Design Of Silicon Controlled Rectifers Sic] For Robust Electrostatic Discharge Protection Applications

Electrostatic Discharge (ESD) phenomenon happens everywhere in our daily life. And it can occurs through the whole lifespan of an Integrated Circuit (IC), from the early wafer fabrication process, extending to assembly operation, and finally ending at the user‟s site. It has been reported that up to 35% of total IC field failures are ESD-induced, with estimated annual costs to the IC industry running to several billion dollars. The most straightforward way to avoid the ICs suffering from the threatening of ESD damages is to develop on-chip ESD protection circuits which can afford a robust, low-impedance bypassing path to divert the ESD current to the ground. There are three different types of popular ESD protection devices widely used in the industry, and they are diodes or diodes string, Grounded-gate NMOS (GGNMOS) and Silicon Controlled Rectifier (SCR). Among these different protection solutions, SCR devices have the highest ESD current conduction capability due to the conductivity modulation effect. But SCR devices also have several shortcomings such as the higher triggering point, the lower clamping voltage etc, which will become obstacles for SCR to be widely used as an ESD protection solutions in most of the industry IC products. At first, in some applications with pin voltage goes below ground or above the VDD, dual directional protection between each two pins are desired. The traditional dual-directional SCR structures will consume a larger silicon area or lead to big leakage current issue due to the happening of punch-through effect. A new and improved SCR structure for low-triggering ESD iv applications has been proposed in this dissertation and successfully realized in a BiCMOS process. Such a structure possesses the desirable characteristics of a dual-polarity conduction, low trigger voltage, small leakage current, large failing current, adjustable holding voltage, and compact size. Another issue with SCR devices is its deep snapback or lower holding voltage, which normally will lead to the latch-up happen. To make SCR devices be immunity with latch-up, it is required to elevate its holding voltage to be larger than the circuits operational voltage, which can be several tens volts in modern power electronic circuits. Two possible solutions have been proposed to resolve this issue. One solution is accomplished by using a segmented emitter topology based on the concept that the holding voltage can be increased by reducing the emitter injection efficiency. Experimental data show that the new SCR can posses a holding voltage that is larger than 40V and a failure current It2 that is higher than 28mA/um. The other solution is accomplished by stacking several low triggering voltage high holding voltage SCR cells together. The TLP measurement results show that this novel SCR stacking structure has an extremely high holding voltage, very small snapback, and acceptable failure current. The High Holding Voltage Figure of Merit (HHVFOM) has been proposed to be a criterion for different high holding voltage solutions. The HHVFOM comparison of our proposed structures and the existing high holding voltage solutions also show the advantages of our work

Design, Characterization And Analysis Of Electrostatic Discharge (esd) Protection Solutions In Emerging And Modern Technologies

Electrostatic Discharge (ESD) is a significant hazard to electronic components and systems. Based on a specific processing technology, a given circuit application requires a customized ESD consideration that includes the devices’ operating voltage, leakage current, breakdown constraints, and footprint. As new technology nodes mature every 3-5 years, design of effective ESD protection solutions has become more and more challenging due to the narrowed design window, elevated electric field and current density, as well as new failure mechanisms that are not well understood. The endeavor of this research is to develop novel, effective and robust ESD protection solutions for both emerging technologies and modern complementary metal–oxide–semiconductor (CMOS) technologies. The Si nanowire field-effect transistors are projected by the International Technology Roadmap for Semiconductors as promising next-generation CMOS devices due to their superior DC and RF performances, as well as ease of fabrication in existing Silicon processing. Aiming at proposing ESD protection solutions for nanowire based circuits, the dimension parameters, fabrication process, and layout dependency of such devices under Human Body Mode (HBM) ESD stresses are studied experimentally in company with failure analysis revealing the failure mechanism induced by ESD. The findings, including design methodologies, failure mechanism, and technology comparisons should provide practical knowhow of the development of ESD protection schemes for the nanowire based integrated circuits. Organic thin-film transistors (OTFTs) are the basic elements for the emerging flexible, printable, large-area, and low-cost organic electronic circuits. Although there are plentiful studies focusing on the DC stress induced reliability degradation, the operation mechanism of OTFTs iv subject to ESD is not yet available in the literature and are urgently needed before the organic technology can be pushed into consumer market. In this work, the ESD operation mechanism of OTFT depending on gate biasing condition and dimension parameters are investigated by extensive characterization and thorough evaluation. The device degradation evolution and failure mechanism under ESD are also investigated by specially designed experiments. In addition to the exploration of ESD protection solutions in emerging technologies, efforts have also been placed in the design and analysis of a major ESD protection device, diodetriggered-silicon-controlled-rectifier (DTSCR), in modern CMOS technology (90nm bulk). On the one hand, a new type DTSCR having bi-directional conduction capability, optimized design window, high HBM robustness and low parasitic capacitance are developed utilizing the combination of a bi-directional silicon-controlled-rectifier and bi-directional diode strings. On the other hand, the HBM and Charged Device Mode (CDM) ESD robustness of DTSCRs using four typical layout topologies are compared and analyzed in terms of trigger voltage, holding voltage, failure current density, turn-on time, and overshoot voltage. The advantages and drawbacks of each layout are summarized and those offering the best overall performance are suggested at the en

Design And Characterization Of Noveldevices For New Generation Of Electrostaticdischarge (esd) Protection Structures

The technology evolution and complexity of new circuit applications involve emerging reliability problems and even more sensitivity of integrated circuits (ICs) to electrostatic discharge (ESD)-induced damage. Regardless of the aggressive evolution in downscaling and subsequent improvement in applications\u27 performance, ICs still should comply with minimum standards of ESD robustness in order to be commercially viable. Although the topic of ESD has received attention industry-wide, the design of robust protection structures and circuits remains challenging because ESD failure mechanisms continue to become more acute and design windows less flexible. The sensitivity of smaller devices, along with a limited understanding of the ESD phenomena and the resulting empirical approach to solving the problem have yielded time consuming, costly and unpredictable design procedures. As turnaround design cycles in new technologies continue to decrease, the traditional trial-and-error design strategy is no longer acceptable, and better analysis capabilities and a systematic design approach are essential to accomplish the increasingly difficult task of adequate ESD protection-circuit design. This dissertation presents a comprehensive design methodology for implementing custom on-chip ESD protection structures in different commercial technologies. First, the ESD topic in the semiconductor industry is revised, as well as ESD standards and commonly used schemes to provide ESD protection in ICs. The general ESD protection approaches are illustrated and discussed using different types of protection components and the concept of the ESD design window. The problem of implementing and assessing ESD protection structures is addressed next, starting from the general discussion of two design methods. The first ESD design method follows an experimental approach, in which design requirements are obtained via fabrication, testing and failure analysis. The second method consists of the technology computer aided design (TCAD)-assisted ESD protection design. This method incorporates numerical simulations in different stages of the ESD design process, and thus results in a more predictable and systematic ESD development strategy. Physical models considered in the device simulation are discussed and subsequently utilized in different ESD designs along this study. The implementation of new custom ESD protection devices and a further integration strategy based on the concept of the high-holding, low-voltage-trigger, silicon controlled rectifier (SCR) (HH-LVTSCR) is demonstrated for implementing ESD solutions in commercial low-voltage digital and mixed-signal applications developed using complementary metal oxide semiconductor (CMOS) and bipolar CMOS (BiCMOS) technologies. This ESD protection concept proposed in this study is also successfully incorporated for implementing a tailored ESD protection solution for an emerging CMOS-based embedded MicroElectroMechanical (MEMS) sensor system-on-a-chip (SoC) technology. Circuit applications that are required to operate at relatively large input/output (I/O) voltage, above/below the VDD/VSS core circuit power supply, introduce further complications in the development and integration of ESD protection solutions. In these applications, the I/O operating voltage can extend over one order of magnitude larger than the safe operating voltage established in advanced technologies, while the IC is also required to comply with stringent ESD robustness requirements. A practical TCAD methodology based on a process- and device- simulation is demonstrated for assessment of the device physics, and subsequent design and implementation of custom P1N1-P2N2 and coupled P1N1-P2N2//N2P3-N3P1 silicon controlled rectifier (SCR)-type devices for ESD protection in different circuit applications, including those applications operating at I/O voltage considerably above/below the VDD/VSS. Results from the TCAD simulations are compared with measurements and used for developing technology- and circuit-adapted protection structures, capable of blocking large voltages and providing versatile dual-polarity symmetric/asymmetric S-type current-voltage characteristics for high ESD protection. The design guidelines introduced in this dissertation are used to optimize and extend the ESD protection capability in existing CMOS/BiCMOS technologies, by implementing smaller and more robust single- or dual-polarity ESD protection structures within the flexibility provided in the specific fabrication process. The ESD design methodologies and characteristics of the developed protection devices are demonstrated via ESD measurements obtained from fabricated stand-alone devices and on-chip ESD protections. The superior ESD protection performance of the devices developed in this study is also successfully verified in IC applications where the standard ESD protection approaches are not suitable to meet the stringent area constraint and performance requirement

Electrical overstress and electrostatic discharge failure in silicon MOS devices

This thesis presents an experimental and theoretical investigation of electrical failure in MOS structures, with a particular emphasis on short-pulse and ESD failure. It begins with an extensive survey of MOS technology, its failure mechanisms and protection schemes. A program of experimental research on MOS breakdown is then reported, the results of which are used to develop a model of breakdown across a wide spectrum of time scales. This model, in which bulk-oxide electron trapping/emission plays a major role, prohibits the direct use of causal theory over short time-scales, invalidating earlier theories on the subject. The work is extended to ESD stress of both polarities. Negative polarity ESD breakdownis found to be primarily oxide-voltage activated, with no significant dependence on temperature of luminosity. Positive polarity breakdown depends on the rate of surface inversion, dictated by the Si avalanche threshold and/or the generation speed of light-induced carriers. An analytical model, based upon the above theory is developed to predict ESD breakdown over a wide range of conditions. The thesis ends with an experimental and theoretical investigation of the effects of ESD breakdown on device and circuit performance. Breakdown sites are modelled as resistive paths in the oxide, and their distorting effects upon transistor performance are studied. The degradation of a damaged transistor under working stress is observed, giving a deeper insight into the latent hazards of ESD damage

Gate oxide failure in MOS devices

The thesis presents an experimental and theoretical investigation of gate oxide breakdown in MOS networks, with a particular emphasis on constant voltage overstress failure. It begins with a literature search on gate oxide failure mechanisms, particularly time-dependent dielectric breakdown, in MOS devices. The experimental procedure is then reported for the study of gate oxide breakdown under constant voltage stress. The experiments were carried out on MOSFETs and MOS capacitor structures, recording the characteristics of the devices before and after the stress. The effects of gate oxide breakdown in one of the transistors in an nMOS inverter were investigated and several parameters were found to have changed. A mathematical model for oxide breakdown, based on physical mechanisms, is proposed. Both electron and hole trapping occurred during the constant voltage stress. Breakdown appears to take place when the trapped hole density reach a critical value. PSPICE simulations were performed for the MOSFETs, nMOS inverter and CMOS logic circuits. Two models of MOSFET with gate oxide short were validated. A good agreement between experiments and simulations was achieved

On-Chip ESD Protection Design: Optimized Clamps

The extensive use of Integrated Circuits (ICs) means complex working conditions for these tiny chips. To guarantee the ICs could work properly in various environments, some special protection strategies are required to improve the reliability of system. From all the possible reliability issues, the electrostatics discharge (ESD) might be the most common one. The peak current of electrostatics can be as high as tens of amperes and the peak voltage can be over thousand voltages. In contrast, the size of semiconductor device fabricated is continuing to scale down, making it even more vulnerable to high level overstress and current surge induced by ESD event. To protect the on-chip semiconductor from damage, some extra clamp cells are put together to consist a network. The network can redirect the superfluous current through the ESD network and clamp the voltage to a low level. In this dissertation, one design concept is introduced that uses the combination of some basic ESD devices to meet different requirements first, and then tries to establish parasitic current path among these devices to further increase the current handling capability. Some design cases are addressed to demonstrate this design concept is valid and efficient: 1. A combination of silicon-controlled-rectifier (SCR) and diode cluster is implemented to resolve the overshoot issue under fast ESD event. 2. A new SCR structure is introduced, which can be used as padding device to increase the clamping voltage without affecting other parameters. Based on this padding device, two design cases are introduced. 3. A controllable SCR clamp structure is presented, which has high current handling capability and can be controlled with by small signal. All these structures and topologies described in this dissertation are compatible with most of popular semiconductor fabrication process

Design of Novel Devices and Circuits for Electrostatic Discharge Protection Applications in Advanced Semiconductor Technologies

Electrostatic Discharge (ESD), as a subset of Electrical Overstress (EOS), was reported to be in charge of more than 35% of failure in integrated circuits (ICs). Especially in the manufacturing process, the silicon wafer turns out to be a functional ICs after numerous physical, chemical and mechanical processes, each of which expose the sensitive and fragile ICs to ESD environment. In normal end-user applications, ESD from human and machine handling, surge and spike signals in the power supply, and wrong supplying signals, will probably cause severe damage to the ICs and even the whole systems. Generally, ESD protections are evaluated after wafer and even system fabrication, increasing the development period and cost if the protections cannot meet customer\u27s requirements. Therefore, it is important to design and customize robust and area-efficient ESD protections for the ICs at the early development stage. As the technologies generally scaling down, however, ESD protection clamps remain comparable area consumption in the recent years because they provide the discharging path for the ESD energy which rarely scales down. Diode is the most simple and effective device for ESD protection in ICs, but the usage is significantly limited by its low turn-on voltage. MOS devices can be triggered by a dynamic-triggered RC circuit for IOs operating at low voltage, while the one triggered by a static-triggered network, e.g., zener-resistor circuit or grounded-gate configuration, provides a high trigger voltage for high-voltage applications. However, the relatively low current discharging capability makes MOS devices as the secondary choice. Silicon-controlled rectifier (SCR) has become famous due to its high robustness and area efficiency, compared to diode and MOS. In this dissertation, a comprehensive design methodology for SCR based on simulation and measurement are presented for different advanced commercial technologies. Furthermore, an ESD clamp is designed and verified for the first time for the emerging GaN technology. For the SCR, no matter what modification is going to be made, the first concern when drawing the layout is to determine the layout geometrical style, finger width and finger number. This problem for diode and MOS device were studied in detail, so the same method was usually used in SCR. The research in this dissertation provides a closer look into the metal layout effect to the SCR, finding out the optimized robustness and minimized side-effect can be obtained by using specific layout geometry. Another concern about SCR is the relatively low turn-on speed when the IOs under protection is stressed by ESD pulses having very fast rising time, e.g., CDM and IEC 61000-4-2 pulses. On this occasion a large overshoot voltage is generated and cause damage to internal circuit component like gate oxides of MOS devices. The key determination of turn-on speed of SCR is physically investigated, followed by a novel design on SCR by directly connecting the Anode Gate and Cathode Gate to form internal trigger (DCSCR), with improved performance verified experimentally in this dissertation. The overshoot voltage and trigger voltage of the DCSCR will be significantly reduced, in return a better protection for internal circuit component is offered without scarifying neither area or robustness. Even though two SCR\u27s with single direction of ESD current path can be constructed in reverse parallel to form bidirectional protection to pins, stand-alone bidirectional SCR (BSCR) is always desirable for sake of smaller area. The inherent high trigger voltage of BSCR that only fit in high-voltage technologies is overcome by embedding a PMOS transistor as trigger element, making it highly suitable for low-voltage ESD protection applications. More than that, this modification simultaneously introduces benefits including high robustness and low overshoot voltage. For high voltage pins, however, it presents another story for ESD designs. The high operation voltages require that a high trigger voltage and high holding voltage, so as to reduce the false trigger and latch-up risk. For several capacitive pins, the displacement current induced by a large snapback will cause severe damage to internal circuits. A novel design on SCR is proposed to minimize the snapback with adjustable trigger and holding voltage. Thanks to the additional a PIN diode, the similar high robustness and stable thermal leakage performance to SCR is maintained. For academic purpose of ESD design, it is always difficult to obtain the complete process deck in TCAD simulation because those information are highly confidential to the companies. Another challenge of using TCAD is the difficulty of maintaining the accuracy of physics models and predicting the performance of the other structures. In this dissertation a TCAD-aid ESD design methodology is used to evaluate ESD performance before the silicon shuttle. GaN is a promising material for high-voltage high-power RF application compared to the GaAs. However, distinct from GaAs, the leaky problem of the schottky junction and the lack of choice of passive/active components in GaN technology limit the ESD protection design, which will be discussed in this dissertation. However, a promising ESD protection clamp is finally developed based on depletion-mode pHEMT with adjustable trigger voltage, reasonable leakage current and high robustness

Resilience of an embedded architecture using hardware redundancy

In the last decade the dominance of the general computing systems market has being replaced by embedded systems with billions of units manufactured every year. Embedded systems appear in contexts where continuous operation is of utmost importance and failure can be profound. Nowadays, radiation poses a serious threat to the reliable operation of safety-critical systems. Fault avoidance techniques, such as radiation hardening, have been commonly used in space applications. However, these components are expensive, lag behind commercial components with regards to performance and do not provide 100% fault elimination. Without fault tolerant mechanisms, many of these faults can become errors at the application or system level, which in turn, can result in catastrophic failures. In this work we study the concepts of fault tolerance and dependability and extend these concepts providing our own definition of resilience. We analyse the physics of radiation-induced faults, the damage mechanisms of particles and the process that leads to computing failures. We provide extensive taxonomies of 1) existing fault tolerant techniques and of 2) the effects of radiation in state-of-the-art electronics, analysing and comparing their characteristics. We propose a detailed model of faults and provide a classification of the different types of faults at various levels. We introduce an algorithm of fault tolerance and define the system states and actions necessary to implement it. We introduce novel hardware and system software techniques that provide a more efficient combination of reliability, performance and power consumption than existing techniques. We propose a new element of the system called syndrome that is the core of a resilient architecture whose software and hardware can adapt to reliable and unreliable environments. We implement a software simulator and disassembler and introduce a testing framework in combination with ERA’s assembler and commercial hardware simulators

Analysis and modeling methods for predicting functional robustness of integrated circuits during fast transient events

La miniaturisation des circuits intégrés se poursuit de nos jours avec le développement de technologies toujours plus fines et denses. Elle permet une intégration des circuits toujours plus massive, avec des performances plus élevées et une réduction des coûts de production. La réduction de taille des circuits s'accompagne aussi d'une augmentation de leur sensibilité électrique. L'électronique automobile est un acteur majeur dans la nouvelle tendance des véhicules autonomes. Ce type d'application a besoin d'analyser des données et d'appliquer des actions sur le véhicule en temps réel. L'objectif à terme est d'améliorer la sécurité des usagers. Il est donc vital de garantir que ces modules électroniques pourront effectuer leurs tâches correctement malgré toutes les perturbations auxquelles ils seront exposés. Néanmoins, l'environnement automobile est particulièrement sévère pour l'électronique. Parmi tous les stress rencontrés, les décharges électrostatiques (ESD - Electrostatic Discharge) sont une importante source d'agression électrique. Ce type d'évènement très bref est suffisamment violent pour détruire des composants électroniques ou les perturber pendant leur fonctionnement. Les recherches présentées ici se concentrent sur l'analyse des défaillances fonctionnelles. À cause des ESD, des fonctions électroniques peuvent cesser temporairement d'être opérantes. Des méthodes d'analyse et de prédiction sont requises au niveau-circuit intégré afin de détecter des points de faiblesses susceptibles de générer des fautes fonctionnelles pendant l'exposition à un stress électrostatique. Différentes approches ont été proposées dans ce but. Une méthode hiérarchique de modélisation a été mise au point afin d'être capable de reproduire la forme d'onde ESD jusqu'à l'entrée du circuit intégré. Avec cette approche, chaque élément du système est modélisé individuellement puis son modèle ajouté au schéma complet. Un cas d'étude réaliste de défaillance fonctionnelle d'un circuit intégré a été analysé à l'aide d'outils de simulation. Afin d'obtenir plus de données sur cette faute, une puce de test a été développée, contenant des structures de surveillance et de mesure directement intégrées dans la puce. La dernière partie de ce travail de recherche est concentrée sur le développement de méthodes d'analyse dans le but d'identifier efficacement des fautes par simulation. Une des techniques développées consiste à modéliser chaque bloc d'une fonction individuellement puis permet de chaîner ces modèles afin de déterminer la robustesse de la fonction complète. La deuxième méthode tente de construire un modèle équivalent dit boite-noire d'une fonction de haut-niveau d'un circuit intégré. Ces travaux de recherche ont mené à la mise au point de prototypes matériels et logiciels et à la mise en évidence de points bloquants qui pourront constituer une base pour de futurs travaux.Miniaturization of electronic circuits continues nowadays with the more recent technology nodes being applied to diverse fields of application such as automotive. Very dense and small integrated circuits are interesting for economic reasons, because they are cheaper to manufacture in mass and can pack more functionalities with elevated performances. The counterpart of size reduction is integrated circuits becoming more fragile electrically. In the automotive world, the new trend of fully autonomous driving is seeing tremendous progress recently. Autonomous vehicles must take decisions and perform critical actions such as braking or steering the wheel. Those decisions are taken by electronic modules, that have now very high responsibilities with regards of our safety. It is important to ensure that those modules will operate no matter the kind of disturbances they can be exposed to. The automotive world is a quite harsh environment for electronic systems. A major source of electrical stress is called the Electrostatic Discharge (ESD). It is a very sudden flow of electricity of large amplitude capable of destroying electronic components, or disturb them during their normal operation. This research focuses on functional failures where functionality can be temporarily lost after an ESD with various impact on the vehicle. To guarantee before manufacturing that a module and its components will perform their duty correctly, new analysis and prediction methods are required against soft-failures caused by electrostatic discharges. In this research, different approaches have been explored and proposed towards that goal. First, a modelling method for reproducing the ESD waveforms from the test generator up to the integrated circuit input is presented. It is based on a hierarchical approach where each element of the system is modelled individually, then added to the complete setup model. A practical case of functional failure at silicon-level is analyzed using simulation tools. To acquire more data on this fault, a testchip has been designed. It contains on-chip monitoring structures to measure voltage and current, and monitor function behavior directly at silicon-level. The last part of this research details different analysis methods developed for identifying efficiently functional weaknesses. The methods rely heavily on simulation tools, and prototypes have been implemented to prove the initial concepts. The first method models each function inside the chip individually, using behavioral models, then enables to connect the models together to deduce the full function's robustness. It enables hierarchical analysis of complex integrated circuit designs, to identify potential weak spots inside the circuit that could require more shielding or protection. The second method is focused on constructing equivalent electrical black box models of integrated circuit functions. The goal is to model the IC with a behavioral, black-box model capable of reproducing waveforms in powered conditions during the ESD. In summary, this research work has led to the development of several hardware and software prototypes. It has also highlighted important modelling challenges to solve in future works to achieve better functional robustness against electrostatic discharges

Electrostatic discharge protection circuit for high-speed mixed-signal circuits

ESD, the discharge of electrostatically generated charges into an IC, is one of the most important reliability problems for ultra-scaled devices. This electrostatic charge can generate voltages of up to tens of kilovolts. These very high voltages can generate very high electric fields and currents across semiconductor devices, which may result in dielectric damage or melting of semiconductors and contacts. It has been reported that up to 70% of IC failures are caused by ESD. Therefore, it’s necessary to design a protection circuit for each pin that discharges the ESD energy to the ground. As the devices are continuously scaling down, while ESD energy remains the same, they become more vulnerable to ESD stress. This higher susceptibility to ESD damage is due to thinner gate oxides and shallower junctions. Furthermore, higher operating frequency of the scaled technologies enforces lower parasitic capacitance of the ESD protection circuits. As a result, increasing the robustness of the ESD protection circuits with minimum additional parasitic capacitance is the main challenge in state of the art CMOS processes. Providing a complete ESD immunity for any circuit involves the design of proper protection circuits for I/O pins in addition to an ESD clamp between power supply pins. In this research both of these aspects are investigated and optimized solutions for them are reported. As Silicon Controlled Rectifier (SCR) has the highest ESD protection level per unit area, ESD protection for I/O pins is provided by optimizing the first breakdown voltage and latch-up immunity of SCR family devices. The triggering voltage of SCR is reduced by a new implementation of gate-substrate triggering technique. Furthermore, a new device based on SCR with internal darlington pair is introduced that can provide ESD protection with very small parasitic capacitance. Besides reducing triggering voltage, latch-up immunity of SCR devices is improved using two novel techniques to increase the holding voltage and the holding current. ESD protection between power rails is provided with transient clamps in which the triggering circuit keeps the clamp “on” during the ESD event. In this research, two new clamps are reported that enhance the triggering circuit of the clamp. The first method uses a CMOS thyristor element to provide enough delay time while the second method uses a flip flop to latch the clamp into “on” state at the ESD event. Moreover, the stability of transient clamps is analyzed and it’s been shown that the two proposed clamps have the highest stability compared to other state of the art ESD clamps. Finally, in order to investigate the impact of ESD protection circuits on high speed applications a current mode logic (CML) driver is designed in 0.13μm CMOS technology. The protection for this driver is provided using both MOS-based and SCR-based protection methods. Measurement results show that, compared to MOS-based protection, SCR-based protection has less impact on the driver performance due to its lower parasitic capacitance