Controlled open-cell two-dimensional liquid foam generation for micro- and nanoscale patterning of materials

Liquid foam consists of liquid film networks. The films can be thinned to the nanoscale via evaporation and have potential in bottom-up material structuring applications. However, their use has been limited due to their dynamic fluidity, complex topological changes, and physical characteristics of the closed system. Here, we present a simple and versatile microfluidic approach for controlling two-dimensional liquid foam, designing not only evaporative microholes for directed drainage to generate desired film networks without topological changes for the first time, but also microposts to pin the generated films at set positions. Patterning materials in liquid is achievable using the thin films as nanoscale molds, which has additional potential through repeatable patterning on a substrate and combination with a lithographic technique. By enabling direct-writable multi-integrated patterning of various heterogeneous materials in two-dimensional or three-dimensional networked nanostructures, this technique provides novel means of nanofabrication superior to both lithographic and bottom-up state-of-the-art techniques

Directing cell migration and organization via nanocrater-patterned cell-repellent interfaces.

Although adhesive interactions between cells and nanostructured interfaces have been studied extensively, there is a paucity of data on how nanostructured interfaces repel cells by directing cell migration and cell-colony organization. Here, by using multiphoton ablation lithography to pattern surfaces with nanoscale craters of various aspect ratios and pitches, we show that the surfaces altered the cells focal-adhesion size and distribution, thus affecting cell morphology, migration and ultimately localization. We also show that nanocrater pitch can disrupt the formation of mature focal adhesions to favour the migration of cells towards higher-pitched regions, which present increased planar area for the formation of stable focal adhesions. Moreover, by designing surfaces with variable pitch but constant nanocrater dimensions, we were able to create circular and striped cellular patterns. Our surface-patterning approach, which does not involve chemical treatments and can be applied to various materials, represents a simple method to control cell behaviour on surfaces

One-step deposition of nano-to-micron-scalable, high-quality digital image correlation patterns for high-strain in-situ multi-microscopy testing

Digital Image Correlation (DIC) is of vital importance in the field of experimental mechanics, yet, producing suitable DIC patterns for demanding in-situ mechanical tests remains challenging, especially for ultra-fine patterns, despite the large number of patterning techniques in the literature. Therefore, we propose a simple, flexible, one-step technique (only requiring a conventional deposition machine) to obtain scalable, high-quality, robust DIC patterns, suitable for a range of microscopic techniques, by deposition of a low melting temperature solder alloy in so-called 'island growth' mode, without elevating the substrate temperature. Proof of principle is shown by (near-)room-temperature deposition of InSn patterns, yielding highly dense, homogeneous DIC patterns over large areas with a feature size that can be tuned from as small as 10nm to 2um and with control over the feature shape and density by changing the deposition parameters. Pattern optimization, in terms of feature size, density, and contrast, is demonstrated for imaging with atomic force microscopy, scanning electron microscopy (SEM), optical microscopy and profilometry. Moreover, the performance of the InSn DIC patterns and their robustness to large deformations is validated in two challenging case studies of in-situ micro-mechanical testing: (i) self-adaptive isogeometric digital height correlation of optical surface height profiles of a coarse, bimodal InSn pattern providing microscopic 3D deformation fields (illustrated for delamination of aluminum interconnects on a polyimide substrate) and (ii) DIC on SEM images of a much finer InSn pattern allowing quantification of high strains near fracture locations (illustrated for rupture of a Fe foil). As such, the high controllability, performance and scalability of the DIC patterns offers a promising step towards more routine DIC-based in-situ micro-mechanical testing.Comment: Accepted for publication in Strai

Improving the Resolution and Throughput of Achromatic Talbot Lithography

High-resolution patterning of periodic structures over large areas has several applications in science and technology. One such method, based on the long-known Talbot effect observed with diffraction gratings, is achromatic Talbot lithography (ATL). This method offers many advantages over other techniques, such as high resolution, large depth of focus, high throughput, etc. Although the technique has been studied in the past, its limits have not yet been explored. Increasing the efficiency and the resolution of the method is essential and might enable many applications in science and technology. In this work, we combine this technique with spatially coherent and quasi-monochromatic light at extreme ultraviolet (EUV) wavelengths and explore new mask design schemes in order to enhance its throughput and resolution. We report on simulations of various mask designs in order to explore their efficiency. Advanced and optimized nanofabrication techniques have to be utilized to achieve high quality and efficient masks for ATL. Exposures using coherent EUV radiation from the Swiss light source (SLS) have been performed, pushing the resolution limits of the technique for dense hole or dot patterning down to 40 nm pitch. In addition, through extensive simulations, alternative mask designs with rings instead of holes are explored for the efficient patterning of hole/dot arrays. We show that these rings exhibit similar aerial images to hole arrays, while enabling higher efficiency and thereby increased throughput for ATL exposures. The mask designs with rings show that they are less prone to problems associated with pattern collapse during the nanofabrication process and therefore are promising for achieving higher resolution