On the suitability and development of layout templates for analog layout reuse and layout-aware synthesis

Accelerating the synthesis of increasingly complex analog integrated circuits is key to bridge the widening gap between what we can integrate and what we can design while meeting ever-tightening time-to-market constraints. It is a well-known fact in the semiconductor industry that such goal can only be attained by means of adequate CAD methodologies, techniques, and accompanying tools. This is particularly important in analog physical synthesis (a.k.a. layout generation), where large sensitivities of the circuit performances to the many subtle details of layout implementation (device matching, loading and coupling effects, reliability, and area features are of utmost importance to analog designers), render complete automation a truly challenging task. To approach the problem, two directions have been traditionally considered, knowledge-based and optimization-based, both with their own pros and cons. Besides, recently reported solutions oriented to speed up the overall design flow by means of reuse-based practices or by cutting off time-consuming, error-prone spins between electrical and layout synthesis (a technique known as layout-aware synthesis), rely on a outstandingly rapid yet efficient layout generation method. This paper analyses the suitability of procedural layout generation based on templates (a knowledge-based approach) by examining the requirements that both layout reuse and layout-aware solutions impose, and how layout templates face them. The ability to capture the know-how of experienced layout designers and the turnaround times for layout instancing are considered main comparative aspects in relation to other layout generation approaches. A discussion on the benefit-cost trade-off of using layout templates is also included. In addition to this analysis, the paper delves deeper into systematic techniques to develop fully reusable layout templates for analog circuits, either for a change of the circuit sizing (i.e., layout retargeting) or a change of the fabrication process (i.e., layout migration). Several examples implemented with the Cadence's Virtuoso tool suite are provided as demonstration of the paper's contributions.Ministerio de Educación y Ciencia TEC2004-0175

A Reuse-based framework for the design of analog and mixed-signal ICs

Despite the spectacular breakthroughs of the semiconductor industry, the ability to design integrated circuits (ICs) under stringent time-to-market (TTM) requirements is lagging behind integration capacity, so far keeping pace with still valid Moore's Law. The resulting gap is threatening with slowing down such a phenomenal growth. The design community believes that it is only by means of powerful CAD tools and design methodologies -and, possibly, a design paradigm shift-that this design gap can be bridged. In this sense, reuse-based design is seen as a promising solution, and concepts such as IP Block, Virtual Component, and Design Reuse have become commonplace thanks to the significant advances in the digital arena. Unfortunately, the very nature of analog and mixed-signal (AMS) design has hindered a similar level of consensus and development. This paper presents a framework for the reuse-based design of AMS circuits. The framework is founded on three key elements: (1) a CAD-supported hierarchical design flow that facilitates the incorporation of AMS reusable blocks, reduces the overall design time, and expedites the management of increasing AMS design complexity; (2) a complete, clear definition of the AMS reusable block, structured into three separate facets or views: the behavioral, structural, and layout facets, the two first for top-down electrical synthesis and bottom-up verification, the latter used during bottom-up physical synthesis; (3) the design for reusability set of tools, methods, and guidelines that, relying on intensive parameterization as well as on design knowledge capture and encapsulation, allows to produce fully reusable AMS blocks. A case study and a functional silicon prototype demonstrate the validity of the paper's proposals.Ministerio de Educación y Ciencia TEC2004-0175

Advanced analog layout design automation in compliance with density uniformity

To fabricate a reliable integrated circuit chip, foundries follow specific design rules and layout processing techniques. One of the parameters, which affect circuit performance and final electronic product quality, is the variation of thickness for each semiconductor layer within the fabricated chips. The thickness is closely dependent on the density of geometric features on that layer. Therefore, to ensure consistent thickness, foundries normally have to seriously control distribution of the feature density on each layer by using post-processing operations. In this research, the methods of controlling feature density distribution on different layers of an analog layout during the process of layout migration from an old technology to a new one or updated design specifications in the same technology have been investigated. We aim to achieve density-uniformity-aware layout retargeting for facilitating manufacturing process in the advanced technologies. This can offer an advantage right to the design stage for the designers to evaluate the effects of applying density uniformity to their drafted layouts, which are otherwise usually done by the foundries at the final manufacturing stage without considering circuit performance. Layout modification for density uniformity includes component position change and size modification, which may induce crosstalk noise caused by extra parasitic capacitance. To effectively control this effect, we have also investigated and proposed a simple yet accurate analytic method to model the parasitic capacitance on multi-layer VLSI chips. Supported by this capacitance modeling research, a unique methodology to deal with density-uniformity-aware analog layout retargeting with the capability of parasitic capacitance control has been presented. The proposed operations include layout geometry position rearrangement, interconnect size modification, and extra dummy fill insertion for enhancing layout density uniformity. All of these operations are holistically coordinated by a linear programming optimization scheme. The experimental results demonstrate the efficacy of the proposed methodology compared to the popular digital solutions in terms of minimum density variation and acute parasitic capacitance control

Analog design for manufacturability: lithography-aware analog layout retargeting

As transistor sizes shrink over time in the advanced nanometer technologies, lithography effects have become a dominant contributor of integrated circuit (IC) yield degradation. Random manufacturing variations, such as photolithographic defect or spot defect, may cause fatal functional failures, while systematic process variations, such as dose fluctuation and defocus, can result in wafer pattern distortions and in turn ruin circuit performance. This dissertation is focused on yield optimization at the circuit design stage or so-called design for manufacturability (DFM) with respect to analog ICs, which has not yet been sufficiently addressed by traditional DFM solutions. On top of a graph-based analog layout retargeting framework, in this dissertation the photolithographic defects and lithography process variations are alleviated by geometrical layout manipulation operations including wire widening, wire shifting, process variation band (PV-band) shifting, and optical proximity correction (OPC). The ultimate objective of this research is to develop efficient algorithms and methodologies in order to achieve lithography-robust analog IC layout design without circuit performance degradation

Analog layout design automation: ILP-based analog routers

The shrinking design window and high parasitic sensitivity in the advanced technology have imposed special challenges on the analog and radio frequency (RF) integrated circuit design. In this thesis, we propose a new methodology to address such a deficiency based on integer linear programming (ILP) but without compromising the capability of handling any special constraints for the analog routing problems. Distinct from the conventional methods, our algorithm utilizes adaptive resolutions for various routing regions. For a more congested region, a routing grid with higher resolution is employed, whereas a lower-resolution grid is adopted to a less crowded routing region. Moreover, we strengthen its speciality in handling interconnect width control so as to route the electrical nets based on analog constraints while considering proper interconnect width to address the acute interconnect parasitics, mismatch minimization, and electromigration effects simultaneously. In addition, to tackle the performance degradation due to layout dependent effects (LDEs) and take advantage of optical proximity correction (OPC) for resolution enhancement of subwavelength lithography, in this thesis we have also proposed an innovative LDE-aware analog layout migration scheme, which is equipped with our special routing methodology. The LDE constraints are first identified with aid of a special sensitivity analysis and then satisfied during the layout migration process. Afterwards the electrical nets are routed by an extended OPC-inclusive ILP-based analog router to improve the final layout image fidelity while the routability and analog constraints are respected in the meantime. The experimental results demonstrate the effectiveness and efficiency of our proposed methods in terms of both circuit performance and image quality compared to the previous works

GBLD: A Formal Model for Layout Description and Generation

In this paper, we introduce a layout description and generation model, GBLD, based on the notions and elements of L-systems and context-free grammars. Our layout model is compatible with geometric layout formats, such as GDSII or CIF. However, it is more powerful and more concise. The layouts represented by GBLD are sizeable, parameterised, and can incorporate design rules. GBLD has the potential to be used as a format for analog layout templates, analog layout retargeting, as well as the final layout format

Technology Independent Synthesis of CMOS Operational Amplifiers

Analog circuit design does not enjoy as much automation as its digital counterpart. Analog sizing is inherently knowledge intensive and requires accurate modeling of the different parametric effects of the devices. Besides, the set of constraints in a typical analog design problem is large, involving complex tradeoffs. For these reasons, the task of modeling an analog design problem in a form viable for automation is much more tedious than the digital design. Consequently, analog blocks are still handcrafted intuitively and often become a bottleneck in the integrated circuit design, thereby increasing the time to market. In this work, we address the problem of automatically solving an analog circuit design problem. Specifically, we propose methods to automate the transistor-level sizing of OpAmps. Given the specifications and the netlist of the OpAmp, our methodology produces a design that has the accuracy of the BSIM models used for simulation and the advantage of a quick design time. The approach is based on generating an initial first-order design and then refining it. In principle, the refining approach is a simulated-annealing scheme that uses (i) localized simulations and (ii) convex optimization scheme (COS). The optimal set of input variables for localized simulations has been selected by using techniques from Design of Experiments (DOE). To formulate the design problem as a COS problem, we have used monomial circuit models that are fitted from simulation data. These models accurately predict the performance of the circuit in the proximity of the initial guess. The models can also be used to gain valuable insight into the behavior of the circuit and understand the interrelations between the different performance constraints. A software framework that implements this methodology has been coded in SKILL language of Cadence. The methodology can be applied to design different OpAmp topologies across different technologies. In other words, the framework is both technology independent and topology independent. In addition, we develop a scheme to empirically model the small signal parameters like \u27gm\u27 and \u27gds\u27 of CMOS transistors. The monomial device models are reusable for a given technology and can be used to formulate the OpAmp design problem as a COS problem. The efficacy of the framework has been demonstrated by automatically designing different OpAmp topologies across different technologies. We designed a two-stage OpAmp and a telescopic OpAmp in TSMC025 and AMI016 technologies. Our results show significant (10–15%) improvement in the performance of both the OpAmps in both the technologies. While the methodology has shown encouraging results in the sub-micrometer regime, the effectiveness of the tool has to be investigated in the deep-sub-micron technologies

AI/ML Algorithms and Applications in VLSI Design and Technology

An evident challenge ahead for the integrated circuit (IC) industry in the nanometer regime is the investigation and development of methods that can reduce the design complexity ensuing from growing process variations and curtail the turnaround time of chip manufacturing. Conventional methodologies employed for such tasks are largely manual; thus, time-consuming and resource-intensive. In contrast, the unique learning strategies of artificial intelligence (AI) provide numerous exciting automated approaches for handling complex and data-intensive tasks in very-large-scale integration (VLSI) design and testing. Employing AI and machine learning (ML) algorithms in VLSI design and manufacturing reduces the time and effort for understanding and processing the data within and across different abstraction levels via automated learning algorithms. It, in turn, improves the IC yield and reduces the manufacturing turnaround time. This paper thoroughly reviews the AI/ML automated approaches introduced in the past towards VLSI design and manufacturing. Moreover, we discuss the scope of AI/ML applications in the future at various abstraction levels to revolutionize the field of VLSI design, aiming for high-speed, highly intelligent, and efficient implementations

Automatic mapping of graphical programming applications to microelectronic technologies

Adaptive computing systems (ACSs) and application-specific integrated circuits (ASICs) can serve as flexible hardware accelerators for applications in domains such as image processing and digital signal processing. However, the mapping of applications onto ACSs and ASICs using the traditional methods can take months for a hardware engineer to develop and debug. In this dissertation, a new approach for automatic mapping of software applications onto ACSs and ASICs has been developed, implemented and validated. This dissertation presents the design flow of the software environment called CHAMPION, which is being developed at the University of Tennessee. This environment permits high-level design entry using the Cantata graphical programming software fromKRI. Using Cantata as the design entry, CHAMPION hides from the user the low-level details of the hardware architecture and the finer issues of application mapping onto the hardware. Validation of the CHAMPION environment was performed using multiple applications of moderate complexity. In one case, theapplication mapping time which required six weeks to perform manually took only six minutes for CHAMPION, yet comparable results were produced. Furthermore, the CHAMPION environment was constructed such that retargeting to a new adaptive computing system could be accomplished in just a few hours as opposed to weeks using manual methods. Thus, CHAMPION permits both ACSs and ASICs to be utilized by a wider audience and application development accomplished in less time

FUZZY KERNEL REGRESSION FOR REGISTRATION AND OTHER IMAGE WARPING APPLICATIONS

In this dissertation a new approach for non-rigid medical im- age registration is presented. It relies onto a probabilistic framework based on the novel concept of Fuzzy Kernel Regression. The theoric framework, after a formal introduction is applied to develop several complete registration systems, two of them are interactive and one is fully automatic. They all use the composition of local deforma- tions to achieve the final alignment. Automatic one is based onto the maximization of mutual information to produce local affine aligments which are merged into the global transformation. Mutual Information maximization procedure uses gradient descent method. Due to the huge amount of data associated to medical images, a multi-resolution topology is embodied, reducing processing time. The distance based interpolation scheme injected facilitates the similairity measure op- timization by attenuating the presence of local maxima in the func- tional. System blocks are implemented on GPGPUs allowing efficient parallel computation of large 3d datasets using SIMT execution. Due to the flexibility of Mutual Information, it can be applied to multi- modality image scans (MRI, CT, PET, etc.). Both quantitative and qualitative experiments show promising results and great potential for future extension. Finally the framework flexibility is shown by means of its succesful application to the image retargeting issue, methods and results are presented