정적 램 및 파워 게이트 회로에 대한 전압 및 보존용 공간 할당 문제

학위논문(박사) -- 서울대학교대학원 : 공과대학 전기·정보공학부, 2021.8. 김태환.칩의 저전력 동작은 중요한 문제이며, 공정이 발전하면서 그 중요성은 점점 커지고 있다. 본 논문은 칩을 구성하는 정적 램(SRAM) 및 로직(logic) 각각에 대해서 저전력으로 동작시키는 방법론을 논한다. 우선, 본 논문에서는 칩을 문턱 전압 근처의 전압(NTV)에서 동작시키고자 할 때 모니터링 회로의 측정을 통해 칩 내의 모든 SRAM 블록에서 동작 실패가 발생하지 않는 최소 동작 전압을 추론하는 방법론을 제안한다. 칩을 NTV 영역에서 동작시키는 것은 에너지 효율성을 증대시킬 수 있는 매우 효과적인 방법 중 하나이지만 SRAM의 경우 동작 실패 때문에 동작 전압을 낮추기 어렵다. 하지만 칩마다 영향을 받는 공정 변이가 다르므로 최소 동작 전압은 칩마다 다르며, 모니터링을 통해 이를 추론해낼 수 있다면 칩별로 SRAM에 서로 다른 전압을 인가해 에너지 효율성을 높일 수 있다. 본 논문에서는 다음과 같은 과정을 통해 이 문제를 해결한다: (1) 디자인 인프라 설계 단계에서는 SRAM의 최소 동작 전압을 추론하고 칩 생산 단계에서는 SRAM 모니터의 측정을 통해 전압을 인가하는 방법론을 제안한다; (2) 칩의 SRAM 비트셀(bitcell)과 주변 회로를 포함한 SRAM 블록들의 공정 변이를 모니터링할 수 있는 SRAM 모니터와 SRAM 모니터에서 모니터링할 대상을 정의한다; (3) SRAM 모니터의 측정값을 이용해 같은 칩에 존재하는 모든 SRAM 블록에서 목표 신뢰수준 내에서 읽기, 쓰기, 및 접근 동작 실패가 발생하지 않는 최소 동작 전압을 추론한다. 벤치마크 회로의 실험 결과는 본 논문에서 제안한 방법을 따라 칩별로 SRAM 블록들의 최소 동작 전압을 다르게 인가할 경우, 기존 방법대로 모든 칩에 동일한 전압을 인가하는 것 대비 수율은 같은 수준으로 유지하면서 SRAM 비트셀 배열의 전력 소모를 감소시킬 수 있음을 보인다. 두 번째로, 본 논문에서는 파워 게이트 회로에서 기존의 보존용 공간 할당 방법들이 지니고 있는 문제를 해결하고 누설 전력 소모를 더 줄일 수 있는 방법론을 제안한다. 기존의 보존용 공간 할당 방법은 멀티플렉서 피드백 루프가 있는 모든 플립플롭에는 무조건 보존용 공간을 할당해야 해야 하기 때문에 다중 비트 보존용 공간의 장점을 충분히 살리지 못하는 문제가 있다. 본 논문에서는 다음과 같은 방법을 통해 보존용 공간을 최소화하는 문제를 해결한다: (1) 보존용 공간 할당 과정에서 멀티플렉서 피드백 루프를 무시할 수 있는 조건을 제시하고, (2) 해당 조건을 이용해 멀티플렉서 피드백 루프가 있는 플립플롭이 많이 존재하는 회로에서 보존용 공간을 최소화한다; (3) 추가로, 플립플롭에 이미 할당된 보존용 공간 중 일부를 제거할 수 있는 조건을 찾고, 이를 이용해 보존용 공간을 더 감소시킨다. 벤치마크 회로의 실험 결과는 본 논문에서 제안한 방법론이 기존의 보존용 공간 할당 방법론보다 더 적은 보존용 공간을 할당하며, 따라서 칩의 면적 및 전력 소모를 감소시킬 수 있음을 보인다.Low power operation of a chip is an important issue, and its importance is increasing as the process technology advances. This dissertation addresses the methodology of operating at low power for each of the SRAM and logic constituting the chip. Firstly, we propose a methodology to infer the minimum operating voltage at which SRAM failure does not occur in all SRAM blocks in the chip operating on near threshold voltage (NTV) regime through the measurement of a monitoring circuit. Operating the chip on NTV regime is one of the most effective ways to increase energy efficiency, but in case of SRAM, it is difficult to lower the operating voltage because of SRAM failure. However, since the process variation on each chip is different, the minimum operating voltage is also different for each chip. If it is possible to infer the minimum operating voltage of SRAM blocks of each chip through monitoring, energy efficiency can be increased by applying different voltage. In this dissertation, we propose a new methodology of resolving this problem. Specifically, (1) we propose to infer minimum operation voltage of SRAM in design infra development phase, and assign the voltage using measurement of SRAM monitor in silicon production phase; (2) we define a SRAM monitor and features to be monitored that can monitor process variation on SRAM blocks including SRAM bitcell and peripheral circuits; (3) we propose a new methodology of inferring minimum operating voltage of SRAM blocks in a chip that does not cause read, write, and access failures under a target confidence level. Through experiments with benchmark circuits, it is confirmed that applying different voltage to SRAM blocks in each chip that inferred by our proposed methodology can save overall power consumption of SRAM bitcell array compared to applying same voltage to SRAM blocks in all chips, while meeting the same yield target. Secondly, we propose a methodology to resolve the problem of the conventional retention storage allocation methods and thereby further reduce leakage power consumption of power gated circuit. Conventional retention storage allocation methods have problem of not fully utilizing the advantage of multi-bit retention storage because of the unavoidable allocation of retention storage on flip-flops with mux-feedback loop. In this dissertation, we propose a new methodology of breaking the bottleneck of minimizing the state retention storage. Specifically, (1) we find a condition that mux-feedback loop can be disregarded during the retention storage allocation; (2) utilizing the condition, we minimize the retention storage of circuits that contain many flip-flops with mux-feedback loop; (3) we find a condition to remove some of the retention storage already allocated to each of flip-flops and propose to further reduce the retention storage. Through experiments with benchmark circuits, it is confirmed that our proposed methodology allocates less retention storage compared to the state-of-the-art methods, occupying less cell area and consuming less power.1 Introduction 1 1.1 Low Voltage SRAM Monitoring Methodology 1 1.2 Retention Storage Allocation on Power Gated Circuit 5 1.3 Contributions of this Dissertation 8 2 SRAM On-Chip Monitoring Methodology for High Yield and Energy Efficient Memory Operation at Near Threshold Voltage 13 2.1 SRAM Failures 13 2.1.1 Read Failure 13 2.1.2 Write Failure 15 2.1.3 Access Failure 16 2.1.4 Hold Failure 16 2.2 SRAM On-chip Monitoring Methodology: Bitcell Variation 18 2.2.1 Overall Flow 18 2.2.2 SRAM Monitor and Monitoring Target 18 2.2.3 Vfail to Vddmin Inference 22 2.3 SRAM On-chip Monitoring Methodology: Peripheral Circuit IR Drop and Variation 29 2.3.1 Consideration of IR Drop 29 2.3.2 Consideration of Peripheral Circuit Variation 30 2.3.3 Vddmin Prediction including Access Failure Prohibition 33 2.4 Experimental Results 41 2.4.1 Vddmin Considering Read and Write Failures 42 2.4.2 Vddmin Considering Read/Write and Access Failures 45 2.4.3 Observation for Practical Use 45 3 Allocation of Always-On State Retention Storage for Power Gated Circuits - Steady State Driven Approach 49 3.1 Motivations and Analysis 49 3.1.1 Impact of Self-loop on Power Gating 49 3.1.2 Circuit Behavior Before Sleeping 52 3.1.3 Wakeup Latency vs. Retention Storage 54 3.2 Steady State Driven Retention Storage Allocation 56 3.2.1 Extracting Steady State Self-loop FFs 57 3.2.2 Allocating State Retention Storage 59 3.2.3 Designing and Optimizing Steady State Monitoring Logic 59 3.2.4 Analysis of the Impact of Steady State Monitoring Time on the Standby Power 63 3.3 Retention Storage Refinement Utilizing Steadiness 65 3.3.1 Extracting Flip-flops for Retention Storage Refinement 66 3.3.2 Designing State Monitoring Logic and Control Signals 68 3.4 Experimental Results 73 3.4.1 Comparison of State Retention Storage 75 3.4.2 Comparison of Power Consumption 79 3.4.3 Impact on Circuit Performance 82 3.4.4 Support for Immediate Power Gating 83 4 Conclusions 89 4.1 Chapter 2 89 4.2 Chapter 3 90박

Circuit Techniques for Adaptive and Reliable High Performance Computing.

Increasing power density with process scaling has caused stagnation in the clock speed of modern microprocessors. Accordingly, designers have adopted message passing and shared memory based multicore architectures in order to keep up with the rapidly rising demand for computing throughput. At the same time, applications are not entirely parallel and improving single-thread performance continues to remain critical. Additionally, reliability is also worsening with process scaling, and margining for failures due to process and environmental variations in modern technologies consumes an increasingly large portion of the power/performance envelope. In the wake of multicore computing, reliability of signal synchronization between the cores is also becoming increasingly critical. This forces designers to search for alternate efficient methods to improve compute performance while addressing reliability. Accordingly, this dissertation presents innovative circuit and architectural techniques for variation-tolerance, performance and reliability targeted at datapath logic, signal synchronization and memories. Firstly, a domino logic based design style for datapath logic is presented that uses Adaptive Robustness Tuning (ART) in addition to timing speculation to provide up to 71% performance gains over conventional domino logic in 32bx32b multiplier in 65nm CMOS. Margins are reduced until functionality errors are detected, that are used to guide the tuning. Secondly, for signal synchronization across clock domains, a new class of dynamic logic based synchronizers with single-cycle synchronization latency is presented, where pulses, rather than stable intermediate voltages cause metastability. Such pulses are amplified using skewed inverters to improve mean time between failures by ~1e6x over jamb latches and double flip-flops at 2GHz in 65nm CMOS. Thirdly, a reconfigurable sensing scheme for 6T SRAMs is presented that employs auto-zero calibration and pre-amplification to improve sensing reliability (by up to 1.2 standard deviations of NMOS threshold voltage in 28nm CMOS); this increased reliability is in turn traded for ~42% sensing speedup. Finally, a main memory architecture design methodology to address reliability and power in the context of Exascale computing systems is presented. Based on 3D-stacked DRAMs, the methodology co-optimizes DRAM access energy, refresh power and the increased cost of error resilience, to meet stringent power and reliability constraints.PhDElectrical EngineeringUniversity of Michigan, Horace H. Rackham School of Graduate Studieshttp://deepblue.lib.umich.edu/bitstream/2027.42/107238/1/bharan_1.pd

Probabilistic Compute-in-Memory Design For Efficient Markov Chain Monte Carlo Sampling

Markov chain Monte Carlo (MCMC) is a widely used sampling method in modern artificial intelligence and probabilistic computing systems. It involves repetitive random number generations and thus often dominates the latency of probabilistic model computing. Hence, we propose a compute-in-memory (CIM) based MCMC design as a hardware acceleration solution. This work investigates SRAM bitcell stochasticity and proposes a novel ``pseudo-read'' operation, based on which we offer a block-wise random number generation circuit scheme for fast random number generation. Moreover, this work proposes a novel multi-stage exclusive-OR gate (MSXOR) design method to generate strictly uniformly distributed random numbers. The probability error deviating from a uniform distribution is suppressed under $10^{-5}$. Also, this work presents a novel in-memory copy circuit scheme to realize data copy inside a CIM sub-array, significantly reducing the use of R/W circuits for power saving. Evaluated in a commercial 28-nm process development kit, this CIM-based MCMC design generates 4-bit$\sim$32-bit samples with an energy efficiency of $0.53$~pJ/sample and high throughput of up to $166.7$M~samples/s. Compared to conventional processors, the overall energy efficiency improves $5.41\times10^{11}$ to $2.33\times10^{12}$ times

Always-On 674uW @ 4GOP/s Error Resilient Binary Neural Networks with Aggressive SRAM Voltage Scaling on a 22nm IoT End-Node

Binary Neural Networks (BNNs) have been shown to be robust to random bit-level noise, making aggressive voltage scaling attractive as a power-saving technique for both logic and SRAMs. In this work, we introduce the first fully programmable IoT end-node system-on-chip (SoC) capable of executing software-defined, hardware-accelerated BNNs at ultra-low voltage. Our SoC exploits a hybrid memory scheme where error-vulnerable SRAMs are complemented by reliable standard-cell memories to safely store critical data under aggressive voltage scaling. On a prototype in 22nm FDX technology, we demonstrate that both the logic and SRAM voltage can be dropped to 0.5Vwithout any accuracy penalty on a BNN trained for the CIFAR-10 dataset, improving energy efficiency by 2.2X w.r.t. nominal conditions. Furthermore, we show that the supply voltage can be dropped to 0.42V (50% of nominal) while keeping more than99% of the nominal accuracy (with a bit error rate ~1/1000). In this operating point, our prototype performs 4Gop/s (15.4Inference/s on the CIFAR-10 dataset) by computing up to 13binary ops per pJ, achieving 22.8 Inference/s/mW while keeping within a peak power envelope of 674uW - low enough to enable always-on operation in ultra-low power smart cameras, long-lifetime environmental sensors, and insect-sized pico-drones.Comment: Submitted to ISICAS2020 journal special issu

Charge Trap Transistors (CTT): Turning Logic Transistors into Embedded Non-Volatile Memory for Advanced High-k/Metal Gate CMOS Technologies

While need for embedded non-volatile memory (eNVM) in modern computing systems continues to grow rapidly, the options have been limited due to integration and scaling challenges as well as operational voltage incompatibilities. Introduced in this work is a unique multi-time programmable memory (MTPM) solution for advanced high-k/metal-gate (HKMG) CMOS technologies which turns as-fabricated standard logic transistors into eNVM elements, without the need for any process adders or additional masks. These logic transistors, when employed as eNVM elements, are dubbed “Charge Trap Transistors” (CTTs). The fundamental device physics, principles of operation, and technological breakthroughs required for employing logic transistors as eNVM are presented. Implementation of CTT eNVM in 32 nm, 22 nm, 14 nm, and 7 nm production technologies has been realized and demonstrated in this work. The emerging memory technology landscape and the space that the CTT technology occupies therein are examined.The motivation behind this work is to develop an eNVM technology that is completely process/mask-free, multi-time programmable, operable at low/logic-compatible voltages, scalable, and secure. The CTT technology satisfies all of the aforementioned criteria. CTTs offer a data retention lifetime of > 10 years at 125 �C and an operation temperature range of -55�-125� C. Hardware results demonstrate an endurance of > 10^4 program/erase cycles which is more than adequate for most embedded applications. Hardware security enhancement, on-chip reconfigurable encryption, firmware, BIOS, chip ID, redundancy, repair at wafer and module test and in the field, performance tailoring, and chip configuration are a few of the applications of CTT eNVM. Moreover, the CTT array in its native (unprogrammed) state measures very well as an entropy source for potential PUF (Physically Unclonable Function) applications such as identification, authentication, anti-counterfeiting, secure boot, and cryptographic IP. In addition to the numerous digital applications, CTTs can also be utilized as an analog memory for applications like neuromorphic computing for machine learning (ML) and artificial intelligence (AI)

Novel High Performance Ultra Low Power Static Random Access Memories (SRAMs) Based on Next Generation Technologies

Title from PDF of title page viewed January 27, 2021Dissertation advisor: Masud H. ChowdhuryVitaIncludes bibliographical references (page 107-120)Thesis (Ph.D.)--School of Computing and Engineering. University of Missouri--Kansas City, 2019Next Big Thing Is Surely Small: Nanotechnology Can Bring Revolution. Nanotechnology leads the world towards many new applications in various fields of computing, communication, defense, entertainment, medical, renewable energy and environment. These nanotechnology applications require an energy-efficient memory system to compute and process. Among all the memories, Static Random Access Memories (SRAMs) are high performance memories and occupies more than 50% of any design area. Therefore, it is critical to design high performance and energy-efficient SRAM design. Ultra low power and high speed applications require a new generation memory capable of operating at low power as well as low execution time. In this thesis, a novel 8T SRAM design is proposed that offers significantly faster access time and lowers energy consumption along with better read stability and write ability. The proposed design can be used in the conventional SRAM as well as in computationally intensive applications like neural networks and machine learning classifiers [1]-[4]. Novel 8T SRAM design offers higher energy efficiency, reliability, robustness and performance compared to the standard 6T and other existing 8T and 9T designs. It offers the advantages of a 10T SRAM without the additional area, delay and power overheads of the 10T SRAM. The proposed 8T SRAM would be able to overcome many other limitations of the conventional 6T and other 7T, 8T and 9T designs. The design employs single bitline for the write operation, therefore the number of write drivers are reduced. The defining feature of the proposed 8T SRAM is its hybrid design, which is the combination of two techniques: (i) the utilization of single-ended bitline and (ii) the utilization of virtual ground. The single-ended bitline technique ensures separate read and write operations, which eventually reduces the delay and power consumption during the read and write operations. It's independent read and write paths allow the use of the minimum sized access transistors and aid in a disturb-free read operation. The virtual ground weakens the positive feedback in the SRAM cell and improves its write ability. The virtual ground technique is also used to reduce leakages. The proposed design does not require precharging the bitlines for the read operation, which reduces the area and power overheads of the memory system by eliminating the precharging circuit. The design isolates the storage node from the read path, which improves the read stability. For reliability study, we have investigated the static noise margin (SNM) of the proposed 8T SRAM, for which, we have used two methods – (i) the traditional SNM method with the butterfly curve, (ii) the N-curve method A comparative analysis is performed between the proposed and the existing SRAM designs in terms of area, total power consumption during the read and write operations, and stability and reliability. All these advantages make the proposed 8T SRAM design an ideal candidate for the conventional and computationally intensive applications like machine learning classifier and deep learning neural network. In addition to this, there is need for next generation technologies to design SRAM memory because the conventional CMOS technology is approaching its physical and performance boundaries and as a consequence, becoming incompatible with ultra-low-power applications. Emerging devices such as Tunnel Field Effect Transistor (TFET)) and Graphene Nanoribbon Field Effect Transistor (GNRFET) devices are highly potential candidates to overcome the limitations of MOSFET because of their ability to achieve subthreshold slopes below 60 mV/decade and very low leakage currents [6]-[9]. This research also explores novel TFET and GNRFET based 6T SRAM. The thesis evaluates the standby leakage power in the Tunnel FET (TFET) based 6T SRAM cell for different pull-up, pull-down, and pass-gate transistors ratios (PU: PD: PG) and compared to 10nm FinFET based 6T SRAM designs. It is observed that the 10nm TFET based SRAMs have 107.57%, 163.64%, and 140.44% less standby leakage power compared to the 10nm FinFET based SRAMs when the PU: PD: PG ratios are 1:1:1, 1:5:2 and 2:5:2, respectively. The thesis also presents an analysis of the stability and reliability of sub-10nm TFET based 6T SRAM circuit with a reduced supply voltage of 500mV. The static noise margin (SNM), which is a critical measure of SRAM stability and reliability, is determined for hold, read and write operations of the 6T TFET SRAM cell. The robustness of the optimized TFET based 6T SRAM circuit is also evaluated at different supply voltages. Simulations were done in HSPICE and Cadence tools. From the analysis, it is clear that the main advantage of the TFET based SRAM would be the significant improvement in terms of leakage or standby power consumption. Compared to the FinFET based SRAM the standby leakage power of the T-SRAMs are 107.57%, 163.64%, and 140.44% less for 1:1:1, 1:5:2 and 2:5:2 configurations, respectively. Since leakage/standby power is the primary source of power consumption in the SRAM, and the overall system energy efficiency depends on SRAM power consumption, TFET based SRAM would lead to massive improvement of the energy efficiency of the system. Therefore, T-SRAMs are more suitable for ultra-low power applications. In addition to this, the thesis evaluates the standby leakage power of types of Graphene Nanoribbon FETs based 6T SRAM bitcell and compared to 10nm FinFET based 6T SRAM bitcell. It is observed that the 10nm MOS type GNRFET based SRAMs have 16.43 times less standby leakage power compared to the 10nm FinFET based SRAMs. The double gate SB-GNRFET based SRAM consumes 1.35E+03 times less energy compared to the 10nm FinFET based SRAM during write. However, during read double gate SB-GNRFET based SRAM consume 15 times more energy than FinFET based SRAM. It is also observed that GNRFET based SRAMs are more stable and reliable than FinFET based SRAM.Introduction -- Background -- Novel High Performance Ultra Low Power SRAM Design -- Tunnel FET Based SRAM Design -- Graphene Nanoribbon FET Based SRAM Design -- Double-gate FDSOI Based SRAM Designs -- Novel CNTFET and MEMRISTOR Based Digital Designs -- Conclusio

Static random-access memory designs based on different FinFET at lower technology node (7nm)

Title from PDF of title page viewed January 15, 2020Thesis advisor: Masud H ChowdhuryVitaIncludes bibliographical references (page 50-57)Thesis (M.S.)--School of Computing and Engineering. University of Missouri--Kansas City, 2019The Static Random-Access Memory (SRAM) has a significant performance impact on current nanoelectronics systems. To improve SRAM efficiency, it is important to utilize emerging technologies to overcome short-channel effects (SCE) of conventional CMOS. FinFET devices are promising emerging devices that can be utilized to improve the performance of SRAM designs at lower technology nodes. In this thesis, I present detail analysis of SRAM cells using different types of FinFET devices at 7nm technology. From the analysis, it can be concluded that the performance of both 6T and 8T SRAM designs are improved. 6T SRAM achieves a 44.97% improvement in the read energy compared to 8T SRAM. However, 6T SRAM write energy degraded by 3.16% compared to 8T SRAM. Read stability and write ability of SRAM cells are determined using Static Noise Margin and N- curve methods. Moreover, Monte Carlo simulations are performed on the SRAM cells to evaluate process variations. Simulations were done in HSPICE using 7nm Asymmetrical Underlap FinFET technology. The quasiplanar FinFET structure gained considerable attention because of the ease of the fabrication process [1] – [4]. Scaling of technology have degraded the performance of CMOS designs because of the short channel effects (SCEs) [5], [6]. Therefore, there has been upsurge in demand for FinFET devices for emerging market segments including artificial intelligence and cloud computing (AI) [8], [9], Internet of Things (IoT) [10] – [13] and biomedical [17] –[18] which have their own exclusive style of design. In recent years, many Underlapped FinFET devices were proposed to have better control of the SCEs in the sub-nanometer technologies [3], [4], [19] – [33]. Underlap on either side of the gate increases effective channel length as seen by the charge carriers. Consequently, the source-to-drain tunneling probability is improved. Moreover, edge direct tunneling leakage components can be reduced by controlling the electric field at the gate-drain junction . There is a limitation on the extent of underlap on drain or source sides because the ION is lower for larger underlap. Additionally, FinFET based designs have major width quantization issue. The width of a FinFET device increases only in quanta of silicon fin height (HFIN) [4]. The width quantization issue becomes critical for ratioed designs like SRAMs, where proper sizing of the transistors is essential for fault-free operation. FinFETs based on Design/Technology Co-Optimization (DTCO_F) approach can overcome these issues [38]. DTCO_F follows special design rules, which provides the specifications for the standard SRAM cells with special spacing rules and low leakages. The performances of 6T SRAM designs implemented by different FinFET devices are compared for different pull-up, pull down and pass gate transistor (PU: PD:PG) ratios to identify the best FinFET device for high speed and low power SRAM applications. Underlapped FinFETs (UF) and Design/Technology Co-Optimized FinFETs (DTCO_F) are used for the design and analysis. It is observed that with the PU: PD:PG ratios of 1:1:1 and 1:5:2 for the UF-SRAMs the read energy has degraded by 3.31% and 48.72% compared to the DTCO_F-SRAMs, respectively. However, the read energy with 2:5:2 ratio has improved by 32.71% in the UF-SRAM compared to the DTCO_F-SRAMs. The write energy with 1:1:1 configuration has improved by 642.27% in the UF-SRAM compared to the DTCO_F-SRAM. On the other hand, the write energy with 1:5:2 and 2:5:2 configurations have degraded by 86.26% and 96% in the UF-SRAMs compared to the DTCO_F-SRAMs. The stability and reliability of different SRAMs are also evaluated for 500mV supply. From the analysis, it can be concluded that Asymmetrical Underlapped FinFET is better for high-speed applications and DTCO FinFET for low power applications.Introduction -- Next generation high performance device: FinFET -- FinFET based SRAM bitcell designs -- Benchmarking of UF-SRAMs and DTCO-F-SRAMS -- Collaborative project -- Internship experience at INTEL and Marvell Semiconductor -- Conclusion and future wor

Nano-scale TG-FinFET: Simulation and Analysis

Transistor has been designed and fabricated in the same way since its invention more than four decades ago enabling exponential shrinking in the channel length. However, hitting fundamental limits imposed the need for introducing disruptive technology to take over. FinFET - 3-D transistor - has been emerged as the first successor to MOSFET to continue the technology scaling roadmap. In this thesis, scaling of nano-meter FinFET has been investigated on both the device and circuit levels. The studies, primarily, consider FinFET in its tri-gate (TG) structure. On the device level, first, the main TCAD models used in simulating electron transport are benchmarked against the most accurate results on the semi-classical level using Monte Carlo techniques. Different models and modifications are investigated in a trial to extend one of the conventional models to the nano-scale simulations. Second, a numerical study for scaling TG-FinFET according to the most recent International Technology Roadmap of Semiconductors is carried out by means of quantum corrected 3-D Monte Carlo simulations in the ballistic and quasi-ballistic regimes, to assess its ultimate performance and scaling behavior for the next generations. Ballisticity ratio (BR) is extracted and discussed over different channel lengths. The electron velocity along the channel is analyzed showing the physical significance of the off-equilibrium transport with scaling the channel length. On the circuit level, first, the impact of FinFET scaling on basic circuit blocks is investigated based on the PTM models. 256-bit (6T) SRAM is evaluated for channel lengths of 20nm down to 7nm showing the scaling trends of basic performance metrics. In addition, the impact of VT variations on the delay, power, and stability is reported considering die-to-die variations. Second, we move to another peer-technology which is 28nm FD-SOI as a comparative study, keeping the SRAM cell as the test block, more advanced study is carried out considering the cell‘s stability and the evolution from dynamic to static metrics