Carbon nanotubes as interconnect for next generation network on chip

Multi-core processors provide better performance when compared with their single-core equivalent. Recently, Networks-on-Chip (NoC) have emerged as a communication methodology for multi core chips. Network-on-Chip uses packet based communication for establishing a communication path between multiple cores connected via interconnects. Clock frequency, energy consumption and chip size are largely determined by these interconnects. According to the International Technology Roadmap for Semiconductors (ITRS), in the next five years up to 80% of microprocessor power will be consumed by interconnects. In the sub 100nm scaling range, interconnect behavior limits the performance and correctness of VLSI systems. The performance of copper interconnects tend to get reduced in the sub 100nm range and hence we need to examine other interconnect options. Single Wall Carbon Nanotubes exhibit better performance in sub 100nm processing technology due to their very large current carrying capacity and large electron mean free paths. This work suggests using Single Wall Carbon Nanotubes (SWCNT) as interconnects for Networks-on-Chip as they consume less energy and gives more throughput and bandwidth when compared with traditional Copper wires

HIGH PERFORMANCE CLOCK DISTRIBUTION FOR HIGH-SPEED VLSI SYSTEMS

Tohoku University堀口 進課

Extending systems-on-chip to the third dimension : performance, cost and technological tradeoffs.

Because of the today's market demand for high-performance, high-density portable hand-held applications, electronic system design technology has shifted the focus from 2-D planar SoC single-chip solutions to different alternative options as tiled silicon and single-level embedded modules as well as 3-D integration. Among the various choices, finding an optimal solution for system implementation dealt usually with cost, performance and other technological trade-off analysis at the system conceptual level. It has been identified that the decisions made within the first 20% of the total design cycle time will ultimately result up to 80% of the final product cost. In this paper, we discuss appropriate and realistic metric for performance and cost trade-off analysis both at system conceptual level (up-front in the design phase) and at implementation phase for verification in the three-dimensional integration. In order to validate the methodology, two ubiquitous electronic systems are analyzed under various implementation schemes and discuss the pros and cons of each of them

Limits on Fundamental Limits to Computation

An indispensable part of our lives, computing has also become essential to industries and governments. Steady improvements in computer hardware have been supported by periodic doubling of transistor densities in integrated circuits over the last fifty years. Such Moore scaling now requires increasingly heroic efforts, stimulating research in alternative hardware and stirring controversy. To help evaluate emerging technologies and enrich our understanding of integrated-circuit scaling, we review fundamental limits to computation: in manufacturing, energy, physical space, design and verification effort, and algorithms. To outline what is achievable in principle and in practice, we recall how some limits were circumvented, compare loose and tight limits. We also point out that engineering difficulties encountered by emerging technologies may indicate yet-unknown limits.Comment: 15 pages, 4 figures, 1 tabl

Design Methodologies and Architecture Solutions for High-Performance Interconnects

ABSTRACT In Deep Sub-Micron (DSM) technologies, interconnects play a crucial role in the correct functionality and largely impact the performance of complex System-on-Chip (SoC) designs. For technologies of 0.25µm and below, wiring capacitance dominates gate capacitance, thus rapidly increasing the interconnect-induced delay. Moreover, the coupling capacitance becomes a significant portion of the on-chip total wiring capacitance, and coupling between adjacent wires cannot be considered as a second-order effect any longer. As a consequence, the traditional top-down design methodology is ineffective, since the actual wiring delays can be computed only after layout parasitic extraction, when the physical design is completed. Fixing all the timing violations often requires several time-consuming iterations of logical and physical design, and it is essentially a trial-and-error approach. Increasingly tighter time-to-market requirements dictate that interconnect parasitics must be taken into account during all phases of the design flow, at different level of abstractions. However, given the aggressive technology scaling trends and the growing design complexity, this approach will only temporarily ameliorate the interconnect problem. We believe that in order to achieve gigascale designs in the nanometer regime, a novel design paradigm, based on new forms of regularity and newly created IP (Intellectual Property) blocks must be developed, to provide a direct path from system-level architectural exploration to physical implementation

Interconnects for future technology generations - conventional CMOS with copper/low-k and beyond

The limitations of the conventional Cu/low-k interconnect technology for use in future ultra-scaled integrated circuits down to 7 nm in the year 2020 are investigated from the power/performance point of view. Compact models are used to demonstrate the impacts of various interconnect process parameters, for instance, the interconnect barrier/liner bilayer thickness and aspect ratio, on the design and optimization of a multilevel interconnect network. A framework to perform a sensitivity analysis for the circuit behavior to interconnect process parameters is created for future FinFET CMOS technology nodes. Multiple predictive cell libraries down to the 7‒nm technology node are constructed to enable early investigation of the electronic chip performance using commercial electronic design automation (EDA) tools with real chip information. Findings indicated new opportunities that arise for emerging novel interconnect technologies from the materials and process perspectives. These opportunities are evaluated based on potential benefits that are quantified with rigorous circuit-level simulations and requirements for key parameters are underlined. The impacts of various emerging interconnect technologies on the performances of emerging devices are analyzed to quantify the realistic circuit- and system-level benefits that these new switches can offer.Ph.D

Fast 3D Integrated Circuit Placement Methodology using Merging Technique

In the recent years the advancement in the field of microelectronics integrated circuit (IC) design technologies proved to be a boon for design and development of various advanced systems in-terms of its reduction in form factor, low power, high speed and with increased capacity to incorporate more designs. These systems provide phenomenal advantage for armoured fighting vehicle (AFV) design to develop miniaturised low power, high performance sub-systems. One such emerging high-end technology to be used to develop systems with high capabilities for AFVs is discussed in this paper. Three dimensional IC design is one of the emerging field used to develop high density heterogeneous systems in a reduced form factor. A novel grouping based partitioning and merge based placement (GPMP) methodology for 3D ICs to reduce through silicon vias (TSVs) count and placement time is proposed. Unlike state-of-the-art techniques, the proposed methodology does not suffer from initial overlap of cells during intra-layer placement which reduces the placement time. Connectivity based grouping and partitioning ensures less number of TSVs and merge based placement further reduces intra layer wire-length. The proposed GPMP methodology has been extensively against the IBMPLACE database and performance has been compared with the latest techniques resulting in 12 per cent improvement in wire-length, 13 per cent reduction in TSV and 1.1x improvement in placement time