Improvement in Retention Time of Capacitorless DRAM with Access Transistor

In this paper, we propose a Junctionless (JL)/Accumulation Mode (AM) transistor with an access transistor (JL in series with JL/AM transistor) based capacitorless Dynamic Random Access Memory (1TDRAM) cell. The JL transistor overcomes the problem of ultrasharp p-n junction associated with conventional Metal-Oxide-Semiconductor (MOS) in nanoscale regime. The access transistor (AT) is utilized to reduces the leakage, and thus, improves the Retention Time (RT) and Sense Margin (SM) of the proposed capacitorless DRAM cell. Thus, the proposed DRAM cell achieved a maximum SM of ~4.6 {\mu}A/{\mu}m with RT of ~6.5 s for a gate length (Lg) of 100nm. Further, this topology shows better gate length scalability with a fixed gate length of AT and achieves RT of ~100 ms and ~10 ms for a scaled gate length of 10 nm at 27 {\deg}C and 85 {\deg}C, respectively

Cryogenic Memory Technologies

The surging interest in quantum computing, space electronics, and superconducting circuits has led to new developments in cryogenic data storage technology. Quantum computers promise to far extend our processing capabilities and may allow solving currently intractable computational challenges. Even with the advent of the quantum computing era, ultra-fast and energy-efficient classical computing systems are still in high demand. One of the classical platforms that can achieve this dream combination is superconducting single flux quantum (SFQ) electronics. A major roadblock towards implementing scalable quantum computers and practical SFQ circuits is the lack of suitable and compatible cryogenic memory that can operate at 4 Kelvin (or lower) temperature. Cryogenic memory is also critically important in space-based applications. A multitude of device technologies have already been explored to find suitable candidates for cryogenic data storage. Here, we review the existing and emerging variants of cryogenic memory technologies. To ensure an organized discussion, we categorize the family of cryogenic memory platforms into three types: superconducting, non-superconducting, and hybrid. We scrutinize the challenges associated with these technologies and discuss their future prospects.Comment: 21 pages, 6 figures, 1 tabl

Advances in Solid State Circuit Technologies

This book brings together contributions from experts in the fields to describe the current status of important topics in solid-state circuit technologies. It consists of 20 chapters which are grouped under the following categories: general information, circuits and devices, materials, and characterization techniques. These chapters have been written by renowned experts in the respective fields making this book valuable to the integrated circuits and materials science communities. It is intended for a diverse readership including electrical engineers and material scientists in the industry and academic institutions. Readers will be able to familiarize themselves with the latest technologies in the various fields

Extended analysis of the Z2-FET: Operation as capacitor-less eDRAM

This article has been accepted for publication by IEEE "Navarro Moral, C.; et al. Extended analysis of the Z2-FET: Operation as capacitor-less eDRAM. IEEE Transactions on Electron Devices, 64(11): 4486-4491 (2017). DOI: 10.1109/TED.2017.2751141(c) 2017 IEEE. Personal use of this material is permitted. Permission from IEEE must be obtained for all other users, including reprinting/ republishing this material for advertising or promotional purposes, creating new collective works for resale or redistribution to servers or lists, or reuse of any copyrighted components of this work in other works."The Z2-FET operation as capacitorless DRAM is analyzed using advanced 2-D TCAD simulations for IoT applications. The simulated architecture is built based on actual 28-nm fully depleted silicon-on-insulator devices. It is found that the triggering mechanism is dominated by the front-gate bias and the carrier’s diffusion length. As in other FB-DRAMs, the memory window is defined by the ON voltage shift with the stored body charge. However, the Z2-FET’s memory state is not exclusively defined by the inner charge but also by the reading conditions

Caractérisation, mécanismes et applications mémoire des transistors avancés sur SOI

Ce travail présente les principaux résultats obtenus avec une large gamme de dispositifs SOI avancés, candidats très prometteurs pour les futurs générations de transistors MOSFETs. Leurs propriétés électriques ont été analysées par des mesures systématiques, agrémentées par des modèles analytiques et/ou des simulations numériques. Nous avons également proposé une utilisation originale de dispositifs FinFETs fabriqués sur ONO enterré en fonctionnalisant le ONO à des fins d'application mémoire non volatile, volatile et unifiées. Après une introduction sur l'état de l'art des dispositifs avancés en technologie SOI, le deuxième chapitre a été consacré à la caractérisation détaillée des propriétés de dispositifs SOI planaires ultra- mince (épaisseur en dessous de 7 nm) et multi-grille. Nous avons montré l excellent contrôle électrostatique par la grille dans les transistors très courts ainsi que des effets intéressants de transport et de couplage. Une approche similaire a été utilisée pour étudier et comparer des dispositifs FinFETs à double grille et triple grille. Nous avons démontré que la configuration FinFET double grille améliore le couplage avec la grille arrière, phénomène important pour des applications à tension de seuil multiple. Nous avons proposé des modèles originaux expliquant l'effet de couplage 3D et le comportement de la mobilité dans des TFTs nanocristallin ZnO. Nos résultats ont souligné les similitudes et les différences entre les transistors SOI et à base de ZnO. Des mesures à basse température et de nouvelles méthodes d'extraction ont permis d'établir que la mobilité dans le ZnO et la qualité de l'interface ZnO/SiO2 sont remarquables. Cet état de fait ouvre des perspectives intéressantes pour l'utilisation de ce type de matériaux aux applications innovantes de l'électronique flexible. Dans le troisième chapitre, nous nous sommes concentrés sur le comportement de la mobilité dans les dispositifs SOI planaires et FinFET en effectuant des mesures de magnétorésistance à basse température. Nous avons mis en évidence expérimentalement un comportement de mobilité inhabituel (multi-branche) obtenu lorsque deux ou plusieurs canaux coexistent et interagissent. Un autre résultat original concerne l existence et l interprétation de la magnétorésistance géométrique dans les FinFETs.L'utilisation de FinFETs fabriqués sur ONO enterré en tant que mémoire non volatile flash a été proposée dans le quatrième chapitre. Deux mécanismes d'injection de charge ont été étudiés systématiquement. En plus de la démonstration de la pertinence de ce type mémoire en termes de performances (rétention, marge de détection), nous avons mis en évidence un comportement inattendu : l amélioration de la marge de détection pour des dispositifs à canaux courts. Notre concept innovant de FinFlash sur ONO enterré présente plusieurs avantages: (i) opération double-bit et (ii) séparation de la grille de stockage et de l'interface de lecture augmentant la fiabilité et autorisant une miniaturisation plus poussée que des Finflash conventionnels avec grille ONO.Dans le dernier chapitre, nous avons exploré le concept de mémoire unifiée, en combinant les opérations non volatiles et 1T-DRAM par le biais des FinFETs sur ONO enterré. Comme escompté pour les mémoires dites unifiées, le courant transitoire en mode 1T-DRAM dépend des charges non volatiles stockées dans le ONO. D'autre part, nous avons montré que les charges piégées dans le nitrure ne sont pas perturbées par les opérations de programmation et lecture de la 1T-DRAM. Les performances de cette mémoire unifiée multi-bits sont prometteuses et pourront être considérablement améliorées par optimisation technologique de ce dispositif.The evolution of electronic systems and portable devices requires innovation in both circuit design and transistor architecture. During last fifty years, the main issue in MOS transistor has been the gate length scaling down. The reduction of power consumption together with the co-integration of different functions is a more recent avenue. In bulk-Si planar technology, device shrinking seems to arrive at the end due to the multiplication of parasitic effects. The relay has been taken by novel SOI-like device architectures. In this perspective, this manuscript presents the main achievements of our work obtained with a variety of advanced fully depleted SOI MOSFETs, which are very promising candidates for next generation MOSFETs. Their electrical properties have been analyzed by systematic measurements and clarified by analytical models and/or simulations. Ultimately, appropriate applications have been proposed based on their beneficial features.In the first chapter, we briefly addressed the short-channel effects and the diverse technologies to improve device performance. The second chapter was dedicated to the detailed characterization and interesting properties of SOI devices. We have demonstrated excellent gate control and high performance in ultra-thin FD SOI MOSFET. The SCEs are efficiently suppressed by decreasing the body thickness below 7 nm. We have investigated the transport and electrostatic properties as well as the coupling mechanisms. The strong impact of body thickness and temperature range has been outlined. A similar approach was used to investigate and compare vertical double-gate and triple-gate FinFETs. DG FinFETs show enhanced coupling to back-gate bias which is applicable and suitable for dynamic threshold voltage tuning. We have proposed original models explaining the 3D coupling effect in FinFETs and the mobility behavior in ZnO TFTs. Our results pointed on the similarities and differences in SOI and ZnO transistors. According to our low-temperature measurements and new promoted extraction methods, the mobility in ZnO and the quality of ZnO/SiO2 interface are respectable, enabling innovating applications in flexible, transparent and power electronics. In the third chapter, we focused on the mobility behavior in planar SOI and FinFET devices by performing low-temperature magnetoresistance measurements. Unusual mobility curve with multi-branch aspect were obtained when two or more channels coexist and interplay. Another original result in the existence of the geometrical magnetoresistance in triple-gate and even double-gate FinFETs.The operation of a flash memory in FinFETs with ONO buried layer was explored in the forth chapter. Two charge injection mechanisms were proposed and systematically investigated. We have discussed the role of device geometry and temperature. Our novel ONO FinFlash concept has several distinct advantages: double-bit operation, separation of storage medium and reading interface, reliability and scalability. In the final chapter, we explored the avenue of unified memory, by combining nonvolatile and 1T-DRAM operations in a single transistor. The key result is that the transient current, relevant for 1T-DRAM operation, depends on the nonvolatile charges stored in the nitride buried layer. On the other hand, the trapped charges are not disturbed by the 1T-DRAM operation. Our experimental data offers the proof-of-concept for such advanced memory. The performance of the unified/multi-bit memory is already decent but will greatly improve in the coming years by processing dedicated devices.SAVOIE-SCD - Bib.électronique (730659901) / SudocGRENOBLE1/INP-Bib.électronique (384210012) / SudocGRENOBLE2/3-Bib.électronique (384219901) / SudocSudocFranceF

Tunnel Field Effect Transistors:from Steep-Slope Electronic Switches to Energy Efficient Logic Applications

The aim of this work has been the investigation of homo-junction Tunnel Field Effect Transistors starting from a compact modelling perspective to its possible applications. Firstly a TCAD based simulation study is done to explain the main device characteristics. The main differences of a Tunnel FET with respect to a conventional MOSFET is pointed out and the differences have been explained. A compact DC/AC model has been developed which is capable of describing the I-V characteristics in all regimes of operation. The model takes in to account ambi-polarity, drain side breakdown and all tunneling related physics. A temperature dependence is also added to the model to study the temperature independent behavior of tunneling. The model was further implemented in a Verilog-A based circuit simulator. Following calibration to experimental results of Silicon and strained-Silicon TFETs, the model has been also used to benchmark against a standard CMOS node for digital and analog applications. The circuits built with Tunnel FETs showed interesting temperature behavior which was superior to the compared CMOS node. In the same work, we also explore and propose solutions for using TFETs for low power memory applications. Both volatile and non-volatile memory concepts are investigated and explored. The application of a Tunnel FET as a capacitor-less memory has been experimentally demonstrated for the first time. New device concepts have been proposed and process flows for the same are developed to realize them in the clean room in EPFL

신경계 모방 시스템을 위한 실리콘 기반 시냅스 모방 트랜지스터

학위논문 (박사)-- 서울대학교 대학원 : 전기·컴퓨터공학부, 2017. 2. 박병국.Current computing systems based on the von Neumann architecture suffer from the fact that serious leakage current issues have risen up in nanoscale devices. Neuromorphic computing system has been believed to solve fundamental challenges in current computing system by mimicking a biological nervous system, especially in terms of parallel signal processing. Synaptic devices are considered as the one of the most important parts of neuromorphic systems because a biological synapse is thought to control signal transmissions and memory effects in our nervous system. However, the memristor, one of the strongest candidates for an artificial synapse, requires additional switching parts in order to transfer and receive signals using the same electrode, leading to extra overheads that may compromise the advantages of massive parallelism inherent in neuromorphic systems. In this dissertation, a silicon-based synaptic transistor with asymmetric dual-gate structure is investigated. The structural feature enables the synaptic transistors to interact with both pre- and post-synaptic neuron circuits directly. A TCAD device simulator and a circuit simulator are used to verify its synaptic learning properties and study its mechanism fundamentally. After verifying all the fabrication flow using a process simulator, the synaptic transistors are fabricated through process techniques including two-step CMP processes. The electrical and synaptic characteristics of the fabricated devices are measured with a semiconductor parameter analyzer, and a device model is created based on the measured data. Furthermore, spiking neural network composed of them is verified systematically using the device model. From the simulation study and electrical measurement, synaptic learning rules are observed in the synaptic transistors including the transition from short-term to long-term memory and spike-timing dependent plasticity. In addition, the spiking neural network composed of the synaptic transistors boasted its ability of pattern recognition using MNIST data set. The total recognition accuracy of the hardware-based neural network system having 784 input nodes and 10 output nodes is improved to nearly 70% by adding inhibitory synapses. These results indicate that the synaptic transistor studied in this dissertation can be used as a synaptic device in neuromorphic systems thanks to its direct connectability with neuron circuits and synaptic learning properties.Chapter 1. Introduction 1 1.1. Fundamental Challenges in Current Computing System 1 1.2. Neurobiological Background 4 1.2.1. Synaptic Transmission 4 1.2.2. Short-Tem and Long-Term Memory 7 1.2.3. Spike-Timing Dependent Plasiticity 9 1.3. Neuromorphic Computing 12 1.4. Outline of the Dissertation 17 Chapter 2. Silicon-Based Synaptic Transistor 18 2.1. Device Configuration 18 2.2. Device Simulation Study 20 2.2.1. Transition from Short-Term to Long-Term Memory 21 2.2.2. Spike-Timing Dependent Plasticity Characteristics 28 2.3. Circuit Simulation Study 30 Chapter 3. Device Fabrication 34 3.1. Process Design and Fabrication Flow 34 3.2. Experimental Results 41 3.2.1. Deposition of Hard Mask and Patterning 41 3.2.2. Formation of G1 through CMP 44 3.2.3. Removal of Hard Mask 46 3.2.4. Fin Channel Formation Using Sidewall Spacer 48 3.2.5. Gate Splitting through CMP and Etchback Processes 50 Chapter 4. Device Characteristics 52 4.1. Field-Effect Transistor Characteristics 52 4.2. Synaptic Learning Properties 54 4.2.1. Transition from Short-Term to Long-Term Memory 54 4.2.2. Spike-Timing Dependent Plasticity Characteristics 58 Chapter 5. System Level Simulation 64 5.1. Hardware-Based Spiking Neural Network 64 5.2. Transferred Synaptic Weights from ANN Using ReLU 69 5.3. Addition of Inhibitory Synapse Part 73 Chapter 6. Conclusion 78 6.1. Review of Overall Work 78 6.2. Future Work 80 Appendix A. Multi-Threshold Voltages in Ultra Thin Body Devices by Asymmetric Dual-Gate Structure 82 Appendix B. Asymmetric Dual-Gate-Structured 1-T DRAM Cell for Retention Characteristics Improvement 90 Appendix C. A Single Memory Cell with Voltaile and Non-Volatile Memory Functions 101 Bibliography 109 Abstract in Korean 133Docto

Dynamic fine-grain body biasing of caches with latency and leakage 3T1D-based monitors

In this paper, we propose a dynamically tunable fine-grain body biasing mechanism to reduce active & standby leakage power in caches under process variations.Preprin

Memristive Non-Volatile Memory Based on Graphene Materials

Resistive random access memory (RRAM), which is considered as one of the most promising next-generation non-volatile memory (NVM) devices and a representative of memristor technologies, demonstrated great potential in acting as an artificial synapse in the industry of neuromorphic systems and artificial intelligence (AI), due its advantages such as fast operation speed, low power consumption, and high device density. Graphene and related materials (GRMs), especially graphene oxide (GO), acting as active materials for RRAM devices, are considered as a promising alternative to other materials including metal oxides and perovskite materials. Herein, an overview of GRM-based RRAM devices is provided, with discussion about the properties of GRMs, main operation mechanisms for resistive switching (RS) behavior, figure of merit (FoM) summary, and prospect extension of GRM-based RRAM devices. With excellent physical and chemical advantages like intrinsic Young’s modulus (1.0 TPa), good tensile strength (130 GPa), excellent carrier mobility (2.0 × 105 cm2∙V−1∙s−1), and high thermal (5000 Wm−1∙K−1) and superior electrical conductivity (1.0 × 106 S∙m−1), GRMs can act as electrodes and resistive switching media in RRAM devices. In addition, the GRM-based interface between electrode and dielectric can have an effect on atomic diffusion limitation in dielectric and surface effect suppression. Immense amounts of concrete research indicate that GRMs might play a significant role in promoting the large-scale commercialization possibility of RRAM devices

Dispositifs innovants à pente sous le seuil abrupte (du TEFT au Z -FET)

Tunnel à effet de champ (TFET) et un nouveau composant MOS à rétroaction que nous avons nommé le Z2-FET.Le Z2-FET est envisagé pour la logique faible consommation et pour les applications mémoire compatibles avecles technologies CMOS avancées. Nous avons étudié de manière systématique des TFETs avec différents oxydesde grille, matériaux et structures de canal, fabriqués sur silicium sur isolant totalement déserté (FDSOI). Lesmesures de bruit à basse fréquence (LFN) sur TFETs montrent la prédominance d'un signal aléatoiretélégraphique (RTS), qui révèle sans ambiguïté le mécanisme d effet tunnel. Un modèle analytique combinantl effet tunnel et le transport dans le canal a été développé, montrant un bon accord entre les résultatsexpérimentaux et les simulations.Nous avons conçu et démontré un nouveau dispositif (Z2-FET, pour pente sous le seuil verticale et zéroionisation par impact), qui présente une commutation extrêmement abrupte (moins de 1 mV par décade decourant), avec un rapport ION / IOFF >109, un large effet de hystérésis et un potentiel de miniaturisation jusqu'à 20nm. La simulation TCAD a été utilisée pour confirmer que la commutation électrique du Z2-FET fonctionne parl'intermédiaire de rétroaction entre les flux des électrons et trous et leurs barrières d'injection respectives. LeZ2-FET est idéalement adapté pour des applications mémoire à un transistor. La mémoire DRAM basée sur leZ2-FET montre des performances très bonnes, avec des tensions d'alimentation jusqu'à 1,1 V, des temps derétention jusqu'à 5,5 s et des vitesses d'accès atteignant 1 ns. Une mémoire SRAM utilisant un seul Z -FET estégalement démontrée sans nécessité de rafraichissement de l information stockée.Notre travail sur le courant GIDL intervenant dans les MOSFETs de type FDSOI a été combiné avec leTFET afin de proposer une nouvelle structure de TFETs optimisés, basée sur l'amplification bipolaire du couranttunnel. Les simulations de nouveau dispostif à injection tunnel amélioré par effet bipolaire (BET-FET) montrentdes résultats prometteurs, avec des ION supérierus à 4mA/ m et des pentes sous le seuil SS inférieures à 60mV/dec sur plus de sept décades de courant, surpassant tous les TFETs silicium rapportés à ce jour.La thèse se conclut par les directions de recherche futures dans le domaine des dispositifs à pente sous leseuil abrupte.This thesis is dedicated to studying sharp switching devices, including the tunneling field-effect-transistor(TFET) and a new feedback device we have named the Z2-FET, for low power logic and memory applicationscompatible with modern silicon technology. We have extensively investigated TFETs with various gate oxides,channel materials and structures, fabricated on fully-depleted silicon-on-insulator (FD-SOI) substrates.Low-frequency noise (LFN) measurements were performed on TFETs, showing the dominance of randomtelegraphy signal (RTS) noise, which reveals the tunneling mechanism. An analytical TFET model combiningtunneling and channel transport has been developed, showing agreement with the experimental and simulationresults.We also conceived and demonstrated a new device named the Z2-FET (for zero subthreshold swing andzero impact ionization), which exhibits extremely sharp switching with subthreshold swing SS 4.10-3 A/ mand SS < 60 mV/dec over 7 decades of current, outperforming all silicon-compatible TFETs reported to date.The thesis concludes with future research directions in the sharp-switching device arena.SAVOIE-SCD - Bib.électronique (730659901) / SudocGRENOBLE1/INP-Bib.électronique (384210012) / SudocGRENOBLE2/3-Bib.électronique (384219901) / SudocSudocFranceF