Principles of Neuromorphic Photonics

In an age overrun with information, the ability to process reams of data has become crucial. The demand for data will continue to grow as smart gadgets multiply and become increasingly integrated into our daily lives. Next-generation industries in artificial intelligence services and high-performance computing are so far supported by microelectronic platforms. These data-intensive enterprises rely on continual improvements in hardware. Their prospects are running up against a stark reality: conventional one-size-fits-all solutions offered by digital electronics can no longer satisfy this need, as Moore's law (exponential hardware scaling), interconnection density, and the von Neumann architecture reach their limits. With its superior speed and reconfigurability, analog photonics can provide some relief to these problems; however, complex applications of analog photonics have remained largely unexplored due to the absence of a robust photonic integration industry. Recently, the landscape for commercially-manufacturable photonic chips has been changing rapidly and now promises to achieve economies of scale previously enjoyed solely by microelectronics. The scientific community has set out to build bridges between the domains of photonic device physics and neural networks, giving rise to the field of \emph{neuromorphic photonics}. This article reviews the recent progress in integrated neuromorphic photonics. We provide an overview of neuromorphic computing, discuss the associated technology (microelectronic and photonic) platforms and compare their metric performance. We discuss photonic neural network approaches and challenges for integrated neuromorphic photonic processors while providing an in-depth description of photonic neurons and a candidate interconnection architecture. We conclude with a future outlook of neuro-inspired photonic processing.Comment: 28 pages, 19 figure

Characterizationof FD-SOI transistor

In this project, measurements have been made on FD-SOI transistors, fabricated by CEA-LETI, to carry out a characterization of these devices, since they are very new and need to be studied. This work has focused on characterizing the aging mechanism of the devices and the observed RTN. To characterize the aging mechanism and variability of the samples based on the applied cycles, the measurements have been made by applying constant stress voltages (CVS) directly to the device with a wafer prove station and a semiconductor parameter analyzer (SPA). To observe TN, different electrical procedures have been studied, controlling the different parameters during the measurements.En aquest projecte s'han realitzat mesures en transistors FD-SOI, fabricats per CEA-LETI, per tal de dur a terme una caracterització d'aquests dispositius, ja que són molt nous i necessiten de ser estudiats. Aquest treball s'ha centrat en caracteritzar l'envelliment dels dispositius i el RTN observat. Per a caracteritzar l'envelliment i la variabilitat de les mostres en funció dels cicles aplicats, les mesures s'han realitzat aplicant tensions d'estrés constant (CVS) directament al dispositiu amb una taula de puntes i un analitzador de paràmetres de semiconductors (SPA). Per tal d'observar RTN s'han estudiat diferents procediments elèctrics, controlant els diferents paràmetres durant les mesures.En este proyecto se han realizado medidas en transistores FD-SOI, fabricados por CEA-LETI, para llevar a cabo una caracterización de estos dispositivos, puesto que son muy nuevos y necesitan de ser estudiados. Este trabajo se ha centrado en caracterizar los mecanismos de envejecimiento de los dispositivos y el RTN observado. Para caracterizar el envejecimiento y la variabilidad de las muestras en función de los ciclos aplicados, las medidas se han realizado aplicando tensiones de estrés constante (CVS) directamente al dispositivo con una tabla de puntas y un analizador de parámetros de semiconductores (SPA). Para observar RTN se han estudiado diferentes procedimientos eléctricos, controlando los diferentes parámetros durante las medidas