892 research outputs found

    Characterization and Modeling of High Power Microwave Effects in CMOS Microelectronics

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    The intentional use of high power microwave (HPM) signals to disrupt microelectronic systems is a substantial threat to vital infrastructure. Conventional methods to assess HPM threats involve empirical testing of electronic equipment, which provides no insight into fundamental mechanisms of HPM induced upset. The work presented in this dissertation is part of a broad effort to develop more effective means for HPM threat assessment. Comprehensive experimental evaluation of CMOS digital electronics was performed to provide critical information of the elementary mechanisms that govern the dynamics of HPM effects. Results show that electrostatic discharge (ESD) protection devices play a significant role in the behavior of circuits irradiated by HPM pulses. The PN junctions of the ESD protection devices distort HPM waveforms producing DC voltages at the input of the core logic elements, which produces output bit errors and abnormal circuit power dissipation. The dynamic capacitance of these devices combines with linear parasitic elements to create resonant structures that produce nonlinear circuit dynamics such as spurious oscillations. The insight into the fundamental mechanisms this research has revealed will contribute substantially to the broader effort aimed at identifying and mitigating susceptibilities in critical systems. Also presented in this work is a modeling technique based on scalable analytical circuit models that accounts for the non-quasi-static behavior of the ESD protection PN junctions. The results of circuit simulations employing these device models are in excellent agreement with experimental measurements, and are capable of predicting the threshold of effect for HPM driven non-linear circuit dynamics. For the first time, a deterministic method of evaluating HPM effects based on physical, scalable device parameters has been demonstrated. The modeling presented in this dissertation can be easily integrated into design cycles and will greatly aid the development of electronic systems with improved HPM immunity

    Novel Rail Clamp Architectures and Their Systematic Design

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    abstract: Rail clamp circuits are widely used for electrostatic discharge (ESD) protection in semiconductor products today. A step-by-step design procedure for the traditional RC and single-inverter-based rail clamp circuit and the design, simulation, implementation, and operation of two novel rail clamp circuits are described for use in the ESD protection of complementary metal-oxide-semiconductor (CMOS) circuits. The step-by-step design procedure for the traditional circuit is technology-node independent, can be fully automated, and aims to achieve a minimal area design that meets specified leakage and ESD specifications under all valid process, voltage, and temperature (PVT) conditions. The first novel rail clamp circuit presented employs a comparator inside the traditional circuit to reduce the value of the time constant needed. The second circuit uses a dynamic time constant approach in which the value of the time constant is dynamically adjusted after the clamp is triggered. Important metrics for the two new circuits such as ESD performance, latch-on immunity, clamp recovery time, supply noise immunity, fastest power-on time supported, and area are evaluated over an industry-standard PVT space using SPICE simulations and measurements on a fabricated 40 nm test chip.Dissertation/ThesisDoctoral Dissertation Electrical Engineering 201

    Design, Characterization and Analysis of Component Level Electrostatic Discharge (ESD) Protection Solutions

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    Electrostatic Discharges (ESD) is a significant hazard to electronic components and systems. Based on a specific process technology, a given circuit application requires a customized ESD consideration that meets all the requirements such as the core circuit\u27s operating condition, maximum accepted leakage current, breakdown conditions for the process and overall device sizes. In every several years, there will be a new process technology becomes mature, and most of those new technology requires custom design of effective ESD protection solution. And usually the design window will shrinks due to the evolving of the technology becomes smaller and smaller. The ESD related failure is a major IC reliability concern and results in a loss of millions dollars each year in the semiconductor industry. To emulate the real word stress condition, several ESD stress models and test methods have been developed. The basic ESD models are Human Body model (HBM), Machine Mode (MM), and Charge Device Model (CDM). For the system-level ESD robustness, it is defined by different standards and specifications than component-level ESD requirements. International Electrotechnical Commission (IEC) 61000-4-2 has been used for the product and the Human Metal Model (HMM) has been used for the system at the wafer level. Increasingly stringent design specifications are forcing original equipment manufacturers (OEMs) to minimize the number of off-chip components. This is the case in emerging multifunction mobile, industrial, automotive and healthcare applications. It requires a high level of ESD robustness and the integrated circuit (IC) level, while finding ways to streamline the ESD characterization during early development cycle. To enable predicting the ESD performance of IC\u27s pins that are directly exposed to a system-level stress condition, a new the human metal model (HMM) test model has been introduced. In this work, a new testing methodology for product-level HMM characterization is introduced. This testing framework allows for consistently identifying ESD-induced failures in a product, substantially simplifying the testing process, and significantly reducing the product evaluation time during development cycle. It helps eliminates the potential inaccuracy provided by the conventional characterization methodology. For verification purposes, this method has been applied to detect the failures of two different products. Addition to the exploration of new characterization methodology that provides better accuracy, we also have looked into the protection devices itself. ICs for emerging high performance precision data acquisition and transceivers in industrial, automotive and wireless infrastructure applications require effective and ESD protection solutions. These circuits, with relatively high operating voltages at the Input/Output (I/O) pins, are increasingly being designed in low voltage Complementary Metal-Oxide-Semiconductor (CMOS) technologies to meet the requirements of low cost and large scale integration. A new dual-polarity SCR optimized for high bidirectional blocking voltages, high trigger current and low capacitance is realized in a sub 3-V, 180-nm CMOS process. This ESD device is designed for a specific application where the operating voltage at the I/O is larger than that of the core circuit. For instance, protecting high voltage swing I/Os in CMOS data acquisition system (DAS) applications. In this reference application, an array of thin film resistors voltage divider is directly connected to the interface pin, reducing the maximum voltage that is obtained at the core device input down to ± 1-5 V. Its ESD characteristics, including the trigger voltage and failure current, are compared against those of a typical CMOS-based SCR. Then, we have looked into the ESD protection designs into more advanced technology, the 28-nm CMOS. An ESD protection design builds on the multiple discharge-paths ESD cell concept and focuses the attention on the detailed design, optimization and realization of the in-situ ESD protection cell for IO pins with variable operation voltages. By introducing different device configurations fabricated in a 28-nm CMOS process, a greater flexibility in the design options and design trade-offs can be obtained in the proposed topology, thus achieving a higher integration and smaller cell size definition for multi-voltage compatibility interface ESD protection applications. This device is optimized for low capacitance and synthesized with the circuit IO components for in-situ ESD protection in communication interface applications developed in a 28-nm, high-k, and metal-gate CMOS technology. ESD devices have been used in different types of applications and also at different environment conditions, such as high temperature. At the last section of this research work, we have performed an investigation of several different ESD devices\u27 performance under various temperature conditions. And it has been shown that the variations of the device structure can results different ESD performance, and some devices can be used at the high temperature and some cannot. And this investigation also brings up a potential threat to the current ESD protection devices that they might be very vulnerable to the latch-up issue at the higher temperature range

    Characterization of an Integrated Circuit with Respect to Electrostatic Discharge-Induced Soft Failures

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    This research proposal presents a methodology whereby an integrated circuit (IC) can be characterized with respect to soft-failures induced by Electrostatic Discharge (ESD)-like events. This methodology uses an exclusively black-box approach to determine the response of an IC in a system-level environment, thereby allowing it to be implemented without intimate knowledge of the DUT IC. Results from this methodology can be referenced during system design to raise awareness of specific vulnerabilities of the core system ICs. During work on this methodology, several sub topics have been explored and developed in the field of system-level ESD. Sections 2 and 3 introduce two topics which were developed to facilitate the generation and expression of IC pin models. Papers 1 and 2 introduce injection methods for characterizing complete systems on an interface-by-interface basis and form the foundation for the following works. Papers 2 and 3 mirror Papers 1 and 2 but instead shift focus away from the system as a whole and outline methods for characterizing the integrated circuits directly. Finally, Section 4 outlines a model method which can be used to describe the failures found in Paper 4 in circuit simulation, rounding out the work. Additional measurements which were unable to be included in Paper 4 are included in Appendices A, B, and C --Abstract, page iv

    Design and Simulation of Device Failure Models for Electrostatic Discharge (ESD) Event

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    In this dissertation, the research mainly focused on discussing ESD failure event simulation and ESD modeling, seeking solutions for ESD issues by simulating ESD event and predict possible ESD reliability problem in IC design. The research involves failure phenomenon caused by ESD/ EOS stress, mainly on the thermal failure due to inevitable self-heating during an ESD stress. Standard Complementary Metal-Oxide-Semiconductor (CMOS) process and high voltage Doublediffusion Metal-Oxide-Semiconductor (DMOS) process are used for design of experiment. A multi-function test platform High Power Pulse Instrument (HPPI) is used for ESD event evaluation and device characterization. SPICE-like software ADICE is for back-end simulation. Electrostatic Discharges (ESD) is one of the hazard that may affect IC circuit function and cause serious damage to the chip. The importance of ESD protection has been raised since the CMOS technology advanced and the dimension of transistors scales down. On the other hand, the variety of applications of chips is also making corresponding ESD protection difficult to meet different design requirement. Aside from typical requirements such as core circuit operation voltage, maximum accepted leakage current, breakdown conditions for the process and overall device sizes, special applications like radio frequency and power electronic requires ESD to be low parasitic capacitance and can sustain high level energy. In that case, a proper ESD protection design demands not only a robust ESD protection scheme, but co-design with the inner circuit. For that purpose, it is necessary to simulate the results of ESD impact on IC and find out possible weak point of the circuit and improve it. The first step of the simulation is to have corresponding models available. Unfortunately, ESD models, especially there are lack of circuit-level ESD models that provide quick and accurate prediction of ESD event. In this dissertation paper, ESD models, especially ESD failure models for device thermal failure are introduced, with modeling methodology accordingly. First, an introduction for ESD event and typical ESD protection schemes are introduced. Its purpose is to give basic concept of ESD. For ESD failure models, two typical types can be categorized depends on the physical mechanisms that cause the ESD damage. One is the gate oxide breakdown, which is electric field related. The other is the thermal-related failure, which stems from the self-heating effect associated with the large current passing through the ESD protection structure. The first one has become increasingly challenging with the aggressive scaling of the gate dielectric in advanced processes and ESD protection for that need to be carefully designed. The second one, thermal failure widely exists in semiconductor devices as long as there is ESD current flow through the device and accumulate heat at junctions. Considering the universality of thermal failure in ESD device, it is imperative to establish a model to simulate ESD caused thermal failure. Several works related to ESD model can be done. One crucial part for a failure model is to define the failure criterion. As common solution for ESD simulation and failure prediction. The maximum current level or breakdown voltage is used to judge whether a device fails under ESD stresses. Such failure criteria based on measurable voltage or current values are straightforward and can be easy to implemented in simulation tools. However, the shortcoming of these failure criteria is each failure criterion is specifically designed for certain ESD stress condition. For example, the failure voltage level for Human Body Model and Charged Device Model are quite different, and it is hard to judge a device\u27s ESD capability under standard test conditions based on its transmission line pulse test result. So it is necessary to look deeper into the physical mechanism of device failure under ESD and find a more universal failure criterion for various stress conditions. As one of the major failure mechanisms, thermal failure evaluated by temperature is a more universal failure criterion for device failure under ESD stress. Whatever the stress model is, the device will fail if a critical temperature is reached at certain part inside the device and cause structural damage. Then finding out that critical temperature is crucial to define the failure point for device thermal failure. One chapter of this dissertation will focus on discussing this issue and propose a simple method to give close estimation of the real failure temperature for typical ESD devices. Combined these related works, a comprehensive diode model for ESD simulation is proposed. Using existing ESD models, diode I-V characteristic from low current turn-on to high current saturation can be simulated. By using temperature as the failure criterion, the last point of diode operation, or the second breakdown point, can be accurately predicted. Additional investigation of ESD capability of devices for special case like vertical GaN diode is discussed in Chapter IV. Due to the distinct material property of GaN, the vertical GaN diode exhibits unique and interesting quasi-static I-V curves quite different from conventional silicon semiconductor devices. And that I-V curve varies with different pulse width, indicating strong conductivity modulation of diode neutral region that will delay the complete turn-on of the vertical GaN diode

    Design, Characterization And Compact Modeling Of Novel Silicon Controlled Rectifier (scr)-based Devices For Electrostatic Discha

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    Electrostatic Discharge (ESD), an event of a sudden transfer of electrons between two bodies at different potentials, happens commonly throughout nature. When such even occurs on integrated circuits (ICs), ICs will be damaged and failures result. As the evolution of semiconductor technologies, increasing usage of automated equipments and the emerging of more and more complex circuit applications, ICs are more sensitive to ESD strikes. Main ESD events occurring in semiconductor industry have been standardized as human body model (HBM), machine model (MM), charged device model (CDM) and international electrotechnical commission model (IEC) for control, monitor and test. In additional to the environmental control of ESD events during manufacturing, shipping and assembly, incorporating on-chip ESD protection circuits inside ICs is another effective solution to reduce the ESD-induced damage. This dissertation presents design, characterization, integration and compact modeling of novel silicon controlled rectifier (SCR)-based devices for on-chip ESD protection. The SCR-based device with a snapback characteristic has long been used to form a VSS-based protection scheme for on-chip ESD protection over a broad rang of technologies because of its low on-resistance, high failure current and the best area efficiency. The ESD design window of the snapback device is defined by the maximum power supply voltage as the low edge and the minimum internal circuitry breakdown voltage as the high edge. The downscaling of semiconductor technology keeps on squeezing the design window of on-chip ESD protection. For the submicron process and below, the turn-on voltage and sustain voltage of ESD protection cell should be lower than 10 V and higher than 5 V, respectively, to avoid core circuit damages and latch-up issue. This presents a big challenge to device/circuit engineers. Meanwhile, the high voltage technologies push the design window to another tough range whose sustain voltage, 45 V for instance, is hard for most snapback ESD devices to reach. Based on the in-depth elaborating on the principle of SCR-based devices, this dissertation first presents a novel unassisted, low trigger- and high holding-voltage SCR (uSCR) which can fit into the aforesaid ESD design window without involving any extra assistant circuitry to realize an area-efficient on-chip ESD protection for low voltage applications. The on-chip integration case is studied to verify the protection effectiveness of the design. Subsequently, this dissertation illustrate the development of a new high holding current SCR (HHC-SCR) device for high voltage ESD protection with increasing the sustain current, not the sustain voltage, of the SCR device to the latchup-immune level to avoid sacrificing the ESD protection robustness of the device. The ESD protection cells have been designed either by using technology computer aided design (TCAD) tools or through trial-and-error iterations, which is cost- or time-consuming or both. Also, the interaction of ESD protection cells and core circuits need to be identified and minimized at pre-silicon stage. It is highly desired to design and evaluate the ESD protection cell using simulation program with integrated circuit emphasis (SPICE)-like circuit simulation by employing compact models in circuit simulators. And the compact model also need to predict the response of ESD protection cells to very fast transient ESD events such as CDM event since it is a major ESD failure mode. The compact model for SCR-based device is not widely available. This dissertation develops a macromodeling approach to build a comprehensive SCR compact model for CDM ESD simulation of complete I/O circuit. This modeling approach offers simplicity, wide availability and compatibility with most commercial simulators by taking advantage of using the advanced BJT model, Vertical Bipolar Inter-Company (VBIC) model. SPICE Gummel-Poon (SGP) model has served the ICs industry well for over 20 years while it is not sufficiently accurate when using SGP model to build a compact model for ESD protection SCR. This dissertation seeks to compare the difference of SCR compact model built by using VBIC and conventional SGP in order to point out the important features of VBIC model for building an accurate and easy-CAD implement SCR model and explain why from device physics and model theory perspectives

    Characterisation of on-chip electrostatic discharge waveforms with sub-nanosecond resolution: design of a differential high voltage probe with high bandwidth

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    Bliksem werd tot aan de ontdekking van de bliksemafleider (18e eeuw) gezien als een van de gevaarlijkste bedreigingen voor het stadsleven. Door het gebruik van micro-elektronica werden ingenieurs gewaar dat ditzelfde fysische verschijnsel, elektrostatische ontlading of ESD genoemd, zich ook op microscopische schaal voordoet. In de jaren zeventig was meer dan 30% van al het chipfalen te wijten aan ESD. Om dit tegen te gaan werd met het onderzoek naar ESD-protecties en -meetsystemen aangevangen. Om meer informatie over het gedrag van een ESD-protectie te verkrijgen wordt een ESD-puls op dit systeem losgelaten. Het antwoord van de protectie op deze puls wordt dan bepaald m.b.v. spannings- en stroomgolfvormmetingen. In dit werk wordt een nieuwe nauwkeurige ESD-golfvormmeettechniek voorgesteld die directe metingen op protecties kan uitvoeren. De karakterisering van ESD-golfvormen op chip wordt enorm bemoeilijkt door de grote hoeveelheid elektromagnetische interferentie die de ESD-puls veroorzaakt. Dit wordt omzeild door het gewenste signaal naar een veilige omgeving te transporteren, waar een standaard meettoestel de meting kan uitvoeren. Dit transport wordt gerealiseerd m.b.v. optische communicatie, wat immuun is voor elektromagnetische interferentie. Zo kan nauwkeurige in-situ-informatie worden verkregen waarmee de ESD-protecties in de toekomst verbeterd kunnen worden.Up to the 18th century, lightning was considered one of nature’s most dangerous threats in city life. This all ended with the lightning rod, protecting thousands of homes during lightning storms. The large-scale use of microelectronics has made engineers aware of the same physical phenomenon occuring on a microscopic scale. This phenomenon is called electrostatic discharge or ESD. In the seventies, more than 30% of all chip failure was attributed to static electricity. To counter this effect, the research for on-chip ESD protections was born. Today ESD is a buzzing line of research, as with new and faster chip technologies comes a higher ESD vulnerability. This makes ESD protection and measurement increasingly important. Although ESD is now a major subject in chip design, it copes with a lack of accurate device models. To gain more information on the exact operation of an ESD protection, an ESD pulse is unleashed upon this device. The response of the protection on this pulse is then assessed by performing voltage or current waveform measurements. This work presents a waveform measurement technique able to accurately perform direct measurements on the ESD protection. Due to the high amount of electromagnetic interference caused by the ESD pulse, direct waveform characterisation near the protection is hard. This is solved by transporting the target signal into a clean area, where the measurement is performed by standard lab equipment. The key is that this transportation is realized by means of optical communication, which is immune to electromagnetic interference. This way, accurate in situ information can be used to protect tomorrow’s chips

    Design And Characterization Of Noveldevices For New Generation Of Electrostaticdischarge (esd) Protection Structures

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    The technology evolution and complexity of new circuit applications involve emerging reliability problems and even more sensitivity of integrated circuits (ICs) to electrostatic discharge (ESD)-induced damage. Regardless of the aggressive evolution in downscaling and subsequent improvement in applications\u27 performance, ICs still should comply with minimum standards of ESD robustness in order to be commercially viable. Although the topic of ESD has received attention industry-wide, the design of robust protection structures and circuits remains challenging because ESD failure mechanisms continue to become more acute and design windows less flexible. The sensitivity of smaller devices, along with a limited understanding of the ESD phenomena and the resulting empirical approach to solving the problem have yielded time consuming, costly and unpredictable design procedures. As turnaround design cycles in new technologies continue to decrease, the traditional trial-and-error design strategy is no longer acceptable, and better analysis capabilities and a systematic design approach are essential to accomplish the increasingly difficult task of adequate ESD protection-circuit design. This dissertation presents a comprehensive design methodology for implementing custom on-chip ESD protection structures in different commercial technologies. First, the ESD topic in the semiconductor industry is revised, as well as ESD standards and commonly used schemes to provide ESD protection in ICs. The general ESD protection approaches are illustrated and discussed using different types of protection components and the concept of the ESD design window. The problem of implementing and assessing ESD protection structures is addressed next, starting from the general discussion of two design methods. The first ESD design method follows an experimental approach, in which design requirements are obtained via fabrication, testing and failure analysis. The second method consists of the technology computer aided design (TCAD)-assisted ESD protection design. This method incorporates numerical simulations in different stages of the ESD design process, and thus results in a more predictable and systematic ESD development strategy. Physical models considered in the device simulation are discussed and subsequently utilized in different ESD designs along this study. The implementation of new custom ESD protection devices and a further integration strategy based on the concept of the high-holding, low-voltage-trigger, silicon controlled rectifier (SCR) (HH-LVTSCR) is demonstrated for implementing ESD solutions in commercial low-voltage digital and mixed-signal applications developed using complementary metal oxide semiconductor (CMOS) and bipolar CMOS (BiCMOS) technologies. This ESD protection concept proposed in this study is also successfully incorporated for implementing a tailored ESD protection solution for an emerging CMOS-based embedded MicroElectroMechanical (MEMS) sensor system-on-a-chip (SoC) technology. Circuit applications that are required to operate at relatively large input/output (I/O) voltage, above/below the VDD/VSS core circuit power supply, introduce further complications in the development and integration of ESD protection solutions. In these applications, the I/O operating voltage can extend over one order of magnitude larger than the safe operating voltage established in advanced technologies, while the IC is also required to comply with stringent ESD robustness requirements. A practical TCAD methodology based on a process- and device- simulation is demonstrated for assessment of the device physics, and subsequent design and implementation of custom P1N1-P2N2 and coupled P1N1-P2N2//N2P3-N3P1 silicon controlled rectifier (SCR)-type devices for ESD protection in different circuit applications, including those applications operating at I/O voltage considerably above/below the VDD/VSS. Results from the TCAD simulations are compared with measurements and used for developing technology- and circuit-adapted protection structures, capable of blocking large voltages and providing versatile dual-polarity symmetric/asymmetric S-type current-voltage characteristics for high ESD protection. The design guidelines introduced in this dissertation are used to optimize and extend the ESD protection capability in existing CMOS/BiCMOS technologies, by implementing smaller and more robust single- or dual-polarity ESD protection structures within the flexibility provided in the specific fabrication process. The ESD design methodologies and characteristics of the developed protection devices are demonstrated via ESD measurements obtained from fabricated stand-alone devices and on-chip ESD protections. The superior ESD protection performance of the devices developed in this study is also successfully verified in IC applications where the standard ESD protection approaches are not suitable to meet the stringent area constraint and performance requirement

    Analysis of design strategies for RF ESD problems in CMOS circuits

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    This thesis analyses the design strategies used to protect RF circuits that are implemented in CMOS technologies. It investigates, in detail, the physical mechanisms involved when a ggNMOS structure is exposed to an ESD event and undergoes snapback. The understanding gained is used to understand why the performance of the current RF ESD clamp is poor and suggestions are made as to how the performance of ggNMOS clamps can be improved beyond the current body of knowledge. The ultimate aim is to be able to design effective ESD protection clamps whilst minimising the effect the circuit has on RF I/O signals. A current ggNMOS based RF ESD I/O protection circuit is analysed in detail using a Transmission Line Pulse (TLP) tester. This is shown to be a very effective diagnostic tool by showing many characteristics of the ggNMOS during the triggering and conducting phase of the ESD event and demonstrate deficiencies in the clamp design. The use of a FIB enhances the analysis by allowing the isolation of individual components in the circuit and therefore their analysis using the TLP tester. SPICE simulations are used to provide further commentary on the debate surrounding the specification required of a TLP tester for there to be a good correlation between a TLP test and the industry standard Human Body Model (HBM) ESD test. Finite element simulations are used to probe deeper in to the mechanisms involved when a ggNMOS undergoes snapback especially with regard to the contribution parasitic components within the ggNMOS make to the snapback process. New ggNMOS clamps are proposed which after some modification are shown to work. Some of the finite element experiments are repeated in a 0.18μπ7. process CMOS test chip and a comparison is made between the two sets of results. In the concluding chapter understanding that has been gained from previous chapters is combined with the published body of knowledge to suggest and explain improvements in the design of a ggNMOS for RF and standard applications. These improvements will improve homogeneity of ggNMOS operation thus allowing the device size to be reduced and parasitic loading for a given ESD performance. These techniques can also be used to ensure that the ESD current does not take an unintended path through the chip

    High-speed Analog-to-digital Converters For Modern Satellite Receivers: Design Verification Test And Sensitivity Analysis

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    Mixed-signal System-on-chip devices such as analog-to-digital converters (ADCs) have become increasingly prevalent in the semiconductor industry. Since the complexity and applications are different for each device, complex testing and characterization methods are required. Specifically, signal integrity in I/O interfaces requires that standard RF design and test techniques must be integrated into mixed signal processes. While such techniques may be difficult to implement, on-chip test-vehicles and RF circuitry offer the possibility of wireless approaches to chip testing. This would eliminate expensive wafer probing solution to verify the design of high-speed ADC functionality currently required for high-speed product evaluation. This thesis describes a new high-speed analog-to-digital converter test methodology. The target systems used on-chip digital de-multiplexing and clock distribution. A detail sequence of performance testing operations is presented. Digital outputs are post processed and fed into a computer-aided ADC performance characterization tool which is custom-developed in a MATLAB GUI. The problems of high sampling rate ADC testing are described. The test methodologies described reduce test costs and overcome many test hardware limitations. As our focus is on satellite receiver systems, we emphasize the measurement of inter-modulation distortion and effective resolution bandwidth. As a primary characterization component, Fourier analysis is used and we address the issue of sample window adjustment to eliminate spectral leakage and false spur generation. A 6-bit 800 MSamples/sec dual channel SiGe-based ADC is used as a target example and investigated on the corner lot process variations to determine the impact of process variations and the sensitivity of the ADCs to critical process parameter variations
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