Data-Width-Driven Power Gating of Integer Arithmetic Circuits

When performing narrow-width computations, power gating of unused arithmetic circuit portions can significantly reduce leakage power. We deploy coarse-grain power gating in 32-bit integer arithmetic circuits that frequently will operate on narrow-width data. Our contributions include a design framework that automatically implements coarse-grain power-gated arithmetic circuits considering a narrow-width input data mode, and an analysis of the impact of circuit architecture on the efficiency of this data-width-driven power gating scheme. As an example, with a performance penalty of 6.7%, coarse-grain power gating of a 45-nm 32-bit multiplier is demonstrated to yield an 11.6x static leakage energy reduction per 8x8-bit operation

ULTRA ENERGY-EFFICIENT SUB-/NEAR-THRESHOLD COMPUTING: PLATFORM AND METHODOLOGY

Ph.DDOCTOR OF PHILOSOPH

Piezoelectric and Magnetoelectric Thick Films for Fabricating Power Sources in Wireless Sensor Nodes

In this manuscript, we review the progress made in the synthesis of thick film-based piezoelectric and magnetoelectric structures for harvesting energy from mechanical vibrations and magnetic field. Piezoelectric compositions in the system Pb(Zr,Ti)O3–Pb(Zn1/3Nb2/3)O3 (PZNT) have shown promise for providing enhanced efficiency due to higher energy density and thus form the base of transducers designed for capturing the mechanical energy. Laminate structures of PZNT with magnetostrictive ferrite materials provide large magnitudes of magnetoelectric coupling and are being targeted to capture the stray magnetic field energy. We analyze the models used to predict the performance of the energy harvesters and present a full system description

CMOS analog integrated circuit design techniques for low-powered ubiquitous device

制度:新 ; 文部省報告番号:甲2633号 ; 学位の種類:博士(工学) ; 授与年月日:2008/3/15 ; 早大学位記番号:新479

Variability-aware design of CMOS nanopower reference circuits

Questo lavoro è inserito nell'ambito della progettazione di circuiti microelettronici analogici con l'uso di tecnologie scalate, per le quali ha sempre maggiore importanza il problema della sensibilità delle grandezze alle variazioni di processo. Viene affrontata la progettazione di generatori di quantità di riferimento molto precisi, basati sull’uso di dispositivi che sono disponibili anche in tecnologie CMOS standard e che sono “intrinsecamente” più robusti rispetto alle variazioni di processo. Questo ha permesso di ottenere una bassa sensibilità al processo insieme ad un consumo di potenza estremamente ridotto, con il principale svantaggio di una elevata occupazione di area. Tutti i risultati sono stati ottenuti in una tecnologia 0.18μm CMOS. In particolare, abbiamo progettato un riferimento di tensione, ottenendo una deviazione standard relativa della tensione di riferimento dello 0.18% e un consumo di potenza inferiore a 70 nW, sulla base di misure su un set di 20 campioni di un singolo batch. Sono anche disponibili risultati relativi alla variabilità inter batch, che mostrano una deviazione standard relativa cumulativa della tensione di riferimento dello 0.35%. Abbiamo quindi progettato un riferimento di corrente, ottenendo anche in questo caso una sensibilità al processo della corrente di riferimento dell’1.4% con un consumo di potenza inferiore a 300 nW (questi sono risultati sperimentali ottenuti dalle misure su 20 campioni di un singolo batch). I riferimenti di tensione e di corrente proposti sono stati quindi utilizzati per la progettazione di un oscillatore a rilassamento a bassa frequenza, che unisce una ridotta sensibilità al processo, inferiore al 2%, con un basso consumo di potenza, circa 300 nW, ottenuto sulla base di simulazioni circuitali. Infine, nella progettazione dei blocchi sopra menzionati, abbiamo applicato un metodo per la determinazione della stabilità dei punti di riposo, basato sull’uso dei CAD standard utilizzati per la progettazione microelettronica. Questo approccio ci ha permesso di determinare la stabilità dei punti di riposo desiderati, e ci ha anche permesso di stabilire che i circuiti di start up spesso non sono necessari

Predicting power scalability in a reconfigurable platform

This thesis focuses on the evolution of digital hardware systems. A reconfigurable platform is proposed and analysed based on thin-body, fully-depleted silicon-on-insulator Schottky-barrier transistors with metal gates and silicide source/drain (TBFDSBSOI). These offer the potential for simplified processing that will allow them to reach ultimate nanoscale gate dimensions. Technology CAD was used to show that the threshold voltage in TBFDSBSOI devices will be controllable by gate potentials that scale down with the channel dimensions while remaining within appropriate gate reliability limits. SPICE simulations determined that the magnitude of the threshold shift predicted by TCAD software would be sufficient to control the logic configuration of a simple, regular array of these TBFDSBSOI transistors as well as to constrain its overall subthreshold power growth. Using these devices, a reconfigurable platform is proposed based on a regular 6-input, 6-output NOR LUT block in which the logic and configuration functions of the array are mapped onto separate gates of the double-gate device. A new analytic model of the relationship between power (P), area (A) and performance (T) has been developed based on a simple VLSI complexity metric of the form ATσ = constant. As σ defines the performance “return” gained as a result of an increase in area, it also represents a bound on the architectural options available in power-scalable digital systems. This analytic model was used to determine that simple computing functions mapped to the reconfigurable platform will exhibit continuous power-area-performance scaling behavior. A number of simple arithmetic circuits were mapped to the array and their delay and subthreshold leakage analysed over a representative range of supply and threshold voltages, thus determining a worse-case range for the device/circuit-level parameters of the model. Finally, an architectural simulation was built in VHDL-AMS. The frequency scaling described by σ, combined with the device/circuit-level parameters predicts the overall power and performance scaling of parallel architectures mapped to the array

Optimisation de dispositifs FDSOI pour la gestion de la consommation et de la vitesse (application aux mémoires et fonctions logiques)

Avec la percée des téléphones portables et des tablettes numériques intégrant des fonctions avancées de traitement de l'information, une croissance exponentielle du marché des systèmes sur puce (SoC pour System On Chip en anglais) est attendue jusqu'en 2016. Ces systèmes, conçus dans les dernières technologies nanométriques, nécessitent des vitesses de fonctionnement très élevées pour offrir des performances incroyables, tout en consommant remarquablement peu. Cependant, concevoir de tels systèmes à l'échelle nanométrique présente de nombreux enjeux en raison de l'accentuation d'effets parasites avec la miniaturisation des transistors MOS sur silicium massif, rendant les circuits plus sensibles aux phénomènes de fluctuations des procédés de fabrication et moins efficaces énergétiquement. La technologie planaire complètement désertée (FD pour Fully depleted en anglais) SOI, offrant un meilleur contrôle du canal du transistor et une faible variabilité de sa tension de seuil grâce à un film de silicium mince et non dopé, apparaît comme une solution technologique très bien adaptée pour répondre aux besoins de ces dispositifs nomades alliant hautes performances et basse consommation. Cependant pour que cette technologie soit viable, il est impératif qu'elle réponde aux besoins des plateformes de conception basse consommation. Un des défis majeurs de l'état de l'art de la technologie planaire FDSOI est de fournir les différentes tensions de seuils (VT) requises pour la gestion de la consommation et de la vitesse. Le travail de recherche de thèse présenté dans ce mémoire a contribué à la mise en place d'une plateforme de conception multi-VT en technologie planaire FDSOI sur oxyde enterré mince (UTB pour Ultra Thin Buried oxide en anglais) pour les nœuds technologiques sub-32 nm. Pour cela, les éléments clefs des plateformes de conception basse consommation en technologie planaire sur silicium massif ont été identifiés. A la suite de cette analyse, différentes architectures de transistors MOS multi-VT FDSOI ont été développées. L'analyse au niveau des circuits numériques et mémoires élémentaires a permis de mettre en avant deux solutions fiables, efficaces et de faible complexité technologique. Les performances des solutions apportées ont été évaluées sur un chemin critique extrait du cœur de processeur ARM Cortex A9 et sur une cellule SRAM 6T haute densité (0,120 m ). Egalement, une cellule SRAM à quatre transistors est proposée, démontrant la flexibilité au niveau conception des solutions proposées. Ce travail de recherche a donné lieu à de nombreuses publications, communications et brevets. Aujourd'hui, la majorité des résultats obtenus ont été transférés chez STMicroelectronics, où l'étude de leur industrialisation est en cours.Driven by the strong growth of smartphone and tablet devices, an exponential growth for the mobile SoC market is forecasted up to 2016. These systems, designed in the latest nanometre technology, require very high speeds to deliver tremendous performances, while consuming remarkably little. However, designing such systems at the nanometre scale introduces many challenges due to the emphasis of parasitic phenomenon effects driven by the scaling of bulk MOSFETs, making circuits more sensitive to the manufacturing process fluctuations and less energy efficient. Undoped thin-film planar fully depleted silicon-on-insulator (FDSOI) devices are being investigated as an alternative to bulk devices in 28nm node and beyond, thanks to its excellent short-channel electrostatic control, low leakage currents and immunity to random dopant fluctuation. This compelling technology appears to meet the needs of nomadic devices, combining high performance and low power consumption. However, to be useful, it is essential that this technology is compatible with low operating power design platforms. A major challenge for this technology is to provide various device threshold voltages (VT), trading off power consumption and speed. The research work presented in this thesis has contributed to the development of a multi-VT design platform in FDSOI planar technology on thin buried oxide (UTB) for the 28nm and below technology nodes. In this framework, the key elements of the low power design platform in bulk planar technology have been studied. Based on this analysis, different architectures of FDSOI multi-VT MOSFETs have been developed. The analysis on the layout of elementary circuits, such as standard cells and SRAM cells, has put forward two reliable, efficient and low technological complexity multi- strategies. Finally, the performances of these solutions have been evaluated on a critical path extracted from the ARM Cortex A9 processor and a high-density 6T SRAM cell (0.120 m ). Also, an SRAM cell with four transistors has been proposed, highlighting the design flexibility brought by these solutions. This thesis has resulted in many publications, communications and patents. Today, the majority of the results obtained have been transferred to STMicroelectronics, where the industrialization is in progress.SAVOIE-SCD - Bib.électronique (730659901) / SudocGRENOBLE1/INP-Bib.électronique (384210012) / SudocGRENOBLE2/3-Bib.électronique (384219901) / SudocSudocFranceF