Design of variability compensation architectures of digital circuits with adaptive body bias

The most critical concern in circuit is to achieve high level of performance with very tight power constraint. As the high performance circuits moved beyond 45nm technology one of the major issues is the parameter variation i.e. deviation in process, temperature and voltage (PVT) values from nominal specifications. A key process parameter subject to variation is the transistor threshold voltage (Vth) which impacts two important parameters: frequency and leakage power. Although the degradation can be compensated by the worstcase scenario based over-design approach, it induces remarkable power and performance overhead which is undesirable in tightly constrained designs. Dynamic voltage scaling (DVS) is a more power efficient approach, however its coarse granularity implies difficulty in handling fine grained variations. These factors have contributed to the growing interest in power aware robust circuit design. We propose a variability compensation architecture with adaptive body bias, for low power applications using 28nm FDSOI technology. The basic approach is based on a dynamic prediction and prevention of possible circuit timing errors. In our proposal we are using a Canary logic technique that enables the typical-case design. The body bias generation is based on a DLL type method which uses an external reference generator and voltage controlled delay line (VCDL) to generate the forward body bias (FBB) control signals. The adaptive technique is used for dynamic detection and correction of path failures in digital designs due to PVT variations. Instead of tuning the supply voltage, the key idea of the design approach is to tune the body bias voltage bymonitoring the error rate during operation. The FBB increases operating speed with an overhead in leakage power

A versatile CMOS transistor array IC for the statistical characterization of time-zero variability, RTN, BTI, and HCI

Statistical characterization of CMOS transistor variability phenomena in modern nanometer technologies is key for accurate end-of-life prediction. This paper presents a novel CMOS transistor array chip to statistically characterize the effects of several critical variability sources, such as time-zero variability (TZV), random telegraph noise (RTN), bias temperature instability (BTI), and hot-carrier injection (HCI). The chip integrates 3136 MOS transistors of both pMOS and nMOS types, with eight different sizes. The implemented architecture provides the chip with a high level of versatility, allowing all required tests and attaining the level of accuracy that the characterization of the above-mentioned variability effects requires. Another very important feature of the array is the capability of performing massively parallel aging testing, thus significantly cutting down the time for statistical characterization. The chip has been fabricated in a 1.2-V, 65-nm CMOS technology with a total chip area of 1800 x 1800 µm²

Wide-Supply-Range All-Digital Leakage Variation Sensor for On-Chip Process and Temperature Monitoring

Variation in process, voltage and temperature is a major obstacle in achieving energy-efficient operation of LSI. This paper proposes an all-digital on-chip circuit to monitor leakage current variations of both of the nMOSFET and pMOSFET independently. As leakage current is highly sensitive to threshold voltage and temperature, the circuit is suitable for tracking process and temperature variation. The circuit uses reconfigurable inhomogeneity to obtain statistical properties from a single monitor instance. A compact reconfigurable inverter topology is proposed to implement the monitor circuit. The compact and digital nature of the inverter enables cell-based design, which will reduce design costs. Measurement results from a 65 nm test chip show the validity of the proposed circuit. For a 124 sample size for both of the nMOSFET and pMOSFET, the monitor area is 4500 μm2 and active power consumption is 76 nW at 0.8 V operation. The proposed technique enables area-efficient and low-cost implementation thus can be used in product chips for applications such as dynamic energy and thermal management, testing and post-silicon tuning

A versatile CMOS transistor array IC for the statistical characterization of time-zero variability, RTN, BTI, and HCI

© 2018 IEEE. Personal use of this material is permitted. Permission from IEEE must be obtained for all other uses, in any current or future media, including reprinting/republishing this material for advertising or promotional purposes,creating new collective works, for resale or redistribution to servers or lists, or reuse of any copyrighted component of this work in other works.Statistical characterization of CMOS transistor variability phenomena in modern nanometer technologies is key for accurate end-of-life prediction. This paper presents a novel CMOS transistor array chip to statistically characterize the effects of several critical variability sources, such as time-zero variability (TZV), random telegraph noise (RTN), bias temperature instability (BTI), and hot-carrier injection (HCI). The chip integrates 3136 MOS transistors of both pMOS and nMOS types, with eight different sizes. The implemented architecture provides the chip with a high level of versatility, allowing all required tests and attaining the level of accuracy that the characterization of the above-mentioned variability effects requires. Another very important feature of the array is the capability of performing massively parallel aging testing, thus significantly cutting down the time for statistical characterization. The chip has been fabricated in a 1.2-V, 65-nm CMOS technology with a total chip area of 1800 x 1800 µm².Peer ReviewedPostprint (author's final draft

Monitor amb control strategies to reduce the impact of process variations in digital circuits

As CMOS technology scales down, Process, Voltage, Temperature and Ageing (PVTA) variations have an increasing impact on the performance and power consumption of electronic devices. These issues may hold back the continuous improvement of these devices in the near future. There are several ways to face the variability problem: to increase the operating margins of maximum clock frequency, the implementation of lithographic friendly layout styles, and the last one and the focus of this thesis, to adapt the circuit to its actual manufacturing and environment conditions by tuning some of the adjustable parameters once the circuit has been manufactured. The main challenge of this thesis is to develop a low-area variability compensation mechanism to automatically mitigate PVTA variations in run-time, i.e. while integrated circuit is running. This implies the development of a sensor to obtain the most accurate picture of variability, and the implementation of a control block to knob some of the electrical parameters of the circuit.A mesura que la tecnologia CMOS escala, les variacions de Procés, Voltatge, Temperatura i Envelliment (PVTA) tenen un impacte creixent en el rendiment i el consum de potència dels dispositius electrònics. Aquesta problemàtica podria arribar a frenar la millora contínua d'aquests dispositius en un futur proper. Hi ha diverses maneres d'afrontar el problema de la variabilitat: relaxar el marge de la freqüència màxima d'operació, implementar dissenys físics de xips més fàcils de litografiar, i per últim i com a tema principal d'aquesta tesi, adaptar el xip a les condicions de fabricació i d'entorn mitjançant la modificació d'algun dels seus paràmetres ajustables una vegada el circuit ja ha estat fabricat. El principal repte d'aquesta tesi és desenvolupar un mecanisme de compensació de variabilitat per tal de mitigar les variacions PVTA de manera automàtica en temps d'execució, és a dir, mentre el xip està funcionant. Això implica el desenvolupament d'un sensor capaç de mesurar la variabilitat de la manera més acurada possible, i la implementació d'un bloc de control que permeti l'ajust d'alguns dels paràmetres elèctrics dels circuits

Ingress of threshold voltage-triggered hardware trojan in the modern FPGA fabric–detection methodology and mitigation

The ageing phenomenon of negative bias temperature instability (NBTI) continues to challenge the dynamic thermal management of modern FPGAs. Increased transistor density leads to thermal accumulation and propagates higher and non-uniform temperature variations across the FPGA. This aggravates the impact of NBTI on key PMOS transistor parameters such as threshold voltage and drain current. Where it ages the transistors, with a successive reduction in FPGA lifetime and reliability, it also challenges its security. The ingress of threshold voltage-triggered hardware Trojan, a stealthy and malicious electronic circuit, in the modern FPGA, is one such potential threat that could exploit NBTI and severely affect its performance. The development of an effective and efficient countermeasure against it is, therefore, highly critical. Accordingly, we present a comprehensive FPGA security scheme, comprising novel elements of hardware Trojan infection, detection, and mitigation, to protect FPGA applications against the hardware Trojan. Built around the threat model of a naval warship’s integrated self-protection system (ISPS), we propose a threshold voltage-triggered hardware Trojan that operates in a threshold voltage region of 0.45V to 0.998V, consuming ultra-low power (10.5nW), and remaining stealthy with an area overhead as low as 1.5% for a 28 nm technology node. The hardware Trojan detection sub-scheme provides a unique lightweight threshold voltage-aware sensor with a detection sensitivity of 0.251mV/nA. With fixed and dynamic ring oscillator-based sensor segments, the precise measurement of frequency and delay variations in response to shifts in the threshold voltage of a PMOS transistor is also proposed. Finally, the FPGA security scheme is reinforced with an online transistor dynamic scaling (OTDS) to mitigate the impact of hardware Trojan through run-time tolerant circuitry capable of identifying critical gates with worst-case drain current degradation

Solid State Circuits Technologies

The evolution of solid-state circuit technology has a long history within a relatively short period of time. This technology has lead to the modern information society that connects us and tools, a large market, and many types of products and applications. The solid-state circuit technology continuously evolves via breakthroughs and improvements every year. This book is devoted to review and present novel approaches for some of the main issues involved in this exciting and vigorous technology. The book is composed of 22 chapters, written by authors coming from 30 different institutions located in 12 different countries throughout the Americas, Asia and Europe. Thus, reflecting the wide international contribution to the book. The broad range of subjects presented in the book offers a general overview of the main issues in modern solid-state circuit technology. Furthermore, the book offers an in depth analysis on specific subjects for specialists. We believe the book is of great scientific and educational value for many readers. I am profoundly indebted to the support provided by all of those involved in the work. First and foremost I would like to acknowledge and thank the authors who worked hard and generously agreed to share their results and knowledge. Second I would like to express my gratitude to the Intech team that invited me to edit the book and give me their full support and a fruitful experience while working together to combine this book

Robust Design of Variation-Sensitive Digital Circuits

The nano-age has already begun, where typical feature dimensions are smaller than 100nm. The operating frequency is expected to increase up to 12 GHz, and a single chip will contain over 12 billion transistors in 2020, as given by the International Technology Roadmap for Semiconductors (ITRS) initiative. ITRS also predicts that the scaling of CMOS devices and process technology, as it is known today, will become much more difficult as the industry advances towards the 16nm technology node and further. This aggressive scaling of CMOS technology has pushed the devices to their physical limits. Design goals are governed by several factors other than power, performance and area such as process variations, radiation induced soft errors, and aging degradation mechanisms. These new design challenges have a strong impact on the parametric yield of nanometer digital circuits and also result in functional yield losses in variation-sensitive digital circuits such as Static Random Access Memory (SRAM) and flip-flops. Moreover, sub-threshold SRAM and flip-flops circuits, which are aggravated by the strong demand for lower power consumption, show larger sensitivity to these challenges which reduces their robustness and yield. Accordingly, it is not surprising that the ITRS considers variability and reliability as the most challenging obstacles for nanometer digital circuits robust design. Soft errors are considered one of the main reliability and robustness concerns in SRAM arrays in sub-100nm technologies due to low operating voltage, small node capacitance, and high packing density. The SRAM arrays soft errors immunity is also affected by process variations. We develop statistical design-oriented soft errors immunity variations models for super-threshold and sub-threshold SRAM cells accounting for die-to-die variations and within-die variations. This work provides new design insights and highlights the important design knobs that can be used to reduce the SRAM cells soft errors immunity variations. The developed models are scalable, bias dependent, and only require the knowledge of easily measurable parameters. This makes them useful in early design exploration, circuit optimization as well as technology prediction. The derived models are verified using Monte Carlo SPICE simulations, referring to an industrial hardware-calibrated 65nm CMOS technology. The demand for higher performance leads to very deep pipelining which means that hundreds of thousands of flip-flops are required to control the data flow under strict timing constraints. A violation of the timing constraints at a flip-flop can result in latching incorrect data causing the overall system to malfunction. In addition, the flip-flops power dissipation represents a considerable fraction of the total power dissipation. Sub-threshold flip-flops are considered the most energy efficient solution for low power applications in which, performance is of secondary importance. Accordingly, statistical gate sizing is conducted to different flip-flops topologies for timing yield improvement of super-threshold flip-flops and power yield improvement of sub-threshold flip-flops. Following that, a comparative analysis between these flip-flops topologies considering the required overhead for yield improvement is performed. This comparative analysis provides useful recommendations that help flip-flops designers on selecting the best flip-flops topology that satisfies their system specifications while taking the process variations impact and robustness requirements into account. Adaptive Body Bias (ABB) allows the tuning of the transistor threshold voltage, Vt, by controlling the transistor body voltage. A forward body bias reduces Vt, increasing the device speed at the expense of increased leakage power. Alternatively, a reverse body bias increases Vt, reducing the leakage power but slowing the device. Therefore, the impact of process variations is mitigated by speeding up slow and less leaky devices or slowing down devices that are fast and highly leaky. Practically, the implementation of the ABB is desirable to bias each device in a design independently, to mitigate within-die variations. However, supplying so many separate voltages inside a die results in a large area overhead. On the other hand, using the same body bias for all devices on the same die limits its capability to compensate for within-die variations. Thus, the granularity level of the ABB scheme is a trade-off between the within-die variations compensation capability and the associated area overhead. This work introduces new ABB circuits that exhibit lower area overhead by a factor of 143X than that of previous ABB circuits. In addition, these ABB circuits are resolution free since no digital-to-analog converters or analog-to-digital converters are required on their implementations. These ABB circuits are adopted to high performance critical paths, emulating a real microprocessor architecture, for process variations compensation and also adopted to SRAM arrays, for Negative Bias Temperature Instability (NBTI) aging and process variations compensation. The effectiveness of the new ABB circuits is verified by post layout simulation results and test chip measurements using triple-well 65nm CMOS technology. The highly capacitive nodes of wide fan-in dynamic circuits and SRAM bitlines limit the performance of these circuits. In addition, process variations mitigation by statistical gate sizing increases this capacitance further and fails in achieving the target yield improvement. We propose new negative capacitance circuits that reduce the overall parasitic capacitance of these highly capacitive nodes. These negative capacitance circuits are adopted to wide fan-in dynamic circuits for timing yield improvement up to 99.87% and to SRAM arrays for read access yield improvement up to 100%. The area and power overheads of these new negative capacitance circuits are amortized over the large die area of the microprocessor and the SRAM array. The effectiveness of the new negative capacitance circuits is verified by post layout simulation results and test chip measurements using 65nm CMOS technology