Configurable 3D-integrated focal-plane sensor-processor array architecture

A mixed-signal Cellular Visual Microprocessor architecture with digital processors is described. An ASIC implementation is also demonstrated. The architecture is composed of a regular sensor readout circuit array, prepared for 3D face-to-face type integration, and one or several cascaded array of mainly identical (SIMD) processing elements. The individual array elements derived from the same general HDL description and could be of different in size, aspect ratio, and computing resources

Heterogeneous integration approach based on flip-chip bonding and misalignment self-correction elements for electronics-optics integration applications

This paper presents a high precision bonding approach, capable of submicron alignment accuracy, based on the thermosonic flip-chip bonding technique and misalignment self-correction elements. The precision of the bonding technique is guaranteed by using of misalignment self-correction bump (convex) and hollow (concave) elements. Metal cone bump and conductive sloped hollow bonding pad elements are created using micro-machining techniques, on a chip specimen and substrate, respectively. The chip and substrate are bonded face-to-face using of an ultrasonic-enhanced flip-chip bonder. By introducing of misalignment self-correction elements, repeatable bonding accuracies of less than 500 nm were confirmed through experimental investigation. Bond properties, including electrical and mechanical properties, are also characterized to confirm the success of the bonding approach. With the obtained results, the proposed bonding approach is capable of being use in electronics-optics heterogeneous integration applications

A review of advances in pixel detectors for experiments with high rate and radiation

The Large Hadron Collider (LHC) experiments ATLAS and CMS have established hybrid pixel detectors as the instrument of choice for particle tracking and vertexing in high rate and radiation environments, as they operate close to the LHC interaction points. With the High Luminosity-LHC upgrade now in sight, for which the tracking detectors will be completely replaced, new generations of pixel detectors are being devised. They have to address enormous challenges in terms of data throughput and radiation levels, ionizing and non-ionizing, that harm the sensing and readout parts of pixel detectors alike. Advances in microelectronics and microprocessing technologies now enable large scale detector designs with unprecedented performance in measurement precision (space and time), radiation hard sensors and readout chips, hybridization techniques, lightweight supports, and fully monolithic approaches to meet these challenges. This paper reviews the world-wide effort on these developments.Comment: 84 pages with 46 figures. Review article.For submission to Rep. Prog. Phy

Copper to copper bonding by nano interfaces for fine pitch interconnections and thermal applications

Ever growing demands for portability and functionality have always governed the electronic technology innovations. IC downscaling with Moore s law at IC level and system miniaturization with System-On-Package (SOP) paradigm at system level, have resulted and will continue to result in ultraminiaturized systems with unprecedented functionality at reduced cost. However, system miniaturization poses several electrical and thermal challenges that demand innovative solutions including advanced materials, bonding and assembly techniques. Heterogeneous material and device integration for thermal structures and IC assembly are limited by the bonding technology and the electrical and thermal impedance of the bonding interfaces. Solder - based bonding technology that is prevalent today is a major limitation to future systems. The trend towards miniaturized systems is expected to drive downscaling of IC I/O pad pitches from 40µm to 1- 5µm in future. Solder technology imposes several pitch, processability and cost restrictions at such fine pitches. Furthermore, according to International Technology Roadmap for Semiconductors (ITRS-2006), the supply current in high performance microprocessors is expected to increase to 220 A by 2012. At such supply current, the current density will exceed the maximum allowable current density of solders. The intrinsic delay and electromigration in solders are other daunting issues that become critical at nanometer sized technology nodes. In addition, formation of intermetallics is also a bottleneck that poses significant mechanical issues. Similarly, thermal power dissipation is growing to unprecedented high with a projected power of 198 W by 2008 (ITRS 2006). Present thermal interfaces are not adequate for such high heat dissipation. Recently, copper based thin film bonding has become a promising approach to address the abovementioned challenges. However, copper-copper direct bonding without using solders has not been studied thoroughly. Typically, bonding is carried out at 400oC for 30 min followed by annealing for 30 min. High thermal budget in such process makes it less attractive for integrated systems because of the associated process incompatibilities. Hence, there is a need to develop a novel low temperature copper to copper bonding process. In the present study, nanomaterials - based copper-to-copper bonding is explored and developed as an alternative to solder-based bonding. To demonstrate fine pitch bonding, the patterning of these nanoparticles is crucial. Therefore, two novel self-patterning techniques based on: 1.) Selective wetting and 2.) Selective nanoparticle deposition, are developed to address this challenge. Nanoparticle active layer facilitates diffusion and, thus, a reliable bond can be achieved using less thermal budget. Quantitative characterization of the bonding revealed good metallurgical bonding with very high bond strength. This has been confirmed by several morphological and structural characterizations. A 30-micron pitch IC assembly test vehicle is used to demonstrate fine pitch patternability and bonding. In conclusion, novel nanoparticle synthesis and patterning techniques were developed and demonstrated for low-impedance and low-cost electrical and thermal interfaces.M.S.Committee Chair: Rao R. Tummala; Committee Member: C. P. Wong; Committee Member: P. M. Ra

US Microelectronics Packaging Ecosystem: Challenges and Opportunities

The semiconductor industry is experiencing a significant shift from traditional methods of shrinking devices and reducing costs. Chip designers actively seek new technological solutions to enhance cost-effectiveness while incorporating more features into the silicon footprint. One promising approach is Heterogeneous Integration (HI), which involves advanced packaging techniques to integrate independently designed and manufactured components using the most suitable process technology. However, adopting HI introduces design and security challenges. To enable HI, research and development of advanced packaging is crucial. The existing research raises the possible security threats in the advanced packaging supply chain, as most of the Outsourced Semiconductor Assembly and Test (OSAT) facilities/vendors are offshore. To deal with the increasing demand for semiconductors and to ensure a secure semiconductor supply chain, there are sizable efforts from the United States (US) government to bring semiconductor fabrication facilities onshore. However, the US-based advanced packaging capabilities must also be ramped up to fully realize the vision of establishing a secure, efficient, resilient semiconductor supply chain. Our effort was motivated to identify the possible bottlenecks and weak links in the advanced packaging supply chain based in the US.Comment: 22 pages, 8 figure

Novel fine pitch interconnection methods using metallised polymer spheres

There is an ongoing demand for electronics devices with more functionality while reducing size and cost, for example smart phones and tablet personal computers. This requirement has led to significantly higher integrated circuit input/output densities and therefore the need for off-chip interconnection pitch reduction. Flip-chip processes utilising anisotropic conductive adhesives anisotropic conductive films (ACAs/ACFs) have been successfully applied in liquid crystal display (LCD) interconnection for more than two decades. However the conflict between the need for a high particle density, to ensure sufficient the conductivity, without increasing the probability of short circuits has remained an issue since the initial utilization of ACAs/ACFs for interconnection. But this issue has become even more severe with the challenge of ultra-fine pitch interconnection. This thesis advances a potential solution to this challenge where the conductive particles typically used in ACAs are selectively deposited onto the connections ensuring conductivity without bridging. The research presented in this thesis work has been undertaken to advance the fundamental understanding of the mechanical characteristics of micro-sized metal coated polymer particles (MCPs) and their application in fine or ultra-fine pitch interconnections. This included use of a new technique based on an in-situ nanomechanical system within SEM which was utilised to study MCP fracture and failure when undergoing deformation. Different loading conditions were applied to both uncoated polymer particles and MCPs, and the in-situ system enables their observation throughout compression. The results showed that both the polymer particles and MCP display viscoelastic characteristics with clear strain-rate hardening behaviour, and that the rate of compression therefore influences the initiation of cracks and their propagation direction. Selective particle deposition using electrophoretic deposition (EPD) and magnetic deposition (MD) of Ni/Au-MCPs have been evaluated and a fine or ultra-fine pitch deposition has been demonstrated, followed by a subsequent assembly process. The MCPs were successfully positively charged using metal cations and this charging mechanism was analysed. A new theory has been proposed to explain the assembly mechanism of EPD of Ni/Au coated particles using this metal cation based charging method. The magnetic deposition experiments showed that sufficient magnetostatic interaction force between the magnetized particles and pads enables a highly selective dense deposition of particles. Successful bonding to form conductive interconnections with pre-deposited particles have been demonstrated using a thermocompression flip-chip bonder, which illustrates the applicable capability of EPD of MCPs for fine or ultra-fine pitch interconnection

Compliant copper microwire arrays for reliable interconnections between large low-CTE packages and printed wiring board

The trend to high I/O density, performance and miniaturization at low cost is driving the industry towards shrinking interposer design rules, requiring a new set of packaging technologies. Low-CTE packages from silicon, glass and low-CTE organic substrates enable high interconnection density, high reliability and integration of system components. However, the large CTE mismatch between the package and the board presents reliability challenges for the board-level interconnections. Novel stress-relief structures that can meet reliability requirements along with electrical performance while meeting the cost constraints are needed to address these challenges. This thesis focuses on a comprehensive methodology starting with modeling, design, fabrication and characterization to validate such stress-relief structures. This study specifically explores SMT-compatible stress-relief microwire arrays in thin polymer carriers as a unique and low-cost solution for reliable board-level interconnections between large low-CTE packages and printed wiring boards. The microwire arrays are pre-fabricated in ultra-thin carriers using low-cost manufacturing processes such as laser vias and copper electroplating, which are then assembled in between the interposer and printed wiring board (PWB) as stress-relief interlayers. The microwire array results in dramatic reduction in solder stresses and strains, even with larger interposer sizes (20 mm × 20 mm), at finer pitch (400 microns), without the need for underfill. The parallel wire arrays result in low resistance and inductance, and therefore do not degrade the electrical performance. The scalability of the structures and the unique processes, from micro to nanowires, provides extendibility to finer pitch and larger package sizes. Finite element method (FEM) was used to study the reliability of the interconnections to provide guidelines for the test vehicle design. The models were built in 2.5D geometries to study the reliability of 400 µm-pitch interconnections with a 100 µm thick, 20 mm × 20 mm silicon package that was SMT-assembled onto an organic printed wiring board. The performance of the microwire array interconnection is compared to that of ball grid array (BGA) interconnections, in warpage, equivalent plastic strain and projected fatigue life. A unique set of materials and processes was used to demonstrate the low-cost fabrication of microwire arrays. Copper microwires with 12 µm diameter and 50 µm height were fabricated on both sides of a 50 µm thick, thermoplastic polymer carrier using dryfilm based photolithography and bottom-up electrolytic plating. The copper microwire interconnections were assembled between silicon interposer and FR-4 PWB through SMT-compatible process. Thermal mechanical reliability of the interconnections was characterized by thermal cycling test from -40°C to 125°C. The initial fatigue failure in the interconnections was identified at 700 cycles in the solder on the silicon package side, which is consistent with the modeling results. This study therefore demonstrated a highly-reliable and SMT-compatible solution for board-level interconnections between large low-CTE packages and printed wiring board.Ph.D

Constraint-Aware, Scalable, and Efficient Algorithms for Multi-Chip Power Module Layout Optimization

Moving towards an electrified world requires ultra high-density power converters. Electric vehicles, electrified aerospace, data centers, etc. are just a few fields among wide application areas of power electronic systems, where high-density power converters are essential. As a critical part of these power converters, power semiconductor modules and their layout optimization has been identified as a crucial step in achieving the maximum performance and density for wide bandgap technologies (i.e., GaN and SiC). New packaging technologies are also introduced to produce reliable and efficient multichip power module (MCPM) designs to push the current limits. The complexity of the emerging MCPM layouts is surpassing the capability of a manual, iterative design process to produce an optimum design with agile development requirements. An electronic design automation tool called PowerSynth has been introduced with ongoing research toward enhanced capabilities to speed up the optimized MCPM layout design process. This dissertation presents the PowerSynth progression timeline with the methodology updates and corresponding critical results compared to v1.1. The first released version (v1.1) of PowerSynth demonstrated the benefits of layout abstraction, and reduced-order modeling techniques to perform rapid optimization of the MCPM module compared to the traditional, manual, and iterative design approach. However, that version is limited by several key factors: layout representation technique, layout generation algorithms, iterative design-rule-checking (DRC), optimization algorithm candidates, etc. To address these limitations, and enhance PowerSynth’s capabilities, constraint-aware, scalable, and efficient algorithms have been developed and implemented. PowerSynth layout engine has evolved from v1.3 to v2.0 throughout the last five years to incorporate the algorithm updates and generate all 2D/2.5D/3D Manhattan layout solutions. These fundamental changes in the layout generation methodology have also called for updates in the performance modeling techniques and enabled exploring different optimization algorithms. The latest PowerSynth 2 architecture has been implemented to enable electro-thermo-mechanical and reliability optimization on 2D/2.5D/3D MCPM layouts, and set up a path toward cabinet-level optimization. PowerSynth v2.0 computer-aided design (CAD) flow has been hardware-validated through manufacturing and testing of an optimized novel 3D MCPM layout. The flow has shown significant speedup compared to the manual design flow with a comparable optimization result

Digitally driven microfabrication of 3D multilayer embedded electronic systems

The integration of multiple digitally driven processes is seen as the solution to many of the current limitations arising from standalone Additive Manufacturing (AM) techniques. A technique has been developed to digitally fabricate fully functioning electronics using a unique combination of AM technologies. This has been achieved by interleaving bottom-up Stereolithography (SL) with Direct Writing (DW) of conductor materials alongside mid-process development (optimising the substrate surface quality), dispensing of interconnects, component placement and thermal curing stages. The resulting process enables the low-temperature production of bespoke three-dimensional, fully packaged and assembled multi-layer embedded electronic circuitry. Two different Digital Light Processing (DLP) Stereolithography systems were developed applying different projection orientations to fabricate electronic substrates by selective photopolymerisation. The bottom up projection orientation produced higher quality more planar surfaces and demonstrated both a theoretical and practical feature resolution of 110 μm. A top down projection method was also developed however a uniform exposure of UV light and planar substrate surface of high quality could not be achieved. The most advantageous combination of three post processing techniques to optimise the substrate surface quality for subsequent conductor deposition was determined and defined as a mid-processing procedure. These techniques included ultrasonic agitation in solvent, thermal baking and additional ultraviolet exposure. SEM and surface analysis showed that a sequence including ultrasonic agitation in D-Limonene with additional UV exposure was optimal. DW of a silver conductive epoxy was used to print conductors on the photopolymer surface using a Musashi dispensing system that applies a pneumatic pressure to a loaded syringe mounted on a 3-axis print head and is controlled through CAD generated machine code. The dispensing behaviour of two isotropic conductive adhesives was characterised through three different nozzle sizes for the production of conductor traces as small as 170 μm wide and 40 μm high. Additionally, the high resolution dispensing of a viscous isotropic conductive adhesive (ICA) also led to a novel deposition approach for producing three dimensional, z-axis connections in the form of high freestanding pillars with an aspect ratio of 3.68 (height of 2mm and diameter of 550μm). Three conductive adhesive curing regimes were applied to printed samples to determine the effect of curing temperature and time on the resulting material resistivity. A temperature of 80 °C for 3 hours resulted in the lowest resistivity while displaying no substrate degradation. ii Compatibility with surface mount technology enabled components including resistors, capacitors and chip packages to be placed directly onto the silver adhesive contact pads before low-temperature thermal curing and embedding within additional layers of photopolymer. Packaging of components as small as 0603 surface mount devices (SMDs) was demonstrated via this process. After embedding of the circuitry in a thick layer of photopolymer using the bottom up Stereolithography apparatus, analysis of the adhesive strength at the boundary between the base substrate and embedding layer was conducted showing that loads up to 1500 N could be applied perpendicular to the embedding plane. A high degree of planarization was also found during evaluation of the embedding stage that resulted in an excellent surface finish on which to deposit subsequent layers. This complete procedure could be repeated numerous times to fabricate multilayer electronic devices. This hybrid process was also adapted to conduct flip-chip packaging of bare die with 195 μm wide bond pads. The SL/DW process combination was used to create conductive trenches in the substrate surface that were filled with isotropic conductive adhesive (ICA) to create conductive pathways. Additional experimentation with the dispensing parameters led to consistent 150 μm ICA bumps at a 457 μm pitch. A flip-chip bonding force of 0.08 N resulted in a contact resistance of 2.3 Ω at a standoff height of ~80 μm. Flip-chips with greater standoff heights of 160 μm were also successfully underfilled with liquid photopolymer using the SL embedding technique, while the same process on chips with 80 μm standoff height was unsuccessful. Finally the approaches were combined to fabricate single, double and triple layer circuit demonstrators; pyramid shaped electronic packages with internal multilayer electronics; fully packaged and underfilled flip-chip bare die and; a microfluidic device facilitating UV catalysis. This new paradigm in manufacturing supports rapid iterative product development and mass customisation of electronics for a specific application and, allows the generation of more dimensionally complex products with increased functionality