4,335 research outputs found

    A survey of carbon nanotube interconnects for energy efficient integrated circuits

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    This article is a review of the state-of-art carbon nanotube interconnects for Silicon application with respect to the recent literature. Amongst all the research on carbon nanotube interconnects, those discussed here cover 1) challenges with current copper interconnects, 2) process & growth of carbon nanotube interconnects compatible with back-end-of-line integration, and 3) modeling and simulation for circuit-level benchmarking and performance prediction. The focus is on the evolution of carbon nanotube interconnects from the process, theoretical modeling, and experimental characterization to on-chip interconnect applications. We provide an overview of the current advancements on carbon nanotube interconnects and also regarding the prospects for designing energy efficient integrated circuits. Each selected category is presented in an accessible manner aiming to serve as a survey and informative cornerstone on carbon nanotube interconnects relevant to students and scientists belonging to a range of fields from physics, processing to circuit design

    A long constraint length VLSI Viterbi decoder for the DSN

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    A Viterbi decoder, capable of decoding convolutional codes with constraint lengths up to 15, is under development for the Deep Space Network (DSN). The objective is to complete a prototype of this decoder by late 1990, and demonstrate its performance using the (15, 1/4) encoder in Galileo. The decoder is expected to provide 1 to 2 dB improvement in bit SNR, compared to the present (7, 1/2) code and existing Maximum Likelihood Convolutional Decoder (MCD). The decoder will be fully programmable for any code up to constraint length 15, and code rate 1/2 to 1/6. The decoder architecture and top-level design are described

    A thermal simulation process based on electrical modeling for complex interconnect, packaging, and 3DI structures

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    To reduce the product development time and achieve first-pass silicon success, fast and accurate estimation of very-large-scale integration (VLSI) interconnect, packaging and 3DI (3D integrated circuits) thermal profiles has become important. Present commercial thermal analysis tools are incapable of handling very complex structures and have integration difficulties with existing design flows. Many analytical thermal models, which could provide fast estimates, are either too specific or oversimplified. This paper highlights a methodology, which exploits electrical resistance solvers for thermal simulation, to allow acquisition of thermal profiles of complex structures with good accuracy and reasonable computation cost. Moreover, a novel accurate closed-form thermal model is developed. The model allows an isotropic or anisotropic equivalent medium to replace the noncritical back-end-of-line (BEOL) regions so that the simulation complexity is dramatically reduced. Using these techniques, this paper introduces the thermal modeling of practical complex VLSI structures to facilitate thermal guideline generation. It also demonstrates the benefits of the proposed anisotropic equivalent medium approximation for real VLSI structures in terms of the accuracy and computational cost. © 2006 IEEE.published_or_final_versio

    VLSI Revisited - Revival in Japan

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    This paper describes the abundance of semiconductor consortia that have come into existence in Japan since the mid-1990s. They clearly reflect the ambition of the government - through its reorganized ministry METI and company initiatives - to regain some of the industrial and technological leadership that Japan has lost. The consortia landscape is very different in Japan compared with EU and the US. Outside Japan the universities play a much bigger and very important role. In Europe there has emerged close collaboration, among national government agencies, companies and the EU Commission in supporting the IT sector with considerable attention to semiconductor technologies. Another major difference, and possibly the most important one, is the fact that US and EU consortia include and mix partners from different areas of the semiconductor landscape including wafer makers, material suppliers, equipment producers and integrated device makers.semiconductors, Hitachi, Sony, Toshiba, Elpida, Renesas, Sematech, VLSI, JESSI, MEDEA, ASPLA, MIRAI, innovation system

    Compact and accurate models of large single-wall carbon-nanotube interconnects

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    Single-wall carbon nanotubes (SWCNTs) have been proposed for very large scale integration interconnect applications and their modeling is carried out using the multiconductor transmission line (MTL) formulation. Their time-domain analysis has some simulation issues related to the high number of SWCNTs within each bundle, which results in a highly complex model and loss of accuracy in the case of long interconnects. In recent years, several techniques have been proposed to reduce the complexity of the model whose accuracy decreases as the interconnection length increases. This paper presents a rigorous new technique to generate accurate reduced-order models of large SWCNT interconnects. The frequency response of the MTL is computed by using the spectral form of the dyadic Green's function of the 1-D propagation problem and the model complexity is reduced using rational-model identification techniques. The proposed approach is validated by numerical results involving hundreds of SWCNTs, which confirm its capability of reducing the complexity of the model, while preserving accuracy over a wide frequency range

    VLSI REVISITED – REVIVAL IN JAPAN

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    This paper describes the abundance of semiconductor consortia that have come into existence in Japan since the mid-1990s. They clearly reflect the ambition of the government – through its reorganized ministry METI and company initiatives - to regain some of the industrial and technological leadership that Japan has lost. The consortia landscape is very different in Japan compared with EU and the US. Outside Japan the universities play a much bigger and very important role. In Europe there has emerged close collaboration, among national government agencies, companies and the EU Commission in supporting the IT sector with considerable attention to semiconductor technologies. Another major difference, and possibly the most important one, is the fact that US and EU consortia include and mix partners from different areas of the semiconductor landscape including wafer makers, material suppliers, equipment producers and integrated device makers.semiconductors; Hitachi; Sony; Toshiba; Elpida; Renesas; Sematech; VLSI; JESSI; MEDEA; ASPLA; MIRAI; innovation system
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