Amorphous In–Ga–Zn–O thin‐film transistor active pixel sensor x‐ray imager for digital breast tomosynthesis

Peer Reviewedhttp://deepblue.lib.umich.edu/bitstream/2027.42/134962/1/mp2382.pd

P‐102: Amorphous Silicon Thin‐Film Transistors‐based Active‐Matrix Organic Light‐Emitting Displays

In this paper, we describe hydrogenated amorphous silicon (a‐Si:H) thin‐film transistor (TFT)‐based active‐matrix arrays for active‐matrix organic light‐emitting displays (AM‐OLEDs). The proposed pixel electrode circuits based on three a‐Si:H TFTs can supply a continuous output current for AM‐OLEDs. Each pixel circuit has compensation circuits that can adjust for the OLED and a‐Si:H TFTs electrical characteristics shifts.Peer Reviewedhttp://deepblue.lib.umich.edu/bitstream/2027.42/92089/1/1.1830416.pd

금속 산화물 및 이차원 나노 물질 기반의 박막 트랜지스터: 성능 최적화 및 양자점 발광 다이오드에 대한 응용

학위논문(박사) -- 서울대학교대학원 : 공과대학 전기·정보공학부, 2021.8. 곽정훈.박막 트랜지스터를 집적한 전자 디스플레이의 개발은 뛰어난 장점으로 인해 큰 관심을 받아왔다. 지난 수십 년 동안 능동 매트릭스 액정 디스플레이 및 유기 발광 다이오드와 같은 평판 디스플레이에 대한 여러 연구가 보고되었습니다. 이러한 우수한 성과에도 불구하고, p형 산화물/나노 반도체의 개발과 백플레인 박막 트랜지스터로 구동되는 양자점 발광 다이오드의 구동에 대한 연구는 제한적입니다. p형 반도체의 전기적 특성은 이동도가 낮고, 오프 전류가 높으며, 소자의 불안정성이 있기 때문입니다. 이러한 의미에서 우리는 앞서 언급한 응용을 위한 p-형 산화물/나노 물질 기반 박막 트랜지스터와 콜로이드 양자점 발광 다이오드를 연구했습니다. 먼저, 우리는 유연한 전자 장치에 잠재적으로 매력적인 나노 와이어 구조로 형성된 대체 전극으로 전기적 특성을 위해 스프레이 코팅된 단일벽 탄소나노 튜브를 소스 및 드레인 전극으로 사용하는 p 형 주석 산화물 (SnO) 박막 트랜지스터를 구현했습니다. 폴리머 에치 스토퍼 층에 SU-8이 있는 SnO 박막 트랜지스터의 소자 구조는 SnO 채널 층의 열화 없이 원하는 영역에서 단일벽 탄소나노튜브의 선택적 에칭을 가능하게 합니다. 또한 단일벽 탄소나노튜브 전극으로 사용하는 SnO 박막 트랜지스터는 적절한 채널폭과 정규화된 전기적 컨택 특성 (~ 1 kΩ cm), 전계 효과 이동성 (~ 0.69 cm2/Vs), 문턱전압이하 스윙 (~ 0.4 V/dec) 및 전류 온-오프 특성 (Ion/Ioff ~ 3.5×103)을 성공적으로 구현하였습니다. 또한 온도에 따른 전기적 컨택 및 채널 특성은 Ni 전극에 필적하는 적절한 접촉 저항과 함께 무시할 수 있는 수준의 가전자띠 테일 스테이트의 3 x 10-3 eV 활성화 에너지로 SnO 채널 전송을 설명합니다. 둘째, 우리는 먼저 상보형 트랜지스터를 구현하여 p (또는 n 형) MoTe2 박막 트랜지스터에 의해 제어되는 양자점 발광 다이오드 구동을 시연합니다. 이 연구에서는 MoTe2 박막 트랜지스터의 유형 변환을 위해 Poly-L-lysine (PLL)에 의한 분자 도핑을 도입하고, 양자점 발광 다이오드 성능 향상을 위해 표면 리간드 변형을 활용합니다. 이와 관련하여 PLL 처리는 전기적 특성의 저하없이 MoTe2 박막 트랜지스터의 뛰어난 유형 변환을 달성하여, 안정적인 p (또는 n 형) 유형 장치를 확보하여 보완 회로의 가용성을 보장합니다. 또한, 옥틸 아민으로 리간드 치환된 양자점은 양자점 발광 다이오드에서 균형 잡힌 전자/정공 주입을 생성하여, 전류 효율 (ηA = 13.9 cd/A)이 개선되고 수명이 더 길어집니다 (L0 = 3000 cd/m2에서 T50 = 66 h). 결과적으로 MoTe2 박막 트랜지스터는 적절한 스위칭 특성을 가진 디스플레이 백플레인 트랜지스터, 광 전류 생성에 대한 내성 및 작동 안정성을 포함하여 양자점 발광 다이오드를 구동하는 능력을 보여줍니다. 이 논문에서 우리는 유망한 응용을 위한 산화물/나노 물질 기반 박막 트랜지스터와 리간드 치환 기술이 적용된 후면 발광 적색 양자점 발광 다이오드에 대해 논의합니다. 백플레인 박막 트랜지스로 p형 SnO와 MoTe2를 사용하고, 새로운 디스플레이 장치로 CdSe 양자점 발광 다이오드를 사용한 우리의 연구 성과는 융합 연구를 위한 구상 분야에서 잠재적으로 사용될 수 있습니다.The development of electronic displays integrated with Thin Film Transistors (TFTs) has been great interests due to their superb merits. For the past decades, several studies have been reported for the flat-panel displays (FPDs) such as active-matrix liquid crystal display (LCD) and organic light-emitting diode (OLED). Despite of these excellent achievements, progress of p-type oxide/nano semiconductors and operation of quantum dot light-emitting diode (QLED) driven by backplane TFTs are limited. This is because the electrical characteristics of p-type semiconductor have low mobility, high off current, and device instability. In this sense, we investigated p-type oxide/nano material-based TFTs and colloidal quantum dot light-emitting diodes (QLEDs) for the afore-mentioned application. First, we implemented p-type tin oxide (SnO) TFTs with spray-coated single-wall carbon nanotube (SWNTs) as source and drain electrodes for their electrical characteristics as alternative electrodes formed of nanowire structures, which are potentially attractive for flexible electronics. The device architecture of SnO TFTs with a polymer etch stop layer (SU-8) enables the selective etching of SWNTs in a desired region without the detrimental effects of SnO channel layers. In addition, SnO TFTs with SWNT electrodes as substitutes successfully demonstrate decent width normalized electrical contact properties (~1 kΩ cm), field effect mobility (~0.69 cm2/Vs), sub-threshold slope (~0.4 V/dec), and current on-off ratio (Ion/Ioff ~ 3.5×103). Furthermore, temperature-dependent electrical contact and channel properties elucidate SnO channel transports with an activation energy of 3×10-3 eV, interpreted as a negligible level of valence-band tail states, together with decent contact resistance comparable to that of Ni electrodes. Second, we firstly demonstrated the QLEDs operation modulated by p (or n-type) MoTe2 TFTs with the realization of complementary type transistor. In this study, molecular doping by Poly-L-lysine (PLL) as an electron dopant is adopted for a type conversion of MoTe2 TFTs, and surface ligand modification is utilized for the improvement of QLED performance. In this regard, the PLL treatment achieves the outstanding type conversion of MoTe2 TFTs without any degradation of electrical properties, leading to securing reliable p (or n-type) devices, thus, availability of complementary circuits. Furthermore, ligand modified QDs capped with octylamine result in balanced electron/hole injection in QLEDs, yielding improved current efficiency (ηA =13.9 cd/A) and longer lifetimes (T50 = 66 h at L0 = 3000 cd/m2). As a result, MoTe2 TFTs demonstrate their capabilities to drive the QLEDs for the envisioned application including display backplane transistor with decent switching properties, immunity for generation of photocurrent, and operation stability. In this thesis, we discuss the oxide/nano material based TFTs and ligand modified bottom emitting red QLEDs for many promising applications. Our research achievements using p-type SnO and MoTe2 as backplane TFTs, and CdSe QLED as novel display device can be used in potentially envision fields for the convergence research.Chapter 1 1 1.1 An Overview of Thin Film Transistors 1 1.2 An Overview of Quantum Dot Light-Emitting Diodes 8 1.3 Outline of Thesis 13 Chapter 2 15 2.1 Materials 15 2.1.1 Synthesis of ZnO Nanoparticles 15 2.1.2 Synthesis of Red Light-Emitting CdSe/Cd1-xZnxS Quantumd Dots 15 2.2 Device Characterization of Thin Film Transistors 17 2.2.1 Characterization for Thin Film Transistor 17 2.2.2 Characterization of Light Response 18 2.3 Device Characterization of Quantum Dot Light-Emitting Diodes 18 2.3.1 Current-voltage-luminance Measurement of QLEDs 18 2.3.2 Efficiency Calculation Methods 21 2.3.3 Other Characterization Methods 22 Chapter 3 24 3.1 Devic Fabrication of SnO TFTs with Spray-Coated Single Walled Carbon Nanotubes as S/D Electrodes 26 3.2 Electrical Performance of SnO TFTs 30 3.3 Contact Resistance of Spray-coated SWNTs as S/D Electrodes 33 3.4 Summary 40 Chapter 4 41 4.1 Description of QLED display driven by MoTe2 TFTs 45 4.2 Ligand Modification of Red CdSe/Cd1-xZnxS Quantum Dots 49 4.3 Type Conversion of MoTe2 TFTs via Electron-Donated Charge Enhancer 54 4.4 Light-Insensitive Behaviors on Photocurrent Generation in MoTe2 TFTs 61 4.5 Operation of QLEDs Driven by Channel-type Controlled MoTe2 TFTs 66 4.6 Summary 70 Chapter 5 71 Bibilography 73 한글 초록 81박

Vertical Thin Film Transistors for Large Area Electronics

The prospect of producing nanometer channel-length thin film transistors (TFTs) for active matrix addressed pixelated arrays opens up new high-performance applications in which the most amenable device topology is the vertical thin film transistor (VTFT) in view of its small area. The previous attempts at fabricating VTFTs have yielded devices with a high drain leakage current, a low ON/OFF current ratio, and no saturation behaviour in the output current at high drain voltages, all induced by short channel effects. To overcome these adversities, particularly dominant as the channel length approaches the nano-scale regime, the reduction of the gate dielectric thickness is essential. However, the problems with scaling the gate dielectric thickness are the high gate leakage current and early dielectric breakdown of the insulator, deteriorating the device performance and reliability. A novel ultra-thin SiNx film suitable for the application as the gate dielectric of short channel TFTs and VTFTs is developed. The deposition is performed in a standard 13.56MHz PECVD system with silane and ammonia precursor gasses diluted in nitrogen. The deposited 50nm SiNx films demonstrate excellent electrical characteristics in terms of a leakage current of 0.1 nA/cm² and a breakdown electric field of 5.6MV/cm. Subsequently, the state of the art performances of 0.5µm channel length VTFTs with 50 and 30nm thick SiNx gate dielectrics are presented in this thesis. The transistors exhibit ON/OFF current ratios over 10^9, the subthreshold slopes as sharp as 0.23 V/dec, and leakage currents in the fA range. More significantly, a high associated yield is obtained for the fabrication of these devices on 3-inch rigid substrates. Finally, to illustrate the tremendous potential of the VTFT for the large area electronics, a 2.2-inch QVGA AMOLD display with in-pixel VTFT-based driver circuits is designed and fabricated. An outstanding value of 56% compared to the 30% produced by conventional technology is achieved as the aperture ratio of the display. Moreover, the initial measurement results reveal an excellent uniformity of the circuit elements.1 yea

Thin-Film Transistor Integration for Biomedical Imaging and AMOLED Displays

Thin film transistor (TFT) backplanes are being continuously researched for new applications such as active-matrix organic light emitting diode (AMOLED) displays, sensors, and x-ray imagers. However, the circuits implemented in presently available fabrication technologies including poly silicon (poly-Si), hydrogenated amorphous silicon (a-Si:H), and organic semiconductor, are prone to spatial and/or temporal non-uniformities. While current-programmed active matrix (AM) can tolerate mismatches and non-uniformity caused by aging, the long settling time is a significant limitation. Consequently, acceleration schemes are needed and are proposed to reduce the settling time to 20 µs. This technique is used in the development of a pixel circuit and system for biomedical imager and sensor. Here, a metal-insulator-semiconductor (MIS) capacitor is adopted for adjustment and boost of the circuit gain. Thus, the new pixel architecture supports multi-modality imaging for a wide range of applications with various input signal intensities. Also, for applications with lower current levels, a fast current-mode line driver is developed based on positive feedback which controls the effect of the parasitic capacitance. The measured settling time of a conventional current source is around 2 ms for a 100-nA input current and 200-pF parasitic capacitance whereas it is less than 4 μs for the driver presented here. For displays needed in mobile devices such as cell phones and DVD players, another new driving scheme is devised that provides for a high temporal stability, low-power consumption, high tolerance of temperature variations, and high resolution. The performance of the new driving scheme is demonstrated in a 9-inch fabricated display intended for DVD players. Also, a multi-modal imager pixel circuit is developed using this technique to provide for gain-adjustment capability. Here, the readout operation is not destructive, enabling the use of low-cost readout circuitry and noise reduction techniques. In addition, a highly stable and reliable driving scheme, based on step calibration is introduced for high precision displays and imagers. This scheme takes advantage of the slow aging of the electronics in the backplane to simplify the drive electronics. The other attractive features of this newly developed driving scheme are its simplicity, low-power consumption, and fast programming critical for implementation of large-area and high-resolution active matrix arrays for high precision

Optoelectronic properties of poly(fluorene) co‐polymer light‐emitting devices on a plastic substrate *

Peer Reviewedhttp://deepblue.lib.umich.edu/bitstream/2027.42/92131/1/1.2150379.pd

Organic Photodiodes and Their Optoelectronic Applications

Recently, organic photodiodes (OPDs) have been acknowledged as a next-generation device for photovoltaic and image sensor applications due to their advantages of large area process, light weight, mechanical flexibility, and excellent photoresponse. This dissertation targets for the development and understanding of high performance organic photodiodes for their medical and industrial applications for the next-generation. As the first research focus, A dielectric / metal / dielectric (DMD) transparent electrode is proposed for the top-illumination OPDs. The fabricated DMD transparent electrode showed the maximum optical transmittance of 85.7 % with sheet resistance of 6.2 ohm/sq. In the second part of the thesis, a development of novel transfer process which enables the dark current suppression for the inverted OPD devices will be discussed. Through the effort, we demonstrated OPD with high D* of 4.82 x 10^12 Jones at reverse bias of 1.5 V with dark current density (Jdark) of 7.7 nA/cm2 and external quantum efficiency (EQE) of 60 %. Additionally in the third part, we investigate a high performance low-bandgap polymer OPD with broadband spectrum. By utilizing the novel transfer process to introduce charge blocking layers, significant suppression of the dark current is achieved while high EQE of the device is preserved. A low Jdark of 5 nA/cm2 at reverse bias of 0.5 V was achieved resulting in the highest D* of 1.5 x 10^13 Jones. To investigate the benefit for the various OPD applications, we developed a novel 3D printing technique to fabricate OPD on hemispherical concave substrate. The techniques allowed the direct patterning of the OPD devices on hemispherical substrates without excessive strain or deformation. Lastly, a simulation of the OPD stacked a-ITZO TFT active pixel sensor (APS) pixel with external transimpedance amplifier (TIA) readout circuit was performed.PHDElectrical & Computer Eng PhDUniversity of Michigan, Horace H. Rackham School of Graduate Studieshttps://deepblue.lib.umich.edu/bitstream/2027.42/137168/1/hyunskim_1.pd