Physics and technologies of silicon LDMOSFET for radio frequency applications

This thesis is devoted to the investigation of devices and technologies of Lateral Double-Diffused- Metal-Oxide-Semiconductor-Field-Effect-Transistor for Radio Frequency (RP) applications. Theoretical analysis and extensive 2-D process and device simulation results are presented. Theoretical analysis and simulations are carried out on RESURF LDMOS in both bulk and SOI substrate in terms of breakdown characteristics, transconductance, on resistance and CV characteristics. Quasi-saturation is a common phenomenon in DMOS devices. In this work, the dependence of quasi-saturation current on device physical and geometrical parameters is investigated in SOI RP LDMOS. Physical insight is gained into quasi-saturation on SOI RP LDMOS with different top silicon thickness and the same drift dose. It reveals that the difference in thick and thin film SOI lies in the different potential drop in the drift region. The influence of RESURF effect on quasi-saturation is also presented. It is shown that quasi-saturation current level can be affected by RESURF due to its influence on the drift dose. The mechanism of self-heating is presented and the influence of top silicon thickness, buried oxide thickness, voltage bias is studied through simulations. The change of peak temperature and its location with bias is due to the shift of electric field with voltage bias. A back-etch structure and fabrication process have been proposed to achieve a superior thermal performance. The negative differential conductance is not present in the non-isothermal IV curves. The temperature rise in the back-etch structure is less than 114 of that in the bulk structure. An RP LDMOS with a step drift doping profile on SIMOX substrate is evaluated. The fabrication process for the drift formation is proposed. The presented results demonstrate that step drift device has higher breakdown voltage than the conventional uniformly doped (UD) device, which provides the possibility to integrate LDMOS with low voltage CMOS for 28V base station application. This structure also has the advantage of suppressed kink effect due to the reduced electric field within the drift region. The step drift structure also features lower capacitance, improved drain current saturation behaviour and reduced self-heating at class AB bias point. For the first time, a novel sandwich structure for lateral RF MOSFET has been analysed based on silicon-on-nothing (SON) technology. The influence of device parameters on BV, CV and thermal performance has been investigated. Partial SON structure is found preferable in terms of heat conduct ability. Comparison on the electrical and thermal performance is made between SON LDMOSFET and conventional SOI alternative with BV of 40V. It is found that SON structure shows improvement in output capacitance and substrate loss. However, the temperature rise in SON device is higher compared to SOI alternative. The performance of the proposed sandwich SON structure has also been investigated in 28V base station applications, which requires breakdown voltage of 80V

Study Of Ingaas Ldmos For Power Conversion Applications

In this work an n-channel In0.65Ga0.35As LDMOS with Al2O3 as gate dielectric is investigated. Instead of using traditional Si process for LDMOS, we suggest In0.65Ga0.35As as substitute material due to its higher electron mobility and its promising for power applications. The proposed 0.5-µm channel-length LDMOS cell is studied through device TCAD simulation tools. Due to different gate dielectric, comprehensive comparisons between In0.65Ga0.35As LDMOS and Si LDMOS are made in two ways, structure with the same cross-sectional dimension, and structure with different thickness of gate dielectric to achieve the same gate capacitance. The on-resistance of the new device shows a big improvement with no degradation on breakdown voltage over traditional device. Also it is indicated from these comparisons that the figure of merit(FOM) Ron·Qg of In0.65Ga0.35As LDMOS shows an average of 91.9% improvement to that of Si LDMOS. To further explore the benefit of using In0.65Ga0.35As LDMOS as switch in power applications, DC-DC buck converter is utilized to observe the performance of LDMOS in terms of power efficiency. The LDMOS performance is experimented with operation frequency of the circuit sweeping in the range from 100 KHz to 100 MHz. It turns out InGaAs LDMOS is good candidate for power applications

Application of waveform engineering to GaN HFET characterisation and class F design

In this work, the largely theoretical existing research on class F has been extended to include a measured waveform based analysis. The results demonstrate how optimum class F performance can be achieved using real devices and highlights a number of interesting issues that a designer of a class F amplifier should consider.EThOS - Electronic Theses Online ServiceGBUnited Kingdo

Komponente na bazi silicijum karbida u elektronskim kolima velike snage

Silicon has been the number one choice of materials for over 40 years. It has reached an almost perfected stage through extensive research for so many years; now it is cheap to be manufactured and performs very reliably at room temperature. However, as modem electronics move to a more advanced level with increasing complexity, materials other than silicon are under consideration. Several areas where Silicon shows shortcomings in high temperature environments and high voltage conditions. The Silicon devices need to be shielded – cooled, are limited to operation at low temperature and low blocking voltage by virtue physical and electric properties. So silicon devices are restricted and have focused on low power electronics applications only, these various limitations in the use of Si devices has led to development of wide band gap semiconductors such as Silicon carbide . And because there is an urgent need for high voltage electronics for advanced technology represented in (transportation - space - communications - power systems) in which silicon has failed to be used. Due to various properties of Silicon carbide like lower intrinsic carrier concentration (10–35 orders of magnitude), higher electric breakdown field (4–20 times), higher thermal conductivity (3–13 times), larger saturated electron drift velocity (2–2.5 times),wide band gap (2.2 eV) and higher, more isotropic bulk electron mobility comparable to that of Si. These properties make it a potential material to overcome the limitations of Si. The fact that wide band gap semiconductors are capable of electronic functionality, particularly in the case of SiC. 4H-SiC is a potentially useful material for high temperature devices because of its refractory nature. So Silicon Carbide (SiC) will bring solid-state power electronics to a new horizon by expanding to applications in the high voltage power electronics sectors. It is the better choice for use in high temperature environment and high voltage conditions. Silicon carbide is about to replace Si material very quickly and scientifically will force Si to get retired. The superior characteristics of silicon carbide, have suggested considering as the next generation of power semiconductor devices. And because our study will concentrate on the use of semiconductors on high voltage unipolar power electronics devices. DIMOSFET will be..