3,694 research outputs found

    Chip- and System-Level Reliability on SiC-based Power Modules

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    The blocking voltage, switching frequency and temperature tolerance of power devices have been greatly improved due to the revolution of wide bandgap (WBG) materials, such as silicon carbide (SiC) and gallium nitride (GaN). Owing to the development of SiC-based power devices, the power rating, operating voltage, and power density of power modules have been significantly improved. However, the reliability of SiC-based power modules has not been fully explored yet. Thus, this dissertation focuses on the chip- and system-level reliability on SiC-based power modules. For chip-level reliability, this work focuses on on-chip SiC ESD protection devices for SiC-based integrated circuits (ICs). In order to develop SiC ESD protection devices, SiC-based Ohmic contact and ion implantation have been studied. Nickel/Titanium/Aluminum (Ni/Ti/Al) metal stacks were deposited on SiC substrates to form Ohmic contact. Circular transfer length method (CTLM) structures were fabricated to characterize contact resistivity. Ion implantation was designed and simulated by Sentraurus technology computer aided design (TCAD) software. Secondary-ion mass spectrometry (SIMS) results show a good match with the simulation results. In addition, SiC ESD protection devices, such as N-type metal-oxide-semiconductor (NMOS), laterally diffused metal-oxide-semiconductor (LDMOS), high-voltage silicon controlled rectifier (HV-SCR) and low-voltage silicon controlled rectifier (LV-SCR), have been designed. Transmission line pulse (TLP) and very fast TLP (VF-TLP) measurements were carried out to characterize their ESD performance. The proposed SiC-based HV-SCR shows the highest failure current on TLP measurement and can be used as an area-efficient ESD protection device. On the other hand, for system-level reliability, this dissertation focuses on the galvanic isolation of high-temperature SiC power modules. Low temperature co-fired ceramics (LTCC) based high-temperature optocouplers were designed and fabricated as galvanic isolators. The LTCC-based high-temperature optocouplers show promising driving capability and steady response speed from 25 ÂşC to 250 ÂşC. In order to verify the performance of the high-temperature optocouplers at the system level, LTCC-based gate drivers that utilize the high-temperature optocouplers as galvanic isolators were designed and integrated into a high-temperature SiC-based power module. Finally, the high-temperature power module with integrated LTCC-based gate drivers was characterized by DPTs from 25 ÂşC to 200 ÂşC. The power module shows reliable switching performance at elevated temperatures

    Chip- and System-Level Reliability on SiC-based Power Modules

    Get PDF
    The blocking voltage, switching frequency and temperature tolerance of power devices have been greatly improved due to the revolution of wide bandgap (WBG) materials, such as silicon carbide (SiC) and gallium nitride (GaN). Owing to the development of SiC-based power devices, the power rating, operating voltage, and power density of power modules have been significantly improved. However, the reliability of SiC-based power modules has not been fully explored yet. Thus, this dissertation focuses on the chip- and system-level reliability on SiC-based power modules. For chip-level reliability, this work focuses on on-chip SiC ESD protection devices for SiC-based integrated circuits (ICs). In order to develop SiC ESD protection devices, SiC-based Ohmic contact and ion implantation have been studied. Nickel/Titanium/Aluminum (Ni/Ti/Al) metal stacks were deposited on SiC substrates to form Ohmic contact. Circular transfer length method (CTLM) structures were fabricated to characterize contact resistivity. Ion implantation was designed and simulated by Sentraurus technology computer aided design (TCAD) software. Secondary-ion mass spectrometry (SIMS) results show a good match with the simulation results. In addition, SiC ESD protection devices, such as N-type metal-oxide-semiconductor (NMOS), laterally diffused metal-oxide-semiconductor (LDMOS), high-voltage silicon controlled rectifier (HV-SCR) and low-voltage silicon controlled rectifier (LV-SCR), have been designed. Transmission line pulse (TLP) and very fast TLP (VF-TLP) measurements were carried out to characterize their ESD performance. The proposed SiC-based HV-SCR shows the highest failure current on TLP measurement and can be used as an area-efficient ESD protection device. On the other hand, for system-level reliability, this dissertation focuses on the galvanic isolation of high-temperature SiC power modules. Low temperature co-fired ceramics (LTCC) based high-temperature optocouplers were designed and fabricated as galvanic isolators. The LTCC-based high-temperature optocouplers show promising driving capability and steady response speed from 25 ÂşC to 250 ÂşC. In order to verify the performance of the high-temperature optocouplers at the system level, LTCC-based gate drivers that utilize the high-temperature optocouplers as galvanic isolators were designed and integrated into a high-temperature SiC-based power module. Finally, the high-temperature power module with integrated LTCC-based gate drivers was characterized by DPTs from 25 ÂşC to 200 ÂşC. The power module shows reliable switching performance at elevated temperatures

    Design of a tunable multi-band differential LC VCO using 0.35 mu m SiGe BiCMOS technology for multi-standard wireless communication systems

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    In this paper, an integrated 2.2-5.7GHz multi-band differential LC VCO for multi-standard wireless communication systems was designed utilizing 0.35 mu m SiGe BiCMOS technology. The topology, which combines the switching inductors and capacitors together in the same circuit, is a novel approach for wideband VCOs. Based on the post-layout simulation results, the VCO can be tuned using a DC voltage of 0 to 3.3 V for 5 different frequency bands (2.27-2.51 GHz, 2.48-2.78 GHz, 3.22-3.53 GHz, 3.48-3.91 GHz and 4.528-5.7 GHz) with a maximum bandwidth of 1.36 GHz and a minimum bandwidth of 300 MHz. The designed and simulated VCO can generate a differential output power between 0.992 and -6.087 dBm with an average power consumption of 44.21 mW including the buffers. The average second and third harmonics level were obtained as -37.21 and -47.6 dBm, respectively. The phase noise between -110.45 and -122.5 dBc/Hz, that was simulated at 1 MHz offset, can be obtained through the frequency of interest. Additionally, the figure of merit (FOM), that includes all important parameters such as the phase noise, the power consumption and the ratio of the operating frequency to the offset frequency, is between -176.48 and -181.16 and comparable or better than the ones with the other current VCOs. The main advantage of this study in comparison with the other VCOs, is covering 5 frequency bands starting from 2.27 up to 5.76 GHz without FOM and area abandonment. Output power of the fundamental frequency changes between -6.087 and 0.992 dBm, depending on the bias conditions (operating bands). Based on the post-layout simulation results, the core VCO circuit draws a current between 2.4-6.3 mA and between 11.4 and 15.3 mA with the buffer circuit from 3.3 V supply. The circuit occupies an area of 1.477 mm(2) on Si substrate, including DC, digital and RF pads

    (Invited) mm-wave silicon ICs: An opportunity for holistic design

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    Millimeter-waves integrated circuits offer a unique opportunity for a holistic design approach encompassing RF, analog, and digital, as well as radiation and electromagnetics. The ability to deal with the complete system from the digital circuitry to on-chip antennas and everything in between offers unparalleled opportunities for completely new architectures and topologies, previously impossible due the traditional partitioning of various blocks in conventional design. This opens a plethora of new architectural and system level innovation within the integrated circuit platform. This paper reviews some of the challenges and opportunities for mm-wave ICs and presents several solutions to them

    Integrated Transversal Equalizers in High-Speed Fiber-Optic Systems

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    Intersymbol interference (ISI) caused by intermodal dispersion in multimode fibers is the major limiting factor in the achievable data rate or transmission distance in high-speed multimode fiber-optic links for local area networks applications. Compared with optical-domain and other electrical-domain dispersion compensation methods, equalization with transversal filters based on distributed circuit techniques presents a cost-effective and low-power solution. The design of integrated distributed transversal equalizers is described in detail with focus on delay lines and gain stages. This seven-tap distributed transversal equalizer prototype has been implemented in a commercial 0.18-µm SiGe BiCMOS process for 10-Gb/s multimode fiber-optic links. A seven-tap distributed transversal equalizer reduces the ISI of a 10-Gb/s signal after 800 m of 50-µm multimode fiber from 5 to 1.38 dB, and improves the bit-error rate from about 10^-5 to less than 10^-12

    The detection of single electrons by means of a Micromegas-covered MediPix2 pixel CMOS readout circuit

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    A small drift chamber was read out by means of a MediPix2 readout chip as direct anode. A Micromegas foil was placed 50 ÎĽ\mum above the chip, and electron multiplication occurred in the gap. With a He/Isobutane 80/20 mixture, gas multiplication factors up to tens of thousands were achieved, resulting in an efficiency for detecting single electrons of better than 90% . We recorded many frames containing 2D images with tracks from cosmic muons. Along these tracks, electron clusters were observed, as well as delta-rays.Comment: 15 pages, 9 included postscript figures, 5 separate jpeg figures, submitted to Nucl. Instr. and Meth. A. A complete postscript version with high resolution figures 1, 3, 11, 12 and 14 can be found at http://www.nikhef.nl/~i06/RandD/final/letter4.p
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