Design, Characterization and Analysis of Component Level Electrostatic Discharge (ESD) Protection Solutions

Electrostatic Discharges (ESD) is a significant hazard to electronic components and systems. Based on a specific process technology, a given circuit application requires a customized ESD consideration that meets all the requirements such as the core circuit\u27s operating condition, maximum accepted leakage current, breakdown conditions for the process and overall device sizes. In every several years, there will be a new process technology becomes mature, and most of those new technology requires custom design of effective ESD protection solution. And usually the design window will shrinks due to the evolving of the technology becomes smaller and smaller. The ESD related failure is a major IC reliability concern and results in a loss of millions dollars each year in the semiconductor industry. To emulate the real word stress condition, several ESD stress models and test methods have been developed. The basic ESD models are Human Body model (HBM), Machine Mode (MM), and Charge Device Model (CDM). For the system-level ESD robustness, it is defined by different standards and specifications than component-level ESD requirements. International Electrotechnical Commission (IEC) 61000-4-2 has been used for the product and the Human Metal Model (HMM) has been used for the system at the wafer level. Increasingly stringent design specifications are forcing original equipment manufacturers (OEMs) to minimize the number of off-chip components. This is the case in emerging multifunction mobile, industrial, automotive and healthcare applications. It requires a high level of ESD robustness and the integrated circuit (IC) level, while finding ways to streamline the ESD characterization during early development cycle. To enable predicting the ESD performance of IC\u27s pins that are directly exposed to a system-level stress condition, a new the human metal model (HMM) test model has been introduced. In this work, a new testing methodology for product-level HMM characterization is introduced. This testing framework allows for consistently identifying ESD-induced failures in a product, substantially simplifying the testing process, and significantly reducing the product evaluation time during development cycle. It helps eliminates the potential inaccuracy provided by the conventional characterization methodology. For verification purposes, this method has been applied to detect the failures of two different products. Addition to the exploration of new characterization methodology that provides better accuracy, we also have looked into the protection devices itself. ICs for emerging high performance precision data acquisition and transceivers in industrial, automotive and wireless infrastructure applications require effective and ESD protection solutions. These circuits, with relatively high operating voltages at the Input/Output (I/O) pins, are increasingly being designed in low voltage Complementary Metal-Oxide-Semiconductor (CMOS) technologies to meet the requirements of low cost and large scale integration. A new dual-polarity SCR optimized for high bidirectional blocking voltages, high trigger current and low capacitance is realized in a sub 3-V, 180-nm CMOS process. This ESD device is designed for a specific application where the operating voltage at the I/O is larger than that of the core circuit. For instance, protecting high voltage swing I/Os in CMOS data acquisition system (DAS) applications. In this reference application, an array of thin film resistors voltage divider is directly connected to the interface pin, reducing the maximum voltage that is obtained at the core device input down to ± 1-5 V. Its ESD characteristics, including the trigger voltage and failure current, are compared against those of a typical CMOS-based SCR. Then, we have looked into the ESD protection designs into more advanced technology, the 28-nm CMOS. An ESD protection design builds on the multiple discharge-paths ESD cell concept and focuses the attention on the detailed design, optimization and realization of the in-situ ESD protection cell for IO pins with variable operation voltages. By introducing different device configurations fabricated in a 28-nm CMOS process, a greater flexibility in the design options and design trade-offs can be obtained in the proposed topology, thus achieving a higher integration and smaller cell size definition for multi-voltage compatibility interface ESD protection applications. This device is optimized for low capacitance and synthesized with the circuit IO components for in-situ ESD protection in communication interface applications developed in a 28-nm, high-k, and metal-gate CMOS technology. ESD devices have been used in different types of applications and also at different environment conditions, such as high temperature. At the last section of this research work, we have performed an investigation of several different ESD devices\u27 performance under various temperature conditions. And it has been shown that the variations of the device structure can results different ESD performance, and some devices can be used at the high temperature and some cannot. And this investigation also brings up a potential threat to the current ESD protection devices that they might be very vulnerable to the latch-up issue at the higher temperature range

On-Chip ESD Protection Design: Optimized Clamps

The extensive use of Integrated Circuits (ICs) means complex working conditions for these tiny chips. To guarantee the ICs could work properly in various environments, some special protection strategies are required to improve the reliability of system. From all the possible reliability issues, the electrostatics discharge (ESD) might be the most common one. The peak current of electrostatics can be as high as tens of amperes and the peak voltage can be over thousand voltages. In contrast, the size of semiconductor device fabricated is continuing to scale down, making it even more vulnerable to high level overstress and current surge induced by ESD event. To protect the on-chip semiconductor from damage, some extra clamp cells are put together to consist a network. The network can redirect the superfluous current through the ESD network and clamp the voltage to a low level. In this dissertation, one design concept is introduced that uses the combination of some basic ESD devices to meet different requirements first, and then tries to establish parasitic current path among these devices to further increase the current handling capability. Some design cases are addressed to demonstrate this design concept is valid and efficient: 1. A combination of silicon-controlled-rectifier (SCR) and diode cluster is implemented to resolve the overshoot issue under fast ESD event. 2. A new SCR structure is introduced, which can be used as padding device to increase the clamping voltage without affecting other parameters. Based on this padding device, two design cases are introduced. 3. A controllable SCR clamp structure is presented, which has high current handling capability and can be controlled with by small signal. All these structures and topologies described in this dissertation are compatible with most of popular semiconductor fabrication process

Area Efficient Device Optimization for ESD Protection in High Speed Interface ICs

Electrostatic discharge (ESD) protection is considered as a vital step in integrated circuit (IC) manufacturing process. IC chips are unable to overcome the effects of transient events without adequate discharge protection. Recent trend in the industry has seen the incorporation of system level ESD protection within the IC chip. Incorporating system level on-chip ESD protection often increases cost, degrades circuit performance and consumes layout area which could otherwise be used for improving the circuit performance. These design challenges could be easily overcome if the parasitic components in a circuit were used for ESD protection. Despite the various design challenges, on-chip ESD protection is still desirable as it saves the area on the circuit board by eliminating the traditional ESD protection devices resulting in more compact circuits. Furthermore, using parasitic components while designing on-chip system level ESD protection can save layout area. In order to effectively implement this solution, a study on ESD events, protection circuits and high-speed ICs was carried out. Different types of ESD events and the different models pertaining to ESD events were studied and are discussed in detail. An overview of high-speed integrated circuits was also carried out with emphasis on the protection topologies that are commonly used. The ESD characteristics of parasitic PNP devices in rail-based ESD protection structure was then studied to summarize its viability as a protection circuit. The turn-on or breakdown voltage of the parasitic PNP is studied by technology computer aided design (TCAD) simulations performed in Silvaco software. The breakdown voltage, holding voltage, on resistance and failure current were studied and modeled to maximize ESD protection

On-die transient event sensors and system-level ESD testing

System level electrostatic discharge (ESD) testing of electronic products is a critical part of product certification. Test methods were investigated to develop system level ESD simulation models to predict soft-failures in a system with multiple sensors. These methods rely completely on measurements. The model developed was valid only for the linear operation range of devices within the system. These methods were applied to a commercial product and used to rapidly determine when a soft failure would occur. Attaching cables and probes to determine stress voltages and currents within a system, as in the previous study, is time-consuming and can alter the test results. On-chip sensors have been developed which allow the user to avoid using cables and probes and can detect an event along with the level, polarity, and location of a transient event seen at the I/O pad. The sensors were implemented with minimum area consumption and can be implemented within the spacer cell of an I/O pad. Some of the proposed sensors were implemented in a commercial test microcontroller and have been tested to successfully record the event occurrence, location, level, and polarity on that test microcontroller. System level tests were then performed on a pseudo-wearable device using the on-chip sensors. The measurements were successful in capturing the peak disturbance and counting the number of ESD events without the addition of any external measurement equipment. A modification of the sensors was also designed to measure the peak voltage on a trace or pin inside a complex electronic product. The peak current can also be found when the sensor is placed across a transient voltage suppressor with a known I-V curve. The peak level is transmitted wirelessly to a receiver outside the system using frequency-modulated magnetic or electric fields, thus allowing multiple measurements to be made without opening the enclosure or otherwise modifying the system. Simulations demonstrate the sensors can accurately detect the peak transient voltage and transmit the level to an external receiver --Abstract, page iv

Design Of Low-capacitance And High-speed Electrostatic Discharge (esd) Devices For Low-voltage Protection Applications

Electrostatic discharge (ESD) is defined as the transfer of charge between bodies at different potentials. The electrostatic discharge induced integrated circuit damages occur throughout the whole life of a product from the manufacturing, testing, shipping, handing, to end user operating stages. This is particularly true as microelectronics technology continues shrink to nano-metric dimensions. The ESD related failures is a major IC reliability concern and results in a loss of millions dollars to the semiconductor industry each year. Several ESD stress models and test methods have been developed to reproduce the real world ESD discharge events and quantify the sensitivity of ESD protection structures. The basic ESD models are: Human body model (HBM), Machine model (MM), and Charged device model (CDM). To avoid or reduce the IC failure due to ESD, the on-chip ESD protection structures and schemes have been implemented to discharge ESD current and clamp overstress voltage under different ESD stress events. Because of its simple structure and good performance, the junction diode is widely used in on-chip ESD protection applications. This is particularly true for ESD protection of lowvoltage ICs where a relatively low trigger voltage for the ESD protection device is required. However, when the diode operates under the ESD stress, its current density and temperature are far beyond the normal conditions and the device is in danger of being damaged. For the design of effective ESD protection solution, the ESD robustness and low parasitic capacitance are two major concerns. The ESD robustness is usually defined after the failure current It2 and on-state resistance Ron. The transmission line pulsing (TLP) measurement is a very effective tool for evaluating the ESD robustness of a circuit or single element. This is particularly helpful in iv characterizing the effect of HBM stress where the ESD-induced damages are more likely due to thermal failures. Two types of diodes with different anode/cathode isolation technologies will be investigated for their ESD performance: one with a LOCOS (Local Oxidation of Silicon) oxide isolation called the LOCOS-bound diode, the other with a polysilicon gate isolation called the polysilicon-bound diode. We first examine the ESD performance of the LOCOS-bound diode. The effects of different diode geometries, metal connection patterns, dimensions and junction configurations on the ESD robustness and parasitic capacitance are investigated experimentally. The devices considered are N+/P-well junction LOCOS-bound diodes having different device widths, lengths and finger numbers, but the approach applies generally to the P+/N-well junction diode as well. The results provide useful insights into optimizing the diode for robust HBM ESD protection applications. Then, the current carrying and voltage clamping capabilities of LOCOS- and polysiliconbound diodes are compared and investigated based on both TCAD simulation and experimental results. Comparison of these capabilities leads to the conclusion that the polysilicon-bound diode is more suited for ESD protection applications due to its higher performance. The effects of polysilicon-bound diode’s design parameters, including the device width, anode/cathode length, finger number, poly-gate length, terminal connection and metal topology, on the ESD robustness are studied. Two figures of merits, FOM_It2 and FOM_Ron, are developed to better assess the effects of different parameters on polysilicon-bound diode’s overall ESD performance. As latest generation package styles such as mBGAs, SOTs, SC70s, and CSPs are going to the millimeter-range dimensions, they are often effectively too small for people to handle with fingers. The recent industry data indicates the charged device model (CDM) ESD event becomes v increasingly important in today’s manufacturing environment and packaging technology. This event generates highly destructive pulses with a very short rise time and very small duration. TLP has been modified to probe CDM ESD protection effectiveness. The pulse width was reduced to the range of 1-10 ns to mimic the very fast transient of the CDM pulses. Such a very fast TLP (VFTLP) testing has been used frequently for CDM ESD characterization. The overshoot voltage and turn-on time are two key considerations for designing the CDM ESD protection devices. A relatively high overshoot voltage can cause failure of the protection devices as well as the protected devices, and a relatively long turn-on time may not switch on the protection device fast enough to effectively protect the core circuit against the CDM stress. The overshoot voltage and turn-on time of an ESD protection device can be observed and extracted from the voltage versus time waveforms measured from the VFTLP testing. Transient behaviors of polysilicon-bound diodes subject to pulses generated by the VFTLP tester are characterized for fast ESD events such as the charged device model. The effects of changing devices’ dimension parameters on the transient behaviors and on the overshoot voltage and turn-on time are studied. The correlation between the diode failure and poly-gate configuration under the VFTLP stress is also investigated. Silicon-controlled rectifier (SCR) is another widely used ESD device for protecting the I/O pins and power supply rails of integrated circuits. Multiple fingers are often needed to achieve optimal ESD protection performance, but the uniformity of finger triggering and current flow is always a concern for multi-finger SCR devices operating under the post-snapback region. Without a proper understanding of the finger turn-on mechanism, design and realization of robust SCRs for ESD protection applications are not possible. Two two-finger SCRs with different combinations of anode/cathode regions are considered, and their finger turn-on vi uniformities are analyzed based on the I-V characteristics obtained from the transmission line pulsing (TLP) tester. The dV/dt effect of pulses with different rise times on the finger turn-on behavior of the SCRs are also investigated experimentally. In this work, unless noted otherwise, all the measurements are conducted using the Barth 4002 transmission line pulsing (TLP) and Barth 4012 very-fast transmission line pulsing (VFTLP) testers

Analysis and Design of Electrostatic Discharge Protection Devices and Circuits

An electrostatic discharge (ESD) is a spontaneous electrical current that flows between two objects at different electrical potentials. ESD currents can reach several amps and are typically in the order of tens of nanoseconds. Concerning microelectronics, on-chip protection against ESD events has become a main concern on the reliability of IC as dimensions continue to shrink. ESD currents could lead to on-chip voltages that are high enough to cause MOS gate oxide breakdown. ICs can thus be damaged by human handling, contact with machinery, packaging, board assembling, etc. The main goal of this study was to analyze the effectiveness of two-stage ESD protection circuits by means of mixed mode TCAD simulations. Two-dimensional device simulations were carried out using T-Suprem4 and Taurus-Medici software from Synopsis. Also, a TCAD input deck calibration for an NXP Semiconductors¿ proprietary 0.14m¿ CMOS technology was realized. In addition, two aspects on the transparency of ESD protections were studied. An excessive leakage problem found in a real product was analyzed in TCAD. Furthermore, a new approach for distributed ESD protection design for broadband applications is also discussed, resulting in improved RF performance.Pérez Monteagudo, JM. (2010). Analysis and Design of Electrostatic Discharge Protection Devices and Circuits. http://hdl.handle.net/10251/21061.Archivo delegad

Analysis of design strategies for RF ESD problems in CMOS circuits

This thesis analyses the design strategies used to protect RF circuits that are implemented in CMOS technologies. It investigates, in detail, the physical mechanisms involved when a ggNMOS structure is exposed to an ESD event and undergoes snapback. The understanding gained is used to understand why the performance of the current RF ESD clamp is poor and suggestions are made as to how the performance of ggNMOS clamps can be improved beyond the current body of knowledge. The ultimate aim is to be able to design effective ESD protection clamps whilst minimising the effect the circuit has on RF I/O signals. A current ggNMOS based RF ESD I/O protection circuit is analysed in detail using a Transmission Line Pulse (TLP) tester. This is shown to be a very effective diagnostic tool by showing many characteristics of the ggNMOS during the triggering and conducting phase of the ESD event and demonstrate deficiencies in the clamp design. The use of a FIB enhances the analysis by allowing the isolation of individual components in the circuit and therefore their analysis using the TLP tester. SPICE simulations are used to provide further commentary on the debate surrounding the specification required of a TLP tester for there to be a good correlation between a TLP test and the industry standard Human Body Model (HBM) ESD test. Finite element simulations are used to probe deeper in to the mechanisms involved when a ggNMOS undergoes snapback especially with regard to the contribution parasitic components within the ggNMOS make to the snapback process. New ggNMOS clamps are proposed which after some modification are shown to work. Some of the finite element experiments are repeated in a 0.18μπ7. process CMOS test chip and a comparison is made between the two sets of results. In the concluding chapter understanding that has been gained from previous chapters is combined with the published body of knowledge to suggest and explain improvements in the design of a ggNMOS for RF and standard applications. These improvements will improve homogeneity of ggNMOS operation thus allowing the device size to be reduced and parasitic loading for a given ESD performance. These techniques can also be used to ensure that the ESD current does not take an unintended path through the chip

Novel Rail Clamp Architectures and Their Systematic Design

abstract: Rail clamp circuits are widely used for electrostatic discharge (ESD) protection in semiconductor products today. A step-by-step design procedure for the traditional RC and single-inverter-based rail clamp circuit and the design, simulation, implementation, and operation of two novel rail clamp circuits are described for use in the ESD protection of complementary metal-oxide-semiconductor (CMOS) circuits. The step-by-step design procedure for the traditional circuit is technology-node independent, can be fully automated, and aims to achieve a minimal area design that meets specified leakage and ESD specifications under all valid process, voltage, and temperature (PVT) conditions. The first novel rail clamp circuit presented employs a comparator inside the traditional circuit to reduce the value of the time constant needed. The second circuit uses a dynamic time constant approach in which the value of the time constant is dynamically adjusted after the clamp is triggered. Important metrics for the two new circuits such as ESD performance, latch-on immunity, clamp recovery time, supply noise immunity, fastest power-on time supported, and area are evaluated over an industry-standard PVT space using SPICE simulations and measurements on a fabricated 40 nm test chip.Dissertation/ThesisDoctoral Dissertation Electrical Engineering 201

Design, Characterization And Analysis Of Electrostatic Discharge (esd) Protection Solutions In Emerging And Modern Technologies

Electrostatic Discharge (ESD) is a significant hazard to electronic components and systems. Based on a specific processing technology, a given circuit application requires a customized ESD consideration that includes the devices’ operating voltage, leakage current, breakdown constraints, and footprint. As new technology nodes mature every 3-5 years, design of effective ESD protection solutions has become more and more challenging due to the narrowed design window, elevated electric field and current density, as well as new failure mechanisms that are not well understood. The endeavor of this research is to develop novel, effective and robust ESD protection solutions for both emerging technologies and modern complementary metal–oxide–semiconductor (CMOS) technologies. The Si nanowire field-effect transistors are projected by the International Technology Roadmap for Semiconductors as promising next-generation CMOS devices due to their superior DC and RF performances, as well as ease of fabrication in existing Silicon processing. Aiming at proposing ESD protection solutions for nanowire based circuits, the dimension parameters, fabrication process, and layout dependency of such devices under Human Body Mode (HBM) ESD stresses are studied experimentally in company with failure analysis revealing the failure mechanism induced by ESD. The findings, including design methodologies, failure mechanism, and technology comparisons should provide practical knowhow of the development of ESD protection schemes for the nanowire based integrated circuits. Organic thin-film transistors (OTFTs) are the basic elements for the emerging flexible, printable, large-area, and low-cost organic electronic circuits. Although there are plentiful studies focusing on the DC stress induced reliability degradation, the operation mechanism of OTFTs iv subject to ESD is not yet available in the literature and are urgently needed before the organic technology can be pushed into consumer market. In this work, the ESD operation mechanism of OTFT depending on gate biasing condition and dimension parameters are investigated by extensive characterization and thorough evaluation. The device degradation evolution and failure mechanism under ESD are also investigated by specially designed experiments. In addition to the exploration of ESD protection solutions in emerging technologies, efforts have also been placed in the design and analysis of a major ESD protection device, diodetriggered-silicon-controlled-rectifier (DTSCR), in modern CMOS technology (90nm bulk). On the one hand, a new type DTSCR having bi-directional conduction capability, optimized design window, high HBM robustness and low parasitic capacitance are developed utilizing the combination of a bi-directional silicon-controlled-rectifier and bi-directional diode strings. On the other hand, the HBM and Charged Device Mode (CDM) ESD robustness of DTSCRs using four typical layout topologies are compared and analyzed in terms of trigger voltage, holding voltage, failure current density, turn-on time, and overshoot voltage. The advantages and drawbacks of each layout are summarized and those offering the best overall performance are suggested at the en

Study Of Esd Effects On Rf Power Amplifiers

Today, ESD is a major consideration in the design and manufacture of ICs. ESD problems are increasing in the electronics industry because of the increasing trend toward higher speed and smaller device sizes. There is growing interest in knowing the effects of ESD protection circuit on the performance of semiconductor integrated circuits (ICs) because of the impact it has on core RF circuit performance. This study investigated the impact of ESD protection circuit on RF Power amplifiers. Even though ESD protection for digital circuits has been known for a while, RF-ESD is a challenge. From a thorough literature search on prior art ESD protection circuits, Silicon controlled rectifier was found to be most effective and reliable ESD protection for power amplifier circuit. A SCR based ESD protection was used to protect the power amplifier and a model was developed to gain better understanding of ESD protected power amplifiers. Simulated results were compared and contrasted against theoretically derived equations. A 5.2GHz fully ESD protected Class AB power amplifier was designed and simulated using TSMC 0.18 um technology. Further, the ESD protection circuit was added to a cascoded Class-E power amplifier operating at 5.2 GHz. ADS simulation results were used to analyze the PA’s RF performance degradation. Various optimization techniques were used to improve the RF circuit performance