15 research outputs found

    MICROELECTRONICS PACKAGING TECHNOLOGY ROADMAPS, ASSEMBLY RELIABILITY, AND PROGNOSTICS

    Get PDF
    This paper reviews the industry roadmaps on commercial-off-the shelf (COTS) microelectronics packaging technologies covering the current trends toward further reducing size and increasing functionality. Due tothe breadth of work being performed in this field, this paper presents only a number of key packaging technologies. The topics for each category were down-selected by reviewing reports of industry roadmaps including the International Technology Roadmap for Semiconductor (ITRS) and by surveying publications of the International Electronics Manufacturing Initiative (iNEMI) and the roadmap of association connecting electronics industry (IPC). The paper also summarizes the findings of numerous articles and websites that allotted to the emerging and trends in microelectronics packaging technologies. A brief discussion was presented on packaging hierarchy from die to package and to system levels. Key elements of reliability for packaging assemblies were presented followed by reliabilty definition from a probablistic failure perspective. An example was present for showing conventional reliability approach using Monte Carlo simulation results for a number of plastic ball grid array (PBGA). The simulation results were compared to experimental thermal cycle test data. Prognostic health monitoring (PHM) methods, a growing field for microelectronics packaging technologies, were briefly discussed. The artificial neural network (ANN), a data-driven PHM, was discussed in details. Finally, it presented inter- and extra-polations using ANN simulation for thermal cycle test data of PBGA and ceramic BGA (CBGA) assemblies

    FiabilitĂ© de l’underfill et estimation de la durĂ©e de vie d’assemblages microĂ©lectroniques

    Get PDF
    Abstract : In order to protect the interconnections in flip-chip packages, an underfill material layer is used to fill the volumes and provide mechanical support between the silicon chip and the substrate. Due to the chip corner geometry and the mismatch of coefficient of thermal expansion (CTE), the underfill suffers from a stress concentration at the chip corners when the temperature is lower than the curing temperature. This stress concentration leads to subsequent mechanical failures in flip-chip packages, such as chip-underfill interfacial delamination and underfill cracking. Local stresses and strains are the most important parameters for understanding the mechanism of underfill failures. As a result, the industry currently relies on the finite element method (FEM) to calculate the stress components, but the FEM may not be accurate enough compared to the actual stresses in underfill. FEM simulations require a careful consideration of important geometrical details and material properties. This thesis proposes a modeling approach that can accurately estimate the underfill delamination areas and crack trajectories, with the following three objectives. The first objective was to develop an experimental technique capable of measuring underfill deformations around the chip corner region. This technique combined confocal microscopy and the digital image correlation (DIC) method to enable tri-dimensional strain measurements at different temperatures, and was named the confocal-DIC technique. This techique was first validated by a theoretical analysis on thermal strains. In a test component similar to a flip-chip package, the strain distribution obtained by the FEM model was in good agreement with the results measured by the confocal-DIC technique, with relative errors less than 20% at chip corners. Then, the second objective was to measure the strain near a crack in underfills. Artificial cracks with lengths of 160 ÎŒm and 640 ÎŒm were fabricated from the chip corner along the 45° diagonal direction. The confocal-DIC-measured maximum hoop strains and first principal strains were located at the crack front area for both the 160 ÎŒm and 640 ÎŒm cracks. A crack model was developed using the extended finite element method (XFEM), and the strain distribution in the simulation had the same trend as the experimental results. The distribution of hoop strains were in good agreement with the measured values, when the model element size was smaller than 22 ÎŒm to capture the strong strain gradient near the crack tip. The third objective was to propose a modeling approach for underfill delamination and cracking with the effects of manufacturing variables. A deep thermal cycling test was performed on 13 test cells to obtain the reference chip-underfill delamination areas and crack profiles. An artificial neural network (ANN) was trained to relate the effects of manufacturing variables and the number of cycles to first delamination of each cell. The predicted numbers of cycles for all 6 cells in the test dataset were located in the intervals of experimental observations. The growth of delamination was carried out on FEM by evaluating the strain energy amplitude at the interface elements between the chip and underfill. For 5 out of 6 cells in validation, the delamination growth model was consistent with the experimental observations. The cracks in bulk underfill were modelled by XFEM without predefined paths. The directions of edge cracks were in good agreement with the experimental observations, with an error of less than 2.5°. This approach met the goal of the thesis of estimating the underfill initial delamination, areas of delamination and crack paths in actual industrial flip-chip assemblies.Afin de protĂ©ger les interconnexions dans les assemblages, une couche de matĂ©riau d’underfill est utilisĂ©e pour remplir le volume et fournir un support mĂ©canique entre la puce de silicium et le substrat. En raison de la gĂ©omĂ©trie du coin de puce et de l’écart du coefficient de dilatation thermique (CTE), l’underfill souffre d’une concentration de contraintes dans les coins lorsque la tempĂ©rature est infĂ©rieure Ă  la tempĂ©rature de cuisson. Cette concentration de contraintes conduit Ă  des dĂ©faillances mĂ©caniques dans les encapsulations de flip-chip, telles que la dĂ©lamination interfaciale puce-underfill et la fissuration d’underfill. Les contraintes et dĂ©formations locales sont les paramĂštres les plus importants pour comprendre le mĂ©canisme des ruptures de l’underfill. En consĂ©quent, l’industrie utilise actuellement la mĂ©thode des Ă©lĂ©ments finis (EF) pour calculer les composantes de la contrainte, qui ne sont pas assez prĂ©cises par rapport aux contraintes actuelles dans l’underfill. Ces simulations nĂ©cessitent un examen minutieux de dĂ©tails gĂ©omĂ©triques importants et des propriĂ©tĂ©s des matĂ©riaux. Cette thĂšse vise Ă  proposer une approche de modĂ©lisation permettant d’estimer avec prĂ©cision les zones de dĂ©lamination et les trajectoires des fissures dans l’underfill, avec les trois objectifs suivants. Le premier objectif est de mettre au point une technique expĂ©rimentale capable de mesurer la dĂ©formation de l’underfill dans la rĂ©gion du coin de puce. Cette technique, combine la microscopie confocale et la mĂ©thode de corrĂ©lation des images numĂ©riques (DIC) pour permettre des mesures tridimensionnelles des dĂ©formations Ă  diffĂ©rentes tempĂ©ratures, et a Ă©tĂ© nommĂ©e le technique confocale-DIC. Cette technique a d’abord Ă©tĂ© validĂ©e par une analyse thĂ©orique en dĂ©formation thermique. Dans un Ă©chantillon similaire Ă  un flip-chip, la distribution de la dĂ©formation obtenues par le modĂšle EF Ă©tait en bon accord avec les rĂ©sultats de la technique confocal-DIC, avec des erreurs relatives infĂ©rieures Ă  20% au coin de puce. Ensuite, le second objectif est de mesurer la dĂ©formation autour d’une fissure dans l’underfill. Des fissures artificielles d’une longueuer de 160 ÎŒm et 640 ÎŒm ont Ă©tĂ© fabriquĂ©es dans l’underfill vers la direction diagonale de 45°. Les dĂ©formations circonfĂ©rentielles maximales et principale maximale Ă©taient situĂ©es aux pointes des fissures correspondantes. Un modĂšle de fissure a Ă©tĂ© dĂ©veloppĂ© en utilisant la mĂ©thode des Ă©lĂ©ments finis Ă©tendue (XFEM), et la distribution des contraintes dans la simuation a montrĂ© la mĂȘme tendance que les rĂ©sultats expĂ©rimentaux. La distribution des dĂ©formations circonfĂ©rentielles maximales Ă©tait en bon accord avec les valeurs mesurĂ©es lorsque la taille des Ă©lĂ©ments Ă©tait plus petite que 22 ÎŒm, assez petit pour capturer le grand gradient de dĂ©formation prĂšs de la pointe de fissure. Le troisiĂšme objectif Ă©tait d’apporter une approche de modĂ©lisation de la dĂ©lamination et de la fissuration de l’underfill avec les effets des variables de fabrication. Un test de cyclage thermique a d’abord Ă©tĂ© effectuĂ© sur 13 cellules pour obtenir les zones dĂ©laminĂ©es entre la puce et l’underfill, et les profils de fissures dans l’underfill, comme rĂ©fĂ©rence. Un rĂ©seau neuronal artificiel (ANN) a Ă©tĂ© formĂ© pour Ă©tablir une liaison entre les effets des variables de fabrication et le nombre de cycles Ă  la dĂ©lamination pour chaque cellule. Les nombres de cycles prĂ©dits pour les 6 cellules de l’ensemble de test Ă©taient situĂ©s dans les intervalles d’observations expĂ©rimentaux. La croissance de la dĂ©lamination a Ă©tĂ© rĂ©alisĂ©e par l’EF en Ă©valuant l’énergie de la dĂ©formation au niveau des Ă©lĂ©ments interfaciaux entre la puce et l’underfill. Pour 5 des 6 cellules de la validation, le modĂšle de croissance du dĂ©laminage Ă©tait conforme aux observations expĂ©rimentales. Les fissures dans l’underfill ont Ă©tĂ© modĂ©lisĂ©es par XFEM sans chemins prĂ©dĂ©finis. Les directions des fissures de bord Ă©taient en bon accord avec les observations expĂ©rimentales, avec une erreur infĂ©rieure Ă  2,5°. Cette approche a rĂ©pondu Ă  la problĂ©matique qui consiste Ă  estimer l’initiation des dĂ©lamination, les zones de dĂ©lamination et les trajectoires de fissures dans l’underfill pour des flip-chips industriels

    Technologies for the integration of Through Silicon Vias in MEMS packages

    Get PDF
    Ein vertikales Stapeln von Si-Chips stellt eine neue Möglichkeit zur Erhöhung der Bauelemente-Integrationsdichte in GehĂ€usen dar. Chips werden dafĂŒr aufeinander platziert, fixiert und untereinander durch vertiakle DurchfĂŒhrungen (Through Silion Vias) verbunden. In dieser Arbeit wird ein neuer Ansatz zur Integration von Through Silicon Vias in 3D MEMS - Aufbauten diskutiert
    corecore