1.3micron quantum dot lasers and superluminescent light emitting diodes

The work described in this thesis involves the development of gallium arsenide based quantum dot lasers and superluminescent light emitting diodes (SLEDs) emitting around 1.3 pm. Initially, the improvement in overall temperature characteristics of a 5 DWELL 1.3 pm quantum dot laser is described through a change in the fabricated device design incorporating a shallow ridge etch and selective gold electroplating. This improved fabrication technique allowed higher temperature ground state operation of the laser and an improvement of 10K in the characteristics temperature at a temperature range higher than 60°C. Later a novel method to broaden the emission spectrum of a SLED by incorporating different amounts of indium in different wells of a DWELL structure is proposed and described. For this device 85nm broad emission spectrum is obtained along with 2.5mW of CW output power at room temperature. Further modification of this structure resulted in a SLED with >8mW CW output power and a 95nm wide, flat emission spectrum at room temperature. In the last part of this thesis a new growth mechanism is described to improve the overall performance of lasers, SLEDs and mesa diodes. For the laser structures lower threshold current density, higher efficiency and lower transparency current densities are observed while the SLEDs emitted >40mW CW output power at room temperature which linearly increased with drive current. Also the mesa diodes exhibited lower reverse leakage current and higher breakdown voltages

Optical gain in GaAsBi/GaAs quantum well diode lasers

Electrically pumped GaAsBi/GaAs quantum well lasers are a promising new class of near-infrared devices where, by use of the unusual band structure properties of GaAsBi alloys, it is possible to suppress the dominant energy-consuming Auger recombination and inter-valence band absorption loss mechanisms, which greatly impact upon the device performance. Suppression of these loss mechanisms promises to lead to highly efficient, uncooled operation of telecommunications lasers, making GaAsBi system a strong candidate for the development of next-generation semiconductor lasers. In this report we present the first experimentally measured optical gain, absorption and spontaneous emission spectra for GaAsBi-based quantum well laser structures. We determine internal optical losses of 10–15 cm−1 and a peak modal gain of 24 cm−1, corresponding to a material gain of approximately 1500 cm−1 at a current density of 2 kA cm−2. To complement the experimental studies, a theoretical analysis of the spontaneous emission and optical gain spectra is presented, using a model based upon a 12-band k.p Hamiltonian for GaAsBi alloys. The results of our theoretical calculations are in excellent quantitative agreement with the experimental data, and together provide a powerful predictive capability for use in the design and optimisation of high efficiency lasers in the infrared

Si-based Germanium-Tin (GeSn) Emitters for Short-Wave Infrared Optoelectronics

Conventional integrated electronics have reached a physical limit, and their efficiency has been influenced by the generated heat in the high-density electronic packages. Integrated photonic circuits based on the highly developed Si complementary-metal-oxide-semiconductor (CMOS) infrastructure was proposed as a viable solution; however, Si-based emitters are the most challenging component for the monolithic integrated photonic circuits. The indirect bandgap of silicon and germanium is a bottleneck for the further development of photonic and optoelectronic integrated circuits. The Ge1-xSnx alloy, a group IV material system compatible with Si CMOS technology, was suggested as a desirable material that theoretically exhibits a direct bandgap when Sn composition increases. Last decade, efforts were made to develop high quality Ge1-xSnx films on Si substrate using commercial reactors. Moreover, the effect of Sn composition on the bandgap energy of Ge1-xSnx alloys was theoretically investigated. In this work, the development of Si-based Ge1-xSnx emitters was pursued with study the temperature-dependent bandgap emission of Ge1-xSnx structures for the short-wave infrared (SWIR) wavelength range (between 1.5 to 3 µm). The photoluminescence (PL) emissions from the bandgap of Ge1-xSnx films were investigated and a direct bandgap Ge1-xSnx was demonstrated for the first time based on the careful analysis of the PL spectra line-width and also the strain-dependent bandgap concept. In addition, the Ge1-xSnx advanced structure including SiGeSn/GeSn/SiGeSn single quantum well (QW) and Ge/Ge0.92Sn0.08/Ge double heterostructures (DHS) were studied. The GeSn QW PL emission was scrutinized from 10 to 300 K and the carrier confinement was analyzed through band offset calculations in the QW structure. Moreover, the electrical and optical characteristics of n-i-p Ge/Ge0.92Sn0.08/Ge light emitting diodes (LEDs) with surface emitting and edge emitting configurations were examined at different temperatures. Additionally, the lasing performance from the DHS Ge/Ge0.89Sn0.11/Ge waveguide was experimentally investigated based on the concept of direct bandgap Ge1-xSnx films and the confinement of carriers and optical field within the Ge/Ge0.89Sn0.11/Ge structure. Finally, an optimized QW design has been proposed that features a direct bandgap Ge0.9Sn0.1 QW with Type-I band alignment favorable for the high carrier confinement and low threshold Ge1-xSnx QW devices