6T CMOS SRAM Stability in Nanoelectronic Era: From Metrics to Built-in Monitoring

The digital technology in the nanoelectronic era is based on intensive data processing and battery-based devices. As a consequence, the need for larger and energy-efficient circuits with large embedded memories is growing rapidly in current system-on-chip (SoC). In this context, where embedded SRAM yield dominate the overall SoC yield, the memory sensitivity to process variation and aging effects has aggressively increased. In addition, long-term aging effects introduce extra variability reducing the failure-free period. Therefore, although stability metrics are used intensively in the circuit design phases, more accurate and non-invasive methodologies must be proposed to observe the stability metric for high reliability systems. This chapter reviews the most extended memory cell stability metrics and evaluates the feasibility of tracking SRAM cell reliability evolution implementing a detailed bit-cell stability characterization measurement. The memory performance degradation observation is focused on estimating the threshold voltage (Vth) drift caused by process variation and reliability mechanisms. A novel SRAM stability degradation measurement architecture is proposed to be included in modern memory designs with minimal hardware intrusion. The new architecture may extend the failure-free period by introducing adaptable circuits depending on the measured memory stability parameter

Supply Voltage Dependence of Heavy Ion Induced SEEs on 65nm CMOS Bulk SRAMs

The power consumption of Static Random Access Memory (SRAM) has become an important issue for modern integrated circuit design, considering the fact that they occupy large area and consume significant portion of power consumption in modern nanometer chips. SRAM operating in low power supply voltages has become an effective approach in reducing power consumption. Therefore, it is essential to experimentally characterize the single event effects (SEE) of hardened and unhardened SRAM cells to determine their appropriate applications, especially when a low supply voltage is preferred. In this thesis, a SRAM test chip was designed and fabricated with four cell arrays sharing the same peripheral circuits, including two types of unhardened cells (standard 6T and sub-threshold 10T) and two types of hardened cells (Quatro and DICE). The systems for functional and radiation tests were built up with power supply voltages that ranged from near threshold 0.4 V to normal supply 1 V. The test chip was irradiated with alpha particles and heavy ions with various linear energy transfers (LETs) at different core supply voltages, ranging from 1 V to 0.4 V. Experimental results of the alpha test and heavy ion test were consistent with the results of the simulation. The cross sections of 6T and 10T cells present much more significant sensitivities than Quatro and DICE cells for all tested supply voltages and LET. The 10T cell demonstrates a more optimal radiation performance than the 6T cell when LET is small (0.44 MeV·cm2/mg), yet no significant advantage is evident when LET is larger than this. In regards to the Quatro and DICE cells, one does not consistently show superior performance over the other in terms of soft error rates (SERs). Multi-bit upsets (MBUs) occupy a larger portion of total SEUs in DICE cell when relatively larger LET and smaller supply voltage are applied. It explains the loss in radiation tolerance competition with Quatro cell when LET is bigger than 9.1 MeV·cm2/mg and supply voltage is smaller than 0.6 V. In addition, the analysis of test results also demonstrated that the error amount distributions follow a Poisson distribution very well for each type of cell array

Ultra-low-power SRAM design in high variability advanced CMOS

Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 2009.Cataloged from PDF version of thesis.Includes bibliographical references (p. 163-181).Embedded SRAMs are a critical component in modern digital systems, and their role is preferentially increasing. As a result, SRAMs strongly impact the overall power, performance, and area, and, in order to manage these severely constrained trade-offs, they must be specially designed for target applications. Highly energy-constrained systems (e.g. implantable biomedical devices, multimedia handsets, etc.) are an important class of applications driving ultra-low-power SRAMs. This thesis analyzes the energy of an SRAM sub-array. Since supply- and threshold-voltage have a strong effect, targets for these are established in order to optimize energy. Despite the heavy emphasis on leakage-energy, analysis of a high-density 256x256 sub-array in 45nm LP CMOS points to two necessary optimizations: (1) aggressive supply-voltage reduction (in addition to Vt elevation), and (2) performance enhancement. Important SRAM metrics, including read/write/hold-margin and read-current, are also investigated to identify trade-offs of these optimizations. Based on the need to lower supply-voltage, a 0.35V 256kb SRAM is demonstrated in 65nm LP CMOS. It uses an 8T bit-cell with peripheral circuit-assists to improve write-margin and bit-line leakage. Additionally, redundancy, to manage the increasing impact of variability in the periphery, is proposed to improve the area-offset trade-off of sense-amplifiers, demonstrating promise for highly advanced technology nodes. Based on the need to improve performance, which is limited by density constraints, a 64kb SRAM, using an offset-compensating sense-amplifier, is demonstrated in 45nm LP CMOS with high-density 0.25[mu]m2 bit-cells.(cont.) The sense-amplifier is regenerative, but non -strobed, overcoming timing uncertainties limiting performance, and it is single-ended, for compatibility with 8T cells. Compared to a conventional strobed sense-amplifier, it achieves 34% improvement in worst-case access-time and 4x improvement in the standard deviation of the access-time.by Naveen Verma.Ph.D

Digital Timing Control in SRAMs for Yield Enhancement and Graceful Aging Degradation

Embedded SRAMs can occupy the majority of the chip area in SOCs. The increase in process variation and aging degradation due to technology scaling can severely compromise the integrity of SRAM memory cells, hence resulting in cell failures. Enough cell failures in a memory can lead to it being rejected during initial testing, and hence decrease the manufacturing yield. Or, as a result of long-term applied stress, lead to in-field system failures. Certain types of cell failures can be mitigated through improved timing control. Post-fabrication programmable timing can allow for after-the-fact calibration of timing signals on a per die basis. This allows for a SRAM's timing signals to be generated based on the characteristics specific to the individual chip, thus allowing for an increase in yield and reduction in in-field system failures. In this thesis, a delay line based SRAM timing block with digitally programmable timing signals has been implemented in a 180 nm CMOS technology. Various timing-related cell failure mechanisms including: 1). Operational Read Failures, 2). Cell Stability Failures, and 3). Power Envelope Failures are investigated. Additionally, the major contributing factors for process variation and device aging degradation are discussed in the context of SRAMs. Simulations show that programmable timing can be used to reduce cell failure rates by over 50%

Design, implementation and testing of SRAM based neutron detectors

Neutrons of thermal and high energies can change the value of a bit stored in a Static Random Access Memory (SRAM) memory chip. The effect is non destructive and linearly dependent on the amount of incoming particles, which makes it exploitable for use as a neutron detector. Detection is done by writing a known pattern to the memory and continuously reading it back checking for wrong values. As the SRAM memory is immune to gamma radiation it is ideal for use in for instance medical linear accelerators for detection of neutron dose to a patient. The intention of this work has been twofold: (1) Testing of different SRAM devices of different bit-sizes, manufacturers, feature sizes and voltages for their sensitivity to neutrons of different energies from thermal to high energies. (2) Design and implement detector hardware, firmware and its accompanying readout system for successful use in irradiation testing. The work has been done in close collaboration with Eivind Larsen, whose main contributions has been related to the nuclear physics aspect of the work in addition to arrangements in regard to beam setup and experimentation. Testing have been done at the Physikalisch-Technische Bundesanstalt (PTB) facility in Braunschweig Germany in a quasi-monochromatic neutron beam of 5:8MeV, 8:5MeV and 14:8MeV, finding a dependence of the sensitivity on the energy. In addition there have been testing conducted in the high energy hadron field at CERF at CERN, finding that by using the results from the other experiments an estimated range of the saturation cross section could be determined. Testing was also conducted at two occasions in the 29MeV proton beam at Oslo Cyclotron Laboratory (OCL) in Oslo Norway, where it was found that the detector could be used as a reference detector for beam monitoring and for beam profile characterization. The cross sections of the detectors were found to be comparable to the 14:8MeV cross section found at PTB. Thermal neutron testing of the devices was done in the thermal neutron field of the nuclear reactor at Institute for Energy Technology (IFE) at Kjeller Norway. All the devices were found to be sensitive to the field. Detector electronics, adapted to the different devices, has been built which can withstand the same radiation as the memory device without malfunctioning. There has been a focus on using Commercial Off The Shelf (COTS) components for reducing the total cost of the detector to about 100-200$US. The use of COTS SRAM memory devices also simplifies the reproducibility and availability of spares. The detector currently uses a two way communication between the detector and iv Abstract the readout computer over two pair of cables reducing the amount of cabling needed for experiments. The detectors can be connected to the communication link in a bus fashion, currently enabling a total of 14 detectors to be tested simultaneously from 100m away, over the same cable. Single Event Latch-up (SEL) and problems with irregular count rate of SRAMs created in the 90nm fabrication node has created problems during testing. Some solutions and techniques to mitigate these in hardware and firmware are presented in this work.Master i FysikkMAMN-PHYSPHYS39

Statistical Characterization and Decomposition of SRAM cell Variability and Aging

abstract: Memories play an integral role in today's advanced ICs. Technology scaling has enabled high density designs at the price paid for impact due to variability and reliability. It is imperative to have accurate methods to measure and extract the variability in the SRAM cell to produce accurate reliability projections for future technologies. This work presents a novel test measurement and extraction technique which is non-invasive to the actual operation of the SRAM memory array. The salient features of this work include i) A single ended SRAM test structure with no disturbance to SRAM operations ii) a convenient test procedure that only requires quasi-static control of external voltages iii) non-iterative method that extracts the VTH variation of each transistor from eight independent switch point measurements. With the present day technology scaling, in addition to the variability with the process, there is also the impact of other aging mechanisms which become dominant. The various aging mechanisms like Negative Bias Temperature Instability (NBTI), Channel Hot Carrier (CHC) and Time Dependent Dielectric Breakdown (TDDB) are critical in the present day nano-scale technology nodes. In this work, we focus on the impact of NBTI due to aging in the SRAM cell and have used Trapping/De-Trapping theory based log(t) model to explain the shift in threshold voltage VTH. The aging section focuses on the following i) Impact of Statistical aging in PMOS device due to NBTI dominates the temporal shift of SRAM cell ii) Besides static variations , shifting in VTH demands increased guard-banding margins in design stage iii) Aging statistics remain constant during the shift, presenting a secondary effect in aging prediction. iv) We have investigated to see if the aging mechanism can be used as a compensation technique to reduce mismatch due to process variations. Finally, the entire test setup has been tested in SPICE and also validated with silicon and the results are presented. The method also facilitates the study of design metrics such as static, read and write noise margins and also the data retention voltage and thus help designers to improve the cell stability of SRAM.Dissertation/ThesisM.S. Electrical Engineering 201

Low energy digital circuit design using sub-threshold operation

Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, February 2006.Includes bibliographical references (p. 189-202).Scaling of process technologies to deep sub-micron dimensions has made power management a significant concern for circuit designers. For emerging low power applications such as distributed micro-sensor networks or medical applications, low energy operation is the primary concern instead of speed, with the eventual goal of harvesting energy from the environment. Sub-threshold operation offers a promising solution for ultra-low-energy applications because it often achieves the minimum energy per operation. While initial explorations into sub-threshold circuits demonstrate its promise, sub-threshold circuit design remains in its infancy. This thesis makes several contributions that make sub-threshold design more accessible to circuit designers. First, a model for energy consumption in sub-threshold provides an analytical solution for the optimum VDD to minimize energy. Fitting this model to a generic circuit allows easy estimation of the impact of processing and environmental parameters on the minimum energy point. Second, analysis of device sizing for sub-threshold circuits shows the trade-offs between sizing for minimum energy and for minimum voltage operation.(cont.) A programmable FIR filter test chip fabricated in 0.18pum bulk CMOS provides measurements to confirm the model and the sizing analysis. Third, a low-overhead method for integrating sub-threshold operation with high performance applications extends dynamic voltage scaling across orders of magnitude of frequency and provides energy scalability down to the minimum energy point. A 90nm bulk CMOS test chip confirms the range of operation for ultra-dynamic voltage scaling. Finally, sub-threshold operation is extended to memories. Analysis of traditional SRAM bitcells and architectures leads to development of a new bitcell for robust sub-threshold SRAM operation. The sub-threshold SRAM is analyzed experimentally in a 65nm bulk CMOS test chip.by Benton H. Calhoun.Ph.D

Low-power and high-performance SRAM design in high variability advanced CMOS technology

As process technologies shrink, the size and number of memories on a chip are exponentially increasing. Embedded SRAMs are a critical component in modern digital systems, and they strongly impact the overall power, performance, and area. To promote memory-related research in academia, this dissertation introduces OpenRAM, a flexible, portable and open-source memory compiler and characterization methodology for generating and verifying memory designs across different technologies.In addition, SRAM designs, focusing on improving power consumption, access time and bitcell stability are explored in high variability advanced CMOS technologies. To have a stable read/write operation for SRAM in high variability process nodes, a differential-ended single-port 8T bitcell is proposed that improves the read noise margin, write noise margin and readout bitcell current by 45%, 48% and 21%, respectively, compared to a conventional 6T bitcell. Also, a differential-ended single-port 12T bitcell for subthreshold operation is proposed that solves the half-select disturbance and allows efficient bit-interleaving. 12T bitcell has a leakage control mechanism which helps to reduce the power consumption and provides operation down to 0.3 V. Both 8T and 12T bitcells are analyzed in a 64 kb SRAM array using 32 nm technology. Besides, to further improve the access time and power consumption, two tracking circuits (multi replica bitline delay and reconfigurable replica bitline delay techniques) are proposed to aid the generation of accurate and optimum sense amplifier set time.An error tolerant SRAM architecture suitable for low voltage video application with dynamic power-quality management is also proposed in this dissertation. This memory uses three power supplies to improve the SRAM stability in low voltages. The proposed triple-supply approach achieves 63% improvement in image quality and 69% reduction in power consumption compared to a single-supply 64 kb SRAM array at 0.70 V

Sensor de envelhecimento para células de memória CMOS

Dissertação de Mestrado, Engenharia e Tecnologia, Instituto Superior de Engenharia, Universidade do Algarve, 2016As memórias Complementary Metal Oxide Semiconductor (CMOS) ocupam uma percentagem de área significativa nos circuitos integrados e, com o desenvolvimento de tecnologias de fabrico a uma escala cada vez mais reduzida, surgem problemas de performance e de fiabilidade. Efeitos como o BTI (Bias Thermal Instability), TDDB (Time Dependent Dielectric Breakdown), HCI (Hot Carrier Injection), EM (Electromigration), degradam os parâmetros físicos dos transístores de efeito de campo (MOSFET), alterando as suas propriedades elétricas ao longo do tempo. O efeito BTI pode ser subdividido em NBTI (Negative BTI) e PBTI (Positive BTI). O efeito NBTI é dominante no processo de degradação e envelhecimento dos transístores CMOS, afetando os transístores PMOS, enquanto o efeito PBTI assume especial relevância na degradação dos transístores NMOS. A degradação provocada por estes efeitos, manifesta-se nos transístores através do incremento do módulo da tensão de limiar de condução |ℎ| ao longo do tempo. A degradação dos transístores é designada por envelhecimento, sendo estes efeitos cumulativos e possuindo um grande impacto na performance do circuito, em particular se ocorrerem outras variações paramétricas. Outras variações paramétricas adicionais que podem ocorrer são as variações de processo (P), tensão (V) e temperatura (T), ou considerando todas estas variações, e de uma forma genérica, PVTA (Process, Voltage, Temperature and Aging). As células de memória de acesso aleatório (RAM, Random Access Memory), em particular as memórias estáticas (SRAM, Static Random Access Memory) e dinâmicas (DRAM, Dynamic Random Access Memory), possuem tempos de leitura e escrita precisos. Quando ao longo do tempo ocorre o envelhecimento das células de memória, devido à degradação das propriedades dos transístores MOSFET, ocorre também uma degradação da performance das células de memória. A degradação de performance é, portanto, resultado das transições lentas que ocorrem, devido ao envelhecimento dos transístores MOSFET que comutam mais tarde, comparativamente a transístores novos. A degradação de performance nas memórias devido às transições lentas pode traduzir-se em leituras e escritas mais lentas, bem como em alterações na capacidade de armazenamento da memória. Esta propriedade pode ser expressa através da margem de sinal ruído (SNM). O SNM é reduzido com o envelhecimento dos transístores MOSFET e, quando o valor do SNM é baixo, a célula perde a sua capacidade de armazenamento, tornando-se mais vulnerável a fontes de ruído. O SNM é, portanto, um valor que permite efetuar a aferição (benchmarking) e comparar as características da memória perante o envelhecimento ou outras variações paramétricas que possam ocorrer. O envelhecimento das memórias CMOS traduz-se portanto na ocorrência de erros nas memórias ao longo do tempo, o que é indesejável especialmente em sistemas críticos. O trabalho apresentado nesta dissertação tem como objetivo o desenvolvimento de um sensor de envelhecimento e performance para memórias CMOS, detetando e sinalizando para o exterior o envelhecimento em células de memória SRAM devido à constante monitorização da sua performance. O sensor de envelhecimento e performance é ligado na bit line da célula de memória e monitoriza ativamente as operações de leitura e escrita decorrentes da operação da memória. O sensor de envelhecimento é composto por dois blocos: um detetor de transições e um detetor de pulsos. O detetor de transições é constituído por oito inversores e uma porta lógica XOR realizada com portas de passagem. Os inversores possuem diferentes relações nos tamanhos dos transístores P/N, permitindo tempos de comutação em diferentes valores de tensão. Assim, quando os inversores com tensões de comutações diferentes são estimulados pelo mesmo sinal de entrada e são ligados a uma porta XOR, permitem gerar na saída um impulso sempre que existe uma comutação na bit line. O impulso terá, portanto, uma duração proporcional ao tempo de comutação do sinal de entrada, que neste caso particular são as operações de leitura e escrita da memória. Quando o envelhecimento ocorre e as transições se tornam mais lentas, os pulsos possuem uma duração superior face aos pulsos gerados numa SRAM nova. Os pulsos gerados seguem para um elemento de atraso (delay element) que provoca um atraso aos pulsos, invertendo-os de seguida, e garantindo que a duração dos pulsos é suficiente para que exista uma deteção. O impulso gerado é ligado ao bloco seguinte que compõe o sensor de envelhecimento e performance, sendo um circuito detetor de pulso. O detetor de pulso implementa um NOR CMOS, controlado por um sinal de relógio (clock) e pelos pulsos invertidos. Quando os dois sinais de input do NOR são ‘0’ o output resultante será ‘1’, criando desta forma uma janela de deteção. O sensor de envelhecimento será ajustado em cada implementação, de forma a que numa célula de memória nova os pulsos invertidos se encontrem alinhados temporalmente com os pulsos de relógio. Este ajuste é feito durante a fase de projeto, em função da frequência de operação requerida para a célula, quer pelo dimensionamento do delay element (ajustando o seu atraso), quer pela definição do período do sinal de relógio. À medida que o envelhecimento dos circuitos ocorre e as comutações nos transístores se tornam mais lentas, a duração dos pulsos aumenta e consequentemente entram na janela de deteção, originando uma sinalização na saída do sensor. Assim, caso ocorram operações de leitura e escrita instáveis, ou seja, que apresentem tempos de execução acima do expectável ou que os seus níveis lógicos estejam degradados, o sensor de envelhecimento e performance devolve para o exterior ‘1’, sinalizando um desempenho crítico para a operação realizada, caso contrário a saída será ‘0’, indicando que não é verificado nenhum erro no desempenho das operações de escrita e leitura. Os transístores do sensor de envelhecimento e performance são dimensionados de acordo com a implementação; por exemplo, os modelos dos transístores selecionados, tensões de alimentação, ou número de células de memória conectadas na bit line, influenciam o dimensionamento prévio do sensor, já que tanto a performance da memória como o desempenho do sensor dependem das condições de operação. Outras soluções previamente propostas e disponíveis na literatura, nomeadamente o sensor de envelhecimento embebido no circuito OCAS (On-Chip Aging Sensor), permitem detetar envelhecimento numa SRAM devido ao envelhecimento por NBTI. Porém esta solução OCAS apenas se aplica a um conjunto de células SRAM conectadas a uma bit line, não sendo aplicado individualmente a outras células de memória como uma DRAM e não contemplando o efeito PBTI. Uma outra solução já existente, o sensor Scout flip-flop utilizado para aplicações ASIC (Application Specific Integrated Circuit) em circuitos digitais síncronos, atua também como um sensor de performance local e responde de forma preditiva na monitorização de faltas por atraso, utilizando por base janelas de deteção. Esta solução não foi projetada para a monitorização de operações de leitura e escrita em memórias SRAM e DRAM. No entanto, pela sua forma de atuar, esta solução aproxima-se mais da solução proposta neste trabalho, uma vez que o seu funcionamento se baseia em sinalização de sinais atrasados. Nesta dissertação, o recurso a simulações SPICE (Simulation Program with Integrated Circuit Emphasis) permite validar e testar o sensor de envelhecimento e performance. O caso de estudo utilizado para aplicar o sensor é uma memória CMOS, SRAM, composta por 6 transístores, juntamente com os seus circuitos periféricos, nomeadamente o amplificador sensor e o circuito de pré-carga e equalização, desenvolvidos em tecnologia CMOS de 65nm e 22nm, com recurso aos modelos de MOSFET ”Berkeley Predictive Technology Models (PTM)”. O sensor é devolvido e testado em 65nm e em 22nm com os modelos PTM, permitindo caracterizar o sensor de envelhecimento e performance desenvolvido, avaliando também de que forma o envelhecimento degrada as operações de leitura e escrita da SRAM, bem como a sua capacidade de armazenamento e robustez face ao ruído. Por fim, as simulações apresentadas provam que o sensor de envelhecimento e performance desenvolvido nesta tese de mestrado permite monitorizar com sucesso a performance e o envelhecimento de circuitos de memória SRAM, ultrapassando os desafios existentes nas anteriores soluções disponíveis para envelhecimento de memórias. Verificou-se que na presença de um envelhecimento que provoque uma degradação igual ou superior a 10%, o sensor de envelhecimento e performance deteta eficazmente a degradação na performance, sinalizando os erros. A sua utilização em memórias DRAM, embora possível, não foi testada nesta dissertação, ficando reservada para trabalho futuro

U-DVS SRAM design considerations

Thesis (S.M.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 2008.Includes bibliographical references (leaves 73-78).With the continuous scaling down of transistor feature sizes, the semiconductor industry faces new challenges. One of these challenges is the incessant increase of power consumption in integrated circuits. This problem has motivated the industry and academia to pay significant attention to low-power circuit design for the past two decades. Operating digital circuits at lower voltage levels was shown to increase energy efficiency and lower power consumption. Being an integral part of the digital systems, Static Random Access Memories (SRAMs), dominate the power consumption and area of modern integrated circuits. Consequently, designing low-power high density SRAMs operational at low voltage levels is an important research problem. This thesis focuses on and makes several contributions to low-power SRAM design. The trade-offs and potential overheads associated with designing SRAMs for a very large voltage range are analyzed. An 8T SRAM cell is designed and optimized for both sub-threshold and above-threshold operation. Hardware reconfigurability is proposed as a solution to power and area overheads due to peripheral assist circuitry which are necessary for low voltage operation. A 64kbit SRAM has been designed in 65nm CMOS process and the fabricated chip has been tested, demonstrating operation at power supply levels from 0.25V to 1.2V. This is the largest operating voltage range reported in 65nm semiconductor technology node. Additionally, another low voltage SRAM has been designed for the on-chip caches of a low-power H.264 video decoder. Power and performance models of the memories have been developed along with a configurable interface circuit. This custom memory implemented with the low-power architecture of the decoder provides nearly 10X power savings.by Mahmut E. Sinangil.S.M