Parameter extraction techniques for the analysis and modeling of resistive memories

A revision of the different numerical techniques employed to extract resistive switching (RS) and modeling parameters is presented. The set and reset voltages, commonly used for variability estimation, are calculated for different resistive memory technologies. The methodologies to extract the series resistance and the parameters linked to the charge-flux memristive modeling approach are also described. It is found that the obtained cycle-to-cycle (C2C) variability depends on the numerical technique used. This result is important, and it implies that when analyzing C2C variability, the extraction technique should be described to perform fair comparisons between different resistive memory technologies. In addition to the use of extensive experimental data for different types of resistive memories, we have also included kinetic Monte Carlo (kMC) simulations to study the formation and rupture events of the percolation paths that constitute the conductive filaments (CF) that allow resistive switching operation in filamentary unipolar and bipolar devices.Consejería de Conocimiento, Investigaci ́on y Universidad, Junta de Andalucía (Spain) and the FEDER program for the projects A.TIC.117.UGR18, B-TIC-624-UGR20 and IE2017-5414Ramón y Cajal grant No. RYC2020-030150-IFunding for open access charge: Universidad de Granada/CBU

Impact of Line Resistance Combined with Device Variability on Resistive RAM Memories

International audienceIn this paper, the performance and reliability of oxide-based Resistive RAM (ReRAM) memory is investigated in a 28nm FDSOI technology versus interconnects resistivity combined with device variability. Indeed, common problems with ReRAM are related to high variability in operating conditions and low yield. At a cell level ReRAMs suffer from variability. At an array level, ReRAMs suffer from different voltage drops seen across the cells due to line resistances. Although research has taken steps to resolve these issues, variability combined with resistive paths remain an important characteristic for ReRAMs. In this context, a deeper understanding of the impact of these characteristics on ReRAM performances is needed to propose variability tolerant designs to ensure the robustness of the technology. The presented study addresses the memory cell, the memory word up to the memory matrix

A thorough investigation of the switching dynamics of TiN/Ti/10 nm-HfO2/W resistive memories

Producción CientíficaThe switching dynamics of TiN/Ti/HfO2/W-based resistive memories is investigated. The analysis consisted in the systematic application of voltage sweeps with different ramp rates and temperatures. The obtained results give clear insight into the role played by transient and thermal effects on the device operation. Both kinetic Monte Carlo simulations and a compact modeling approach based on the Dynamic Memdiode Model are considered in this work with the aim of assessing, in terms of their respective scopes, the nature of the physical processes that characterize the formation and rupture of the filamentary conducting channel spanning the oxide film. As a result of this study, a better understanding of the different facets of the resistive switching dynamics is achieved. It is shown that the temperature and, mainly, the applied electric field, control the switching mechanism of our devices. The Dynamic Memdiode Model, being a behavioral analytic approach, is shown to be particularly suitable for reproducing the conduction characteristics of our devices using a single set of parameters for the different operation regimes.Ministerio de Ciencia e Innovación de España - FEDER [PID2022-139586NB-C41, PID2022-139586NB-C42, PID2022-139586NB-C43, PID2022-139586NB-C44]Consejería de Conocimiento, Investigación y Universidad, Junta de Andalucía [B-TIC-624-UGR20]Consejo Superior de Investigaciones Científicas (CSIC)- FEDER [20225AT012]Ramón y Cajal grant number RYC2020-030150-IEuropean project MEMQuD (code 20FUN06) which has received funding from the EMPIR programme co-financed by the Participating States and from the European Union's Horizon 2020 research and innovation programme

A thorough investigation of the switching dynamics of TiN/Ti/10 nm-HfO2/W resistive memories

The switching dynamics of TiN/Ti/HfO2/W-based resistive memories is investigated. The analysis consisted in the systematic application of voltage sweeps with different ramp rates and temperatures. The obtained results give clear insight into the role played by transient and thermal effects on the device operation. Both kinetic Monte Carlo simulations and a compact modeling approach based on the Dynamic Memdiode Model are considered in this work with the aim of assessing, in terms of their respective scopes, the nature of the physical processes that characterize the formation and rupture of the filamentary conducting channel spanning the oxide film. As a result of this study, a better understanding of the different facets of the resistive switching dynamics is achieved. It is shown that the temperature and, mainly, the applied electric field, control the switching mechanism of our devices. The Dynamic Memdiode Model, being a behavioral analytic approach, is shown to be particularly suitable for reproducing the conduction characteristics of our devices using a single set of parameters for the different operation regimesFEDER program [PID2022-139586NB-C41, PID2022- 139586NB-C42PID2022-139586NB-C43PID2022-139586NB-C44]The Consejería de Conocimiento, Investigaci´on y UniversidadJunta de Andalucía (Spain) [B-TIC-624-UGR20]Spanish Consejo Superior de Investigaciones Científicas (CSIC) [20225AT012]FEDER fundsRamón y Cajal grant number RYC2020-030150-IEuropean project MEMQuD, code 20FUN06EMPIR programme co-financed by the Participating StatesEuropean Union’s Horizon 2020 research and innovation programm

Metal oxides of resistive memories investigated by electron and ion backscattering

The memristor is one of the most promising devices being studied for multiple uses in future electronic systems, with applications ranging from nonvolatile memories to artificial neural networks. Its working is based on the forming and rupturing of nano-scaled conductive filaments, which drastically alters the device’s resistance. These filaments are formed by oxygen vacancy accumulation, hence a deep understanding of the self-diffusion of oxygen in these systems is necessary. Accurate measurements of oxygen self-diffusion on metal oxides was achieved with the development of a quantitative analysis of the energy spectrum of the backscattering of electrons. The novel technique called Electron Rutherford Backscattering Spectroscopy (ERBS) uses the scattering of high energy electrons ( 40 keV) to probe the sample’s near surface (10–100 nm). Measurements of the high energy loss region – called Reflection High-Energy Electron Loss Spectroscopy (RHEELS) – also exhibit characteristics of the material’s electronic structure. A careful procedure was developed for the fitting of ERBS spectra, which was then applied on the analysis of multi-layered samples of Si3N4/TiO2, and measurements of the band gap of common oxides, such as SiO2, CaCO3 and Li2CO3. Monte Carlo simulations were employed to study the effects of multiple elastic scatterings in ERBS spectra, and a dielectric function description of inelastic scatterings extended the simulation to also consider the plasmon excitation peaks observed in RHEELS. These analysis tools were integrated into a package named PowerInteraction. With its use, a series of measurements of oxygen self-diffusion in TiO2 were conducted. The samples were composed of two sputtered deposited TiO2 layers, one of which was enriched with the 18 mass oxygen isotope. After thermal annealing, diffusion profiles were obtained by tracking the relative concentration of oxygen isotopes in both films. From the logarithmic temperature dependence of the diffusion coefficients, an activation energy of 1.05 eV for oxygen self-diffusion in TiO2 was obtained. Common ion beam analysis, such as RBS and NRA/NRP (Nuclear Reaction Analysis/Profiling), were also used to provide complementary information.O memristor é um dos dispositivos mais promissores sendo estudados para múltiplos usos em sistemas eletrônicos, com aplicações desde memórias não voláteis a redes neurais artificiais. Seu funcionamento é baseado na formação e ruptura de filamentos condutores nanométricos, o que altera drasticamente a resistência do dispositivo. Estes filamentos são formados pela acumulação de vacâncias de oxigênio, portanto um profundo entendimento da autodifusão de oxigênio nestes sistemas é necessário. Medidas acuradas da difusão em óxidos metálicos foi obtida com o desenvolvimento de uma análise quantitativa do espectro em energia de elétrons retroespalhados. A inovadora técnica de RBS de elétrons (ERBS) utiliza elétrons de alta energia ( 40 keV) para investigar a região próxima a superfície (10–100 nm). Medidas da região de alta perda de energia – chamada de Spectroscopia de Perda de Alta-Energia de Elétrons Refletidos (RHEELS) – também exibe características da estrutura eletrônica dos materiais. Um procedimento cuidadoso para o ajuste de espectros de ERBS foi desenvolvido, e então aplicado na análise de amostras multi camada de Si3N4/TiO2, e medidas de band gap de alguns óxidos, como SiO2, CaCO3 e Li2CO3. Simulações de Monte Carlo foram empregadas no estudo dos efeitos de espalhamento múltiplo nos espectros de ERBS, e uma descrição dielétrica dos espalhamentos inelásticos extendeu as simulação para também considerarem os picos de exitação plasmônica observados em RHEELS. Estas ferramentas de análise foram integradas em um pacote chamado PowerInteraction. Com o uso deste, uma série de medidas de autodifusão de oxigênio em TiO2 foram conduzidas. As amostras eram compostas por dois filmes de TiO2 depositados por sputtering, um dos quais enriquecido com isótopo 18 de oxigênio. Após tratamentos térmicos, perfis de difusão foram obtidos pelo rastreio das concentrações relativas dos isótopos de oxigênio nos dois filmes. Do comportamento logarítmico dos coeficientes de difusão em relação à temperatura, uma energia de ativação de 1.05 eV para a autodifusão de oxigênio em TiO2 foi obtida. Análises por feixes de íons, como RBS e NRA/NRP (Análise/Perfilometria por Reação Nuclear), também forneceram informações complementares

Investigation of resistance switching in SiOx RRAM cells using a 3D multi-scale kinetic Monte Carlo simulator

We employ an advanced three-dimensional (3D) electro-thermal simulator to explore the physics and potential of oxide-based resistive random-access memory (RRAM) cells. The physical simulation model has been developed recently, and couples a kinetic Monte Carlo study of electron and ionic transport to the self-heating phenomenon while accounting carefully for the physics of vacancy generation and recombination, and trapping mechanisms. The simulation framework successfully captures resistance switching, including the electroforming, set and reset processes, by modeling the dynamics of conductive filaments in the 3D space. This work focuses on the promising yet less studied RRAM structures based on silicon-rich silica (SiOx) RRAMs. We explain the intrinsic nature of resistance switching of the SiOx layer, analyze the effect of self-heating on device performance, highlight the role of the initial vacancy distributions acting as precursors for switching, and also stress the importance of using 3D physics-based models to capture accurately the switching processes. The simulation work is backed by experimental studies. The simulator is useful for improving our understanding of the little-known physics of SiOx resistive memory devices, as well as other oxide-based RRAM systems (e.g. transition metal oxide RRAMs), offering design and optimization capabilities with regard to the reliability and variability of memory cells

An experimental and simulation study of the role of thermal effects on variability in TiN/Ti/HfO2/W resistive switching nonlinear devices

An in-depth simulation and experimental study has been performed to analyze thermal effects on the variability of resistive memories. Kinetic Monte Carlo (kMC) simulations, that reproduce well the nonlinearity and stochasticity of resistive switching devices, have been employed to explain the experimental results. The series resistance and the transition voltages and currents have been extracted from devices based on the TiN/Ti/HfO2/W stack we have fabricated and measured at temperatures ranging from 77 K to 350 K. We observed that the variability for all the magnitudes analyzed was much higher at low temperatures. In the kMC simulations, we obtained conductive filaments (CFs) with less compactness at low temperatures. This led us to explain the higher variability, based on the variations of the CF morphology and density seen at low temperatures

Variability and power enhancement of current controlled resistive switching devices

characterized using both current and voltage sweeps, with the device resistance and its cycle-to-cycle variability being analysed in each case. Experimental measurements indicate a clear improvement on resistance states stability when using current sweeps to induce both set and reset processes. Moreover, it has been found that using current to induce these transitions is more efficient than using voltage sweeps, as seen when analysing the device power consumption. The same results are obtained for devices with a Ni top electrode and a bilayer or pentalayer of HfO2/Al2O3 as dielectric. Finally, kinetic Monte Carlo and compact modelling simulation studies are performed to shed light on the experimental resultsConsejería de Conocimiento, Investigaci´on y Universidad, Junta de Andalucía (Spain)FEDER program for the project B-TIC-624-UGR20Spanish Consejo Superior de Investigaciones Científicas (CSIC) for the intramural project 20225AT012Ramón y Cajal grant No. RYC2020-030150-I

Variability and power enhancement of current controlled resistive switching devices

Producción CientíficaIn this work, the unipolar resistive switching behaviour of Ni/HfO2/Si(n+) devices is studied. The structures are characterized using both current and voltage sweeps, with the device resistance and its cycle-to-cycle variability being analysed in each case. Experimental measurements indicate a clear improvement on resistance states stability when using current sweeps to induce both set and reset processes. Moreover, it has been found that using current to induce these transitions is more efficient than using voltage sweeps, as seen when analysing the device power consumption. The same results are obtained for devices with a Ni top electrode and a bilayer or pentalayer of HfO2/Al2O3 as dielectric. Finally, kinetic Monte Carlo and compact modelling simulation studies are performed to shed light on the experimental results.Junta de Andalucía - FEDER (B-TIC-624-UGR20)Consejo Superior de Investigaciones Científicas (CSIC) (project 20225AT012)Ramón y Cajal (grant RYC2020-030150-I