CMOS-3D smart imager architectures for feature detection

This paper reports a multi-layered smart image sensor architecture for feature extraction based on detection of interest points. The architecture is conceived for 3-D integrated circuit technologies consisting of two layers (tiers) plus memory. The top tier includes sensing and processing circuitry aimed to perform Gaussian filtering and generate Gaussian pyramids in fully concurrent way. The circuitry in this tier operates in mixed-signal domain. It embeds in-pixel correlated double sampling, a switched-capacitor network for Gaussian pyramid generation, analog memories and a comparator for in-pixel analog-to-digital conversion. This tier can be further split into two for improved resolution; one containing the sensors and another containing a capacitor per sensor plus the mixed-signal processing circuitry. Regarding the bottom tier, it embeds digital circuitry entitled for the calculation of Harris, Hessian, and difference-of-Gaussian detectors. The overall system can hence be configured by the user to detect interest points by using the algorithm out of these three better suited to practical applications. The paper describes the different kind of algorithms featured and the circuitry employed at top and bottom tiers. The Gaussian pyramid is implemented with a switched-capacitor network in less than 50 μs, outperforming more conventional solutions.Xunta de Galicia 10PXIB206037PRMinisterio de Ciencia e Innovación TEC2009-12686, IPT-2011-1625-430000Office of Naval Research N00014111031

A Programmable Vision Chip with High Speed Image Processing

International audienceA high speed Analog VLSI Image acquisition and pre-processing system is described in this paper. A 64×64 pixel retina is used to extract the magnitude and direction of spatial gradients from images. So, the sensor implements some low-level image processing in a massively parallel strategy in each pixel of the sensor. Spatial gradients, various convolutions as Sobel filter or Laplacian are described and implemented on the circuit. The retina implements in a massively parallel way, at pixel level, some various treatments based on a four-quadrants multipliers architecture. Each pixel includes a photodiode, an amplifier, two storage capacitors and an analog arithmetic unit. A maximal output frame rate of about 10000 frames per second with only image acquisition and 2000 to 5000 frames per second with image processing is achieved in a 0.35 μm standard CMOS process. The retina provides address-event coded output on three asynchronous buses, one output is dedicated to the gradient and both other to the pixel values. A prototype based on this principle, has been designed. Simulation results from Mentor GraphicsTMsoftware and AustriaMicrosystem Design kit are presented

Realization of a ROIC for 72x4 PV-IR detectors

Silicon Readout Integrated Circuits (ROIC) for HgCdTe Focal Plane Arrays of 1x4 and 72x4 photovoltaic detectors are represented. The analog circuit blocks are completely identical for both, while the digital control circuit is modified to take into account the larger array size. The manufacturing technology is 0.35μm, double poly-Si, three-metal CMOS process. ROIC structure includes four elements TDI functioning with a super sampling rate of 3, bidirectional scanning, dead pixel de-selection, automatic gain adjustment in response to pixel deselection besides programmable four gain setting (up to 2.58pC storage), and programmable integration time. ROIC has four outputs with a dynamic range of 2.8V (from 1.2V to 4V) for an output load of 10pF capacitive in parallel with 1MΩ resistance, and operates at a clock frequency of 5 MHz. The input referred noise is less than 1037 μV with 460 fF integration capacitor, corresponding to 2978 electrons

A CMOS-based Lab-on-Chip Array for the Combined Magnetic Stimulation and Opto-Chemical Sensing of Neural Tissue

This paper presents a novel CMOS-based lab-on-chip platform for non-contact magnetic stimulation and recording of neural tissue. The proposed system is the first of its kind to integrate magnetic-stimulation and opto-chemical sensing in a single pixel, tesselated to form an 8 à 8 array. Fabricated in a commercially-available 0.35 ¿m CMOS technology, the system can be intrinsically used for both optical imaging and pH sensing and includes mechanisms for calibrating out sensor variation and mismatch. In addition to sensory acquisition via an integrated 10-bit ADC, a 64-instruction spatiotemporal pattern generator has been embedded within the array for driving the microscale magnetic neural stimulation. In this application the ISFET-based sensors are used to capacitively-couple neuronal charge in close proximity to the floating gate. Optical imaging hardware has also been embedded to provide topographic detail of the neural tissue.Published versio

CMOS digital pixel sensor array with time domain analogue to digital conversion

This thesis presents a digital pixel sensor array, which is the first stage of an ongoing project to produce a CMOS image sensor with on-chip image processing. The analogue to digital conversion is performed at the pixel level, with the result stored in pixel memory. This architecture allows fast, reliable access to the image data and simplifies the integration of the image array and the processing logic. Each pixel contains a photodiode sensor, a comparator, memory and addressing logic. The photodiode sensor operates in integrating mode, where the photodiode junction capacitance is first charged to an initial voltage, and then discharged by the photodiode leakage current, which is comprised mainly of optically generated carriers. The analogue to digital conversion is performed by measuring the time taken for the photodiode cathode voltage to fall from its initial voltage, to the comparator reference voltage. This triggers the 8-bit pixel memory, which stores a data value representative of the time. The trigger signal also resets the photodiode, which conserves the charge stored in the junction capacitance, and also prevents blooming. An on-chip control circuit generates the digital data that is distributed globally to the array. The control circuit compensates for the inverse relationship between the integration time and the photocurrent by adjusting the data clock timing. The period of the data clock is increased at the same rate as the integration time, resulting in a linear relationship between the digital data and the photocurrent. The design is realised as a 64 x 64 pixel array, manufactured in O.35µm 3.3 V CMOS technology. Each pixel occupies an area of 45µm x 45µm with a 12.3% fill factor, and the entire pixel array and control circuit measures 3.7mm x 3.9mm. Experimental results confirm the operation of the digital pixel, and the linearising control circuit. The digital pixel has a dynamic range of 85dB, and can be adapted to different lighting conditions by varying a single clock frequency. The data captured by the array can be randomly accessed, and is read from the array nondestructivcly

Low-power CMOS digital-pixel Imagers for high-speed uncooled PbSe IR applications

This PhD dissertation describes the research and development of a new low-cost medium wavelength infrared MWIR monolithic imager technology for high-speed uncooled industrial applications. It takes the baton on the latest technological advances in the field of vapour phase deposition (VPD) PbSe-based medium wavelength IR (MWIR) detection accomplished by the industrial partner NIT S.L., adding fundamental knowledge on the investigation of novel VLSI analog and mixed-signal design techniques at circuit and system levels for the development of the readout integrated device attached to the detector. The work supports on the hypothesis that, by the use of the preceding design techniques, current standard inexpensive CMOS technologies fulfill all operational requirements of the VPD PbSe detector in terms of connectivity, reliability, functionality and scalability to integrate the device. The resulting monolithic PbSe-CMOS camera must consume very low power, operate at kHz frequencies, exhibit good uniformity and fit the CMOS read-out active pixels in the compact pitch of the focal plane, all while addressing the particular characteristics of the MWIR detector: high dark-to-signal ratios, large input parasitic capacitance values and remarkable mismatching in PbSe integration. In order to achieve these demands, this thesis proposes null inter-pixel crosstalk vision sensor architectures based on a digital-only focal plane array (FPA) of configurable pixel sensors. Each digital pixel sensor (DPS) cell is equipped with fast communication modules, self-biasing, offset cancellation, analog-to-digital converter (ADC) and fixed pattern noise (FPN) correction. In-pixel power consumption is minimized by the use of comprehensive MOSFET subthreshold operation. The main aim is to potentiate the integration of PbSe-based infra-red (IR)-image sensing technologies so as to widen its use, not only in distinct scenarios, but also at different stages of PbSe-CMOS integration maturity. For this purpose, we posit to investigate a comprehensive set of functional blocks distributed in two parallel approaches: • Frame-based “Smart” MWIR imaging based on new DPS circuit topologies with gain and offset FPN correction capabilities. This research line exploits the detector pitch to offer fully-digital programmability at pixel level and complete functionality with input parasitic capacitance compensation and internal frame memory. • Frame-free “Compact”-pitch MWIR vision based on a novel DPS lossless analog integrator and configurable temporal difference, combined with asynchronous communication protocols inside the focal plane. This strategy is conceived to allow extensive pitch compaction and readout speed increase by the suppression of in-pixel digital filtering, and the use of dynamic bandwidth allocation in each pixel of the FPA. In order make the electrical validation of first prototypes independent of the expensive PbSe deposition processes at wafer level, investigation is extended as well to the development of affordable sensor emulation strategies and integrated test platforms specifically oriented to image read-out integrated circuits. DPS cells, imagers and test chips have been fabricated and characterized in standard 0.15μm 1P6M, 0.35μm 2P4M and 2.5μm 2P1M CMOS technologies, all as part of research projects with industrial partnership. The research has led to the first high-speed uncooled frame-based IR quantum imager monolithically fabricated in a standard VLSI CMOS technology, and has given rise to the Tachyon series [1], a new line of commercial IR cameras used in real-time industrial, environmental and transportation control systems. The frame-free architectures investigated in this work represent a firm step forward to push further pixel pitch and system bandwidth up to the limits imposed by the evolving PbSe detector in future generations of the device.La present tesi doctoral descriu la recerca i el desenvolupament d'una nova tecnologia monolítica d'imatgeria infraroja de longitud d'ona mitja (MWIR), no refrigerada i de baix cost, per a usos industrials d'alta velocitat. El treball pren el relleu dels últims avenços assolits pel soci industrial NIT S.L. en el camp dels detectors MWIR de PbSe depositats en fase vapor (VPD), afegint-hi coneixement fonamental en la investigació de noves tècniques de disseny de circuits VLSI analògics i mixtes pel desenvolupament del dispositiu integrat de lectura unit al detector pixelat. Es parteix de la hipòtesi que, mitjançant l'ús de les esmentades tècniques de disseny, les tecnologies CMOS estàndard satisfan tots els requeriments operacionals del detector VPD PbSe respecte a connectivitat, fiabilitat, funcionalitat i escalabilitat per integrar de forma econòmica el dispositiu. La càmera PbSe-CMOS resultant ha de consumir molt baixa potència, operar a freqüències de kHz, exhibir bona uniformitat, i encabir els píxels actius CMOS de lectura en el pitch compacte del pla focal de la imatge, tot atenent a les particulars característiques del detector: altes relacions de corrent d'obscuritat a senyal, elevats valors de capacitat paràsita a l'entrada i dispersions importants en el procés de fabricació. Amb la finalitat de complir amb els requisits previs, es proposen arquitectures de sensors de visió de molt baix acoblament interpíxel basades en l'ús d'una matriu de pla focal (FPA) de píxels actius exclusivament digitals. Cada píxel sensor digital (DPS) està equipat amb mòduls de comunicació d'alta velocitat, autopolarització, cancel·lació de l'offset, conversió analògica-digital (ADC) i correcció del soroll de patró fixe (FPN). El consum en cada cel·la es minimitza fent un ús exhaustiu del MOSFET operant en subllindar. L'objectiu últim és potenciar la integració de les tecnologies de sensat d'imatge infraroja (IR) basades en PbSe per expandir-ne el seu ús, no només a diferents escenaris, sinó també en diferents estadis de maduresa de la integració PbSe-CMOS. En aquest sentit, es proposa investigar un conjunt complet de blocs funcionals distribuïts en dos enfocs paral·lels: - Dispositius d'imatgeria MWIR "Smart" basats en frames utilitzant noves topologies de circuit DPS amb correcció de l'FPN en guany i offset. Aquesta línia de recerca exprimeix el pitch del detector per oferir una programabilitat completament digital a nivell de píxel i plena funcionalitat amb compensació de la capacitat paràsita d'entrada i memòria interna de fotograma. - Dispositius de visió MWIR "Compact"-pitch "frame-free" en base a un novedós esquema d'integració analògica en el DPS i diferenciació temporal configurable, combinats amb protocols de comunicació asíncrons dins del pla focal. Aquesta estratègia es concep per permetre una alta compactació del pitch i un increment de la velocitat de lectura, mitjançant la supressió del filtrat digital intern i l'assignació dinàmica de l'ample de banda a cada píxel de l'FPA. Per tal d'independitzar la validació elèctrica dels primers prototips respecte a costosos processos de deposició del PbSe sensor a nivell d'oblia, la recerca s'amplia també al desenvolupament de noves estratègies d'emulació del detector d'IR i plataformes de test integrades especialment orientades a circuits integrats de lectura d'imatge. Cel·les DPS, dispositius d'imatge i xips de test s'han fabricat i caracteritzat, respectivament, en tecnologies CMOS estàndard 0.15 micres 1P6M, 0.35 micres 2P4M i 2.5 micres 2P1M, tots dins el marc de projectes de recerca amb socis industrials. Aquest treball ha conduït a la fabricació del primer dispositiu quàntic d'imatgeria IR d'alta velocitat, no refrigerat, basat en frames, i monolíticament fabricat en tecnologia VLSI CMOS estàndard, i ha donat lloc a Tachyon, una nova línia de càmeres IR comercials emprades en sistemes de control industrial, mediambiental i de transport en temps real.Postprint (published version

High Speed CMOS Image Sensor

abstract: High speed image sensors are used as a diagnostic tool to analyze high speed processes for industrial, automotive, defense and biomedical application. The high fame rate of these sensors, capture a series of images that enables the viewer to understand and analyze the high speed phenomena. However, the pixel readout circuits designed for these sensors with a high frame rate (100fps to 1 Mfps) have a very low fill factor which are less than 58%. For high speed operation, the exposure time is less and (or) the light intensity incident on the image sensor is less. This makes it difficult for the sensor to detect faint light signals and gives a lower limit on the signal levels being detected by the sensor. Moreover, the leakage paths in the pixel readout circuit also sets a limit on the signal level being detected. Therefore, the fill factor of the pixel should be maximized and the leakage currents in the readout circuits should be minimized. This thesis work presents the design of the pixel readout circuit suitable for high speed and low light imaging application. The circuit is an improvement to the 6T pixel readout architecture. The designed readout circuit minimizes the leakage currents in the circuit and detects light producing a signal level of 350µV at the cathode of the photodiode. A novel layout technique is used for the pixel, which improves the fill factor of the pixel to 64.625%. The read out circuit designed is an integral part of high speed image sensor, which is fabricated using a 0.18 µm CMOS technology with the die size of 3.1mm x 3.4 mm, the pixel size of 20µm x 20 µm, number of pixel of 96 x 96 and four 10-bit pipelined ADC’s. The image sensor achieves a high frame rate of 10508 fps and readout speed of 96 M pixels / sec.Dissertation/ThesisMasters Thesis Electrical Engineering 201

A versatile sensor interface for programmable vision systems-on-chip

This paper describes an optical sensor interface designed for a programmable mixed-signal vision chip. This chip has been designed and manufactured in a standard 0.35μm n-well CMOS technology with one poly layer and five metal layers. It contains a digital shell for control and data interchange, and a central array of 128 × 128 identical cells, each cell corresponding to a pixel. Die size is 11.885 × 12.230mm2 and cell size is 75.7μm × 73.3μm. Each cell contains 198 transistors dedicated to functions like processing, storage, and sensing. The system is oriented to real-time, single-chip image acquisition and processing. Since each pixel performs the basic functions of sensing, processing and storage, data transferences are fully parallel (image-wide). The programmability of the processing functions enables the realization of complex image processing functions based on the sequential application of simpler operations. This paper provides a general overview of the system architecture and functionality, with special emphasis on the optical interface.European Commission IST-1999-19007Office of Naval Research (USA) N00014021088

Polarization Imaging Sensors in Advanced Feature CMOS Technologies

The scaling of CMOS technology, as predicted by Moore\u27s law, has allowed for realization of high resolution imaging sensors and for the emergence of multi-mega-pixel imagers. Designing imaging sensors in advanced feature technologies poses many challenges especially since transistor models do not accurately portray their performance in these technologies. Furthermore, transistors fabricated in advanced feature technologies operate in a non-conventional mode known as velocity saturation. Traditionally, analog designers have been discouraged from designing circuits in this mode of operation due to the low gain properties in single transistor amplifiers. Nevertheless, velocity saturation will become even more prominent mode of operation as transistors continue to shrink and warrants careful design of circuits that can exploit this mode of operation. In this research endeavor, I have utilized velocity saturation mode of operation in order to realize low noise imaging sensors. These imaging sensors incorporate low noise analog circuits at the focal plane in order to improve the signal to noise ratio and are fabricated in 0.18 micron technology. Furthermore, I have explored nanofabrication techniques for realizing metallic nanowires acting as polarization filters. These nanoscopic metallic wires are deposited on the surface of the CMOS imaging sensor in order to add polarization sensitivity to the CMOS imaging sensor. This hybrid sensor will serve as a test bed for exploring the next generation of low noise and highly sensitive polarization imaging sensors