertion in the post -route stag