Quantum Electronic Interference In Nano Amorphous Silicon And Other Thin Film Resistance Memory

This thesis describes conductivity in amorphous semiconductors and insulators—some doped with metals, in which elastic electrons can random walk across a transport length of ~10 nm. At low temperatures, back diffusion of coherent electrons causes constructive quantum interference that leads to reduced diffusivity/conductivity. Rich physics also arises in this so-called weak-localization (WL) regime from electron-phase mutilation by spin-orbit interaction (weak-antilocalization or WAL) and magnetic modulation, and from Friedel-oscillation-enhanced backscattering and Zeeman splitting (electron-electron-interaction or EEI). Conductivity is analyzed by a new tool to eliminate contact resistance without using the four-point-probe method. The Aharonov-Bohm oscillation in magnetoresistance affords the cleanest evidence of interference, seen in amorphous HfO2 and Al2O3, each containing a single 6-7 nm conductive loop. The loop is atomically thin and has no in-loop path dispersion, which allows the oscillation to persist with uncharacteristically low attenuation. In amorphous Si, quantum conductivity correction and magnetoresistance are universally exhibited in multiple states and multiple samples. But doping amorphous Si3N4 with Pt creates a novel feature: a sharp resistance maximum at Tmax below which the WAL-mediated spin-orbit interaction completely dominates over the spin-insensitive WL. This interaction can further quench the coherent length to keep it commensurate with the magnetic length, thus permitting the EEI-directed magnetoresistance to develop to unprecedented strength. Reduced HfO2 and Al2O3 also feature the same characteristics, albeit in one-dimension conduction. Ubiquitous to amorphous nano conductors is their strong electron-phonon interaction. It imparts electrons with up to 100x heavier mass, which is translated into up to 100x reduction in diffusivity. Yet at low enough temperatures, electron diffusion can fully saturate the 10 nm transport length in all our samples. This prevents weak localization from crossover to strong localization, so the nano amorphous devices remain conductive down to 0K. Yet under a critical voltage ~ 1 V, they can trap injected electrons at locally soft spots and stabilize them by bond relaxation; in doing so they promptly switch to the insulator state. Thanks to these attributes, which are reversible, our devices are all excellent resistance-switching non-volatile memory

Cerium oxide based resistive random access memory devices

Resistive Random Access Memory (RRAM) is an emerging technology of non-volatile memory (NVM). Although the observation of metal oxide that can undergo an abrupt insulator-metal transition into a conductive state has been known for over 40 years, researchers started investigating those materials for memory applications in late 1990s. It has been considered as the next generation memory technology to replace current flash memory because RRAM has demonstrated feasible switching characteristics and potential to build high density arrays and also RRAM is also compatible with contemporary CMOS processes, which means RRAM can be integrated into current CMOS chips. While the structure of RRAM is a simple metal-insulator-metal (MIM) device, there are numerous materials that exhibit resistive switching. The switching behavior is not only dependent on the switching layer materials but also dependent on the choice of metal electrodes and their interfacial properties. Many metal oxides such as hafnium oxide, titanium oxide, aluminum oxide, nickel oxide (NiO), tantalum oxide and etc. have been studied in details; however, some materials are unexplored such as cerium oxide. In addition to nonvolatile storage applications, RRAM is considered as one of essential elements for advancing neuromorphic computing because of its analog switching and retention characteristics. This thesis investigated CeO[subscript x]-based RRAMs, from its fundamental device characteristics to neuromorphic applications.Electrical and Computer Engineerin

Defect Induced Aging and Breakdown in High-k Dielectrics

abstract: High-k dielectrics have been employed in the metal-oxide semiconductor field effect transistors (MOSFETs) since 45 nm technology node. In this MOSFET industry, Moore’s law projects the feature size of MOSFET scales half within every 18 months. Such scaling down theory has not only led to the physical limit of manufacturing but also raised the reliability issues in MOSFETs. After the incorporation of HfO2 based high-k dielectrics, the stacked oxides based gate insulator is facing rather challenging reliability issues due to the vulnerable HfO2 layer, ultra-thin interfacial SiO2 layer, and even messy interface between SiO2 and HfO2. Bias temperature instabilities (BTI), hot channel electrons injections (HCI), stress-induced leakage current (SILC), and time dependent dielectric breakdown (TDDB) are the four most prominent reliability challenges impacting the lifetime of the chips under use. In order to fully understand the origins that could potentially challenge the reliability of the MOSFETs the defects induced aging and breakdown of the high-k dielectrics have been profoundly investigated here. BTI aging has been investigated to be related to charging effects from the bulk oxide traps and generations of Si-H bonds related interface traps. CVS and RVS induced dielectric breakdown studies have been performed and investigated. The breakdown process is regarded to be related to oxygen vacancies generations triggered by hot hole injections from anode. Post breakdown conduction study in the RRAM devices have shown irreversible characteristics of the dielectrics, although the resistance could be switched into high resistance state.Dissertation/ThesisDoctoral Dissertation Electrical Engineering 201

Gestión de jerarquías de memoria híbridas a nivel de sistema

Tesis inédita de la Universidad Complutense de Madrid, Facultad de Informática, Departamento de Arquitectura de Computadoras y Automática y de Ku Leuven, Arenberg Doctoral School, Faculty of Engineering Science, leída el 11/05/2017.In electronics and computer science, the term ‘memory’ generally refers to devices that are used to store information that we use in various appliances ranging from our PCs to all hand-held devices, smart appliances etc. Primary/main memory is used for storage systems that function at a high speed (i.e. RAM). The primary memory is often associated with addressable semiconductor memory, i.e. integrated circuits consisting of silicon-based transistors, used for example as primary memory but also other purposes in computers and other digital electronic devices. The secondary/auxiliary memory, in comparison provides program and data storage that is slower to access but offers larger capacity. Examples include external hard drives, portable flash drives, CDs, and DVDs. These devices and media must be either plugged in or inserted into a computer in order to be accessed by the system. Since secondary storage technology is not always connected to the computer, it is commonly used for backing up data. The term storage is often used to describe secondary memory. Secondary memory stores a large amount of data at lesser cost per byte than primary memory; this makes secondary storage about two orders of magnitude less expensive than primary storage. There are two main types of semiconductor memory: volatile and nonvolatile. Examples of non-volatile memory are ‘Flash’ memory (sometimes used as secondary, sometimes primary computer memory) and ROM/PROM/EPROM/EEPROM memory (used for firmware such as boot programs). Examples of volatile memory are primary memory (typically dynamic RAM, DRAM), and fast CPU cache memory (typically static RAM, SRAM, which is fast but energy-consuming and offer lower memory capacity per are a unit than DRAM). Non-volatile memory technologies in Si-based electronics date back to the 1990s. Flash memory is widely used in consumer electronic products such as cellphones and music players and NAND Flash-based solid-state disks (SSDs) are increasingly displacing hard disk drives as the primary storage device in laptops, desktops, and even data centers. The integration limit of Flash memories is approaching, and many new types of memory to replace conventional Flash memories have been proposed. The rapid increase of leakage currents in Silicon CMOS transistors with scaling poses a big challenge for the integration of SRAM memories. There is also the case of susceptibility to read/write failure with low power schemes. As a result of this, over the past decade, there has been an extensive pooling of time, resources and effort towards developing emerging memory technologies like Resistive RAM (ReRAM/RRAM), STT-MRAM, Domain Wall Memory and Phase Change Memory(PRAM). Emerging non-volatile memory technologies promise new memories to store more data at less cost than the expensive-to build silicon chips used by popular consumer gadgets including digital cameras, cell phones and portable music players. These new memory technologies combine the speed of static random-access memory (SRAM), the density of dynamic random-access memory (DRAM), and the non-volatility of Flash memory and so become very attractive as another possibility for future memory hierarchies. The research and information on these Non-Volatile Memory (NVM) technologies has matured over the last decade. These NVMs are now being explored thoroughly nowadays as viable replacements for conventional SRAM based memories even for the higher levels of the memory hierarchy. Many other new classes of emerging memory technologies such as transparent and plastic, three-dimensional(3-D), and quantum dot memory technologies have also gained tremendous popularity in recent years...En el campo de la informática, el término ‘memoria’ se refiere generalmente a dispositivos que son usados para almacenar información que posteriormente será usada en diversos dispositivos, desde computadoras personales (PC), móviles, dispositivos inteligentes, etc. La memoria principal del sistema se utiliza para almacenar los datos e instrucciones de los procesos que se encuentre en ejecución, por lo que se requiere que funcionen a alta velocidad (por ejemplo, DRAM). La memoria principal está implementada habitualmente mediante memorias semiconductoras direccionables, siendo DRAM y SRAM los principales exponentes. Por otro lado, la memoria auxiliar o secundaria proporciona almacenaje(para ficheros, por ejemplo); es más lenta pero ofrece una mayor capacidad. Ejemplos típicos de memoria secundaria son discos duros, memorias flash portables, CDs y DVDs. Debido a que estos dispositivos no necesitan estar conectados a la computadora de forma permanente, son muy utilizados para almacenar copias de seguridad. La memoria secundaria almacena una gran cantidad de datos aun coste menor por bit que la memoria principal, siendo habitualmente dos órdenes de magnitud más barata que la memoria primaria. Existen dos tipos de memorias de tipo semiconductor: volátiles y no volátiles. Ejemplos de memorias no volátiles son las memorias Flash (algunas veces usadas como memoria secundaria y otras veces como memoria principal) y memorias ROM/PROM/EPROM/EEPROM (usadas para firmware como programas de arranque). Ejemplos de memoria volátil son las memorias DRAM (RAM dinámica), actualmente la opción predominante a la hora de implementar la memoria principal, y las memorias SRAM (RAM estática) más rápida y costosa, utilizada para los diferentes niveles de cache. Las tecnologías de memorias no volátiles basadas en electrónica de silicio se remontan a la década de1990. Una variante de memoria de almacenaje por carga denominada como memoria Flash es mundialmente usada en productos electrónicos de consumo como telefonía móvil y reproductores de música mientras NAND Flash solid state disks(SSDs) están progresivamente desplazando a los dispositivos de disco duro como principal unidad de almacenamiento en computadoras portátiles, de escritorio e incluso en centros de datos. En la actualidad, hay varios factores que amenazan la actual predominancia de memorias semiconductoras basadas en cargas (capacitivas). Por un lado, se está alcanzando el límite de integración de las memorias Flash, lo que compromete su escalado en el medio plazo. Por otra parte, el fuerte incremento de las corrientes de fuga de los transistores de silicio CMOS actuales, supone un enorme desafío para la integración de memorias SRAM. Asimismo, estas memorias son cada vez más susceptibles a fallos de lectura/escritura en diseños de bajo consumo. Como resultado de estos problemas, que se agravan con cada nueva generación tecnológica, en los últimos años se han intensificado los esfuerzos para desarrollar nuevas tecnologías que reemplacen o al menos complementen a las actuales. Los transistores de efecto campo eléctrico ferroso (FeFET en sus siglas en inglés) se consideran una de las alternativas más prometedores para sustituir tanto a Flash (por su mayor densidad) como a DRAM (por su mayor velocidad), pero aún está en una fase muy inicial de su desarrollo. Hay otras tecnologías algo más maduras, en el ámbito de las memorias RAM resistivas, entre las que cabe destacar ReRAM (o RRAM), STT-RAM, Domain Wall Memory y Phase Change Memory (PRAM)...Depto. de Arquitectura de Computadores y AutomáticaFac. de InformáticaTRUEunpu

Nano-intrinsic security primitives for internet of everything

With the advent of Internet-enabled electronic devices and mobile computer systems, maintaining data security is one of the most important challenges in modern civilization. The innovation of physically unclonable functions (PUFs) shows great potential for enabling low-cost low-power authentication, anti-counterfeiting and beyond on the semiconductor chips. This is because secrets in a PUF are hidden in the randomness of the physical properties of desirably identical devices, making it extremely difficult, if not impossible, to extract them. Hence, the basic idea of PUF is to take advantage of inevitable non-idealities in the physical domain to create a system that can provide an innovative way to secure device identities, sensitive information, and their communications. While the physical variation exists everywhere, various materials, systems, and technologies have been considered as the source of unpredictable physical device variation in large scales for generating security primitives. The purpose of this project is to develop emerging solid-state memory-based security primitives and examine their robustness as well as feasibility. Firstly, the author gives an extensive overview of PUFs. The rationality, classification, and application of PUF are discussed. To objectively compare the quality of PUFs, the author formulates important PUF properties and evaluation metrics. By reviewing previously proposed constructions ranging from conventional standard complementary metal-oxide-semiconductor (CMOS) components to emerging non-volatile memories, the quality of different PUFs classes are discussed and summarized. Through a comparative analysis, emerging non-volatile redox-based resistor memories (ReRAMs) have shown the potential as promising candidates for the next generation of low-cost, low-power, compact in size, and secure PUF. Next, the author presents novel approaches to build a PUF by utilizing concatenated two layers of ReRAM crossbar arrays. Upon concatenate two layers, the nonlinear structure is introduced, and this results in the improved uniformity and the avalanche characteristic of the proposed PUF. A group of cell readout method is employed, and it supports a massive pool of challenge-response pairs of the nonlinear ReRAM-based PUF. The non-linear PUF construction is experimentally assessed using the evaluation metrics, and the quality of randomness is verified using predictive analysis. Last but not least, random telegraph noise (RTN) is studied as a source of entropy for a true random number generation (TRNG). RTN is usually considered a disadvantageous feature in the conventional CMOS designs. However, in combination with appropriate readout scheme, RTN in ReRAM can be used as a novel technique to generate quality random numbers. The proposed differential readout-based design can maintain the quality of output by reducing the effect of the undesired noise from the whole system, while the controlling difficulty of the conventional readout method can be significantly reduced. This is advantageous as the differential readout circuit can embrace the resistance variation features of ReRAMs without extensive pre-calibration. The study in this thesis has the potential to enable the development of cost-efficient and lightweight security primitives that can be integrated into modern computer mobile systems and devices for providing a high level of security

Device Modeling and Circuit Design of Neuromorphic Memory Structures

The downscaling of CMOS technology and the benefits gleaned thereof have made it the cornerstone of the semiconductor industry for many years. As the technology reaches its fundamental physical limits, however, CMOS is expected to run out of steam instigating the exploration of new nanoelectronic devices. Memristors have emerged as promising candidates for future computing paradigms, specifically, memory arrays and neuromorphic circuits. Towards this end, this dissertation will explore the use of two memristive devices, namely, Transition Metal Oxide (TMO) devices and Insulator Metal Transition (IMT) devices in constructing neuromorphic circuits. A compact model for TMO devices is first proposed and verified against experimental data. The proposed model, unlike most of the other models present in the literature, leverages the instantaneous resistance of the device as the state variable which facilitates parameter extraction. In addition, a model for the forming voltage of TMO devices is developed and verified against experimental data and Monte Carlo simulations. Impact of the device geometry and material characteristics of the TMO device on the forming voltage is investigated and techniques for reducing the forming voltage are proposed. The use of TMOs in syanptic arrays is then explored and a multi-driver write scheme is proposed that improves their performance. The proposed technique enhances voltage delivery across the selected cells via suppressing the effective line resistance and leakage current paths, thus, improving the performance of the crossbar array. An IMT compact model is also developed and verified against experiemntal data and electro-thermal device simulations. The proposed model describes the device as a memristive system with the temperature being the state variable, thus, capturing the temperature dependent resistive switching of the IMT device in a compact form suitable for SPICE implementation. An IMT based Integrate-And-Fire neuron is then proposed. The IMT neuron leverages the temperature dynamics of the device to deliver the functionality of the neuron. The proposed IMT neuron is more compact than its CMOS counterparts as it alleviates the need for complex CMOS circuitry. Impact of the IMT device parameters on the neuron\u27s performance is then studied and design considerations are provided

Nouvelles Architectures Hybrides (Logique / Mémoires Non-Volatiles et technologies associées.)

Les nouvelles approches de technologies mémoires permettront une intégration dite back-end, où les cellules élémentaires de stockage seront fabriquées lors des dernières étapes de réalisation à grande échelle du circuit. Ces approches innovantes sont souvent basées sur l'utilisation de matériaux actifs présentant deux états de résistance distincts. Le passage d'un état à l'autre est contrôlé en courant ou en tension donnant lieu à une caractéristique I-V hystérétique. Nos mémoires résistives sont composées d'argent en métal électrochimiquement actif et de sulfure amorphe agissant comme électrolyte. Leur fonctionnement repose sur la formation réversible et la dissolution d'un filament conducteur. Le potentiel d'application de ces nouveaux dispositifs n'est pas limité aux mémoires ultra-haute densité mais aussi aux circuits embarqués. En empilant ces mémoires dans la troisième dimension au niveau des interconnections des circuits logiques CMOS, de nouvelles architectures hybrides et innovantes deviennent possibles. Il serait alors envisageable d'exploiter un fonctionnement à basse énergie, à haute vitesse d'écriture/lecture et de haute performance telles que l'endurance et la rétention. Dans cette thèse, en se concentrant sur les aspects de la technologie de mémoire en vue de développer de nouvelles architectures, l'introduction d'une fonctionnalité non-volatile au niveau logique est démontrée par trois circuits hybrides: commutateurs de routage non volatiles dans un Field Programmable Gate Arrays, un 6T-SRAM non volatile, et les neurones stochastiques pour un réseau neuronal. Pour améliorer les solutions existantes, les limitations de la performances des dispositifs mémoires sont identifiés et résolus avec des nouveaux empilements ou en fournissant des défauts de circuits tolérants.Novel approaches in the field of memory technology should enable backend integration, where individual storage nodes will be fabricated during the last fabrication steps of the VLSI circuit. In this case, memory operation is often based upon the use of active materials with resistive switching properties. A topology of resistive memory consists of silver as electrochemically active metal and amorphous sulfide acting as electrolyte and relies on the reversible formation and dissolution of a conductive filament. The application potential of these new memories is not limited to stand-alone (ultra-high density), but is also suitable for embedded applications. By stacking these memories in the third dimension at the interconnection level of CMOS logic, new ultra-scalable hybrid architectures becomes possible which exploit low energy operation, fast write/read access and high performance with respect to endurance and retention. In this thesis, focusing on memory technology aspects in view of developing new architectures, the introduction of non-volatile functionality at the logic level is demonstrated through three hybrid (CMOS logic ReRAM devices) circuits: nonvolatile routing switches in a Field Programmable Gate Array, nonvolatile 6T-SRAMs, and stochastic neurons of an hardware neural network. To be competitive or even improve existing solutions, limitations on the memory devices performances are identified and solved by stack engineering of CBRAM devices or providing faults tolerant circuits.SAVOIE-SCD - Bib.électronique (730659901) / SudocGRENOBLE1/INP-Bib.électronique (384210012) / SudocGRENOBLE2/3-Bib.électronique (384219901) / SudocSudocFranceF

Simulation and implementation of novel deep learning hardware architectures for resource constrained devices

Corey Lammie designed mixed signal memristive-complementary metal–oxide–semiconductor (CMOS) and field programmable gate arrays (FPGA) hardware architectures, which were used to reduce the power and resource requirements of Deep Learning (DL) systems; both during inference and training. Disruptive design methodologies, such as those explored in this thesis, can be used to facilitate the design of next-generation DL systems

Low-temperature amorphous oxide semiconductors for thin-film transistors and memristors: physical insights and applications

While amorphous oxides semiconductors (AOS), namely InGaZnO (IGZO), have found market application in the display industry, their disruptive properties permit to envisage for more advanced concepts such as System-on-Panel (SoP) in which AOS devices could be used for addressing (and readout) of sensors and displays, for communication, and even for memory as oxide memristors are candidates for the next-generation memories. This work concerns the application of AOS for these applications considering the low thermal budgets (< 180 °C) required for flexible, low cost and alternative substrates. For maintaining low driving voltages, a sputtered multicomponent/multi-layered high-κ dielectric (Ta2O5+SiO2) was developed for low temperature IGZO TFTs which permitted high performance without sacrificing reliability and stability. Devices’ performance under temperature was investigated and the bias and temperature dependent mobility was modelled and included in TCAD simulation. Even for IGZO compositions yielding very high thermal activation, circuit topologies for counteracting both this and the bias stress effect were suggested. Channel length scaling of the devices was investigated, showing that operation for radio frequency identification (RFID) can be achieved without significant performance deterioration from short channel effects, which are attenuated by the high-κ dielectric, as is shown in TCAD simulation. The applicability of these devices in SoP is then exemplified by suggesting a large area flexible radiation sensing system with on-chip clock-generation, sensor matrix addressing and signal read-out, performed by the IGZO TFTs. Application for paper electronics was also shown, in which TCAD simulation was used to investigate on the unconventional floating gate structure. AOS memristors are also presented, with two distinct operation modes that could be envisaged for data storage or for synaptic applications. Employing typical TFT methodologies and materials, these are ease to integrate in oxide SoP architectures