Advances in Solid State Circuit Technologies

This book brings together contributions from experts in the fields to describe the current status of important topics in solid-state circuit technologies. It consists of 20 chapters which are grouped under the following categories: general information, circuits and devices, materials, and characterization techniques. These chapters have been written by renowned experts in the respective fields making this book valuable to the integrated circuits and materials science communities. It is intended for a diverse readership including electrical engineers and material scientists in the industry and academic institutions. Readers will be able to familiarize themselves with the latest technologies in the various fields

Strain-Engineered MOSFETs

This book brings together new developments in the area of strain-engineered MOSFETs using high-mibility substrates such as SIGe, strained-Si, germanium-on-insulator and III-V semiconductors into a single text which will cover the materials aspects, principles, and design of advanced devices, their fabrication and applications. The book presents a full TCAD methodology for strain-engineering in Si CMOS technology involving data flow from process simulation to systematic process variability simulation and generation of SPICE process compact models for manufacturing for yield optimization

Towards integrating chalcogenide based phase change memory with silicon microelectronics

The continued dominance of floating gate technology as the premier non-volatile memory (NVM) technology is expected to hit a roadblock due to issues associated with its inability to catch up with CMOS scaling. The uncertain future of floating gate memory has led to a host of unorthodox NVM technologies to surface as potential heirs. Among the mix is phase change memory (PCM), which is a non-volatile, resistance variable, memory technology wherein the state of the memory bit is defined by the resistance of the memory material. This research study examines novel, bilayer chalcogenide based materials composed of Ge-chalcogenide (GeTe or Ge2Se3) and Sn-chalcogenide (SnTe or SnSe) for phase change memory applications and explores their integration with CMOS technology. By using a layered arrangement, it is possible to induce phase change response in materials, which normally do not exhibit such behavior, and thus form new materials which may have lower threshold voltage and programming current requirements. Also, through the incorporation of a metal containing layer, the phase transition characteristics of the memory layer can be tailored in order to obtain in-situ, a material with optimized phase change properties. Using X-ray diffraction (XRD) and time resolved XRD, it has been demonstrated that stacked phase change memory films exhibit both structural and compositional dependency with annealing temperature. The outcome of the structural transformation of the bottom layer, is an annealing temperature dependent residual stress. By the incorporation of a Sn layer, the phase transition characteristics of Ge-chalcogenide thin films can be tuned. Clear evidence of thermally induced Ge, Sn and chalcogen inter-diffusion, has been discerned via transmission electron microscopy and parallel electron energy loss spectroscopy. The presence of Al2O3 as capping layer has been found to mitigate volatilization and metallic Sn phase separation at high temperatures. Two terminal PCM cells employing these bilayers have been designed, fabricated and tested. All devices exhibit threshold switching and memory switching behavior. By the application of suitable voltage programming pulses, RESET state switching can be accomplished in these devices, thus demonstrating single bit memory functionality. A process for integrating bilayer PCM technology with 2 µm CMOS has been designed and developed. The baseline RIT CMOS process has been modified to incorporate 12 levels of photolithography, 3 levels of metal and the addition of PCM as a BEOL process. On electrical testing, NMOS connected PCM devices exhibit switching behavior. The effect of the state (SET/RESET) of the series connected PCM cell on the drain current of the NMOS has also been investigated. It is determined that threshold switching of the PCM cell is essential in order to observe any change in MOS drain current with variation in drain voltage. Thus, successful integration of bilayer PCM with CMOS has been demonstrated

Charge Trap Transistors (CTT): Turning Logic Transistors into Embedded Non-Volatile Memory for Advanced High-k/Metal Gate CMOS Technologies

While need for embedded non-volatile memory (eNVM) in modern computing systems continues to grow rapidly, the options have been limited due to integration and scaling challenges as well as operational voltage incompatibilities. Introduced in this work is a unique multi-time programmable memory (MTPM) solution for advanced high-k/metal-gate (HKMG) CMOS technologies which turns as-fabricated standard logic transistors into eNVM elements, without the need for any process adders or additional masks. These logic transistors, when employed as eNVM elements, are dubbed “Charge Trap Transistors” (CTTs). The fundamental device physics, principles of operation, and technological breakthroughs required for employing logic transistors as eNVM are presented. Implementation of CTT eNVM in 32 nm, 22 nm, 14 nm, and 7 nm production technologies has been realized and demonstrated in this work. The emerging memory technology landscape and the space that the CTT technology occupies therein are examined.The motivation behind this work is to develop an eNVM technology that is completely process/mask-free, multi-time programmable, operable at low/logic-compatible voltages, scalable, and secure. The CTT technology satisfies all of the aforementioned criteria. CTTs offer a data retention lifetime of > 10 years at 125 �C and an operation temperature range of -55�-125� C. Hardware results demonstrate an endurance of > 10^4 program/erase cycles which is more than adequate for most embedded applications. Hardware security enhancement, on-chip reconfigurable encryption, firmware, BIOS, chip ID, redundancy, repair at wafer and module test and in the field, performance tailoring, and chip configuration are a few of the applications of CTT eNVM. Moreover, the CTT array in its native (unprogrammed) state measures very well as an entropy source for potential PUF (Physically Unclonable Function) applications such as identification, authentication, anti-counterfeiting, secure boot, and cryptographic IP. In addition to the numerous digital applications, CTTs can also be utilized as an analog memory for applications like neuromorphic computing for machine learning (ML) and artificial intelligence (AI)

High-Density Solid-State Memory Devices and Technologies

This Special Issue aims to examine high-density solid-state memory devices and technologies from various standpoints in an attempt to foster their continuous success in the future. Considering that broadening of the range of applications will likely offer different types of solid-state memories their chance in the spotlight, the Special Issue is not focused on a specific storage solution but rather embraces all the most relevant solid-state memory devices and technologies currently on stage. Even the subjects dealt with in this Special Issue are widespread, ranging from process and design issues/innovations to the experimental and theoretical analysis of the operation and from the performance and reliability of memory devices and arrays to the exploitation of solid-state memories to pursue new computing paradigms

Improving Phase Change Memory (PCM) and Spin-Torque-Transfer Magnetic-RAM (STT-MRAM) as Next-Generation Memories: A Circuit Perspective

In the memory hierarchy of computer systems, the traditional semiconductor memories Static RAM (SRAM) and Dynamic RAM (DRAM) have already served for several decades as cache and main memory. With technology scaling, they face increasingly intractable challenges like power, density, reliability and scalability. As a result, they become less appealing in the multi/many-core era with ever increasing size and memory-intensity of working sets. Recently, there is an increasing interest in using emerging non-volatile memory technologies in replacement of SRAM and DRAM, due to their advantages like non-volatility, high device density, near-zero cell leakage and resilience to soft errors. Among several new memory technologies, Phase Change Memory (PCM) and Spin-Torque-Transfer Magnetic-RAM (STT-MRAM) are most promising candidates in building main memory and cache, respectively. However, both of them possess unique limitations that preventing them from being effectively adopted. In this dissertation, I present my circuit design work on tackling the limitations of PCM and STT-MRAM. At bit level, both PCM and STT-MRAM suffer from excessive write energy, and PCM has very limited write endurance. For PCM, I implement Differential Write to remove large number of unnecessary bit-writes that do not alter the stored data. It is then extended to STT-MRAM as Early Write Termination, with specific optimizations to eliminate the overhead of pre-write read. At array level, PCM enjoys high density but could not provide competitive throughput due to its long write latency and limited number of read/write circuits. I propose a Pseudo-Multi-Port Bank design to exploit intra-bank parallelism by recycling and reusing shared peripheral circuits between accesses in a time-multiplexed manner. On the other hand, although STT-MRAM features satisfactory throughput, its conventional array architecture is constrained on density and scalability by the pitch of the per-column bitline pair. I propose a Common-Source-Line Array architecture which uses a shared source-line along the row, essentially leaving only one bitline per column. For these techniques, I provide circuit level analyses as well as architecture/system level and/or process/device level discussions. In addition, relevant background and work are thoroughly surveyed and potential future research topics are discussed, offering insights and prospects of these next-generation memories

Lateral Power Mosfets Hardened Against Single Event Radiation Effects

The underlying physical mechanisms of destructive single event effects (SEE) from heavy ion radiation have been widely studied in traditional vertical double-diffused power MOSFETs (VDMOS). Recently lateral double-diffused power MOSFETs (LDMOS), which inherently provide lower gate charge than VDMOS, have become an attractive option for MHz-frequency DC-DC converters in terrestrial power electronics applications [1]. There are growing interests in extending the LDMOS concept into radiation-hard space applications. Since the LDMOS has a device structure considerably different from VDMOS, the well studied single event burn-out (SEB) or single event gate rapture (SEGR) response of VDMOS cannot be simply assumed for LDMOS devices without further investigation. A few recent studies have begun to investigate ionizing radiation effects in LDMOS devices, however, these studies were mainly focused on displacement damage and total ionizing dose (TID) effects, with very limited data reported on the heavy ion SEE response of these devices [2]-[5]. Furthermore, the breakdown voltage of the LDMOS devices in these studies was limited to less than 80 volts (mostly in the range of 20-30 volts), considerably below the voltage requirement for some space power applications. In this work, we numerically and experimentally investigate the physical insights of SEE in two different fabricated LDMOS devices designed by the author and intended for use in radiation hard applications. The first device is a 24 V Resurf LDMOS fabricated on P-type epitaxial silicon on a P+ silicon substrate. The second device is a iv much different 150 V SOI Resurf LDMOS fabricated on a 1.0 micron thick N-type silicon-on-insulator substrate with a 1.0 micron thick buried silicon dioxide layer on an N-type silicon handle wafer. Each device contains internal features, layout techniques, and process methods designed to improve single event and total ionizing dose radiation hardness. Technology computer aided design (TCAD) software was used to develop the transistor design and fabrication process of each device and also to simulate the device response to heavy ion radiation. Using these simulations in conjunction with experimentally gathered heavy ion radiation test data, we explain and illustrate the fundamental physical mechanisms by which destructive single event effects occur in these LDMOS devices. We also explore the design tradeoffs for making an LDMOS device resistant to destructive single event effects, both in terms of electrical performance and impact on other radiation hardness metric

ULTRARAM™:Design, Modelling, Fabrication and Testing of Ultra-low-power III-V Memory Devices and Arrays

In this thesis, a novel memory based on III-V compound semiconductors is studied, both theoretically and experimentally, with the aim of developing a technology with superior performance capabilities to established and emerging rival memories. This technology is known as ULTRARAM™. The memory concept is based on quantum resonant tunnelling through InAs/AlSb heterostructures, which are engineered to only allow electron tunnelling at precise energy alignment(s) when a bias is applied. The memory device features a floating gate (FG) as the storage medium, where electrons that tunnel through the InAs/AlSb heterostructure are confined in the FG to define the memory logic (0 or 1). The large conduction band offset of the InAs/AlSb heterojunction (2.1 eV) keeps electrons in the FG indefinitely, constituting a non-volatile logic state. Electrons can be removed from the FG via a similar resonant tunnelling process by reversing the voltage polarity. This concept shares similarities with flash memory, however the resonant tunnelling mechanism provides ultra-low-power, low-voltage, high-endurance and high-speed switching capability. The quantum tunnelling junction is studied in detail using the non-equilibrium Green’s function (NEGF) method. Then, Poisson-Schrödinger simulations are used to design a high-contrast readout procedure for the memory using the unusual type-III band-offset of the InAs/GaSb heterojunction. With the theoretical groundwork for the technology laid out, the memory performance is modelled and a high-density ULTRARAM™ memory architecture is proposed for random-access memory applications. Later, NEGF calculations are used for a detailed study of the process tolerances in the tunnelling region required for ULTRARAM™ large-scale wafer manufacture. Using interfacial misfit array growth techniques, III-V layers (InAs, AlSb and GaSb) for ULTRARAM™ were successfully implemented on both GaAs and Si substrates. Single devices and 2×2 arrays were then fabricated using a top-down processing approach. The memories demonstrated outstanding memory performance on both substrate materials at 10, 20 and 50 µm gate lengths at room temperature. Non-volatile switching was obtained with ≤ 2.5 V pulses, corresponding to a switching energy per unit area that is lower than DRAM and flash by factors of 100 and 1000 respectively. Memory logic was retained for over 24 hours whilst undergoing over 10^6 readout operations. Analysis of the retention data suggests a storage time exceeding 1000 years. Devices showed promising durability results, enduring over 10^7 cycles without degradation, at least two orders of magnitude improvement over flash memory. Switching of the cell’s logic was possible at 500 µs pulse durations for a 20 µm gate length, suggesting a subns switching time if scaled to modern-day feature sizes. The proposed half-voltage architecture is shown to operate in principle, where the memory state is preserved during a disturbance test of > 10^5 half-cycles. With regard to the device physics, these findings point towards ULTRARAM™ as a universal memory candidate. The path towards future commercial viability relies on process development for aggressive device and array-size scaling and implementation on larger Si wafe