Semiconductor Device Modeling, Simulation, and Failure Prediction for Electrostatic Discharge Conditions

Electrostatic Discharge (ESD) caused failures are major reliability issues in IC industry. Device modeling for ESD conditions is necessary to evaluate ESD robustness in simulation. Although SPICE model is accurate and efficient for circuit simulations in most cases, devices under ESD conditions operate in abnormal status. SPICE model cannot cover the device operating region beyond normal operation. Thermal failure is one of the main reasons to cause device failure under ESD conditions. A compact model is developed to predict thermal failure with circuit simulators. Instead of considering the detailed failure mechanisms, a failure temperature is introduced to indicate device failure. The developed model is implemented by a multiple-stage thermal network. P-N junction is the fundamental structure for ESD protection devices. An enhanced diode model is proposed and is used to simulate the device behaviors for ESD events. The model includes all physical effects for ESD conditions, which are voltage overshoot, self-heating effect, velocity saturation and thermal failure. The proposed model not only can fit the I-V and transient characteristics, but also can predict failure for different pulses. Safe Operating Area (SOA) is an important factor to evaluate the LDMOS performance. The transient SOA boundary is considered as power-defined. By placing the failure monitor under certain conditions, the developed modeling methodology can predict the boundary of transient SOA for any short pulse stress conditions. No matter failure happens before or after snapback phenomenon. Weibull distribution is popular to evaluate the dielectric lifetime for CVS. By using the transformative version of power law, the pulsing stresses are converted into CVS, and TDDB under ESD conditions for SiN MIMCAPs is analyzed. The thickness dependency and area independency of capacitor breakdown voltage is observed, which can be explained by the constant ?E model instead of conventional percolation model

Design, Characterization And Analysis Of Electrostatic Discharge (esd) Protection Solutions In Emerging And Modern Technologies

Electrostatic Discharge (ESD) is a significant hazard to electronic components and systems. Based on a specific processing technology, a given circuit application requires a customized ESD consideration that includes the devices’ operating voltage, leakage current, breakdown constraints, and footprint. As new technology nodes mature every 3-5 years, design of effective ESD protection solutions has become more and more challenging due to the narrowed design window, elevated electric field and current density, as well as new failure mechanisms that are not well understood. The endeavor of this research is to develop novel, effective and robust ESD protection solutions for both emerging technologies and modern complementary metal–oxide–semiconductor (CMOS) technologies. The Si nanowire field-effect transistors are projected by the International Technology Roadmap for Semiconductors as promising next-generation CMOS devices due to their superior DC and RF performances, as well as ease of fabrication in existing Silicon processing. Aiming at proposing ESD protection solutions for nanowire based circuits, the dimension parameters, fabrication process, and layout dependency of such devices under Human Body Mode (HBM) ESD stresses are studied experimentally in company with failure analysis revealing the failure mechanism induced by ESD. The findings, including design methodologies, failure mechanism, and technology comparisons should provide practical knowhow of the development of ESD protection schemes for the nanowire based integrated circuits. Organic thin-film transistors (OTFTs) are the basic elements for the emerging flexible, printable, large-area, and low-cost organic electronic circuits. Although there are plentiful studies focusing on the DC stress induced reliability degradation, the operation mechanism of OTFTs iv subject to ESD is not yet available in the literature and are urgently needed before the organic technology can be pushed into consumer market. In this work, the ESD operation mechanism of OTFT depending on gate biasing condition and dimension parameters are investigated by extensive characterization and thorough evaluation. The device degradation evolution and failure mechanism under ESD are also investigated by specially designed experiments. In addition to the exploration of ESD protection solutions in emerging technologies, efforts have also been placed in the design and analysis of a major ESD protection device, diodetriggered-silicon-controlled-rectifier (DTSCR), in modern CMOS technology (90nm bulk). On the one hand, a new type DTSCR having bi-directional conduction capability, optimized design window, high HBM robustness and low parasitic capacitance are developed utilizing the combination of a bi-directional silicon-controlled-rectifier and bi-directional diode strings. On the other hand, the HBM and Charged Device Mode (CDM) ESD robustness of DTSCRs using four typical layout topologies are compared and analyzed in terms of trigger voltage, holding voltage, failure current density, turn-on time, and overshoot voltage. The advantages and drawbacks of each layout are summarized and those offering the best overall performance are suggested at the en

Simulation of charge-trapping in nano-scale MOSFETs in the presence of random-dopants-induced variability

The growing variability of electrical characteristics is a major issue associated with continuous downscaling of contemporary bulk MOSFETs. In addition, the operating conditions brought about by these same scaling trends have pushed MOSFET degradation mechanisms such as Bias Temperature Instability (BTI) to the forefront as a critical reliability threat. This thesis investigates the impact of this ageing phenomena, in conjunction with device variability, on key MOSFET electrical parameters. A three-dimensional drift-diffusion approximation is adopted as the simulation approach in this work, with random dopant fluctuations—the dominant source of statistical variability—included in the simulations. The testbed device is a realistic 35 nm physical gate length n-channel conventional bulk MOSFET. 1000 microscopically different implementations of the transistor are simulated and subjected to charge-trapping at the oxide interface. The statistical simulations reveal relatively rare but very large threshold voltage shifts, with magnitudes over 3 times than that predicted by the conventional theoretical approach. The physical origin of this effect is investigated in terms of the electrostatic influences of the random dopants and trapped charges on the channel electron concentration. Simulations with progressively increased trapped charge densities—emulating the characteristic condition of BTI degradation—result in further variability of the threshold voltage distribution. Weak correlations of the order of 10-2 are found between the pre-degradation threshold voltage and post-degradation threshold voltage shift distributions. The importance of accounting for random dopant fluctuations in the simulations is emphasised in order to obtain qualitative agreement between simulation results and published experimental measurements. Finally, the information gained from these device-level physical simulations is integrated into statistical compact models, making the information available to circuit designers

Design And Characterization Of Noveldevices For New Generation Of Electrostaticdischarge (esd) Protection Structures

The technology evolution and complexity of new circuit applications involve emerging reliability problems and even more sensitivity of integrated circuits (ICs) to electrostatic discharge (ESD)-induced damage. Regardless of the aggressive evolution in downscaling and subsequent improvement in applications\u27 performance, ICs still should comply with minimum standards of ESD robustness in order to be commercially viable. Although the topic of ESD has received attention industry-wide, the design of robust protection structures and circuits remains challenging because ESD failure mechanisms continue to become more acute and design windows less flexible. The sensitivity of smaller devices, along with a limited understanding of the ESD phenomena and the resulting empirical approach to solving the problem have yielded time consuming, costly and unpredictable design procedures. As turnaround design cycles in new technologies continue to decrease, the traditional trial-and-error design strategy is no longer acceptable, and better analysis capabilities and a systematic design approach are essential to accomplish the increasingly difficult task of adequate ESD protection-circuit design. This dissertation presents a comprehensive design methodology for implementing custom on-chip ESD protection structures in different commercial technologies. First, the ESD topic in the semiconductor industry is revised, as well as ESD standards and commonly used schemes to provide ESD protection in ICs. The general ESD protection approaches are illustrated and discussed using different types of protection components and the concept of the ESD design window. The problem of implementing and assessing ESD protection structures is addressed next, starting from the general discussion of two design methods. The first ESD design method follows an experimental approach, in which design requirements are obtained via fabrication, testing and failure analysis. The second method consists of the technology computer aided design (TCAD)-assisted ESD protection design. This method incorporates numerical simulations in different stages of the ESD design process, and thus results in a more predictable and systematic ESD development strategy. Physical models considered in the device simulation are discussed and subsequently utilized in different ESD designs along this study. The implementation of new custom ESD protection devices and a further integration strategy based on the concept of the high-holding, low-voltage-trigger, silicon controlled rectifier (SCR) (HH-LVTSCR) is demonstrated for implementing ESD solutions in commercial low-voltage digital and mixed-signal applications developed using complementary metal oxide semiconductor (CMOS) and bipolar CMOS (BiCMOS) technologies. This ESD protection concept proposed in this study is also successfully incorporated for implementing a tailored ESD protection solution for an emerging CMOS-based embedded MicroElectroMechanical (MEMS) sensor system-on-a-chip (SoC) technology. Circuit applications that are required to operate at relatively large input/output (I/O) voltage, above/below the VDD/VSS core circuit power supply, introduce further complications in the development and integration of ESD protection solutions. In these applications, the I/O operating voltage can extend over one order of magnitude larger than the safe operating voltage established in advanced technologies, while the IC is also required to comply with stringent ESD robustness requirements. A practical TCAD methodology based on a process- and device- simulation is demonstrated for assessment of the device physics, and subsequent design and implementation of custom P1N1-P2N2 and coupled P1N1-P2N2//N2P3-N3P1 silicon controlled rectifier (SCR)-type devices for ESD protection in different circuit applications, including those applications operating at I/O voltage considerably above/below the VDD/VSS. Results from the TCAD simulations are compared with measurements and used for developing technology- and circuit-adapted protection structures, capable of blocking large voltages and providing versatile dual-polarity symmetric/asymmetric S-type current-voltage characteristics for high ESD protection. The design guidelines introduced in this dissertation are used to optimize and extend the ESD protection capability in existing CMOS/BiCMOS technologies, by implementing smaller and more robust single- or dual-polarity ESD protection structures within the flexibility provided in the specific fabrication process. The ESD design methodologies and characteristics of the developed protection devices are demonstrated via ESD measurements obtained from fabricated stand-alone devices and on-chip ESD protections. The superior ESD protection performance of the devices developed in this study is also successfully verified in IC applications where the standard ESD protection approaches are not suitable to meet the stringent area constraint and performance requirement

Design of Novel Devices and Circuits for Electrostatic Discharge Protection Applications in Advanced Semiconductor Technologies

Electrostatic Discharge (ESD), as a subset of Electrical Overstress (EOS), was reported to be in charge of more than 35% of failure in integrated circuits (ICs). Especially in the manufacturing process, the silicon wafer turns out to be a functional ICs after numerous physical, chemical and mechanical processes, each of which expose the sensitive and fragile ICs to ESD environment. In normal end-user applications, ESD from human and machine handling, surge and spike signals in the power supply, and wrong supplying signals, will probably cause severe damage to the ICs and even the whole systems. Generally, ESD protections are evaluated after wafer and even system fabrication, increasing the development period and cost if the protections cannot meet customer\u27s requirements. Therefore, it is important to design and customize robust and area-efficient ESD protections for the ICs at the early development stage. As the technologies generally scaling down, however, ESD protection clamps remain comparable area consumption in the recent years because they provide the discharging path for the ESD energy which rarely scales down. Diode is the most simple and effective device for ESD protection in ICs, but the usage is significantly limited by its low turn-on voltage. MOS devices can be triggered by a dynamic-triggered RC circuit for IOs operating at low voltage, while the one triggered by a static-triggered network, e.g., zener-resistor circuit or grounded-gate configuration, provides a high trigger voltage for high-voltage applications. However, the relatively low current discharging capability makes MOS devices as the secondary choice. Silicon-controlled rectifier (SCR) has become famous due to its high robustness and area efficiency, compared to diode and MOS. In this dissertation, a comprehensive design methodology for SCR based on simulation and measurement are presented for different advanced commercial technologies. Furthermore, an ESD clamp is designed and verified for the first time for the emerging GaN technology. For the SCR, no matter what modification is going to be made, the first concern when drawing the layout is to determine the layout geometrical style, finger width and finger number. This problem for diode and MOS device were studied in detail, so the same method was usually used in SCR. The research in this dissertation provides a closer look into the metal layout effect to the SCR, finding out the optimized robustness and minimized side-effect can be obtained by using specific layout geometry. Another concern about SCR is the relatively low turn-on speed when the IOs under protection is stressed by ESD pulses having very fast rising time, e.g., CDM and IEC 61000-4-2 pulses. On this occasion a large overshoot voltage is generated and cause damage to internal circuit component like gate oxides of MOS devices. The key determination of turn-on speed of SCR is physically investigated, followed by a novel design on SCR by directly connecting the Anode Gate and Cathode Gate to form internal trigger (DCSCR), with improved performance verified experimentally in this dissertation. The overshoot voltage and trigger voltage of the DCSCR will be significantly reduced, in return a better protection for internal circuit component is offered without scarifying neither area or robustness. Even though two SCR\u27s with single direction of ESD current path can be constructed in reverse parallel to form bidirectional protection to pins, stand-alone bidirectional SCR (BSCR) is always desirable for sake of smaller area. The inherent high trigger voltage of BSCR that only fit in high-voltage technologies is overcome by embedding a PMOS transistor as trigger element, making it highly suitable for low-voltage ESD protection applications. More than that, this modification simultaneously introduces benefits including high robustness and low overshoot voltage. For high voltage pins, however, it presents another story for ESD designs. The high operation voltages require that a high trigger voltage and high holding voltage, so as to reduce the false trigger and latch-up risk. For several capacitive pins, the displacement current induced by a large snapback will cause severe damage to internal circuits. A novel design on SCR is proposed to minimize the snapback with adjustable trigger and holding voltage. Thanks to the additional a PIN diode, the similar high robustness and stable thermal leakage performance to SCR is maintained. For academic purpose of ESD design, it is always difficult to obtain the complete process deck in TCAD simulation because those information are highly confidential to the companies. Another challenge of using TCAD is the difficulty of maintaining the accuracy of physics models and predicting the performance of the other structures. In this dissertation a TCAD-aid ESD design methodology is used to evaluate ESD performance before the silicon shuttle. GaN is a promising material for high-voltage high-power RF application compared to the GaAs. However, distinct from GaAs, the leaky problem of the schottky junction and the lack of choice of passive/active components in GaN technology limit the ESD protection design, which will be discussed in this dissertation. However, a promising ESD protection clamp is finally developed based on depletion-mode pHEMT with adjustable trigger voltage, reasonable leakage current and high robustness

MEMS Accelerometers

Micro-electro-mechanical system (MEMS) devices are widely used for inertia, pressure, and ultrasound sensing applications. Research on integrated MEMS technology has undergone extensive development driven by the requirements of a compact footprint, low cost, and increased functionality. Accelerometers are among the most widely used sensors implemented in MEMS technology. MEMS accelerometers are showing a growing presence in almost all industries ranging from automotive to medical. A traditional MEMS accelerometer employs a proof mass suspended to springs, which displaces in response to an external acceleration. A single proof mass can be used for one- or multi-axis sensing. A variety of transduction mechanisms have been used to detect the displacement. They include capacitive, piezoelectric, thermal, tunneling, and optical mechanisms. Capacitive accelerometers are widely used due to their DC measurement interface, thermal stability, reliability, and low cost. However, they are sensitive to electromagnetic field interferences and have poor performance for high-end applications (e.g., precise attitude control for the satellite). Over the past three decades, steady progress has been made in the area of optical accelerometers for high-performance and high-sensitivity applications but several challenges are still to be tackled by researchers and engineers to fully realize opto-mechanical accelerometers, such as chip-scale integration, scaling, low bandwidth, etc

NASA Tech Briefs Index, 1976

Abstracts of new technology derived from the research and development activities of the National Aeronautics and Space Administration are presented. Emphasis is placed on information considered likely to be transferrable across industrial, regional, or disciplinary lines. Subject matter covered includes: electronic components and circuits; electronic systems; physical sciences; materials; life sciences; mechanics; machinery; fabrication technology; and mathematics and information sciences

Index to 1986 NASA Tech Briefs, volume 11, numbers 1-4

Short announcements of new technology derived from the R&D activities of NASA are presented. These briefs emphasize information considered likely to be transferrable across industrial, regional, or disciplinary lines and are issued to encourage commercial application. This index for 1986 Tech Briefs contains abstracts and four indexes: subject, personal author, originating center, and Tech Brief Number. The following areas are covered: electronic components and circuits, electronic systems, physical sciences, materials, life sciences, mechanics, machinery, fabrication technology, and mathematics and information sciences