2,765 research outputs found
Aluminum Oxide Layers as Possible Components for Layered Tunnel Barriers
We have studied transport properties of Nb/Al/AlOx/Nb tunnel junctions with
ultrathin aluminum oxide layers formed by (i) thermal oxidation and (ii) plasma
oxidation, before and after rapid thermal post-annealing of the completed
structures at temperatures up to 550 deg C. Post-annealing at temperatures
above 300 deg C results in a significant decrease of the tunneling conductance
of thermally-grown barriers, while plasma-grown barriers start to change only
at annealing temperatures above 450 deg C. Fitting the experimental I-V curves
of the junctions using the results of the microscopic theory of direct
tunneling shows that the annealing of thermally-grown oxides at temperatures
above 300 deg C results in a substantial increase of their average tunnel
barriers height, from ~1.8 eV to ~2.45 eV, versus the practically unchanged
height of ~2.0 eV for plasma-grown layers. This difference, together with high
endurance of annealed barriers under electric stress (breakdown field above 10
MV/cm) may enable all-AlOx and SiO2/AlOx layered "crested" barriers for
advanced floating-gate memory applications.Comment: 7 pages, 6 figure
Universality of transport properties of ultra-thin oxide films
We report low-temperature measurements of current-voltage characteristics for
highly conductive Nb/Al-AlOx-Nb junctions with thicknesses of the Al interlayer
ranging from 40 to 150 nm and ultra-thin barriers formed by diffusive oxidation
of the Al surface. In the superconducting state these devices have revealed a
strong subgap current leakage. Analyzing Cooper-pair and quasiparticle currents
across the devices, we conclude that the strong suppression of the subgap
resistance comparing with conventional tunnel junctions originates from a
universal bimodal distribution of transparencies across the Al-oxide barrier
proposed earlier by Schep and Bauer. We suggest a simple physical explanation
of its source in the nanometer-thick oxide films relating it to strong local
barrier-height fluctuations which are generated by oxygen vacancies in thin
aluminum oxide tunnel barriers formed by thermal oxidation.Comment: revised text and a new figur
Single-Electron Traps: A Quantitative Comparison of Theory and Experiment
We have carried out a coordinated experimental and theoretical study of
single-electron traps based on submicron aluminum islands and aluminum oxide
tunnel junctions. The results of geometrical modeling using a modified version
of MIT's FastCap were used as input data for the general-purpose
single-electron circuit simulator MOSES. The analysis indicates reasonable
quantitative agreement between theory and experiment for those trap
characteristics which are not affected by random offset charges. The observed
differences between theory and experiment (ranging from a few to fifty percent)
can be readily explained by the uncertainty in the exact geometry of the
experimental nanostructures.Comment: 17 pages, 21 figures, RevTex, eps
A model for programming characteristics of Sonos type flash with high-kappa dielectrics
Silicon Oxide Nitride Oxide Silicon (SONOS) FLASH memories have recently gained a lot of attention due to better retention and scaling opportunities over the conventional Floating Gate FLASH memories. The constant demand for device scaling, to attain higher density, higher performance, and low cost per bit, has posed charge leakage problems. SONOS type devices with high-kappa storage layers and/or high-kappa blocking oxide have been proposed to alleviate the demand for constant tunnel oxide scaling. In comparison to conventional FLASH, these devices operate at lower voltages, exhibit higher programming speeds, comparable retention times, less over-erase problem and better compatibility with low power CMOS logic; The objective of this thesis is to develop a comprehensive model which can be used to obtain the programming characteristics, i.e., shift in threshold voltage vs. program time, for trap-based FLASH memories with high-kappa dielectrics. The proposed model is used to obtain the programming characteristics for SONOS type devices. The results from this model are compared with the experimental results and in general the agreement is good. For SONOS type devices with high-kappa blocking oxides, the density of available nitride traps for charge storage is shown to have a linear dependence with the potential energy difference between the silicon substrate and the nitride storage for different gate biases. The model is also used to get an estimate of available trap energy levels in the nitride layer as a function of applied voltage
Towards understanding two-level-systems in amorphous solids -- Insights from quantum circuits
Amorphous solids show surprisingly universal behaviour at low temperatures.
The prevailing wisdom is that this can be explained by the existence of
two-state defects within the material. The so-called standard tunneling model
has become the established framework to explain these results, yet it still
leaves the central question essentially unanswered -- what are these two-level
defects? This question has recently taken on a new urgency with the rise of
superconducting circuits in quantum computing, circuit quantum electrodynamics,
magnetometry, electrometry and metrology. Superconducting circuits made from
aluminium or niobium are fundamentally limited by losses due to two-level
defects within the amorphous oxide layers encasing them. On the other hand,
these circuits also provide a novel and effective method for studying the very
defects which limit their operation. We can now go beyond ensemble measurements
and probe individual defects -- observing the quantum nature of their dynamics
and studying their formation, their behaviour as a function of applied field,
strain, temperature and other properties. This article reviews the plethora of
recent experimental results in this area and discusses the various theoretical
models which have been used to describe the observations. In doing so, it
summarises the current approaches to solving this fundamentally important
problem in solid-state physics.Comment: 34 pages, 7 figures, 1 tabl
Bias spectroscopy and simultaneous SET charge state detection of Si:P double dots
We report a detailed study of low-temperature (mK) transport properties of a
silicon double-dot system fabricated by phosphorous ion implantation. The
device under study consists of two phosphorous nanoscale islands doped to above
the metal-insulator transition, separated from each other and the source and
drain reservoirs by nominally undoped (intrinsic) silicon tunnel barriers.
Metallic control gates, together with an Al-AlOx single-electron transistor,
were positioned on the substrate surface, capacitively coupled to the buried
dots. The individual double-dot charge states were probed using source-drain
bias spectroscopy combined with non-invasive SET charge sensing. The system was
measured in linear (VSD = 0) and non-linear (VSD 0) regimes allowing
calculations of the relevant capacitances. Simultaneous detection using both
SET sensing and source-drain current measurements was demonstrated, providing a
valuable combination for the analysis of the system. Evolution of the triple
points with applied bias was observed using both charge and current sensing.
Coulomb diamonds, showing the interplay between the Coulomb charging effects of
the two dots, were measured using simultaneous detection and compared with
numerical simulations.Comment: 7 pages, 6 figure
Oxygen impurities link bistability and magnetoresistance in organic spin valves
Vertical cross-bar devices based on manganite and cobalt injecting electrodes and metal-quinoline molecular transport layer are known to manifest both magnetoresistance and electrical bistability. The two effects are strongly interwoven, inspiring new device applications such as electrical control of the magnetoresistance and magnetic modulation of bistability. To investigate the full device functionality, we first identify the mechanism responsible for electrical switching by associating the electrical conductivity and the impedance behavior with chemical states of buried layers obtained by in operando photoelectron spectroscopy. These measurements revealed that a significant fraction of oxygen ions migrates under voltage polarity, resulting in a modification of the electronic properties of the organic material and of the oxidation of interfacial layer with ferromagnetic contacts. Variable oxygen doping of the organic molecule represents the key element for correlating bistability and magnetoresistance and our measurements provide the first experimental evidence in favor of the impurity band model describing the spin transport in organic semiconductors in similar devices
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