Negative Bias Temperature Instability (NBTI) Monitoring and Mitigation Technique for MOSFET

修士論

DEEP SUBMICRON CMOS VLSI CIRCUIT RELIABILITY MODELING, SIMULATION AND DESIGN

CMOS VLSI circuit reliability modeling and simulation have attracted intense research interest in the last two decades, and as a result almost all IC Design For Reliability (DFR) tools now try to incrementally simulate device wearout mechanisms in iterative ways. These DFR tools are capable of accurately characterizing the device wearout process and predicting its impact on circuit performance. Nevertheless, excessive simulation time and tedious parameter testing process often limit popularity of these tools in product design and fabrication. This work develops a new SPICE reliability simulation method that shifts the focus of reliability analysis from device wearout to circuit functionality. A set of accelerated lifetime models and failure equivalent circuit models are proposed for the most common MOSFET intrinsic wearout mechanisms, including Hot Carrier Injection (HCI), Time Dependent Dielectric Breakdown (TDDB), and Negative Bias Temperature Instability (NBTI). The accelerated lifetime models help to identify the most degraded transistors in a circuit in terms of the device's terminal voltage and current waveforms. Then corresponding failure equivalent circuit models are incorporated into the circuit to substitute these identified transistors. Finally, SPICE simulation is performed again to check circuit functionality and analyze the impact of device wearout on circuit operation. Device wearout effects are lumped into a very limited number of failure equivalent circuit model parameters, and circuit performance degradation and functionality are determined by the magnitude of these parameters. In this new method, it is unnecessary to perform a large number of small-step SPICE simulation iterations. Therefore, simulation time is obviously shortened in comparison to other tools. In addition, a reduced set of failure equivalent circuit model parameters, rather than a large number of device SPICE model parameters, need to be accurately characterized at each interim wearout process. Thus device testing and parameter extraction work are also significantly simplified. These advantages will allow circuit designers to perform quick and efficient circuit reliability analyses and to develop practical guidelines for reliable electronic designs

Negative Bias Temperature Instability And Charge Trapping Effects On Analog And Digital Circuit Reliability

Nanoscale p-channel transistors under negative gate bias at an elevated temperature show threshold voltage degradation after a short period of stress time. In addition, nanoscale (45 nm) n-channel transistors using high-k (HfO2) dielectrics to reduce gate leakage power for advanced microprocessors exhibit fast transient charge trapping effect leading to threshold voltage instability and mobility reduction. A simulation methodology to quantify the circuit level degradation subjected to negative bias temperature instability (NBTI) and fast transient charge trapping effect has been developed in this thesis work. Different current mirror and two-stage operation amplifier structures are studied to evaluate the impact of NBTI on CMOS analog circuit performances for nanoscale applications. Fundamental digital circuit such as an eleven-stage ring oscillator has also been evaluated to examine the fast transient charge transient effect of HfO2 high-k transistors on the propagation delay of ring oscillator performance. The preliminary results show that the negative bias temperature instability reduces the bandwidth of CMOS operating amplifiers, but increases the amplifier\u27s voltage gain at mid-frequency range. The transient charge trapping effect increases the propagation delay of ring oscillator. The evaluation methodology developed in this thesis could be extended to study other CMOS device and circuit reliability issues subjected to electrical and temperature stresses

Negative Bias Temperature Instability And Charge Trapping Effects On Analog And Digital Circuit Reliability

Nanoscale p-channel transistors under negative gate bias at an elevated temperature show threshold voltage degradation after a short period of stress time. In addition, nanoscale (45 nm) n-channel transistors using high-k (HfO2) dielectrics to reduce gate leakage power for advanced microprocessors exhibit fast transient charge trapping effect leading to threshold voltage instability and mobility reduction. A simulation methodology to quantify the circuit level degradation subjected to negative bias temperature instability (NBTI) and fast transient charge trapping effect has been developed in this thesis work. Different current mirror and two-stage operation amplifier structures are studied to evaluate the impact of NBTI on CMOS analog circuit performances for nanoscale applications. Fundamental digital circuit such as an eleven-stage ring oscillator has also been evaluated to examine the fast transient charge transient effect of HfO2 high-k transistors on the propagation delay of ring oscillator performance. The preliminary results show that the negative bias temperature instability reduces the bandwidth of CMOS operating amplifiers, but increases the amplifier\u27s voltage gain at mid-frequency range. The transient charge trapping effect increases the propagation delay of ring oscillator. The evaluation methodology developed in this thesis could be extended to study other CMOS device and circuit reliability issues subjected to electrical and temperature stresses

The impact of repetitive unclamped inductive switching on the electrical parameters of low-voltage trench power nMOSFETs

The impact of hot-carrier injection (HCI) due to repetitive unclamped inductive switching (UIS) on the electrical performance of low-voltage trench power n-type MOSFETs (nMOSFETs) is assessed. Trench power nMOSFETs with 20- and 30-V breakdown voltage ratings in TO-220 packages have been fabricated and subjected to over 100 million cycles of repetitive UIS with different avalanche currents IAV at a mounting base temperature TMB of 150°C. Impact ionization during avalanche conduction in the channel causes hot-hole injection into the gate dielectric, which results in a reduction of the threshold voltage VGSTX, as the number of avalanche cycles N increases. The experimental data reveal a power-law relationship between the change in the threshold voltage ΔVGSTX and N. The results show that the power-law prefactor is directly proportional to the avalanche current. After 100 million cycles, it was observed in the 20-V rated MOSFETs that the power-law prefactor increased by 30% when IAV was increased from 160 to 225 A, thereby approximating a linear relationship. A stable subthreshold slope with avalanche cycling indicates that interface trap generation may not be an active degradation mechanism. The impact of the cell pitch on avalanche ruggedness is also investigated by testing 2.5- and 4- m cell-pitch 30-V rated MOSFETs. Measurements showed that the power-law prefactor reduced by 40% when the cell pitch was reduced by 37.5%. The improved VGSTX stability with the smaller cell-pitch MOSFETs is attributed to a lower avalanche current per unit cell resulting in less hot-hole injection and, hence, smaller VGSTX shift. The 2.5-m cell-pitch MOSFETs also show 25% improved on -state resistance RDSON, better RDSON stability, and 20% less subthreshold slope compared with the 4-m cell-pitch MOSFETs, although with 100% higher initial IDSS and less IDSS stability with avalanche cycling. These results are important for manufacturers of automotive MOSFETs where multiple avalanche occurrences over the lifetime of the MOSFET are expected

Two dimensional quantum and reliability modelling for lightly doped nanoscale devices

The downscaling of MOSFET devices leads to well-studied short channel effects and more complex quantum mechanical effects. Both quantum and short channel effects not only alter the performance but they also affect the reliability. This continued scaling of the MOS device gate length puts a demand on the reduction of the gate oxide thickness and the substrate doping density. Quantum mechanical effects give rise to the quantization of energy in the conduction band, which consequently creates a larger effective bandgap and brings a displacement of the inversion layer charge out of the Si/SiO2 interface. Such a displacement of charge is equivalent to an increase in the effective oxide layer thickness, a growth in the threshold voltage, and a decrease in the current level. Therefore, using the classical analysis approach without including the quantum effects may lead to perceptible errors in the prognosis of the performance of modern deep submicron devices. In this work, compact Verilog-A compatible 2D models including quantum short channel effects and confinement for the potential, threshold voltage, and the carrier charge sheet density for symmetrical lightly doped double-gate MOSFETs are developed. The proposed models are not only applicable to ultra-scaled devices but they have also been derived from analytical 2D Poisson and 1D Schrodinger equations including 2D electrostatics, in order to incorporate quantum mechanical effects. Electron and hole quasi-Fermi potential effects were considered. The models were further enhanced to include negative bias temperature instability (NBTI) in order to assess the reliability of the device. NBTI effects incorporated into the models constitute interface state generation and hole-trapping. The models are continuous and have been verified by comparison with COMSOL and BALMOS numerical simulations for channel lengths down to 7nm; very good agreement within ±5% has been observed for silicon thicknesses ranging from 3nm to 20nm at 1 GHz operation after 10 years

ランダム・テレグラフ・ノイズの微細MOSFETへの影響に関する研究

筑波大学 (University of Tsukuba)201

Multi-criteria optimization for energy-efficient multi-core systems-on-chip

The steady down-scaling of transistor dimensions has made possible the evolutionary progress leading to today’s high-performance multi-GHz microprocessors and core based System-on-Chip (SoC) that offer superior performance, dramatically reduced cost per function, and much-reduced physical size compared to their predecessors. On the negative side, this rapid scaling however also translates to high power densities, higher operating temperatures and reduced reliability making it imperative to address design issues that have cropped up in its wake. In particular, the aggressive physical miniaturization have increased CMOS fault sensitivity to the extent that many reliability constraints pose threat to the device normal operation and accelerate the onset of wearout-based failures. Among various wearout-based failure mechanisms, Negative biased temperature instability (NBTI) has been recognized as the most critical source of device aging. The urge of reliable, low-power circuits is driving the EDA community to develop new design techniques, circuit solutions, algorithms, and software, that can address these critical issues. Unfortunately, this challenge is complicated by the fact that power and reliability are known to be intrinsically conflicting metrics: traditional solutions to improve reliability such as redundancy, increase of voltage levels, and up-sizing of critical devices do contrast with traditional low-power solutions, which rely on compact architectures, scaled supply voltages, and small devices. This dissertation focuses on methodologies to bridge this gap and establishes an important link between low-power solutions and aging effects. More specifically, we proposed new architectural solutions based on power management strategies to enable the design of low-power, aging aware cache memories. Cache memories are one of the most critical components for warranting reliable and timely operation. However, they are also more susceptible to aging effects. Due to symmetric structure of a memory cell, aging occurs regardless of the fact that a cell (or word) is accessed or not. Moreover, aging is a worst-case matric and line with worst-case access pattern determines the aging of the entire cache. In order to stop the aging of a memory cell, it must be put into a proper idle state when a cell (or word) is not accessed which require proper management of the idleness of each atomic unit of power management. We have proposed several reliability management techniques based on the idea of cache partitioning to alleviate NBTI-induced aging and obtain joint energy and lifetime benefits. We introduce graceful degradation mechanism which allows different cache blocks into which a cache is partitioned to age at different rates. This implies that various sub-blocks become unreliable at different times, and the cache keeps functioning with reduced efficiency. We extended the capabilities of this architecture by integrating the concept of reconfigurable caches to maintain the performance of the cache throughout its lifetime. By this strategy, whenever a block becomes unreliable, the remaining cache is reconfigured to work as a smaller size cache with only a marginal degradation of performance. Many mission-critical applications require guaranteed lifetime of their operations and therefore the hardware implementing their functionality. Such constraints are usually enforced by means of various reliability enhancing solutions mostly based on redundancy which are not energy-friendly. In our work, we have proposed a novel cache architecture in which a smart use of cache partitions for redundancy allows us to obtain cache that meet a desired lifetime target with minimal energy consumption

Impact of aging on the soft error rate of 6T SRAM for planar and bulk technologies

This paper evaluates the impact of aging on the radiation sensitivity of 6T SRAMfor two planar bulk technologies. This study ismotivated by the growing impact of aging and radiation effects on the reliability of CMOS technology. Amodelling methodology dedicated to this newphenomenon is proposed. Thismodelling uses the radiation modelling device MUSCA SEP3 and an electrical aging modelling. First, the impact of aging on SEE sensitivity is studied through a parametric modeling of the threshold voltages of the transistors composing the 6T SRAM. Then, an operative avionics environment is modelled in order to evaluate the consequences on reliability