2,069 research outputs found

    Online Simulation in Semiconductor Manufacturing

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    In semiconductor manufacturing discrete event simulation systems are quite established to support multiple planning decisions. During the recent years, the productivity is increasing by using simulation methods. The motivation for this thesis is to use online simulation not only for planning decisions, but also for a wide range of operational decisions. Therefore an integrated online simulation system for short term forecasting has been developed. The production environment is a mature high mix logic wafer fab. It has been selected because of its vast potential for performance improvement. In this thesis several aspects of online simulation will be addressed: The first aspect is the implementation of an online simulation system in semiconductor manufacturing. The general problem is to achieve a high speed, a high level of detail, and a high forecast accuracy. To resolve these problems, an online simulation system has been created. The simulation model has a high level of detail. It is created automatically from underling fab data. To create such a simulation model from fab data, additional problems related to the underlying data arise. The major parts are the data access, the data integration, and the data quality. These problems have been solved by using an integrated data model with several data extraction, data transformation, and data cleaning steps. The second aspect is related to the accuracy of online simulation. The overall problem is to increase the forecast horizon, increase the level of detail of the forecast and reduce the forecast error. To provide useful forecast results, the simulation model contains a high level of modeling details and a proper initialization. The influences on the forecast quality will be analyzed. The results show that the simulation forecast accuracy achieves good quality to predict future fab performance. The last aspect is to find ways to use simulation forecast results to improve the fab performance. Numerous applications have been identified. For each application a description is available. It contains the requirements of such a forecast, the decision variables, and background information. An application example shows, where a performance problem exists and how online simulation is able to resolve it. To further enhance the real time capability of online simulation, a major part is to investigate new ways to connect the simulation model with the wafer fab. For fab driven simulation, the simulation model and the real wafer fab run concurrently. The wafer fab provides several events to update the simulation during runtime. So the model is always synchronized with the real fab. It becomes possible to start a simulation run in real time. There is no further delay for data extraction, data transformation and model creation. A prototype for a single work center has been implemented to show the feasibility

    A review of data mining applications in semiconductor manufacturing

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    The authors acknowledge Fundacao para a Ciencia e a Tecnologia (FCT-MCTES) for its financial support via the project UIDB/00667/2020 (UNIDEMI).For decades, industrial companies have been collecting and storing high amounts of data with the aim of better controlling and managing their processes. However, this vast amount of information and hidden knowledge implicit in all of this data could be utilized more efficiently. With the help of data mining techniques unknown relationships can be systematically discovered. The production of semiconductors is a highly complex process, which entails several subprocesses that employ a diverse array of equipment. The size of the semiconductors signifies a high number of units can be produced, which require huge amounts of data in order to be able to control and improve the semiconductor manufacturing process. Therefore, in this paper a structured review is made through a sample of 137 papers of the published articles in the scientific community regarding data mining applications in semiconductor manufacturing. A detailed bibliometric analysis is also made. All data mining applications are classified in function of the application area. The results are then analyzed and conclusions are drawn.publishersversionpublishe

    Prediction of Tool Recipe Runtimes in Semiconductor Manufacturing

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    To improve throughput, due date adherence, or tool usage in semiconductor manufacturing, it is crucial to model the duration of individual processes such as coating, diffusion, or etching. Equipped with such data, production planning can develop dispatch schemes and schedules for optimized material routing. However, just a few tools indicate how long a process will take. Many variables affect the runtime of tool recipes that are used to realize processes. These variables include wafer processing mode, historical context, batch size, and job handling. In this thesis, a model that allows inferring tool recipe runtimes with adequate accuracy shall be developed. Firstly, predictive models shall be built for selected tools with known runtime behavior to establish a baseline for the methodology. Tools will be selected to cover a broad spectrum of processing modalities. The main predictors will be revealed using variable importance analysis. Furthermore, the analysis shall reveal under which conditions recipe runtime modeling is most accurate. Secondly, a generic approach shall be created to model recipe runtime. By accounting for tool, process, and material context, methods would be investigated from feature selection and automatic model selection. Finally, a pipeline for data cleansing, feature engineering, model building, and metrics will be developed using historical data from a wide range of factory data sources. Finally, a scheme to operationalize the findings shall be outlined. In particular, this requires establishing model serving to enable consumption in applications such as dispatching or operator interfaces

    Cycle time prediction in the Wafer Test Fab of a semiconductor manufacturing plant using an artificial neural network model

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    Cycle Time Estimation in a Semiconductor Wafer Fab: A concatenated Machine Learning Approach

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    Die fortschreitende Digitalisierung aller Bereiche des Lebens und der Industrie lässt die Nachfrage nach Mikrochips steigen. Immer mehr Branchen – unter anderem auch die Automobilindustrie – stellen fest, dass die Lieferketten heutzutage von den Halbleiterherstellern abhängig sind, was kürzlich zur Halbleiterkrise geführt hat. Diese Situation erhöht den Bedarf an genauen Vorhersagen von Lieferzeiten von Halbleitern. Da aber deren Produktion extrem schwierig ist, sind solche Schätzungen nicht einfach zu erstellen. Gängige Ansätze sind entweder zu simpel (z.B. Mittelwert- oder rollierende Mittelwertschätzer) oder benötigen zu viel Zeit für detaillierte Szenarioanalysen (z.B. ereignisdiskrete Simulationen). Daher wird in dieser Arbeit eine neue Methodik vorgeschlagen, die genauer als Mittelwert- oder rollierende Mittelwertschätzer, aber schneller als Simulationen sein soll. Diese Methodik nutzt eine Verkettung von Modellen des maschinellen Lernens, die in der Lage sind, Wartezeiten in einer Halbleiterfabrik auf der Grundlage einer Reihe von Merkmalen vorherzusagen. In dieser Arbeit wird diese Methodik entwickelt und analysiert. Sie umfasst eine detaillierte Analyse der für jedes Modell benötigten Merkmale, eine Analyse des genauen Produktionsprozesses, den jedes Produkt durchlaufen muss – was als "Route" bezeichnet wird – und entwickelte Strategien zur Bewältigung von Unsicherheiten, wenn die Merkmalswerte in der Zukunft nicht bekannt sind. Zusätzlichwird die vorgeschlagene Methodik mit realen Betriebsdaten aus einerWafer-Fabrik der Robert Bosch GmbH evaluiert. Es kann gezeigt werden, dass die Methodik den Mittelwert- und Rollierenden Mittelwertschätzern überlegen ist, insbesondere in Situationen, in denen die Zykluszeit eines Loses signifikant vom Mittelwert abweicht. Zusätzlich kann gezeigt werden, dass die Ausführungszeit der Methode signifikant kürzer ist als die einer detaillierten Simulation

    Entwicklung und Einführung von Produktionssteuerungsverbesserungen für die kundenorientierte Halbleiterfertigung

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    Production control in a semiconductor production facility is a very complex and timeconsuming task. Different demands regarding facility performance parameters are defined by customer and facility management. These requirements are usually opponents, and an efficient strategy is not simple to define. In semiconductor manufacturing, the available production control systems often use priorities to define the importance of each production lot. The production lots are ranked according to the defined priorities. This process is called dispatching. The priority allocation is carried out by special algorithms. In literature, a huge variety of different strategies and rules is available. For the semiconductor foundry business, there is a need for a very flexible and adaptable policy taking the facility state and the defined requirements into account. At our case the production processes are characterized by a low-volume high-mix product portfolio. This portfolio causes additional stability problems and performance lags. The unstable characteristic increases the influence of reasonable production control logic. This thesis offers a very flexible and adaptable production control policy. This policy is based on a detailed facility model with real-life production data. The data is extracted from a real high-mix low-volume semiconductor facility. The dispatching strategy combines several dispatching rules. Different requirements like line balance, throughput optimization and on-time delivery targets can be taken into account. An automated detailed facility model calculates a semi-optimal combination of the different dispatching rules under a defined objective function. The objective function includes different demands from the management and the customer. The optimization is realized by a genetic heuristic for a fast and efficient finding of a close-to-optimal solution. The strategy is evaluated with real-life production data. The analysis with the detailed facility model of this fab shows an average improvement of 5% to 8% for several facility performance parameters like cycle time per mask layer. Finally the approach is realized and applied at a typical high-mix low-volume semiconductor facility. The system realization bases on a JAVA implementation. This implementation includes common state-of-the-art technologies such as web services. The system replaces the older production control solution. Besides the dispatching algorithm, the production policy includes the possibility to skip several metrology operations under defined boundary conditions. In a real-life production process, not all metrology operations are necessary for each lot. The thesis evaluates the influence of the sampling mechanism to the production process. The solution is included into the system implementation as a framework to assign different sampling rules to different metrology operations. Evaluations show greater improvements at bottleneck situations. After the productive introduction and usage of both systems, the practical results are evaluated. The staff survey offers good acceptance and response to the system. Furthermore positive effects on the performance measures are visible. The implemented system became part of the daily tools of a real semiconductor facility.Produktionssteuerung im Bereich der kundenorientierten Halbleiterfertigung ist heutzutage eine sehr komplexe und zeitintensive Aufgabe. Verschiedene Anforderungen bezüglich der Fabrikperformance werden seitens der Kunden als auch des Fabrikmanagements definiert. Diese Anforderungen stehen oftmals in Konkurrenz. Dadurch ist eine effiziente Strategie zur Kompromissfindung nicht einfach zu definieren. Heutige Halbleiterfabriken mit ihren verfügbaren Produktionssteuerungssystemen nutzen oft prioritätsbasierte Lösungen zur Definition der Wichtigkeit eines jeden Produktionsloses. Anhand dieser Prioritäten werden die Produktionslose sortiert und bearbeitet. In der Literatur existiert eine große Bandbreite verschiedener Algorithmen. Im Bereich der kundenorientierten Halbleiterfertigung wird eine sehr flexible und anpassbare Strategie benötigt, die auch den aktuellen Fabrikzustand als auch die wechselnden Kundenanforderungen berücksichtigt. Dies gilt insbesondere für den hochvariablen geringvolumigen Produktionsfall. Diese Arbeit behandelt eine flexible Strategie für den hochvariablen Produktionsfall einer solchen Produktionsstätte. Der Algorithmus basiert auf einem detaillierten Fabriksimulationsmodell mit Rückgriff auf Realdaten. Neben synthetischen Testdaten wurde der Algorithmus auch anhand einer realen Fertigungsumgebung geprüft. Verschiedene Steuerungsregeln werden hierbei sinnvoll kombiniert und gewichtet. Wechselnde Anforderungen wie Linienbalance, Durchsatz oder Liefertermintreue können adressiert und optimiert werden. Mittels einer definierten Zielfunktion erlaubt die automatische Modellgenerierung eine Optimierung anhand des aktuellen Fabrikzustandes. Die Optimierung basiert auf einen genetischen Algorithmus für eine flexible und effiziente Lösungssuche. Die Strategie wurde mit Realdaten aus der Fertigung einer typischen hochvariablen geringvolumigen Halbleiterfertigung geprüft und analysiert. Die Analyse zeigt ein Verbesserungspotential von 5% bis 8% für die bekannten Performancekriterien wie Cycletime im Vergleich zu gewöhnlichen statischen Steuerungspolitiken. Eine prototypische Implementierung realisiert diesen Ansatz zur Nutzung in der realen Fabrikumgebung. Die Implementierung basiert auf der JAVA-Programmiersprache. Aktuelle Implementierungsmethoden erlauben den flexiblen Einsatz in der Produktionsumgebung. Neben der Fabriksteuerung wurde die Möglichkeit der Reduktion von Messoperationszeit (auch bekannt unter Sampling) unter gegebenen Randbedingungen einer hochvariablen geringvolumigen Fertigung untersucht und geprüft. Oftmals ist aufgrund stabiler Prozesse in der Fertigung die Messung aller Lose an einem bestimmten Produktionsschritt nicht notwendig. Diese Arbeit untersucht den Einfluss dieses gängigen Verfahrens aus der Massenfertigung für die spezielle geringvolumige Produktionsumgebung. Die Analysen zeigen insbesondere in Ausnahmesituationen wie Anlagenausfällen und Kapazitätsengpässe einen positiven Effekt, während der Einfluss unter normalen Produktionsbedingungen aufgrund der hohen Produktvariabilität als gering angesehen werden kann. Nach produktiver Einführung in einem typischen Vertreter dieser Halbleiterfabriken zeigten sich schnell positive Effekte auf die Fabrikperformance als auch eine breite Nutzerakzeptanz. Das implementierte System wurde Bestandteil der täglichen genutzten Werkzeuglandschaft an diesem Standort

    AI/ML Algorithms and Applications in VLSI Design and Technology

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    An evident challenge ahead for the integrated circuit (IC) industry in the nanometer regime is the investigation and development of methods that can reduce the design complexity ensuing from growing process variations and curtail the turnaround time of chip manufacturing. Conventional methodologies employed for such tasks are largely manual; thus, time-consuming and resource-intensive. In contrast, the unique learning strategies of artificial intelligence (AI) provide numerous exciting automated approaches for handling complex and data-intensive tasks in very-large-scale integration (VLSI) design and testing. Employing AI and machine learning (ML) algorithms in VLSI design and manufacturing reduces the time and effort for understanding and processing the data within and across different abstraction levels via automated learning algorithms. It, in turn, improves the IC yield and reduces the manufacturing turnaround time. This paper thoroughly reviews the AI/ML automated approaches introduced in the past towards VLSI design and manufacturing. Moreover, we discuss the scope of AI/ML applications in the future at various abstraction levels to revolutionize the field of VLSI design, aiming for high-speed, highly intelligent, and efficient implementations

    Backlog control in optoelectronic production using a digital twin

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    Digital twins are becoming increasingly popular in industry and are being used in various areas, such as production planning and control. Logistics performance still needs to be improved, especially in highly complex and automated production processes such as optoelectronics. The significant challenges faced by industrial companies today, such as stricter quality standards, smaller quantities and shorter product life cycles, exacerbate this phenomenon. In this context, digital twins offer a point of reference for improvement by providing an additional database that can be used to make more informed decisions in realtime. The novel contribution of this paper is the design of a simulation as a digital twin in the context of optoelectronic production. It is used to simulate a variety of backlog scenarios in production planning and to provide an additional source of data for backlog control. We also present an application example of how the digital twin can reduce backlogs in the production process. The simulation indicates that the designed model can effectively support the improvement of logistics performance by addressing the significant challenges in modern production
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