Modeling nanoscale quasi-ballistic MOS transistors:a circuit design perspective

The scaling of device technologies poses new challenges, not only in circuit design, but also in device modeling, especially because of the short-channel effects and the emergence of novel phenomena like ballistic transport. Nonetheless, it enables the design of ultra low-power analog and Radio Frequency (RF) circuits by allowing to push the operating points intomoderate and eventually weak inversion regions, which are increasingly becoming the preferred regions of operation for such applications. Even though modern compact models have evolved to adequately model the short-channel effects in all regions of operation, there is a lack of simpler models that (a) reliably predict the physics of downscaled devices while (b) remaining continuous through moderate inversion and (c) aid the designer’s intuition through simple designmethodologies. In this work, we extend the EKV charge based model to include the velocity saturation effect for weak inversion operation. Using the simple analytical model hence developed, we propose a design methodology for low-power analog circuit design. Then, we focus our attention on ballistic transport in MOSFETs, that is expected to dominate in the deeply scaled devices. Again, despite the extensive body of work available in the literature, most models remain deeply rooted in physics, consisting of fairly complicated equations, that are of little use for an intuitive understanding and design. In addition, the quasi-ballistic devices, which lie on the continuumbetween the ballistic and the diffusive devices, pose their own modeling challenges: a model for the quasi-ballistic devices would have to remain continuous between the ballistic and diffusive regimes. Most of the published works, based on the carrier flux transport over the source-channel potential barrier approach, seem to ignore the electrostatics in the rest of the channel. The shape of the electrostatic potential in the channel is approximated through polynomial functions, which is adequate for the very short-channel devices but not scalable to long channel quasi-ballistic devices. In this work, we study the role of the gate and the electrostatics in a ballistic channel by drawing on the insights gained from Monte-Carlo simulations on quasi-ballistic and ballistic doublegate MOSFETs. We propose a simple semi-empirical model of the channel charge, using which we develop an analytical model for the channel potential, both of which could be used as precursors to a scalable compact model that would encompass the ballistic, quasi-ballistic and drift-diffusion regimes

Two dimensional quantum and reliability modelling for lightly doped nanoscale devices

The downscaling of MOSFET devices leads to well-studied short channel effects and more complex quantum mechanical effects. Both quantum and short channel effects not only alter the performance but they also affect the reliability. This continued scaling of the MOS device gate length puts a demand on the reduction of the gate oxide thickness and the substrate doping density. Quantum mechanical effects give rise to the quantization of energy in the conduction band, which consequently creates a larger effective bandgap and brings a displacement of the inversion layer charge out of the Si/SiO2 interface. Such a displacement of charge is equivalent to an increase in the effective oxide layer thickness, a growth in the threshold voltage, and a decrease in the current level. Therefore, using the classical analysis approach without including the quantum effects may lead to perceptible errors in the prognosis of the performance of modern deep submicron devices. In this work, compact Verilog-A compatible 2D models including quantum short channel effects and confinement for the potential, threshold voltage, and the carrier charge sheet density for symmetrical lightly doped double-gate MOSFETs are developed. The proposed models are not only applicable to ultra-scaled devices but they have also been derived from analytical 2D Poisson and 1D Schrodinger equations including 2D electrostatics, in order to incorporate quantum mechanical effects. Electron and hole quasi-Fermi potential effects were considered. The models were further enhanced to include negative bias temperature instability (NBTI) in order to assess the reliability of the device. NBTI effects incorporated into the models constitute interface state generation and hole-trapping. The models are continuous and have been verified by comparison with COMSOL and BALMOS numerical simulations for channel lengths down to 7nm; very good agreement within ±5% has been observed for silicon thicknesses ranging from 3nm to 20nm at 1 GHz operation after 10 years

Compact Models for Integrated Circuit Design

This modern treatise on compact models for circuit computer-aided design (CAD) presents industry standard models for bipolar-junction transistors (BJTs), metal-oxide-semiconductor (MOS) field-effect-transistors (FETs), FinFETs, and tunnel field-effect transistors (TFETs), along with statistical MOS models. Featuring exercise problems at the end of each chapter and extensive references at the end of the book, the text supplies fundamental and practical knowledge necessary for efficient integrated circuit (IC) design using nanoscale devices. It ensures even those unfamiliar with semiconductor physics gain a solid grasp of compact modeling concepts

ANALYTICAL COMPACT MODELING OF NANOSCALE MULTIPLE-GATE MOSFETS.

L’objectiu principal d’aquest treball és el desenvolupament d’un model compacte per a MOSFETs de múltiple porta d’escala nanomètrica, que sigui analític, basat en la física del dispositiu, i predictiu per a simulacions AC i DC. Els dispositius investigats són el MOSFET estàndar en mode d’inversió, a més d’un nou dispositiu anomenat “junctionless MOSFET” (MOSFET sense unions). El model es va desenvolupar en una formulació compacta amb l’ajuda de l’equació de Poisson i la tècnica de la transformación conforme de Schwarz-Cristoffel. Es varen obtenir les equacions del voltatge llindar i el pendent subllindar. Usant la funció W de Lambert, a més d’una funció de suavització per a la transcició entre les regions de depleció i acumulació, s’obté un model unificat de la densitat de càrrega, vàlid per a tots els modes d’operació del transistor. S’estudien també les dependències entre els paràmetres físics del dispositiu i el seu impacte en el seu rendiment. Es tenen en compteefectes importants de canal curt i de quantització. Es discuteixen també la simetria al voltant de Vds= 0 V, i la continuïtat del corrent de drenador en les derivades d’ordre superior. El model va ser validat mitjançant simulacions TCAD numèriques i mesures experimentals.El objetivo principal de este trabajo es el desarrollo de un modelo compacto para MOSFETs de múltiple puerta de escala nanométrica, que sea analítico, basado en la física del dispositivo, y predictivo para simulaciones AC y DC. Los dispositivos investigados son el MOSFET estándar en modo inversión, además de un nuevo dispositivo llamado “junctionless MOSFET” (MOSFET sin uniones). El modelo se desarrolló en una formulación compacta con la ayuda de la ecuación de Poisson y la técnica de transformación conforme de Schwarz-Cristoffel. Se obtuvieron las ecuaciones del voltaje umbral y la pendiente subumbral. Usando la función W de Lambert, además de una función de suavización para la transición entre las regiones de depleción y acumulación, se obtiene un modelo unificado de la densidad de carga, válido para todos los modos de operación del transistor. Se estudian también las dependencias entre los parámetros físicos del dispositivo y su impacto en su rendimiento. Se tienen en cuenta efectos importantes de canal corto y de cuantización. Se discuten también la simetría alrededor de Vds= 0 V, y la continuidad de la corriente de drenador en las derivadas de orden superior. El modelo fue validado mediante simulaciones TCAD numéricas y medidas experimentales.The main focus is on the development of an analytical, physics-based and predictive DC and AC compact model for nanoscale multiple-gate MOSFETs. The investigated devices are the standard inversion mode MOSFET and a new device concept called junctionless MOSFET. The model is derived in closed-from with the help of Poisson's equation and the conformal mapping technique by Schwarz-Christoffel. Equations for the calculation of the threshold voltage and subthreshold slope are derived. Using Lambert's W-function and a smoothing function for the transition between the depletion and accumulation region, an unified charge density model valid for all operating regimes is developed. Dependencies between the physical device parameters and their impact on the device performance are worked out. Important short-channel and quantization effects are taken into account. Symmetry around Vds = 0 V and continuity of the drain current at derivatives of higher order are discussed. The model is validated versus numerical TCAD simulations and measurement data

Ultra-thin and flexible CMOS technology: ISFET-based microsystem for biomedical applications

A new paradigm of silicon technology is the ultra-thin chip (UTC) technology and the emerging applications. Very thin integrated circuits (ICs) with through-silicon vias (TSVs) will allow the stacking and interconnection of multiple dies in a compact format allowing a migration towards three-dimensional ICs (3D-ICs). Also, extremely thin and therefore mechanically bendable silicon chips in conjunction with the emerging thin-film and organic semiconductor technologies will enhance the performance and functionality of large-area flexible electronic systems. However, UTC technology requires special attention related to the circuit design, fabrication, dicing and handling of ultra-thin chips as they have different physical properties compared to their bulky counterparts. Also, transistors and other active devices on UTCs experiencing variable bending stresses will suffer from the piezoresistive effect of silicon substrate which results in a shift of their operating point and therefore, an additional aspect should be considered during circuit design. This thesis tries to address some of these challenges related to UTC technology by focusing initially on modelling of transistors on mechanically bendable Si-UTCs. The developed behavioural models are a combination of mathematical equations and extracted parameters from BSIM4 and BSIM6 modified by a set of equations describing the bending-induced stresses on silicon. The transistor models are written in Verilog-A and compiled in Cadence Virtuoso environment where they were simulated at different bending conditions. To complement this, the verification of these models through experimental results is also presented. Two chips were designed using a 180 nm CMOS technology. The first chip includes nMOS and pMOS transistors with fixed channel width and two different channel lengths and two different channel orientations (0° and 90°) with respect to the wafer crystal orientation. The second chip includes inverter logic gates with different transistor sizes and orientations, as in the previous chip. Both chips were thinned down to ∼20m using dicing-before-grinding (DBG) prior to electrical characterisation at different bending conditions. Furthermore, this thesis presents the first reported fully integrated CMOS-based ISFET microsystem on UTC technology. The design of the integrated CMOS-based ISFET chip with 512 integrated on-chip ISFET sensors along with their read-out and digitisation scheme is presented. The integrated circuits (ICs) are thinned down to ∼30m and the bulky, as well as thinned ICs, are electrically and electrochemically characterised. Also, the thesis presents the first reported mechanically bendable CMOS-based ISFET device demonstrating that mechanical deformation of the die can result in drift compensation through the exploitation of the piezoresistive nature of silicon. Finally, this thesis presents the studies towards the development of on-chip reference electrodes and biodegradable and ultra-thin biosensors for the detection of neurotransmitters such as dopamine and serotonin