3 research outputs found
Tunable Visibly Transparent Optics Derived from Porous Silicon
Visibly
transparent porous silicon dioxide (PSiO<sub>2</sub>) and PSiO<sub>2</sub>/titanium dioxide (TiO<sub>2</sub>) optical elements were
fabricated by thermal oxidation, or a combination of thermal oxidation
and atomic layer deposition infilling, of an electrochemically etched
porous silicon (PSi) structure containing an electrochemically defined
porosity profile. The thermally oxidized PSiO<sub>2</sub> structures
are transparent at visible wavelengths and can be designed to have
refractive indices ranging from 1.1 to 1.4. The refractive index can
be increased above 2.0 through TiO<sub>2</sub> infilling of the pores.
Applying this oxidation and TiO<sub>2</sub> infilling methodology
enabled tuning of a distributed Bragg reflector (DBR) formed from
PSi across the visible spectrum. At the maximum filling, the DBR exhibited
a transmission of 2% at 620 nm. Simulations match well with measured
spectra. In addition to forming DBR filters, phase-shaping gradient
refractive index (GRIN) elements were formed. As a demonstration,
a 4 mm diameter radial GRIN PSiO<sub>2</sub> element with a parabolic,
lens-like phase profile with a calculated focal length of 1.48 m was
formed. The calculated focal length was reduced to 0.80 m upon the
addition of TiO<sub>2</sub>. All the structures showed broad transparency
in the visible and were stable to the materials conversion process
Transfer-Printing of Tunable Porous Silicon Microcavities with Embedded Emitters
Here
we demonstrate, via a modified transfer-printing technique,
that electrochemically fabricated porous silicon (PSi) distributed
Bragg reflectors (DBRs) can serve as the basis of high-quality hybrid
microcavities compatible with most forms of photoemitters. Vertical
microcavities consisting of an emitter layer sandwiched between 11-
and 15-period PSi DBRs were constructed. The emitter layer included
a polymer doped with PbS quantum dots, as well as a heterogeneous
GaAs thin film. In this structure, the PbS emission was significantly
redistributed to a 2.1 nm full-width at half-maximum around 1198 nm,
while the PSi/GaAs hybrid microcavity emitted at 902 nm with a sub-nanometer
full-width at half-maximum and quality-factor of 1058. Modification
of PSi DBRs to include a PSi cavity coupling layer enabled tuning
of the total cavity optical thickness. Infiltration of the PSi with
Al<sub>2</sub>O<sub>3</sub> by atomic layer deposition globally red-shifted
the emission peak of PbS quantum dots up to ∼18 nm (∼0.9
nm per cycle), while introducing a cavity coupling layer with a gradient
optical thickness spatially modulated the cavity resonance of the
PSi/GaAs hybrid such that there was an ∼30 nm spectral variation
in the emission of separate GaAs modules printed ∼3 mm apart
Porous Silicon Gradient Refractive Index Micro-Optics
The emergence and
growth of transformation optics over the past decade has revitalized
interest in how a gradient refractive index (GRIN) can be used to
control light propagation. Two-dimensional demonstrations with lithographically
defined silicon (Si) have displayed the power of GRIN optics and also
represent a promising opportunity for integrating compact optical
elements within Si photonic integrated circuits. Here, we demonstrate
the fabrication of three-dimensional Si-based GRIN micro-optics through
the shape-defined formation of porous Si (PSi). Conventional microfabrication
creates Si square microcolumns (SMCs) that can be electrochemically
etched into PSi elements with nanoscale porosity along the shape-defined
etching pathway, which imparts the geometry with structural birefringence.
Free-space characterization of the transmitted intensity distribution
through a homogeneously etched PSi SMC exhibits polarization splitting
behavior resembling that of dielectric metasurfaces that require considerably
more laborious fabrication. Coupled birefringence/GRIN effects are
studied by way of PSi SMCs etched with a linear (increasing from edge
to center) GRIN profile. The transmitted intensity distribution shows
polarization-selective focusing behavior with one polarization focused
to a diffraction-limited spot and the orthogonal polarization focused
into two laterally displaced foci. Optical thickness-based analysis
readily predicts the experimentally observed phenomena, which strongly
match finite-element electromagnetic simulations