Low-Power, Low-Voltage SRAM Circuits Design For Nanometric CMOS Technologies

Embedded SRAM memory is a vital component in modern SoCs. More than 80% of the System-on-Chip (SoC) die area is often occupied by SRAM arrays. As such, system reliability and yield is largely governed by the SRAM's performance and robustness. The aggressive scaling trend in CMOS device minimum feature size, coupled with the growing demand in high-capacity memory integration, has imposed the use of minimal size devices to realize a memory bitcell. The smallest 6T SRAM bitcell to date occupies a 0.1um2 in silicon area. SRAM bitcells continue to benefit from an aggressive scaling trend in CMOS technologies. Unfortunately, other system components, such as interconnects, experience a slower scaling trend. This has resulted in dramatic deterioration in a cell's ability to drive a heavily-loaded interconnects. Moreover, the growing fluctuation in device properties due to Process, Voltage, and Temperature (PVT) variations has added more uncertainty to SRAM operation. Thus ensuring the ability of a miniaturized cell to drive heavily-loaded bitlines and to generate adequate voltage swing is becoming challenging. A large percentage of state-of-the-art SoC system failures are attributed to the inability of SRAM cells to generate the targeted bitline voltage swing within a given access time. The use of read-assist mechanisms and current mode sense amplifiers are the two key strategies used to surmount bitline loading effects. On the other hand, new bitcell topologies and cell supply voltage management are used to overcome fluctuations in device properties. In this research we tackled conventional 6T SRAM bitcell limited drivability by introducing new integrated voltage sensing schemes and current-mode sense amplifiers. The proposed schemes feature a read-assist mechanism. The proposed schemes' functionality and superiority over existing schemes are verified using transient and statistical SPICE simulations. Post-layout extracted views of the devices are used for realistic simulation results. Low-voltage operated SRAM reliability and yield enhancement is investigated and a wordline boost technique is proposed as a means to manage the cell's WL operating voltage. The proposed wordline driver design shows a significant improvement in reliability and yield in a 400-mV 6T SRAM cell. The proposed wordline driver design exploit the cell's Dynamic Noise Margin (DNM), therefore boost peak level and boost decay rate programmability features are added. SPICE transient and statistical simulations are used to verify the proposed design's functionality. Finally, at a bitcell-level, we proposed a new five-transistor (5T) SRAM bitcell which shows competitive performance and reliability figures of merit compared to the conventional 6T bitcell. The functionality of the proposed cell is verified by post-layout SPICE simulations. The proposed bitcell topology is designed, implemented and fabricated in a standard ST CMOS 65nm technology process. A 1.2_ 1.2 mm2 multi-design project test chip consisting of four 32-Kbit (256-row x 128-column) SRAM macros with the required peripheral and timing control units is fabricated. Two of the designed SRAM macros are dedicated for this work, namely, a 32-Kbit 5T macro and a 32-Kbit 6T macro which is used as a comparison reference. Other macros belong to other projects and are not discussed in this document

Power Efficient SRAM Design with Integrated Bit Line Charge Pump

Bit line toggling of SRAM systems in write operations leads to the largest portion of power dissipation. To reduce this amount of power loss and achieve power efficient memory, we propose a new SRAM design that integrates charge pump circuits to harvest and reuse bit line charge. In this work, a power-efficient charge recycling SRAM is designed and implemented in 180nm CMOS technology. Post-layout simulation demonstrates an 11% of power saving and 3.8% of area overhead, if the bit width of SRAM is chosen as 8. Alternatively, 22% of power reduction is obtained if the bit width of SRAM is extended to 64. Compared with existing charge recycling SRAM schemes, this proposed SRAM is robust to process variation, demonstrates good read/write stability, and illustrates better trade-off between design complexity and power reduction

Modeling and Mitigation of Soft Errors in Nanoscale SRAMs

Energetic particle (alpha particle, cosmic neutron, etc.) induced single event data upset or soft error has emerged as a key reliability concern in SRAMs in sub-100 nanometre technologies. Low operating voltage, small node capacitance, high packing density, and lack of error masking mechanisms are primarily responsible for the soft error susceptibility of SRAMs. In addition, since SRAM occupies the majority of die area in system-on-chips (SoCs) and microprocessors, different leakage reduction techniques, such as, supply voltage reduction, gated grounding, etc., are applied to SRAMs in order to limit the overall chip leakage. These leakage reduction techniques exponentially increase the soft error rate in SRAMs. The soft error rate is further accentuated by process variations, which are prominent in scaled-down technologies. In this research, we address these concerns and propose techniques to characterize and mitigate soft errors in nanoscale SRAMs. We develop a comprehensive analytical model of the critical charge, which is a key to assessing the soft error susceptibility of SRAMs. The model is based on the dynamic behaviour of the cell and a simple decoupling technique for the non-linearly coupled storage nodes. The model describes the critical charge in terms of NMOS and PMOS transistor parameters, cell supply voltage, and noise current parameters. Consequently, it enables characterizing the spread of critical charge due to process induced variations in these parameters and to manufacturing defects, such as, resistive contacts or vias. In addition, the model can estimate the improvement in critical charge when MIM capacitors are added to the cell in order to improve the soft error robustness. The model is validated by SPICE simulations (90nm CMOS) and radiation test. The critical charge calculated by the model is in good agreement with SPICE simulations with a maximum discrepancy of less than 5%. The soft error rate estimated by the model for low voltage (sub 0.8 V) operations is within 10% of the soft error rate measured in the radiation test. Therefore, the model can serve as a reliable alternative to time consuming SPICE simulations for optimizing the critical charge and hence the soft error rate at the design stage. In order to limit the soft error rate further, we propose an area-efficient multiword based error correction code (MECC) scheme. The MECC scheme combines four 32 bit data words to form a composite 128 bit ECC word and uses an optimized 4-input transmission-gate XOR logic. Thus MECC significantly reduces the area overhead for check-bit storage and the delay penalty for error correction. In addition, MECC interleaves two composite words in a row for limiting cosmic neutron induced multi-bit errors. The ground potentials of the composite words are controlled to minimize leakage power without compromising the read data stability. However, use of composite words involves a unique write operation where one data word is written while other three data words are read to update the check-bits. A power efficient word line signaling technique is developed to facilitate the write operation. A 64 kb SRAM macro with MECC is designed and fabricated in a commercial 90nm CMOS technology. Measurement results show that the SRAM consumes 534 μW at 100 MHz with a data latency of 3.3 ns for a single bit error correction. This translates into 82% per-bit energy saving and 8x speed improvement over recently reported multiword ECC schemes. Accelerated neutron radiation test carried out at TRIUMF in Vancouver confirms that the proposed MECC scheme can correct up to 85% of soft errors