2,099 research outputs found

    Electronic control circuits: A compilation

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    A compilation of technical R and D information on circuits and modular subassemblies is presented as a part of a technology utilization program. Fundamental design principles and applications are given. Electronic control circuits discussed include: anti-noise circuit; ground protection device for bioinstrumentation; temperature compensation for operational amplifiers; hybrid gatling capacitor; automatic signal range control; integrated clock-switching control; and precision voltage tolerance detector

    A 0.35 ฮผm CMOS 17-bit@40-kS/s cascade 2-1 ฮฃฮ” modulator with programmable gain and programmable chopper stabilization

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    This paper describes a 0.35ฮผm CMOS chopper-stabilized Switched-Capacitor 2-1 cascade ฮฃDelta; modulator for automotive sensor interfaces. For a better fitting to the characteristics of different sensor outputs, the modulator includes a programmable set of gains (x0.5, x1, x2, and x4) and a programmable set of chopper frequencies (fs/16, fs/8, fs/4 and fs/2). It has also been designed to operate within the restrictive environmental conditions of automotive electronics (-40ยฐC, 175ยฐC). The modulator architecture has been selected after an exhaustive comparison among multiple ฮฃฮ”M topologies in terms of resolution, speed and power dissipation. The design of the modulator building blocks is based upon a top-down CAD methodology which combines simulation and statistical optimization at different levels of the modulator hierarchy. The circuit is clocked at 5.12MHz and consumes, all together, 14.7mW from a single 3.3-V supply. Experimental measurements result in 99.77dB of Dynamic Range (DR), which combined with the gain programmability leads to an overall DR of 112dB. This puts the presented design beyond the state-of-the-art according with the existing bibliography

    ์ ์ธต ๋‚˜๋…ธ์‹œํŠธ ๊ตฌ์กฐ์˜ ์Œ์˜ ์ •์ „์šฉ๋Ÿ‰ ์ „๊ณ„ ํšจ๊ณผ ํŠธ๋žœ์ง€์Šคํ„ฐ

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    ํ•™์œ„๋…ผ๋ฌธ(๋ฐ•์‚ฌ) -- ์„œ์šธ๋Œ€ํ•™๊ต๋Œ€ํ•™์› : ๊ณต๊ณผ๋Œ€ํ•™ ์ „๊ธฐยท์ •๋ณด๊ณตํ•™๋ถ€, 2022. 8. ์ตœ์šฐ์˜.The development of integrated circuit (IC) technology has continued to improve speed and capacity through miniaturization of devices. However, power density is increasing rapidly due to the increasing leakage current as miniaturization advances. Although the remarkable advancement of process technology has allowed complementary-metal-oxide-semiconductor (CMOS) technology to consistently overcome its constraints, the physical limitations of the metal-oxide-semiconductor field-effect transistor (MOSFET) are unmanageable. Accordingly, research on logic device is being divided into a CMOS-extension and a beyond-CMOS. CMOS-extension focuses on the gate-all-around field-effect transistors (GAAFETs) which is a promising architecture for future CMOS thanks to the excellent electrostatic gate controllability. Particularly, nanosheet (NS) architecture with high current drivability required in ICs, is the most promising. However, NS GAAFET has a trade-off relation between the controllability and the drivability, which requires the necessity of a higher-level effective oxide thickness (EOT) scaling for further scaling of NS GAAFET. On the other hand, beyond-CMOS mainly focuses on developing devices with novel mechanisms to overcome the MOSFETs' physical limits. Among several candidates, negative capacitance field-effect transistors (NCFETs) with exceptional CMOS compatibility and current drivability are highlighted as future logic devices for low-power, high-performance operation. Although the NCFET utilizing the negative capacitance (NC) effect of a ferroelectric has been demonstrated theoretically by the Landau model, it is challenging to be implemented due to the fact that stabilized NC and sub-thermionic subthreshold swing (SS) are incompatible. In this dissertation, a GAA NCFET that maintains a stable capacitance boosting by NC effect and exhibits high performance is demonstrated. A ferroelectric-antiferroelectric mixed-phase hafnium-zirconium-oxide (HZO) thin film was introduced, whose effect was confirmed by capacitors and FET experiments. Furthermore, the mixed-phase HZO was demonstrated on a stacked nanosheet gate-all-around (stacked NS GAA) structure, the advanced CMOS technology, which exhibits a superior gate controllability as well as a satisfactory drivability for ICs. The hysteresis-free stable NC operation with the superior performance was confirmed in NS GAA NCFET. The improved SS and on-current (Ion) compared to MOSFETs fabricated in the same manner were validated, and its feasibility as a low-power, high-performance logic device was proven based on a variety of figure of merits.์ง‘์ ํšŒ๋กœ ๊ธฐ์ˆ ์˜ ๋ฐœ์ „์€ ์†Œ์ž์˜ ์†Œํ˜•ํ™”๋ฅผ ํ†ตํ•œ ์†๋„ ๋ฐ ์šฉ๋Ÿ‰์˜ ํ–ฅ์ƒ์„ ์œ„ํ•ด ๋ฐœ์ „์„ ๊ฑฐ๋“ญํ•ด์™”๋‹ค. ๊ทธ๋Ÿฌ๋‚˜ ์†Œํ˜•ํ™”๋ฅผ ๊ฑฐ๋“ญํ• ์ˆ˜๋ก ์ฆ๊ฐ€ํ•˜๋Š” ๋ˆ„์„ค์ „๋ฅ˜์˜ ๋ฌธ์ œ๋กœ ์ „๋ ฅ ๋ฐ€๋„๊ฐ€ ๊ธ‰๊ฒฉํ•˜๊ฒŒ ์ฆ๊ฐ€ํ•˜๊ณ  ์žˆ๋‹ค. ์ƒ๋ณดํ˜• ๊ธˆ์†-์‚ฐํ™”๋ง‰-๋ฐ˜๋„์ฒด(CMOS) ๊ธฐ์ˆ ์€ ๋ˆˆ๋ถ€์‹  ๊ณต์ •๊ธฐ์ˆ ์˜ ์„ฑ์žฅ์— ํž˜์ž…์–ด ํ•œ๊ณ„๋ฅผ ๋Š์ž„์—†์ด ๊ทน๋ณตํ•ด์™”์œผ๋‚˜, ๊ธฐ์กด์˜ ๊ธˆ์†-์‚ฐํ™”๋ง‰-๋ฐ˜๋„์ฒด ์ „๊ณ„-ํšจ๊ณผ-ํŠธ๋žœ์ง€์Šคํ„ฐ(MOSFET)์˜ ๋ฌผ๋ฆฌ์  ํ•œ๊ณ„๋Š” ๊ทน๋ณตํ•  ์ˆ˜ ์—†๋Š” ๋ฌธ์ œ์ด๋‹ค. ์ด์— ๋”ฐ๋ผ ๋…ผ๋ฆฌ ๋ฐ˜๋„์ฒด์— ๊ด€ํ•œ ์—ฐ๊ตฌ๋Š” CMOS๋ฅผ ์—ฐ์žฅํ•˜๋Š” ๋ฐฉํ–ฅ๊ณผ CMOS๋ฅผ ๋›ฐ์–ด๋„˜๋Š” ๋ฐฉํ–ฅ์œผ๋กœ ๋‚˜๋‰˜์–ด ์ง„ํ–‰๋˜๊ณ  ์žˆ๋‹ค. CMOS๋ฅผ ์—ฐ์žฅํ•˜๋Š” ๋ฐฉํ–ฅ์€ ๋›ฐ์–ด๋‚œ ์ •์ „๊ธฐ์  ๊ฒŒ์ดํŠธ ์žฅ์•…๋ ฅ์„ ๊ฐ–๋Š” ์ฐจ์„ธ๋Œ€ CMOS ๊ตฌ์กฐ๋กœ ์œ ๋งํ•œ ๊ฒŒ์ดํŠธ-์˜ฌ-์–ด๋ผ์šด๋“œ ์ „๊ณ„-ํšจ๊ณผ-ํŠธ๋žœ์ง€์Šคํ„ฐ(GAAFET)์— ๊ด€ํ•œ ์—ฐ๊ตฌ๊ฐ€ ์ฃผ๋ฅผ ์ด๋ฃฌ๋‹ค. ํŠนํžˆ ๋†’์€ ์ „๋ฅ˜ ๊ตฌ๋™๋ ฅ์„ ๊ฐ€์งˆ ์ˆ˜ ์žˆ๋Š” ๋‚˜๋…ธ์‹œํŠธ(NS) ๊ตฌ์กฐ๊ฐ€ ๊ฐ€์žฅ ์œ ๋งํ•œ๋ฐ, ๊ฒŒ์ดํŠธ ์žฅ์•…๋ ฅ์ด ์ „๋ฅ˜ ๊ตฌ๋™๋ ฅ๊ณผ ์ƒ์ถฉ๋œ๋‹ค๋Š” ๋‹จ์ ์ด ์žˆ๋‹ค. ์ด์— ๋”ฐ๋ผ NS GAAFET ๊ธฐ์ˆ ์„ ์œ„ํ•ด์„œ๋Š” ๋” ๋†’์€ ์ˆ˜์ค€์˜ ์œ ํšจ์‚ฐํ™”๋ง‰๋‘๊ป˜ (EOT) ์Šค์ผ€์ผ๋ง์ด ํ•„์ˆ˜์ ์ด๋‹ค. ํ•œํŽธ, CMOS๋ฅผ ๋›ฐ์–ด๋„˜๋Š” ๋ฐฉํ–ฅ์˜ ์—ฐ๊ตฌ๋Š” MOSFET์˜ ๋ฌผ๋ฆฌ์  ํ•œ๊ณ„๋ฅผ ๊ทน๋ณตํ•˜๊ธฐ ์œ„ํ•ด ์ƒˆ๋กœ์šด ๋ฉ”์ปค๋‹ˆ์ฆ˜์„ ๊ฐ–๋Š” ์†Œ์ž๋ฅผ ๊ฐœ๋ฐœํ•˜๋Š” ๋ฐฉํ–ฅ์œผ๋กœ ์ด๋ฃจ์–ด์ง„๋‹ค. ๋‹ค์–‘ํ•œ ํ›„๋ณด๊ตฐ ์ค‘ CMOS ํ˜ธํ™˜์„ฑ๊ณผ ์ „๋ฅ˜ ๊ตฌ๋™๋Šฅ๋ ฅ์ด ๋›ฐ์–ด๋‚œ ์Œ์˜ ์ •์ „์šฉ๋Ÿ‰ ์ „๊ณ„-ํšจ๊ณผ-ํŠธ๋žœ์ง€์Šคํ„ฐ(NCFET)์ด ์ €์ „๋ ฅ, ๊ณ ์„ฑ๋Šฅ ๋™์ž‘์„ ์œ„ํ•œ ๋ฏธ๋ž˜ CMOS ์†Œ์ž๋กœ ๊ฐ๊ด‘๋ฐ›๊ณ  ์žˆ๋‹ค. ๊ฐ•์œ ์ „์ฒด์˜ ์Œ์˜ ์ •์ „์šฉ๋Ÿ‰ (NC) ํšจ๊ณผ๋ฅผ ์ด์šฉํ•œ NCFET์€ Landau ๋ชจ๋ธ์— ์˜ํ•ด ์ด๋ก ์ ์œผ๋กœ ์ฆ๋ช…๋˜์—ˆ์œผ๋‚˜, ์—ด์—ญํ•™์ ์œผ๋กœ ์•ˆ์ •ํ•œ ์ƒํƒœ์™€ 60 mV/dec ์ดํ•˜์˜ ๋ฌธํ„ฑ์ „์••-์ดํ•˜-๊ธฐ์šธ๊ธฐ(SS)๋ฅผ ๋™์‹œ์— ๊ตฌํ˜„ํ•˜๊ธฐ ๋ถˆ๊ฐ€๋Šฅํ•˜๋‹ค๋Š” ๋ฌธ์ œ๊ฐ€ ์žˆ๋‹ค. ๋ณธ ํ•™์œ„๋…ผ๋ฌธ์—์„œ๋Š” ์•ˆ์ •ํ•œ ์ •์ „์šฉ๋Ÿ‰ ํ–ฅ์ƒ ํŠน์„ฑ์„ ๊ฐ€์ง€๋ฉฐ ๋†’์€ ์„ฑ๋Šฅ์„ ๊ฐ–๋Š” NS GAA NCFET์„ ๊ตฌํ˜„ํ•˜์˜€๋‹ค. ๊ฐ•์œ ์ „์ฒด(ferroelectric)-๋ฐ˜๊ฐ•์œ ์ „์ฒด(antiferroelectric) ํ˜ผํ•ฉ์ƒ(mixed-phase) ํ•˜ํ”„๋Š„-์ง€๋ฅด์ฝ”๋Š„-์˜ฅ์‚ฌ์ด๋“œ(HZO) ๋ฐ•๋ง‰์˜ ์ •์ „์šฉ๋Ÿ‰ ํ–ฅ์ƒ ํšจ๊ณผ๋ฅผ ์ปคํŒจ์‹œํ„ฐ ๋ฐ FET ์ œ์ž‘์„ ํ†ตํ•ด ํšจ๊ณผ๋ฅผ ๊ฒ€์ฆํ•˜์˜€๋‹ค. ๋˜ํ•œ ๋†’์€ ๊ฒŒ์ดํŠธ ์žฅ์•…๋ ฅ์„ ๊ฐ€์ง€๋ฉฐ ์ง‘์ ํšŒ๋กœ์—์„œ ์š”๊ตฌํ•˜๋Š” ์ „๋ฅ˜ ๊ตฌ๋™๋ ฅ์„ ๋งŒ์กฑ์‹œํ‚ฌ ์ˆ˜ ์žˆ๋Š” ์ ์ธตํ˜• ๋‚˜๋…ธ์‹œํŠธ ๊ฒŒ์ดํŠธ-์˜ฌ-์–ด๋ผ์šด๋“œ(stacked NS GAA) ๊ตฌ์กฐ์— ํ˜ผํ•ฉ์ƒ NC ๋ฐ•๋ง‰์„ ์ ์šฉํ•œ FET์„ ์‹œ์—ฐํ•˜๊ณ  ์„ฑ๋Šฅ์˜ ์šฐ์ˆ˜์„ฑ์„ ํ™•์ธํ•˜์˜€๋‹ค. ๋™์ผํ•˜๊ฒŒ ์ œ์ž‘๋œ MOSFET ๋Œ€๋น„ ํ–ฅ์ƒ๋œ SS์™€ ๊ตฌ๋™ ์ „๋ฅ˜(Ion)๋ฅผ ํ™•์ธํ•˜์˜€๊ณ , ๋‹ค์–‘ํ•œ ์„ฑ๋Šฅ ์ง€์ˆ˜๋ฅผ ํ† ๋Œ€๋กœ ์ €์ „๋ ฅ, ๊ณ ์„ฑ๋Šฅ ๋กœ์ง ์†Œ์ž๋กœ์„œ์˜ ํƒ€๋‹น์„ฑ์„ ๊ฒ€์ฆํ•˜์˜€๋‹ค.Abstract i Contents iv List of Table vii List of Figures viii Chapter 1 Introduction 1 1.1 Power and Area Scaling Challenges 1 1.2 Nanosheet Gate-All-Around FETs 5 1.2.1 Gate-All-Around FETs 5 1.2.2 Nanosheet GAAFETs 6 1.3 Negative Capacitance FETs 11 1.3.1 Negative Capacitance in Ferroelectric Materials 11 1.3.2 Negative Capacitance for Steep Switching Devices 14 1.3.3 Stable NC vs. Sub-thermionic SS 17 1.4 Scope and Organization of Dissertation 21 Chapter 2 Stacked NS GAA NCFET with Ferroelectric-Antiferroelectric-Mixed-Phase HZO 22 2.1 Mixed-Phase HZO for Capacitance Boosting 22 2.2 NS GAA NCFET using Mixed-Phase HZO 25 Chapter 3 HZO ALD Stack Optimization 28 3.1 Metal-Ferroelectric-Interlayer-Silicon (MFIS) / MFM Capacitors 29 3.1.1 Fabrication of MFIS Capacitors 29 3.1.2 Electrical Characteristics of MFIS / MFM Capacitors 33 3.2 SOI Planar NCFETs 38 3.2.1 DC Measurements 38 3.2.2 Direct Capacitance Measurements 47 3.2.3 Speed Measurements 49 Chapter 4 Device Fabrication of Stacked NS GAA NCFET 51 4.1 Initial Process Flow of NS GAA NCFET 52 4.2 Process Issues and Solution 56 4.2.1 External Resistance 56 4.2.2 TiN Gate Sidewall Spacer 60 4.2.3 Unintentionally Etched Sacrificial Layer 65 4.2.4 Discussions 68 4.3 Channel Release Process 69 4.3.1 Consideration in Channel Release Process 69 4.3.2 Methods for SiGe Selective Etching 72 4.3.3 SiGe Selective Etching using Carboxylic Acid Solution 75 4.4 Revised Process of NS GAA NCFET 78 Chapter 5 Electrical Characteristics of Fabricated NS GAA NCFET 84 5.1 DC Characteristics 85 5.1.1 NS GAA NCFET vs. Planar SOI NCFET 85 5.1.2 Performance Enhancement of NS GAA NCFET 88 5.1.3 Performance Evaluation 96 5.2 Operating Temperature Properties 99 Chapter 6 Conclusion 102 Bibliography 105 ์ดˆ ๋ก 115๋ฐ•

    Infrared detectors - Special interest bibliography with abstracts

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    Bibliography and abstracts of literature related to infrared detectors used in geoscience researc

    Prediction and measurement of radiation damage to CMOS devices on board spacecraft

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    The CMOS Radiation Effects Measurement (CREM) experiment is presently being flown on the Explorer-55. The purpose of the experiment is to evaluate device performance in the actual space radiation environment and to correlate the respective measurements to on-the-ground laboratory irradiation results. The experiment contains an assembly of C-MOS and P-MOS devices shielded in front by flat slabs of aluminum and by a practically infinite shield in the back. Predictions of radiation damage to C-MOS devices are based on standard environment models and computational techniques. A comparison of the shifts in CMOS threshold potentials, that is, those measured in space to those obtained from the on-the-ground simulation experiment with Co-60, indicates that the measured space damage is smaller than predicted by about a factor of 2-3 for thin shields, but agrees well with predictions for thicker shields

    Process techniques study of integrated circuits Final scientific report

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    Surface impurity and structural defect analysis on thermally grown silicon oxide integrated circui

    Ultra-low power mixed-signal frontend for wearable EEGs

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    Electronics circuits are ubiquitous in daily life, aided by advancements in the chip design industry, leading to miniaturised solutions for typical day to day problems. One of the critical healthcare areas helped by this advancement in technology is electroencephalography (EEG). EEG is a non-invasive method of tracking a person's brain waves, and a crucial tool in several healthcare contexts, including epilepsy and sleep disorders. Current ambulatory EEG systems still suffer from limitations that affect their usability. Furthermore, many patients admitted to emergency departments (ED) for a neurological disorder like altered mental status or seizures, would remain undiagnosed hours to days after admission, which leads to an elevated rate of death compared to other conditions. Conducting a thorough EEG monitoring in early-stage could prevent further damage to the brain and avoid high mortality. But lack of portability and ease of access results in a long wait time for the prescribed patients. All real signals are analogue in nature, including brainwaves sensed by EEG systems. For converting the EEG signal into digital for further processing, a truly wearable EEG has to have an analogue mixed-signal front-end (AFE). This research aims to define the specifications for building a custom AFE for the EEG recording and use that to review the suitability of the architectures available in the literature. Another critical task is to provide new architectures that can meet the developed specifications for EEG monitoring and can be used in epilepsy diagnosis, sleep monitoring, drowsiness detection and depression study. The thesis starts with a preview on EEG technology and available methods of brainwaves recording. It further expands to design requirements for the AFE, with a discussion about critical issues that need resolving. Three new continuous-time capacitive feedback chopped amplifier designs are proposed. A novel calibration loop for setting the accurate value for a pseudo-resistor, which is a crucial block in the proposed topology, is also discussed. This pseudoresistor calibration loop achieved the resistor variation of under 8.25%. The thesis also presents a new design of a curvature corrected bandgap, as well as a novel DDA based fourth-order Sallen-Key filter. A modified sensor frontend architecture is then proposed, along with a detailed analysis of its implementation. Measurement results of the AFE are finally presented. The AFE consumed a total power of 3.2A (including ADC, amplifier, filter, and current generation circuitry) with the overall integrated input-referred noise of 0.87V-rms in the frequency band of 0.5-50Hz. Measurement results confirmed that only the proposed AFE achieved all defined specifications for the wearable EEG system with the smallest power consumption than state-of-art architectures that meet few but not all specifications. The AFE also achieved a CMRR of 131.62dB, which is higher than any studied architectures.Open Acces

    InSb charge coupled infrared imaging device: The 20 element linear imager

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    The design and fabrication of the 8585 InSb charge coupled infrared imaging device (CCIRID) chip are reported. The InSb material characteristics are described along with mask and process modifications. Test results for the 2- and 20-element CCIRID's are discussed, including gate oxide characteristics, charge transfer efficiency, optical mode of operation, and development of the surface potential diagram
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