Charge Trap Transistors (CTT): Turning Logic Transistors into Embedded Non-Volatile Memory for Advanced High-k/Metal Gate CMOS Technologies

While need for embedded non-volatile memory (eNVM) in modern computing systems continues to grow rapidly, the options have been limited due to integration and scaling challenges as well as operational voltage incompatibilities. Introduced in this work is a unique multi-time programmable memory (MTPM) solution for advanced high-k/metal-gate (HKMG) CMOS technologies which turns as-fabricated standard logic transistors into eNVM elements, without the need for any process adders or additional masks. These logic transistors, when employed as eNVM elements, are dubbed “Charge Trap Transistors” (CTTs). The fundamental device physics, principles of operation, and technological breakthroughs required for employing logic transistors as eNVM are presented. Implementation of CTT eNVM in 32 nm, 22 nm, 14 nm, and 7 nm production technologies has been realized and demonstrated in this work. The emerging memory technology landscape and the space that the CTT technology occupies therein are examined.The motivation behind this work is to develop an eNVM technology that is completely process/mask-free, multi-time programmable, operable at low/logic-compatible voltages, scalable, and secure. The CTT technology satisfies all of the aforementioned criteria. CTTs offer a data retention lifetime of > 10 years at 125 �C and an operation temperature range of -55�-125� C. Hardware results demonstrate an endurance of > 10^4 program/erase cycles which is more than adequate for most embedded applications. Hardware security enhancement, on-chip reconfigurable encryption, firmware, BIOS, chip ID, redundancy, repair at wafer and module test and in the field, performance tailoring, and chip configuration are a few of the applications of CTT eNVM. Moreover, the CTT array in its native (unprogrammed) state measures very well as an entropy source for potential PUF (Physically Unclonable Function) applications such as identification, authentication, anti-counterfeiting, secure boot, and cryptographic IP. In addition to the numerous digital applications, CTTs can also be utilized as an analog memory for applications like neuromorphic computing for machine learning (ML) and artificial intelligence (AI)

Custom Interface for Charge Trap EEPROM Applications

Cryptographic attacks and memory observability among DRAM or PROM have drawn researcher's attention. C. Kothandaraman et al. [1] have proposed a secure memory element using charge-trap based transistor for a potential memory application. The charge trapping layer used in this work is HfO2 which is a high-k dielectric. The properties of HfO2 making it superior to replace traditional SiO2 dielectric are brought together. In general, the trend of scaling non-volatile memory is presented and how dielectric thickness effects the gate length is shown using HfO2 as a solution for scaling beyond 45nm node. This work presents an on-chip interface architecture between CPU and secure EEPROM for control and data communication. This architecture allows the secure EEPROM to be embedded with the processing unit preventing interface eavesdropping so that encryption keys can be accessed locally and securely. It is also designed to overcome the cold-boot attacks [2] and side channel attacks [3] employing on-chip implementation and parallel data communication. Based on the literature, the programming voltages are proposed to meet the optimal requirement of data retention and lifetime. Also, future predictions are made on dielectrics and device architecture for continuous scaling. The interface design is implemented in VHDL and validated with secure EEPROM model. The synthesis and simulation results of the design are presented

ELECTRICAL CHARACTERIZATION, PHYSICS, MODELING AND RELIABILITY OF INNOVATIVE NON-VOLATILE MEMORIES

Enclosed in this thesis work it can be found the results of a three years long research activity performed during the XXIV-th cycle of the Ph.D. school in Engineering Science of the Università degli Studi di Ferrara. The topic of this work is concerned about the electrical characterization, physics, modeling and reliability of innovative non-volatile memories, addressing most of the proposed alternative to the floating-gate based memories which currently are facing a technology dead end. Throughout the chapters of this thesis it will be provided a detailed characterization of the envisioned replacements for the common NOR and NAND Flash technologies into the near future embedded and MPSoCs (Multi Processing System on Chip) systems. In Chapter 1 it will be introduced the non-volatile memory technology with direct reference on nowadays Flash mainstream, providing indications and comments on why the system designers should be forced to change the approach to new memory concepts. In Chapter 2 it will be presented one of the most studied post-floating gate memory technology for MPSoCs: the Phase Change Memory. The results of an extensive electrical characterization performed on these devices led to important discoveries such as the kinematics of the erase operation and potential reliability threats in memory operations. A modeling framework has been developed to support the experimental results and to validate them on projected scaled technology. In Chapter 3 an embedded memory for automotive environment will be shown: the SimpleEE p-channel memory. The characterization of this memory proven the technology robustness providing at the same time new insights on the erratic bits phenomenon largely studied on NOR and NAND counterparts. Chapter 4 will show the research studies performed on a memory device based on the Nano-MEMS concept. This particular memory generation proves to be integrated in very harsh environment such as military applications, geothermal and space avionics. A detailed study on the physical principles underlying this memory will be presented. In Chapter 5 a successor of the standard NAND Flash will be analyzed: the Charge Trapping NAND. This kind of memory shares the same principles of the traditional floating gate technology except for the storage medium which now has been substituted by a discrete nature storage (i.e. silicon nitride traps). The conclusions and the results summary for each memory technology will be provided in Chapter 6. Finally, on Appendix A it will be shown the results of a recently started research activity on the high level reliability memory management exploiting the results of the studies for Phase Change Memories

45-nm Radiation Hardened Cache Design

abstract: Circuits on smaller technology nodes become more vulnerable to radiation-induced upset. Since this is a major problem for electronic circuits used in space applications, designers have a variety of solutions in hand. Radiation hardening by design (RHBD) is an approach, where electronic components are designed to work properly in certain radiation environments without the use of special fabrication processes. This work focuses on the cache design for a high performance microprocessor. The design tries to mitigate radiation effects like SEE, on a commercial foundry 45 nm SOI process. The design has been ported from a previously done cache design at the 90 nm process node. The cache design is a 16 KB, 4 way set associative, write-through design that uses a no-write allocate policy. The cache has been tested to write and read at above 2 GHz at VDD = 0.9 V. Interleaved layout, parity protection, dual redundancy, and checking circuits are used in the design to achieve radiation hardness. High speed is accomplished through the use of dynamic circuits and short wiring routes wherever possible. Gated clocks and optimized wire connections are used to reduce power. Structured methodology is used to build up the entire cache.Dissertation/ThesisM.S. Electrical Engineering 201

Fault Tolerant Electronic System Design

Due to technology scaling, which means reduced transistor size, higher density, lower voltage and more aggressive clock frequency, VLSI devices may become more sensitive against soft errors. Especially for those devices used in safety- and mission-critical applications, dependability and reliability are becoming increasingly important constraints during the development of system on/around them. Other phenomena (e.g., aging and wear-out effects) also have negative impacts on reliability of modern circuits. Recent researches show that even at sea level, radiation particles can still induce soft errors in electronic systems. On one hand, processor-based system are commonly used in a wide variety of applications, including safety-critical and high availability missions, e.g., in the automotive, biomedical and aerospace domains. In these fields, an error may produce catastrophic consequences. Thus, dependability is a primary target that must be achieved taking into account tight constraints in terms of cost, performance, power and time to market. With standards and regulations (e.g., ISO-26262, DO-254, IEC-61508) clearly specify the targets to be achieved and the methods to prove their achievement, techniques working at system level are particularly attracting. On the other hand, Field Programmable Gate Array (FPGA) devices are becoming more and more attractive, also in safety- and mission-critical applications due to the high performance, low power consumption and the flexibility for reconfiguration they provide. Two types of FPGAs are commonly used, based on their configuration memory cell technology, i.e., SRAM-based and Flash-based FPGA. For SRAM-based FPGAs, the SRAM cells of the configuration memory highly susceptible to radiation induced effects which can leads to system failure; and for Flash-based FPGAs, even though their non-volatile configuration memory cells are almost immune to Single Event Upsets induced by energetic particles, the floating gate switches and the logic cells in the configuration tiles can still suffer from Single Event Effects when hit by an highly charged particle. So analysis and mitigation techniques for Single Event Effects on FPGAs are becoming increasingly important in the design flow especially when reliability is one of the main requirements

Low Power Memory/Memristor Devices and Systems

This reprint focusses on achieving low-power computation using memristive devices. The topic was designed as a convenient reference point: it contains a mix of techniques starting from the fundamental manufacturing of memristive devices all the way to applications such as physically unclonable functions, and also covers perspectives on, e.g., in-memory computing, which is inextricably linked with emerging memory devices such as memristors. Finally, the reprint contains a few articles representing how other communities (from typical CMOS design to photonics) are fighting on their own fronts in the quest towards low-power computation, as a comparison with the memristor literature. We hope that readers will enjoy discovering the articles within

High-Density Solid-State Memory Devices and Technologies

This Special Issue aims to examine high-density solid-state memory devices and technologies from various standpoints in an attempt to foster their continuous success in the future. Considering that broadening of the range of applications will likely offer different types of solid-state memories their chance in the spotlight, the Special Issue is not focused on a specific storage solution but rather embraces all the most relevant solid-state memory devices and technologies currently on stage. Even the subjects dealt with in this Special Issue are widespread, ranging from process and design issues/innovations to the experimental and theoretical analysis of the operation and from the performance and reliability of memory devices and arrays to the exploitation of solid-state memories to pursue new computing paradigms