Supply Current Modeling and Analysis of Deep Sub-Micron Cmos Circuits

Continued technology scaling has introduced many new challenges in VLSI design. Instantaneous switching of the gates yields high current flow through them that causes large voltage drop at the supply lines. Such high instantaneous currents and voltage drop cause reliability and performance degradation. Reliability is an issue as high magnitude of current can cause electromigration, whereas, voltage drop can slow down the circuit performance. Therefore, designing power supply lines emphasizes the need of computing maximum current through them. However, the development of digital integrated circuits in short design cycle requires accurate and fast timing and power simulation. Unfortunately, simulators that employ device modeling methods, such as HSPICE are prohibitively slow for large designs. Therefore, methods which can produce good maximum current estimates in short times are critical. In this work a compact model has been developed for maximum current estimation that speeds up the computation by orders of magnitude over the commercial tools

FPGA Architecture Optimization Using Geometric Programming

Volume 4 No 13 of the periodical Progression. Published November, February, May and August by The Radiant Healing Centre. SPCL PER BT 732 P76 V.1,1932-V.5,193

Design for manufacturing (DFM) in submicron VLSI design

As VLSI technology scales to 65nm and below, traditional communication between design and manufacturing becomes more and more inadequate. Gone are the days when designers simply pass the design GDSII file to the foundry and expect very good man¬ufacturing and parametric yield. This is largely due to the enormous challenges in the manufacturing stage as the feature size continues to shrink. Thus, the idea of DFM (Design for Manufacturing) is getting very popular. Even though there is no universally accepted definition of DFM, in my opinion, one of the major parts of DFM is to bring manufacturing information into the design stage in a way that is understood by designers. Consequently, designers can act on the information to improve both manufacturing and parametric yield. In this dissertation, I will present several attempts to reduce the gap between design and manufacturing communities: Alt-PSM aware standard cell designs, printability improve¬ment for detailed routing and the ASIC design flow with litho aware static timing analysis. Experiment results show that we can greatly improve the manufacturability of the designs and we can reduce design pessimism significantly for easier design closure

A Structured Design Methodology for High Performance VLSI Arrays

abstract: The geometric growth in the integrated circuit technology due to transistor scaling also with system-on-chip design strategy, the complexity of the integrated circuit has increased manifold. Short time to market with high reliability and performance is one of the most competitive challenges. Both custom and ASIC design methodologies have evolved over the time to cope with this but the high manual labor in custom and statistic design in ASIC are still causes of concern. This work proposes a new circuit design strategy that focuses mostly on arrayed structures like TLB, RF, Cache, IPCAM etc. that reduces the manual effort to a great extent and also makes the design regular, repetitive still achieving high performance. The method proposes making the complete design custom schematic but using the standard cells. This requires adding some custom cells to the already exhaustive library to optimize the design for performance. Once schematic is finalized, the designer places these standard cells in a spreadsheet, placing closely the cells in the critical paths. A Perl script then generates Cadence Encounter compatible placement file. The design is then routed in Encounter. Since designer is the best judge of the circuit architecture, placement by the designer will allow achieve most optimal design. Several designs like IPCAM, issue logic, TLB, RF and Cache designs were carried out and the performance were compared against the fully custom and ASIC flow. The TLB, RF and Cache were the part of the HEMES microprocessor.Dissertation/ThesisPh.D. Electrical Engineering 201

Overcoming the challenges in very deep submicron for area reduction, power reduction and faster design closure

The project is aimed at understanding the existing very deep sub-micron (VDSM) implementation of a digital design, analyzing it from the point of view of power, area and timing and to come up with solutions and strategies to optimize the implementation in terms of power, area and timing. The effort involved, to understand the constraints, reasons and the requirements resulting in the existing implementation of the design. Further, various experiments were carried out to improve the design in various aspects like power, area and timing. The tradeoffs required and the benefits of each of the experiments were contrasted and analyzed. The optimum solutions and strategies which balance the requirements were tried out and published at the end of the report